DE102013218991A1 - Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems - Google Patents
Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems Download PDFInfo
- Publication number
- DE102013218991A1 DE102013218991A1 DE102013218991.5A DE102013218991A DE102013218991A1 DE 102013218991 A1 DE102013218991 A1 DE 102013218991A1 DE 102013218991 A DE102013218991 A DE 102013218991A DE 102013218991 A1 DE102013218991 A1 DE 102013218991A1
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- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 48
- 238000003384 imaging method Methods 0.000 claims abstract description 20
- 238000012360 testing method Methods 0.000 claims description 72
- 230000005540 biological transmission Effects 0.000 claims description 23
- 238000004458 analytical method Methods 0.000 claims description 21
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- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
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- 239000012528 membrane Substances 0.000 description 19
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Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/444—Compensating; Calibrating, e.g. dark current, temperature drift, noise reduction or baseline correction; Adjusting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Geometry (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013218991.5A DE102013218991A1 (de) | 2013-09-20 | 2013-09-20 | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
| PCT/EP2014/002528 WO2015039751A1 (de) | 2013-09-20 | 2014-09-18 | Vorrichtung zum bestimmen einer optischen eigenschaft eines optischen abbildungssystems |
| JP2016515495A JP6546912B2 (ja) | 2013-09-20 | 2014-09-18 | 光学結像系の光学特性を測定する方法及び装置 |
| US15/075,369 US10006807B2 (en) | 2013-09-20 | 2016-03-21 | Apparatus for determining an optical property of an optical imaging system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013218991.5A DE102013218991A1 (de) | 2013-09-20 | 2013-09-20 | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013218991A1 true DE102013218991A1 (de) | 2015-03-26 |
Family
ID=51659602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013218991.5A Ceased DE102013218991A1 (de) | 2013-09-20 | 2013-09-20 | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10006807B2 (https=) |
| JP (1) | JP6546912B2 (https=) |
| DE (1) | DE102013218991A1 (https=) |
| WO (1) | WO2015039751A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018157977A1 (de) * | 2017-03-02 | 2018-09-07 | Carl Zeiss Smt Gmbh | Messvorrichtung zur vermessung eines wellenfrontfehlers eines abbildenden optischen systems |
| WO2019166183A1 (en) * | 2018-02-28 | 2019-09-06 | Asml Netherlands B.V. | Apodization measurement for lithographic apparatus |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014209348A1 (de) * | 2014-05-16 | 2015-11-19 | Carl Zeiss Smt Gmbh | Ermittlung einer korrigierten Größe |
| DE102015226571B4 (de) * | 2015-12-22 | 2019-10-24 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zur Wellenfrontanalyse |
| DE102016212477A1 (de) * | 2016-07-08 | 2018-01-11 | Carl Zeiss Smt Gmbh | Messverfahren und Messsystem zur interferometrischen Vermessung der Abbildungsqualität eines optischen Abbildungssystems |
| DE102017208340A1 (de) | 2017-05-17 | 2018-11-22 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission |
| CN110892330B (zh) | 2017-07-10 | 2024-05-03 | Asml荷兰有限公司 | 光刻方法和设备 |
| DE102017217251A1 (de) * | 2017-09-27 | 2019-03-28 | Carl Zeiss Smt Gmbh | Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems |
| US11019326B2 (en) * | 2018-02-09 | 2021-05-25 | Jenoptik Optical Systems, Llc | Light-source characterizer and associated methods |
| DE102021206203A1 (de) * | 2021-06-17 | 2022-12-22 | Carl Zeiss Smt Gmbh | Heizanordnung und Verfahren zum Heizen eines optischen Elements |
| JP7690373B2 (ja) * | 2021-10-13 | 2025-06-10 | レーザーテック株式会社 | 瞳観察方法、撮像方法、および撮像装置 |
| KR20240082039A (ko) * | 2022-12-01 | 2024-06-10 | 삼성전자주식회사 | 모니터링 유닛 및 이를 포함하는 기판 처리 장치 |
| CN116202749B (zh) * | 2023-03-02 | 2025-08-22 | 中国人民解放军国防科技大学 | 一种在线监测强光元件退化失效的装置和方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10109929A1 (de) * | 2000-02-23 | 2001-11-22 | Zeiss Carl | Vorrichtung zur Wellenfronterfassung |
| US20060109544A1 (en) | 2004-11-22 | 2006-05-25 | Knight's Armament Company | Night-day boresight with adjustable wedge-prism assembly |
| DE102005041373A1 (de) | 2004-11-29 | 2006-06-01 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur kalibrierenden Wellenfrontvermessung |
| US8102511B2 (en) | 2004-10-06 | 2012-01-24 | Asml Netherlands B.V. | Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby |
| US20120182537A1 (en) | 2009-09-23 | 2012-07-19 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus, and device manufacturing method |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100210569B1 (ko) | 1995-09-29 | 1999-07-15 | 미따라이 하지메 | 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법 |
| EP1184727A1 (en) * | 2000-09-01 | 2002-03-06 | Asm Lithography B.V. | Lithographic apparatus |
| US6710856B2 (en) * | 2000-09-01 | 2004-03-23 | Asml Netherlands B.V. | Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
| JP2003227914A (ja) | 2002-01-31 | 2003-08-15 | Canon Inc | Ｅｕｖ光用の波面分割素子及びそれを有する位相測定装置 |
| US6958806B2 (en) * | 2002-12-02 | 2005-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| AU2003281995A1 (en) | 2003-04-11 | 2004-11-01 | Carl Zeiss Smt Ag | Diffuser, wavefront source, wavefront sensor and projection lighting facility |
| JP4387359B2 (ja) * | 2003-09-26 | 2009-12-16 | カール・ツァイス・エスエムティー・アーゲー | 光学特性の測定方法、及び波面検出系を備えた投影露光システム |
| JP2006080446A (ja) * | 2004-09-13 | 2006-03-23 | Nikon Corp | 露光装置、波面計測装置、反射レチクル、波面計測用マスク、露光方法、波面計測方法及びマイクロデバイスの製造方法 |
| US7812928B2 (en) | 2005-07-06 | 2010-10-12 | Nikon Corporation | Exposure apparatus |
| US7709816B2 (en) | 2007-08-16 | 2010-05-04 | Sematech, Inc. | Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication |
| DE102007054683A1 (de) | 2007-11-14 | 2009-05-28 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| DE102008004762A1 (de) * | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
| DE102008002247A1 (de) | 2008-06-05 | 2009-12-10 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Systems |
| DE102010038697B4 (de) * | 2010-07-30 | 2012-07-19 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie |
| DE102011077223B4 (de) | 2011-06-08 | 2013-08-14 | Carl Zeiss Smt Gmbh | Messsystem |
-
2013
- 2013-09-20 DE DE102013218991.5A patent/DE102013218991A1/de not_active Ceased
-
2014
- 2014-09-18 JP JP2016515495A patent/JP6546912B2/ja active Active
- 2014-09-18 WO PCT/EP2014/002528 patent/WO2015039751A1/de not_active Ceased
-
2016
- 2016-03-21 US US15/075,369 patent/US10006807B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10109929A1 (de) * | 2000-02-23 | 2001-11-22 | Zeiss Carl | Vorrichtung zur Wellenfronterfassung |
| US8102511B2 (en) | 2004-10-06 | 2012-01-24 | Asml Netherlands B.V. | Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby |
| US20060109544A1 (en) | 2004-11-22 | 2006-05-25 | Knight's Armament Company | Night-day boresight with adjustable wedge-prism assembly |
| DE102005041373A1 (de) | 2004-11-29 | 2006-06-01 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur kalibrierenden Wellenfrontvermessung |
| US20120182537A1 (en) | 2009-09-23 | 2012-07-19 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus, and device manufacturing method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018157977A1 (de) * | 2017-03-02 | 2018-09-07 | Carl Zeiss Smt Gmbh | Messvorrichtung zur vermessung eines wellenfrontfehlers eines abbildenden optischen systems |
| US11441970B2 (en) | 2017-03-02 | 2022-09-13 | Carl Zeiss Smt Gmbh | Measurement apparatus for measuring a wavefront aberration of an imaging optical system |
| WO2019166183A1 (en) * | 2018-02-28 | 2019-09-06 | Asml Netherlands B.V. | Apodization measurement for lithographic apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6546912B2 (ja) | 2019-07-17 |
| US20160202118A1 (en) | 2016-07-14 |
| WO2015039751A1 (de) | 2015-03-26 |
| JP2016538576A (ja) | 2016-12-08 |
| US10006807B2 (en) | 2018-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: G01J0009020000 Ipc: G01M0011020000 |
|
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |