DE102013204644A1 - Oberflächenemittierender laser mit drittem reflektor - Google Patents
Oberflächenemittierender laser mit drittem reflektor Download PDFInfo
- Publication number
- DE102013204644A1 DE102013204644A1 DE102013204644A DE102013204644A DE102013204644A1 DE 102013204644 A1 DE102013204644 A1 DE 102013204644A1 DE 102013204644 A DE102013204644 A DE 102013204644A DE 102013204644 A DE102013204644 A DE 102013204644A DE 102013204644 A1 DE102013204644 A1 DE 102013204644A1
- Authority
- DE
- Germany
- Prior art keywords
- pump
- radiation
- gan
- reflector
- active region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18363—Structure of the reflectors, e.g. hybrid mirrors comprising air layers
- H01S5/18366—Membrane DBR, i.e. a movable DBR on top of the VCSEL
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18383—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with periodic active regions at nodes or maxima of light intensity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/041—Optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18377—Structure of the reflectors, e.g. hybrid mirrors comprising layers of different kind of materials, e.g. combinations of semiconducting with dielectric or metallic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3201—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures incorporating bulkstrain effects, e.g. strain compensation, strain related to polarisation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/427,105 US9112331B2 (en) | 2012-03-22 | 2012-03-22 | Surface emitting laser incorporating third reflector |
| US13/427105 | 2012-03-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013204644A1 true DE102013204644A1 (de) | 2013-09-26 |
Family
ID=48226795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013204644A Ceased DE102013204644A1 (de) | 2012-03-22 | 2013-03-15 | Oberflächenemittierender laser mit drittem reflektor |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9112331B2 (https=) |
| JP (1) | JP5966140B2 (https=) |
| CN (1) | CN103326240B (https=) |
| DE (1) | DE102013204644A1 (https=) |
| GB (1) | GB2500489B (https=) |
| TW (1) | TWI572103B (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9112332B2 (en) | 2012-06-14 | 2015-08-18 | Palo Alto Research Center Incorporated | Electron beam pumped vertical cavity surface emitting laser |
| US9735543B2 (en) * | 2014-08-22 | 2017-08-15 | Empire Technology Development Llc | Optical interconnects |
| JP6688109B2 (ja) * | 2016-02-25 | 2020-04-28 | 日本碍子株式会社 | 面発光素子、外部共振器型垂直面発光レーザー、および面発光素子の製造方法 |
| US10541514B2 (en) | 2016-02-25 | 2020-01-21 | Ngk Insulators, Ltd. | Surface-emitting device, vertical external-cavity surface-emitting laser, and method for manufacturing surface-emitting device |
| US9780532B1 (en) | 2016-11-21 | 2017-10-03 | Palo Alto Research Center Incorporated | Vertical external cavity surface emitting laser utilizing an external micromirror array |
| CN107887790A (zh) * | 2017-09-27 | 2018-04-06 | 华东师范大学 | 一种多波长GaN基非对称量子阱面发射激光器及其制备方法 |
| US10290996B1 (en) * | 2018-04-25 | 2019-05-14 | Hewlett Packard Enterprise Development Lp | Bottom emitting vertical-cavity surface-emitting lasers |
| KR102709344B1 (ko) * | 2018-06-19 | 2024-09-25 | 엑셀리타스 테크놀로지스 코포레이션 | 파장 가변형 수직 공진 표면광 레이저 내의 양자 우물 배치 |
| CN112753145B (zh) * | 2018-09-19 | 2025-01-17 | 新墨西哥大学雨林创新 | 高功率光泵浦半导体盘形激光器的宽带有源反射镜架构 |
| CN113661619A (zh) * | 2019-03-11 | 2021-11-16 | 维林光电公司 | 稳定的uv激光器 |
| TWI733579B (zh) | 2019-09-09 | 2021-07-11 | 全新光電科技股份有限公司 | 垂直共振腔表面放射雷射二極體(vcsel)的量測方法及磊晶片測試治具 |
| JP2023127163A (ja) * | 2022-03-01 | 2023-09-13 | スタンレー電気株式会社 | 垂直共振器型発光素子 |
Family Cites Families (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4730334A (en) | 1987-01-05 | 1988-03-08 | Collins George J | Ultraviolet metal ion laser |
| US5461637A (en) | 1994-03-16 | 1995-10-24 | Micracor, Inc. | High brightness, vertical cavity semiconductor lasers |
| US5561680A (en) * | 1994-12-20 | 1996-10-01 | Philips Electronics North America Corporation | II-VI semiconductor diode laser having a strained layer |
| JPH08321660A (ja) * | 1995-05-25 | 1996-12-03 | Nichia Chem Ind Ltd | 窒化物半導体レーザ素子 |
| US5771253A (en) | 1995-10-13 | 1998-06-23 | The Board Of Trustees Of The Leland Stanford Junior University | High performance micromechanical tunable verticle cavity surface emitting laser |
| US5677923A (en) | 1996-01-11 | 1997-10-14 | Mcdonnell Douglas Corporation | Vertical cavity electron beam pumped semiconductor lasers and methods |
| US5706306A (en) | 1996-03-15 | 1998-01-06 | Motorola | VCSEL with distributed Bragg reflectors for visible light |
| US7167495B2 (en) * | 1998-12-21 | 2007-01-23 | Finisar Corporation | Use of GaAs extended barrier layers between active regions containing nitrogen and AlGaAs confining layers |
| US6411638B1 (en) | 1999-08-31 | 2002-06-25 | Honeywell Inc. | Coupled cavity anti-guided vertical-cavity surface-emitting laser |
| JP2001085793A (ja) | 1999-09-10 | 2001-03-30 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
| US6393038B1 (en) | 1999-10-04 | 2002-05-21 | Sandia Corporation | Frequency-doubled vertical-external-cavity surface-emitting laser |
| JP2001168451A (ja) * | 1999-12-08 | 2001-06-22 | Fuji Photo Film Co Ltd | 面発光型半導体素子の製造方法およびその面発光型半導体素子を用いた半導体レーザ装置 |
| US6735234B1 (en) * | 2000-02-11 | 2004-05-11 | Giga Tera Ag | Passively mode-locked optically pumped semiconductor external-cavity surface-emitting laser |
| US6778582B1 (en) * | 2000-03-06 | 2004-08-17 | Novalux, Inc. | Coupled cavity high power semiconductor laser |
| US20060029120A1 (en) * | 2000-03-06 | 2006-02-09 | Novalux Inc. | Coupled cavity high power semiconductor laser |
| US6611544B1 (en) | 2000-04-11 | 2003-08-26 | E20 Communications, Inc. | Method and apparatus for narrow bandwidth distributed bragg reflector semiconductor lasers |
| US6611546B1 (en) * | 2001-08-15 | 2003-08-26 | Blueleaf, Inc. | Optical transmitter comprising a stepwise tunable laser |
| US6556602B2 (en) | 2000-12-05 | 2003-04-29 | The Boeing Company | Electron beam pumped semiconductor laser screen and associated fabrication method |
| US6882669B2 (en) | 2001-02-10 | 2005-04-19 | Zhijiang Hang | High-power surface emitting laser and fabrication methods thereof |
| US6879618B2 (en) | 2001-04-11 | 2005-04-12 | Eastman Kodak Company | Incoherent light-emitting device apparatus for driving vertical laser cavity |
| WO2003007437A2 (en) | 2001-07-09 | 2003-01-23 | Siros Technologies, Inc. | Chirp-free directly modulated light source with integrated wavelocker |
| US20030031218A1 (en) | 2001-08-13 | 2003-02-13 | Jang-Hun Yeh | VCSEL structure and method of making same |
| US6697413B2 (en) | 2001-10-31 | 2004-02-24 | Applied Optoelectronics, Inc. | Tunable vertical-cavity surface-emitting laser with tuning junction |
| US6775314B1 (en) * | 2001-11-29 | 2004-08-10 | Sandia Corporation | Distributed bragg reflector using AIGaN/GaN |
| US6806110B2 (en) | 2002-05-16 | 2004-10-19 | Agilent Technologies, Inc. | Monolithic multi-wavelength vertical-cavity surface emitting laser array and method of manufacture therefor |
| US6859481B2 (en) * | 2002-07-16 | 2005-02-22 | Applied Optoelectronics, Inc. | Optically-pumped multiple-quantum well active region with improved distribution of optical pumping power |
| GB2399941A (en) | 2003-03-24 | 2004-09-29 | Univ Strathclyde | Vertical cavity semiconductor optical devices |
| DE102004024611A1 (de) | 2003-05-23 | 2005-03-03 | Osram Opto Semiconductors Gmbh | Optisch gepumpte Halbleitervorrichtung |
| JP2005051124A (ja) | 2003-07-30 | 2005-02-24 | Sumitomo Electric Ind Ltd | 面発光型半導体素子 |
| DE10339980B4 (de) * | 2003-08-29 | 2011-01-05 | Osram Opto Semiconductors Gmbh | Halbleiterlaser mit reduzierter Verlustwärme |
| JP4671617B2 (ja) * | 2004-03-30 | 2011-04-20 | 三洋電機株式会社 | 集積型半導体レーザ素子 |
| US20060029112A1 (en) * | 2004-03-31 | 2006-02-09 | Young Ian A | Surface emitting laser with an integrated absorber |
| KR20050120483A (ko) | 2004-06-19 | 2005-12-22 | 삼성전자주식회사 | 고효율 면발광 반도체 레이저 소자, 상기 레이저 소자용레이저 펌핑부, 그리고 그 제조 방법 |
| US7403553B2 (en) | 2004-06-25 | 2008-07-22 | Finisar Corporation | Absorbing layers for reduced spontaneous emission effects in an integrated photodiode |
| US7590161B1 (en) | 2004-10-05 | 2009-09-15 | Photon Systems | Electron beam pumped semiconductor laser |
| EP1648060B1 (en) | 2004-10-14 | 2008-07-23 | Samsung Electronics Co.,Ltd. | Funnel structure vertical external cavity surface-emitting laser (VECSEL) |
| KR101015501B1 (ko) | 2004-12-28 | 2011-02-16 | 삼성전자주식회사 | 다수의 양자우물을 갖는 외부 공진기형 면발광 레이저 소자 |
| JP4027393B2 (ja) * | 2005-04-28 | 2007-12-26 | キヤノン株式会社 | 面発光レーザ |
| KR101100434B1 (ko) | 2005-05-07 | 2011-12-30 | 삼성전자주식회사 | 후방 광펌핑 방식의 외부 공진기형 면발광 레이저 |
| JP2007019399A (ja) * | 2005-07-11 | 2007-01-25 | Toshiba Corp | 半導体レーザ装置 |
| KR101228108B1 (ko) * | 2005-11-09 | 2013-01-31 | 삼성전자주식회사 | 펌프 빔 반사층을 갖는 외부 공진기형 면발광 레이저 |
| KR101100431B1 (ko) * | 2005-11-22 | 2011-12-30 | 삼성전자주식회사 | 고효율 2차 조화파 생성 외부 공진기형 면발광 레이저 |
| KR101270166B1 (ko) * | 2006-01-17 | 2013-05-31 | 삼성전자주식회사 | 외부 공진기형 면발광 레이저 |
| US7801197B2 (en) * | 2006-06-16 | 2010-09-21 | Epicrystals Oy | High power laser device |
| KR101217557B1 (ko) * | 2006-08-02 | 2013-01-02 | 삼성전자주식회사 | 직접 광변조가 가능한 레이저 모듈 및 이를 채용한 레이저디스플레이 장치 |
| KR101206035B1 (ko) | 2006-11-14 | 2012-11-28 | 삼성전자주식회사 | 수직 외부 공동 면발광 레이저 |
| KR101257850B1 (ko) | 2006-11-22 | 2013-04-24 | 삼성전자주식회사 | 고효율 레이저칩 및 이를 이용한 외부 공진기형 면발광레이저 |
| US8023547B2 (en) * | 2007-03-16 | 2011-09-20 | Koninklijke Philips Electronics N.V. | Vertical extended cavity surface emission laser and method for manufacturing a light emitting component of the same |
| JP4766704B2 (ja) | 2007-04-20 | 2011-09-07 | キヤノン株式会社 | 面発光レーザ |
| US8102893B2 (en) | 2007-06-14 | 2012-01-24 | Necsel Intellectual Property | Multiple emitter VECSEL |
| EP2174392B1 (en) | 2007-08-02 | 2020-04-29 | EFFECT Photonics B.V. | Semiconductor laser device |
| CN101849334A (zh) | 2007-11-07 | 2010-09-29 | 皇家飞利浦电子股份有限公司 | 具有增大的强度的扩展腔半导体激光设备 |
| CN101447644B (zh) * | 2007-11-28 | 2010-11-10 | 中国科学院长春光学精密机械与物理研究所 | 电泵浦面发射耦合微腔有机激光器件 |
| CN101904062A (zh) * | 2007-12-19 | 2010-12-01 | 皇家飞利浦电子股份有限公司 | Vecsel泵浦固态激光器 |
| US7801195B2 (en) * | 2008-02-14 | 2010-09-21 | Koninklijke Philips Electronics N.V. | Electrically-pumped semiconductor zigzag extended cavity surface emitting lasers and superluminescent LEDs |
| US8355417B2 (en) * | 2008-10-14 | 2013-01-15 | Koninklijke Philips Electronics N.V. | Vertical cavity surface emitting laser with improved mode-selectivity |
| US7983317B2 (en) * | 2008-12-16 | 2011-07-19 | Corning Incorporated | MQW laser structure comprising plural MQW regions |
| US8121169B2 (en) | 2009-04-14 | 2012-02-21 | Corning Incorporated | Split control of front and rear DBR grating portions |
| US8000371B2 (en) * | 2009-09-22 | 2011-08-16 | Palo Alto Research Center Incorporated | Vertical surface emitting semiconductor device |
| TW201126853A (en) | 2010-01-25 | 2011-08-01 | Univ Nat Changhua Education | Laser diode with asymmetric quantum well |
| JP2012015139A (ja) * | 2010-06-29 | 2012-01-19 | Fuji Xerox Co Ltd | 面発光型半導体レーザ、面発光型半導体レーザ装置、光伝送装置および情報処理装置 |
| US20130163627A1 (en) | 2011-12-24 | 2013-06-27 | Princeton Optronics | Laser Illuminator System |
-
2012
- 2012-03-22 US US13/427,105 patent/US9112331B2/en active Active
-
2013
- 2013-03-11 JP JP2013047452A patent/JP5966140B2/ja not_active Expired - Fee Related
- 2013-03-15 DE DE102013204644A patent/DE102013204644A1/de not_active Ceased
- 2013-03-20 TW TW102109824A patent/TWI572103B/zh not_active IP Right Cessation
- 2013-03-21 GB GB1305179.2A patent/GB2500489B/en not_active Expired - Fee Related
- 2013-03-21 CN CN201310091688.4A patent/CN103326240B/zh not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| Y.C. Shen et al. gemessen, wie in Applied Phys. Lett. 91, 141101 (2007) |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013229580A (ja) | 2013-11-07 |
| GB2500489B (en) | 2018-09-26 |
| US20130343420A1 (en) | 2013-12-26 |
| TWI572103B (zh) | 2017-02-21 |
| CN103326240A (zh) | 2013-09-25 |
| US9112331B2 (en) | 2015-08-18 |
| TW201345095A (zh) | 2013-11-01 |
| JP5966140B2 (ja) | 2016-08-10 |
| GB2500489A (en) | 2013-09-25 |
| CN103326240B (zh) | 2018-09-18 |
| GB201305179D0 (en) | 2013-05-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102013204644A1 (de) | Oberflächenemittierender laser mit drittem reflektor | |
| DE102013204964B4 (de) | Optisch gepumpte oberflächenemittierende Laser mit Reflektor mit hohem Reflexionsvermögen und begrenzter Bandbreite | |
| EP2220733B1 (de) | Laserlichtquelle | |
| DE69219322T2 (de) | Halbleiterlasersystem mit externem resonator | |
| DE102009019996B4 (de) | DFB Laserdiode mit lateraler Kopplung für große Ausgangsleistungen | |
| DE3689188T2 (de) | Halbleiterlaser. | |
| DE10214120B4 (de) | Optisch pumpbare oberflächenemittierende Halbleiterlaservorrichtung | |
| WO2003030316A2 (de) | Optisch gepumpter vertikal emittierender halbleiterlaser | |
| WO2010105865A2 (de) | Optoelektronisches halbleiterbauteil | |
| EP4140001A1 (de) | Halbleiterlaser und lidar-system sowie laser-system mit dem halbleiterlaser | |
| EP1535376B1 (de) | Optisch gepumpte strahlungsemittierende halbleitervorrichtung und verfahren zu deren herstellung | |
| DE112021000475T5 (de) | Halbleiter-laserelement | |
| DE102007051315B4 (de) | Strahlungsemittierendes Bauelement | |
| DE102011075502A1 (de) | Breitstreifen-Diodenlaser mit hoher Effizienz und geringer Fernfelddivergenz | |
| DE10243545A1 (de) | Optisch gepumpte Halbleiterlaservorrichtung | |
| DE102021117534A1 (de) | Oberflächenemittierender halbleiterlaser und verfahren zur herstellung eines oberflächenemittierenden halbleiterlasers | |
| EP2337168B1 (de) | Oberflächenemittierende Laserstrahlquelle mit zwei Kavitäten | |
| DE102017129173A1 (de) | Strahlungsquelle zur Emission von Terahertz-Strahlung | |
| WO2018219667A1 (de) | Halbleiterlaserdiode mit zwei resonatoren | |
| US9373936B1 (en) | Resonant active grating mirror for surface emitting lasers | |
| DE102004036963A1 (de) | Optisch gepumpte oberflächenemittierende Halbleiterlaser-Vorrichtung | |
| DE102005056949B4 (de) | Optisch gepumpter oberflächenemittierender Halbleiterlaser und optische Projektionsvorrichtung mit solch einem Halbleiterlaser | |
| RU2535649C1 (ru) | Полупроводниковый лазер | |
| DE102018111131B4 (de) | Halbleiterlaserelement und Herstellungsverfahren dafür | |
| WO2021239407A1 (de) | Halbleiterlaser mit horizontalem und vertikalem laserelement, lidar-system und verfahren zur herstellung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R082 | Change of representative |
Representative=s name: GRUENECKER, KINKELDEY, STOCKMAIR & SCHWANHAEUS, DE Representative=s name: GRUENECKER PATENT- UND RECHTSANWAELTE PARTG MB, DE |
|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final |