DE102012113168A1 - Photodiodenanordnungen und Fertigungsverfahren - Google Patents

Photodiodenanordnungen und Fertigungsverfahren Download PDF

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Publication number
DE102012113168A1
DE102012113168A1 DE102012113168A DE102012113168A DE102012113168A1 DE 102012113168 A1 DE102012113168 A1 DE 102012113168A1 DE 102012113168 A DE102012113168 A DE 102012113168A DE 102012113168 A DE102012113168 A DE 102012113168A DE 102012113168 A1 DE102012113168 A1 DE 102012113168A1
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DE
Germany
Prior art keywords
layer
doped
photodiode array
silicon wafer
epitaxial layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102012113168A
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German (de)
English (en)
Inventor
wird später genannt werden Erfinder
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE102012113168A1 publication Critical patent/DE102012113168A1/de
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/028—Manufacture or treatment of image sensors covered by group H10F39/12 performed after manufacture of the image sensors, e.g. annealing, gettering of impurities, short-circuit elimination or recrystallisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/221—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
    • H10F39/1898—Indirect radiation image sensors, e.g. using luminescent members
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H10F77/148—Shapes of potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Light Receiving Elements (AREA)
DE102012113168A 2012-01-04 2012-12-28 Photodiodenanordnungen und Fertigungsverfahren Withdrawn DE102012113168A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/343,165 US8736008B2 (en) 2012-01-04 2012-01-04 Photodiode array and methods of fabrication
US13/343,165 2012-01-04

Publications (1)

Publication Number Publication Date
DE102012113168A1 true DE102012113168A1 (de) 2013-07-04

Family

ID=48608049

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102012113168A Withdrawn DE102012113168A1 (de) 2012-01-04 2012-12-28 Photodiodenanordnungen und Fertigungsverfahren

Country Status (3)

Country Link
US (1) US8736008B2 (enExample)
JP (1) JP6133055B2 (enExample)
DE (1) DE102012113168A1 (enExample)

Cited By (1)

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WO2014166707A1 (de) * 2013-04-11 2014-10-16 Siemens Aktiengesellschaft Herstellungsverfahren eines sensorchips sowie computertomographischer detektor

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CN105723243B (zh) 2013-11-15 2019-07-09 皇家飞利浦有限公司 柔性基底上的双面有机光探测器
JP2015133408A (ja) 2014-01-14 2015-07-23 株式会社島津製作所 放射線検出器
JP2018505565A (ja) * 2014-12-19 2018-02-22 ジーレイ スイッツァーランド エスアー モノリシックｃｍｏｓ集積ピクセル検出器ならびに様々な用途を含む粒子検出および撮像のためのシステムおよび方法
US9754992B2 (en) 2015-01-21 2017-09-05 Terapede Systems Inc. Integrated scintillator grid with photodiodes
JP6725231B2 (ja) * 2015-10-06 2020-07-15 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子、および電子装置
US10522532B2 (en) * 2016-05-27 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Through via extending through a group III-V layer
WO2017213622A1 (en) * 2016-06-06 2017-12-14 Terapede Systems Inc. Integrated scintillator grid with photodiodes
KR102635858B1 (ko) * 2017-01-05 2024-02-15 삼성전자주식회사 이미지 센서
EP3723138A1 (en) * 2019-04-10 2020-10-14 ams International AG Optoelectronic device, photonic detector and method of producing an optoelectronic device
US11874409B2 (en) 2020-07-06 2024-01-16 Canon Medical Systems Corporation Correction X-ray detector, X-ray CT apparatus, and detector element determining method
CN120419317A (zh) * 2022-12-30 2025-08-01 上海联影医疗科技股份有限公司 用于探测辐射射线的光子计数探测器
WO2025036368A1 (zh) * 2023-08-16 2025-02-20 上海联影微电子科技有限公司 光电二极管及其制造方法、电子元件

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US7291782B2 (en) * 2002-06-22 2007-11-06 Nanosolar, Inc. Optoelectronic device and fabrication method
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014166707A1 (de) * 2013-04-11 2014-10-16 Siemens Aktiengesellschaft Herstellungsverfahren eines sensorchips sowie computertomographischer detektor

Also Published As

Publication number Publication date
US20130168750A1 (en) 2013-07-04
JP6133055B2 (ja) 2017-05-24
JP2013140975A (ja) 2013-07-18
US8736008B2 (en) 2014-05-27

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Representative=s name: RUEGER, BARTHELT & ABEL PATENTANWAELTE, DE

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee