DE102012103430B4 - Verfahren zum Heften von Chips auf ein Substrat - Google Patents

Verfahren zum Heften von Chips auf ein Substrat Download PDF

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Publication number
DE102012103430B4
DE102012103430B4 DE102012103430.3A DE102012103430A DE102012103430B4 DE 102012103430 B4 DE102012103430 B4 DE 102012103430B4 DE 102012103430 A DE102012103430 A DE 102012103430A DE 102012103430 B4 DE102012103430 B4 DE 102012103430B4
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Germany
Prior art keywords
functional layer
substrate
contacts
chips
chip
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DE102012103430.3A
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German (de)
English (en)
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DE102012103430A1 (de
Inventor
Jürgen Burggraf
Markus Wimplinger
Harald Wiesbauer
Alfred Sigl
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EV Group E Thallner GmbH
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EV Group E Thallner GmbH
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Priority to DE102012103430.3A priority Critical patent/DE102012103430B4/de
Application filed by EV Group E Thallner GmbH filed Critical EV Group E Thallner GmbH
Priority to SG2014011613A priority patent/SG2014011613A/en
Priority to KR1020147028521A priority patent/KR102121080B1/ko
Priority to PCT/EP2013/055556 priority patent/WO2013156234A1/de
Priority to JP2015506146A priority patent/JP6223421B2/ja
Priority to ATA9123/2013A priority patent/AT517747B1/de
Priority to CN201380020754.7A priority patent/CN104520979B/zh
Priority to US14/395,084 priority patent/US9245869B2/en
Publication of DE102012103430A1 publication Critical patent/DE102012103430A1/de
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Publication of DE102012103430B4 publication Critical patent/DE102012103430B4/de
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    • H01L2224/83001Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus
    • H01L2224/83002Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus being a removable or sacrificial coating
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    • H01L2224/83009Pre-treatment of the layer connector or the bonding area
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    • H01L2224/831Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
    • H01L2224/83102Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus using surface energy, e.g. capillary forces
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    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
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    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83193Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed on both the semiconductor or solid-state body and another item or body to be connected to the semiconductor or solid-state body
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    • H01L2224/832Applying energy for connecting
    • H01L2224/83201Compression bonding
    • H01L2224/83203Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
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    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • H01L2224/83855Hardening the adhesive by curing, i.e. thermosetting
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    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83905Combinations of bonding methods provided for in at least two different groups from H01L2224/838 - H01L2224/83904
    • H01L2224/83907Intermediate bonding, i.e. intermediate bonding step for temporarily bonding the semiconductor or solid-state body, followed by at least a further bonding step
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    • H01L2224/92Specific sequence of method steps
    • H01L2224/9205Intermediate bonding steps, i.e. partial connection of the semiconductor or solid-state body during the connecting process
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    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9211Parallel connecting processes
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    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0655Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
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    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
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    • H01L2924/30Technical effects
    • H01L2924/38Effects and problems related to the device integration
    • H01L2924/381Pitch distance

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
DE102012103430.3A 2012-04-19 2012-04-19 Verfahren zum Heften von Chips auf ein Substrat Active DE102012103430B4 (de)

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Application Number Priority Date Filing Date Title
DE102012103430.3A DE102012103430B4 (de) 2012-04-19 2012-04-19 Verfahren zum Heften von Chips auf ein Substrat
KR1020147028521A KR102121080B1 (ko) 2012-04-19 2013-03-18 칩 접촉 요소를 위한 오프닝을 가진 기능성 층이 구비된 기판에 접촉 요소로 칩을 접합하기 위한 방법
PCT/EP2013/055556 WO2013156234A1 (de) 2012-04-19 2013-03-18 Verfahren zum heften von chips mit kontaktelement auf ein mit einer funktionsschicht mit öffnungen für die chipkontaktelementen versehenes substrat
JP2015506146A JP6223421B2 (ja) 2012-04-19 2013-03-18 コンタクトエレメントを備えたチップを、チップコンタクトエレメントに対する開口を有する機能層を備えた基板に仮接合する方法
SG2014011613A SG2014011613A (en) 2012-04-19 2013-03-18 Method for fastening chips with a contact element onto a substrate provided with a functional layer having openings for the chip contact elements
ATA9123/2013A AT517747B1 (de) 2012-04-19 2013-03-18 Verfahren zum Heften von Chips mit Kontaktelement auf ein mit einer Funktionsschicht mit Öffnungen für die Chipkontaktelementen versehenes Substrat
CN201380020754.7A CN104520979B (zh) 2012-04-19 2013-03-18 将具有接触元件的芯片固定到设置有带有芯片接触元件的开口的功能层的衬底上的方法
US14/395,084 US9245869B2 (en) 2012-04-19 2013-03-18 Method for fastening chips with a contact element onto a substrate provided with a functional layer having openings for the chip contact elements

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CN105189409B (zh) * 2013-03-29 2018-11-09 三菱综合材料株式会社 金属-陶瓷板层压体的制造装置及制造方法、功率模块用基板的制造装置及制造方法

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US5384952A (en) * 1990-12-26 1995-01-31 Nec Corporation Method of connecting an integrated circuit chip to a substrate
DE19651566A1 (de) * 1996-12-11 1998-06-18 David Finn Chip-Modul sowie Verfahren zu dessen Herstellung
US6168972B1 (en) * 1998-12-22 2001-01-02 Fujitsu Limited Flip chip pre-assembly underfill process
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US5611140A (en) * 1989-12-18 1997-03-18 Epoxy Technology, Inc. Method of forming electrically conductive polymer interconnects on electrical substrates
EP1255292A1 (en) * 2000-01-14 2002-11-06 Toray Engineering Co., Ltd. Chip mounting method
US6573122B2 (en) 2001-03-28 2003-06-03 International Rectifier Corporation Wafer level insulation underfill for die attach
TWI230989B (en) * 2004-05-05 2005-04-11 Megic Corp Chip bonding method
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DE102006045094A1 (de) * 2006-09-21 2008-03-27 Qimonda Ag Verfahren zum Herstellen von Chip-zu-Chip-Verbindungen
JP2010171118A (ja) 2009-01-21 2010-08-05 Panasonic Electric Works Co Ltd 実装部品の表面実装方法、その方法を用いて得られる実装部品構造体、及びその方法に用いられるアンダーフィル用液状エポキシ樹脂組成物
KR20120091691A (ko) * 2011-02-09 2012-08-20 삼성전자주식회사 휨 방지용 접합패턴을 갖는 반도체 소자 및 그 제조방법

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Publication number Priority date Publication date Assignee Title
US5384952A (en) * 1990-12-26 1995-01-31 Nec Corporation Method of connecting an integrated circuit chip to a substrate
DE19651566A1 (de) * 1996-12-11 1998-06-18 David Finn Chip-Modul sowie Verfahren zu dessen Herstellung
US6168972B1 (en) * 1998-12-22 2001-01-02 Fujitsu Limited Flip chip pre-assembly underfill process
US20040169275A1 (en) * 2003-02-27 2004-09-02 Motorola, Inc. Area-array device assembly with pre-applied underfill layers on printed wiring board
US20060068521A1 (en) * 2004-09-29 2006-03-30 Song-Hua Shi Method of fabricating microelectronic package using no-flow underfill technology and microelectronic package formed according to the method

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AT517747B1 (de) 2019-03-15
US9245869B2 (en) 2016-01-26
JP6223421B2 (ja) 2017-11-01
KR20150013448A (ko) 2015-02-05
AT517747A5 (de) 2017-04-15
CN104520979A (zh) 2015-04-15
CN104520979B (zh) 2018-09-11
JP2015515135A (ja) 2015-05-21
SG2014011613A (en) 2014-06-27
KR102121080B1 (ko) 2020-06-10
US20150104902A1 (en) 2015-04-16
WO2013156234A1 (de) 2013-10-24

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