DE102011114650A1 - Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe - Google Patents

Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe Download PDF

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Publication number
DE102011114650A1
DE102011114650A1 DE102011114650A DE102011114650A DE102011114650A1 DE 102011114650 A1 DE102011114650 A1 DE 102011114650A1 DE 102011114650 A DE102011114650 A DE 102011114650A DE 102011114650 A DE102011114650 A DE 102011114650A DE 102011114650 A1 DE102011114650 A1 DE 102011114650A1
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DE
Germany
Prior art keywords
och
phenyl
coona
cooh
glucoside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102011114650A
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German (de)
English (en)
Inventor
Peer Kirsch
Wolfgang Hierse
Eckhard Claus
Melanie Kleineidam
Gerd-Volker Röschenthaler
Nataliya Kalinovich
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Merck Patent GmbH
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Merck Patent GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent GmbH filed Critical Merck Patent GmbH
Publication of DE102011114650A1 publication Critical patent/DE102011114650A1/de
Withdrawn legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • C07F9/5407Acyclic saturated phosphonium compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Detergent Compositions (AREA)
DE102011114650A 2010-10-29 2011-09-30 Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe Withdrawn DE102011114650A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10014147.2 2010-10-29
EP10014147 2010-10-29

Publications (1)

Publication Number Publication Date
DE102011114650A1 true DE102011114650A1 (de) 2012-05-03

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DE102011114650A Withdrawn DE102011114650A1 (de) 2010-10-29 2011-09-30 Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe

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DE (1) DE102011114650A1 (ro)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015014735A1 (en) * 2013-08-01 2015-02-05 Solvay Specialty Polymers Italy S.P.A. Fluorinated compounds containing a -osf5 group and process for their preparation
US9557652B2 (en) 2012-12-14 2017-01-31 Basf Se Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
WO2023002869A1 (ja) * 2021-07-21 2023-01-26 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性樹脂組成物の製造方法、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、樹脂、及び樹脂の製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4968599A (en) 1987-03-24 1990-11-06 Eastman Kodak Company Photographic composition containing a fluorinated sulfosuccinate
US4988610A (en) 1988-07-26 1991-01-29 Eastman Kodak Company Hydrophilic colloid compositions for photographic materials
JPH09111286A (ja) 1995-10-13 1997-04-28 Nikko Chemical Co Ltd エマルション組成物及び洗浄剤組成物並びに洗浄方法
JP2001133984A (ja) 1999-11-01 2001-05-18 Shin Etsu Chem Co Ltd 反射防止膜材料及びパターン形成方法
WO2003010128A2 (en) 2001-07-25 2003-02-06 Ciba Specialty Chemicals Holding Inc. Perfluoroalkyl-substituted amines, acids, amino acids and thioether acids
US6890608B2 (en) 2002-03-29 2005-05-10 Fuji Photo Film Co., Ltd. Optical compensatory sheet, liquid-crystal display and elliptical polarizing plate employing same
DE102005000858A1 (de) 2005-01-05 2006-07-20 Merck Patent Gmbh Fluortenside

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4968599A (en) 1987-03-24 1990-11-06 Eastman Kodak Company Photographic composition containing a fluorinated sulfosuccinate
US4988610A (en) 1988-07-26 1991-01-29 Eastman Kodak Company Hydrophilic colloid compositions for photographic materials
JPH09111286A (ja) 1995-10-13 1997-04-28 Nikko Chemical Co Ltd エマルション組成物及び洗浄剤組成物並びに洗浄方法
JP2001133984A (ja) 1999-11-01 2001-05-18 Shin Etsu Chem Co Ltd 反射防止膜材料及びパターン形成方法
WO2003010128A2 (en) 2001-07-25 2003-02-06 Ciba Specialty Chemicals Holding Inc. Perfluoroalkyl-substituted amines, acids, amino acids and thioether acids
US6890608B2 (en) 2002-03-29 2005-05-10 Fuji Photo Film Co., Ltd. Optical compensatory sheet, liquid-crystal display and elliptical polarizing plate employing same
DE102005000858A1 (de) 2005-01-05 2006-07-20 Merck Patent Gmbh Fluortenside

Non-Patent Citations (12)

* Cited by examiner, † Cited by third party
Title
A. R. Pitt et al., Colloids and Surfaces A: Physicochemical and Engineering Aspects, 1996, 114, 321-335
A. R. Pitt, Progr. Colloid Polym. Sci, 1997, 103, 307-317
C. J. Schack, R. D. Wilson, J. S. Muirhead, S. N. Cohz, J. Am. Chem. Soc. 1969, 91, 2907-2911
G. L. Kennedy, Jr., J. L. Butenhoff, G. W. Olsen, J. C. O'Connor, A. M. Seacat, R. G. Biegel, S. R. Murphy, D. G. Farrar, Critical Review in Toxicology, 2004, 34, 351-384
G. L. Trainor, J. Carbohydr. Chem. 1985, 4, 545-563
J. R. Case, H. L. Roberts, UK 928412, 1963
J. R. Case, R. Price, N. H. Ray, H. L. Roberts, J. Wright, J. Chem. Soc. 1962, 2107-2110
K. Seppelt, Angew. Chem. 1976, 88, 56-59
L. R. Anderson, D. E. Young, D. E. Gould, R. Juurik-Hogan, D. Neuchterlein, W. B. Fox, J. Org. Chem. 1970, 35, 3730-3733
OECD Guidelines for Testing of Chemicals, Method 302 B, Seiten 1-8, adoptiert 17 Juli 1992
W. Heilemann, R. Mews, S. Pohl, W. Saak, Chem. Ber. 1989, 122, 427-432
Z.-T. Liu et al., Ind. Eng. Chem. Res. 2007, 46, 22-28

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557652B2 (en) 2012-12-14 2017-01-31 Basf Se Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
WO2015014735A1 (en) * 2013-08-01 2015-02-05 Solvay Specialty Polymers Italy S.P.A. Fluorinated compounds containing a -osf5 group and process for their preparation
CN105431412A (zh) * 2013-08-01 2016-03-23 索尔维特殊聚合物意大利有限公司 含-osf5基团的氟化的化合物及其制备方法
CN105431412B (zh) * 2013-08-01 2018-05-11 索尔维特殊聚合物意大利有限公司 含-osf5基团的氟化的化合物及其制备方法
US10047045B2 (en) 2013-08-01 2018-08-14 Solvay Specialty Polymers Italy S.P.A. Fluorinated compounds containing a -OSF5 group and process for their preparation
US11014879B2 (en) 2013-08-01 2021-05-25 Solvay Specialty Polymers Italy S.P.A. Fluorinated compounds containing a—OSF5 group and process for their preparation
WO2023002869A1 (ja) * 2021-07-21 2023-01-26 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性樹脂組成物の製造方法、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、樹脂、及び樹脂の製造方法

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Date Code Title Description
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20140401