DE102011114650A1 - Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe - Google Patents
Oberflächenaktive Substanzen mit terminaler Pentafluorsulfoxy-Gruppe Download PDFInfo
- Publication number
- DE102011114650A1 DE102011114650A1 DE102011114650A DE102011114650A DE102011114650A1 DE 102011114650 A1 DE102011114650 A1 DE 102011114650A1 DE 102011114650 A DE102011114650 A DE 102011114650A DE 102011114650 A DE102011114650 A DE 102011114650A DE 102011114650 A1 DE102011114650 A1 DE 102011114650A1
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- Prior art keywords
- och
- phenyl
- coona
- cooh
- glucoside
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/54—Quaternary phosphonium compounds
- C07F9/5407—Acyclic saturated phosphonium compounds
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- Molecular Biology (AREA)
- Detergent Compositions (AREA)
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US9557652B2 (en) | 2012-12-14 | 2017-01-31 | Basf Se | Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below |
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Cited By (7)
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