DE102009020501A1 - Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls - Google Patents
Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls Download PDFInfo
- Publication number
- DE102009020501A1 DE102009020501A1 DE102009020501A DE102009020501A DE102009020501A1 DE 102009020501 A1 DE102009020501 A1 DE 102009020501A1 DE 102009020501 A DE102009020501 A DE 102009020501A DE 102009020501 A DE102009020501 A DE 102009020501A DE 102009020501 A1 DE102009020501 A1 DE 102009020501A1
- Authority
- DE
- Germany
- Prior art keywords
- bandwidth
- narrowing module
- optical component
- bandwidth narrowing
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003595 spectral effect Effects 0.000 title claims abstract description 35
- 230000003287 optical effect Effects 0.000 claims abstract description 91
- 238000001228 spectrum Methods 0.000 claims description 14
- 238000001459 lithography Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 230000008901 benefit Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 241000288906 Primates Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
- G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
- G02B26/0883—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism
- G02B26/0891—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements the refracting element being a prism forming an optical wedge
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Lasers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009020501A DE102009020501A1 (de) | 2009-05-08 | 2009-05-08 | Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls |
| PCT/EP2010/002722 WO2010127831A1 (en) | 2009-05-08 | 2010-05-04 | Bandwidth narrowing module for setting a spectral bandwidth of a laser beam |
| JP2012508944A JP2012526373A (ja) | 2009-05-08 | 2010-05-04 | レーザビームのスペクトルバンド幅を設定するための狭帯域化モジュール |
| US13/238,470 US20120099612A1 (en) | 2009-05-08 | 2011-09-21 | Bandwidth narrowing module for setting a spectral bandwidth of a laser beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009020501A DE102009020501A1 (de) | 2009-05-08 | 2009-05-08 | Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102009020501A1 true DE102009020501A1 (de) | 2010-12-23 |
Family
ID=42542902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102009020501A Withdrawn DE102009020501A1 (de) | 2009-05-08 | 2009-05-08 | Bandbreiteneinengungsmoduls zur Einstellung einer spektralen Bandbreite eines Laserstrahls |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20120099612A1 (https=) |
| JP (1) | JP2012526373A (https=) |
| DE (1) | DE102009020501A1 (https=) |
| WO (1) | WO2010127831A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019238417A1 (de) | 2018-06-14 | 2019-12-19 | Carl Zeiss Smt Gmbh | Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasers |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103676498B (zh) * | 2013-11-18 | 2017-04-05 | 中国科学院上海光学精密机械研究所 | 光刻机光瞳整形单元结构及其衍射光学元件设计方法 |
| WO2016132321A1 (en) * | 2015-02-18 | 2016-08-25 | Imax Emea Limited | Despeckling system for projected light |
| US9666191B1 (en) * | 2016-03-17 | 2017-05-30 | Vocalzoom Systems Ltd. | Laser-based system and optical microphone having increased bandwidth |
| KR101753355B1 (ko) | 2016-07-20 | 2017-07-06 | 서울대학교산학협력단 | 레이저 홀로그래픽 리소그래피 장치 및 패턴 제조 방법 |
| PL446827A1 (pl) * | 2023-11-23 | 2025-05-26 | Uniwersytet Warszawski | Sposób widmowego zawężania impulsów laserowych światła oraz układ do widmowego zawężania impulsów laserowych światła |
| EP4560851B1 (en) | 2023-11-23 | 2026-04-08 | Uniwersytet Warszawski | Method and system for spectral narrowing of laser light pulses |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6163559A (en) * | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
| US20020075932A1 (en) * | 1999-06-23 | 2002-06-20 | Lambda Physik Ag. | Line-narrowing module for high power laser |
| US20020131468A1 (en) * | 1998-08-06 | 2002-09-19 | Lambda Physik Ag. | Laser resonator for improving narrow band emission of an excimer laser |
| US6856638B2 (en) * | 2000-10-23 | 2005-02-15 | Lambda Physik Ag | Resonator arrangement for bandwidth control |
| US20070001127A1 (en) * | 2005-06-30 | 2007-01-04 | Cymer, Inc. | Active bandwidth control for a laser |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19980703204A (ko) * | 1995-04-03 | 1998-10-15 | 안자끼 사토루 | 협대역 레이저 장치 |
| JP4102457B2 (ja) * | 1997-05-09 | 2008-06-18 | 株式会社小松製作所 | 狭帯域化レーザ装置 |
| US6757316B2 (en) * | 1999-12-27 | 2004-06-29 | Cymer, Inc. | Four KHz gas discharge laser |
| JP3590524B2 (ja) * | 1998-03-25 | 2004-11-17 | 株式会社小松製作所 | 狭帯域化レーザの波面制御装置 |
| US6061382A (en) * | 1998-05-04 | 2000-05-09 | Lambda Physik Gmbh | Laser system and method for narrow spectral linewidth through wavefront curvature compensation |
| US6542243B2 (en) * | 2000-01-27 | 2003-04-01 | Lambda Physik Ag | Resonator optics monitoring method |
| JP5157004B2 (ja) * | 2006-07-04 | 2013-03-06 | 株式会社小松製作所 | 狭帯域化レーザのスペクトル幅調整方法 |
| JP5114767B2 (ja) * | 2006-10-10 | 2013-01-09 | 株式会社小松製作所 | 狭帯域化レーザのスペクトル幅調整装置 |
-
2009
- 2009-05-08 DE DE102009020501A patent/DE102009020501A1/de not_active Withdrawn
-
2010
- 2010-05-04 WO PCT/EP2010/002722 patent/WO2010127831A1/en not_active Ceased
- 2010-05-04 JP JP2012508944A patent/JP2012526373A/ja active Pending
-
2011
- 2011-09-21 US US13/238,470 patent/US20120099612A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6163559A (en) * | 1998-06-22 | 2000-12-19 | Cymer, Inc. | Beam expander for ultraviolet lasers |
| US20020131468A1 (en) * | 1998-08-06 | 2002-09-19 | Lambda Physik Ag. | Laser resonator for improving narrow band emission of an excimer laser |
| US20020075932A1 (en) * | 1999-06-23 | 2002-06-20 | Lambda Physik Ag. | Line-narrowing module for high power laser |
| US6856638B2 (en) * | 2000-10-23 | 2005-02-15 | Lambda Physik Ag | Resonator arrangement for bandwidth control |
| US20070001127A1 (en) * | 2005-06-30 | 2007-01-04 | Cymer, Inc. | Active bandwidth control for a laser |
Non-Patent Citations (1)
| Title |
|---|
| DE-Buch: "Laser", Kneubühl, Siegrist, Teubner 1989, S. 261 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019238417A1 (de) | 2018-06-14 | 2019-12-19 | Carl Zeiss Smt Gmbh | Optische baugruppe zur verringerung einer spektralen bandbreite eines ausgabestrahls eines lasers |
| DE102018209602A1 (de) | 2018-06-14 | 2019-12-19 | Carl Zeiss Smt Gmbh | Optische Baugruppe zur Verringerung einer spektralen Bandbreite eines Ausgabestrahls eines Lasers |
| DE102018209602B4 (de) | 2018-06-14 | 2022-05-12 | Carl Zeiss Smt Gmbh | Optische Baugruppe zur Verringerung einer spektralen Bandbreite eines Ausgabestrahls eines Lasers |
| US12300959B2 (en) | 2018-06-14 | 2025-05-13 | Carl Zeiss Smt Gmbh | Optical assembly for reducing a spectral bandwidth of an output beam of a laser |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012526373A (ja) | 2012-10-25 |
| WO2010127831A1 (en) | 2010-11-11 |
| US20120099612A1 (en) | 2012-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| R016 | Response to examination communication | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |
Effective date: 20141202 |