DE102006000783B3 - Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen - Google Patents
Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen Download PDFInfo
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- DE102006000783B3 DE102006000783B3 DE102006000783A DE102006000783A DE102006000783B3 DE 102006000783 B3 DE102006000783 B3 DE 102006000783B3 DE 102006000783 A DE102006000783 A DE 102006000783A DE 102006000783 A DE102006000783 A DE 102006000783A DE 102006000783 B3 DE102006000783 B3 DE 102006000783B3
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- acrylic
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- 230000005855 radiation Effects 0.000 title claims abstract description 112
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 29
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- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 49
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- RGADKZXRWFOTFV-UHFFFAOYSA-N 2-(hydroxymethyl)-2-methylpropane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OCC(C)(CO)CO RGADKZXRWFOTFV-UHFFFAOYSA-N 0.000 claims 1
- QCKSZAKUOKFTMN-UHFFFAOYSA-N 2-(hydroxymethyl)-2-propylpropane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCC(CO)(CO)CO QCKSZAKUOKFTMN-UHFFFAOYSA-N 0.000 claims 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 claims 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 claims 1
- GCNKJQRMNYNDBI-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(2-methylprop-2-enoyloxymethyl)butyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CC)COC(=O)C(C)=C GCNKJQRMNYNDBI-UHFFFAOYSA-N 0.000 claims 1
- TUOBEAZXHLTYLF-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CC)COC(=O)C=C TUOBEAZXHLTYLF-UHFFFAOYSA-N 0.000 claims 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 claims 1
- CWXROEOROJHCOG-UHFFFAOYSA-N [3-hydroxy-2-(hydroxymethyl)-2-methylpropyl] prop-2-enoate Chemical compound OCC(C)(CO)COC(=O)C=C CWXROEOROJHCOG-UHFFFAOYSA-N 0.000 claims 1
- 238000007743 anodising Methods 0.000 claims 1
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- -1 methacryl compound Chemical class 0.000 abstract description 103
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- 125000000217 alkyl group Chemical group 0.000 description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 15
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- 125000001424 substituent group Chemical group 0.000 description 15
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- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- XXROGKLTLUQVRX-UHFFFAOYSA-N hydroxymethylethylene Natural products OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical compound C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- DCYOBGZUOMKFPA-UHFFFAOYSA-N iron(2+);iron(3+);octadecacyanide Chemical compound [Fe+2].[Fe+2].[Fe+2].[Fe+3].[Fe+3].[Fe+3].[Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] DCYOBGZUOMKFPA-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- QZIQJVCYUQZDIR-UHFFFAOYSA-N mechlorethamine hydrochloride Chemical compound Cl.ClCCN(C)CCCl QZIQJVCYUQZDIR-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- 238000003541 multi-stage reaction Methods 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical class O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000006574 non-aromatic ring group Chemical group 0.000 description 1
- 150000004010 onium ions Chemical class 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000003791 organic solvent mixture Substances 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- 238000006025 oxidative dimerization reaction Methods 0.000 description 1
- UUEVFMOUBSLVJW-UHFFFAOYSA-N oxo-[[1-[2-[2-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethoxy]ethoxy]ethyl]pyridin-4-ylidene]methyl]azanium;dibromide Chemical compound [Br-].[Br-].C1=CC(=C[NH+]=O)C=CN1CCOCCOCCN1C=CC(=C[NH+]=O)C=C1 UUEVFMOUBSLVJW-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000412 polyarylene Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 150000003252 quinoxalines Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- SPVXKVOXSXTJOY-UHFFFAOYSA-O selenonium Chemical compound [SeH3+] SPVXKVOXSXTJOY-UHFFFAOYSA-O 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 125000005537 sulfoxonium group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000000147 tetrahydroquinolinyl group Chemical group N1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000003507 tetrahydrothiofenyl group Chemical group 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006000783A DE102006000783B3 (de) | 2006-01-04 | 2006-01-04 | Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen |
| PCT/EP2007/000009 WO2007077207A2 (en) | 2006-01-04 | 2007-01-02 | Photopolymer composition suitable for lithographic printing plates |
| EP07702560A EP1969426B1 (en) | 2006-01-04 | 2007-01-02 | Photopolymer composition suitable for lithographic printing plates |
| JP2008548991A JP4824774B2 (ja) | 2006-01-04 | 2007-01-02 | 平版印刷版に適したフォトポリマー組成物 |
| US12/159,287 US8119331B2 (en) | 2006-01-04 | 2007-01-02 | Photopolymer composition usable for lithographic plates |
| CN200780001847.XA CN101379432B (zh) | 2006-01-04 | 2007-01-02 | 适于平版印刷印版的感光聚合物组合物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006000783A DE102006000783B3 (de) | 2006-01-04 | 2006-01-04 | Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102006000783B3 true DE102006000783B3 (de) | 2007-04-26 |
Family
ID=37905577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006000783A Expired - Fee Related DE102006000783B3 (de) | 2006-01-04 | 2006-01-04 | Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8119331B2 (enExample) |
| EP (1) | EP1969426B1 (enExample) |
| JP (1) | JP4824774B2 (enExample) |
| CN (1) | CN101379432B (enExample) |
| DE (1) | DE102006000783B3 (enExample) |
| WO (1) | WO2007077207A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| JP5481339B2 (ja) | 2009-09-30 | 2014-04-23 | 富士フイルム株式会社 | 平版印刷版原版及びその製版方法 |
| JP5537980B2 (ja) * | 2010-02-12 | 2014-07-02 | 富士フイルム株式会社 | 平版印刷版原版及びその製版方法 |
| JP2012091461A (ja) * | 2010-10-28 | 2012-05-17 | Basf Se | 湿し水及び湿し水濃縮液 |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| JP5186574B2 (ja) * | 2011-02-28 | 2013-04-17 | 富士フイルム株式会社 | 平版印刷版原版及びその製版方法 |
| JP2012211944A (ja) * | 2011-03-30 | 2012-11-01 | Fujifilm Corp | 感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| CN103941544A (zh) | 2014-01-26 | 2014-07-23 | 京东方科技集团股份有限公司 | 一种光刻胶及其制作方法、使用方法 |
| CN103809378A (zh) | 2014-01-26 | 2014-05-21 | 京东方科技集团股份有限公司 | 一种负性光刻胶及其制备方法、使用方法 |
| CN107249902B (zh) * | 2015-02-27 | 2020-04-03 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制版方法及印刷方法 |
| EP3632695B1 (en) * | 2017-05-31 | 2022-08-10 | FUJIFILM Corporation | Lithographic printing plate original plate, and method for producing lithographic printing plate |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2361041A1 (de) * | 1973-12-07 | 1975-06-12 | Hoechst Ag | Photopolymerisierbare kopiermasse |
| WO1994017452A1 (en) * | 1993-01-20 | 1994-08-04 | Agfa-Gevaert Naamloze Vennootschap | Photopolymerizable composition of high sensitivity and method for obtaining images therewith |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3891523A (en) * | 1970-01-19 | 1975-06-24 | Dainippon Ink & Chemicals | Photopolymerizable, isocyanate-containing prepolymers |
| US3960572A (en) * | 1973-02-21 | 1976-06-01 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive compositions comprising a polyester-polyether block polymer |
| DE3521955A1 (de) * | 1985-06-20 | 1987-01-02 | Basf Ag | Verfahren zur herstellung von klebfreien, glatten oberflaechen von photopolymerisierten reliefdruckformen fuer den flexodruck |
| DE4129284A1 (de) * | 1991-09-03 | 1993-03-04 | Agfa Gevaert Ag | Bilderzeugungselement mit einem fotopolymerisierbaren monomer |
| JP3254572B2 (ja) * | 1996-06-28 | 2002-02-12 | バンティコ株式会社 | 光重合性熱硬化性樹脂組成物 |
| US5939239A (en) * | 1997-12-01 | 1999-08-17 | Nichigo-Morton Co., Ltd. | Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers |
| TW494277B (en) * | 1998-05-29 | 2002-07-11 | Nichigo Morton Co Ltd | Photoimageable composition having improved flexibility |
| US6207347B1 (en) * | 1998-05-29 | 2001-03-27 | Nichigo-Morton Co. Ltd. | Photoimageable composition having improved flexibility |
| JP2000212234A (ja) * | 1998-11-17 | 2000-08-02 | Showa Denko Kk | 光硬化性組成物 |
| CN1318774A (zh) * | 2000-04-18 | 2001-10-24 | 富士胶片株式会社 | 光敏影像记录材料 |
| CN1347929A (zh) * | 2000-10-10 | 2002-05-08 | 麦克德米德有限公司 | 用于制造印刷板的光敏树脂组合物 |
| JP2002251008A (ja) * | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
| JP2003040965A (ja) * | 2001-08-01 | 2003-02-13 | Kansai Paint Co Ltd | 不飽和基含有ウレタン樹脂及びそれを用いた活性エネルギー線硬化組成物 |
| DE10255664B4 (de) * | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Für lithographische Druckplatten geeignete Photopolymerzusammensetzung |
| DE10255663B4 (de) | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente |
| US6902866B1 (en) * | 2003-11-24 | 2005-06-07 | Gary Ganghui Teng | Thermosensitive lithographic printing plate comprising specific acrylate monomers |
| DE602006008960D1 (de) * | 2005-07-20 | 2009-10-15 | Eastman Kodak Co | Für lithographische druckplatten geeignete photopolymerzusammensetzung |
| US7175969B1 (en) * | 2006-07-18 | 2007-02-13 | Eastman Kodak Company | Method of preparing negative-working radiation-sensitive elements |
-
2006
- 2006-01-04 DE DE102006000783A patent/DE102006000783B3/de not_active Expired - Fee Related
-
2007
- 2007-01-02 JP JP2008548991A patent/JP4824774B2/ja not_active Expired - Fee Related
- 2007-01-02 US US12/159,287 patent/US8119331B2/en not_active Expired - Fee Related
- 2007-01-02 WO PCT/EP2007/000009 patent/WO2007077207A2/en not_active Ceased
- 2007-01-02 CN CN200780001847.XA patent/CN101379432B/zh active Active
- 2007-01-02 EP EP07702560A patent/EP1969426B1/en not_active Not-in-force
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2361041A1 (de) * | 1973-12-07 | 1975-06-12 | Hoechst Ag | Photopolymerisierbare kopiermasse |
| WO1994017452A1 (en) * | 1993-01-20 | 1994-08-04 | Agfa-Gevaert Naamloze Vennootschap | Photopolymerizable composition of high sensitivity and method for obtaining images therewith |
Non-Patent Citations (2)
| Title |
|---|
| JP 2002174898 A (mit automatischer englischer Computerübersetzung) * |
| JP 2002-174898 A (mit automatischer englischer Computerübersetzung) |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101379432A (zh) | 2009-03-04 |
| EP1969426B1 (en) | 2010-09-22 |
| WO2007077207A3 (en) | 2007-11-29 |
| EP1969426A2 (en) | 2008-09-17 |
| CN101379432B (zh) | 2012-05-02 |
| US8119331B2 (en) | 2012-02-21 |
| JP2009522609A (ja) | 2009-06-11 |
| JP4824774B2 (ja) | 2011-11-30 |
| WO2007077207A2 (en) | 2007-07-12 |
| US20090011363A1 (en) | 2009-01-08 |
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| 8100 | Publication of patent without earlier publication of application | ||
| 8364 | No opposition during term of opposition | ||
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Owner name: KODAK GRAPHIC COMMUNICATIONS GMBH, 37520 OSTER, DE |
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| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |