DE102004051374A1 - Galvanogeformtes Ionenimplantations-Strukturmaterial und Verfahren zur Herstellung des Strukturmaterials - Google Patents

Galvanogeformtes Ionenimplantations-Strukturmaterial und Verfahren zur Herstellung des Strukturmaterials Download PDF

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Publication number
DE102004051374A1
DE102004051374A1 DE102004051374A DE102004051374A DE102004051374A1 DE 102004051374 A1 DE102004051374 A1 DE 102004051374A1 DE 102004051374 A DE102004051374 A DE 102004051374A DE 102004051374 A DE102004051374 A DE 102004051374A DE 102004051374 A1 DE102004051374 A1 DE 102004051374A1
Authority
DE
Germany
Prior art keywords
ion implantation
electroformed
structural material
material according
electroformed body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102004051374A
Other languages
German (de)
English (en)
Inventor
Koji Osaka Nitta
Shinji Osaka Inazawa
Tsuyoshi Hyogo Haga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE102004051374A1 publication Critical patent/DE102004051374A1/de
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Micromachines (AREA)
DE102004051374A 2003-10-30 2004-10-21 Galvanogeformtes Ionenimplantations-Strukturmaterial und Verfahren zur Herstellung des Strukturmaterials Withdrawn DE102004051374A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003-370309 2003-10-29
JP2003370309 2003-10-30

Publications (1)

Publication Number Publication Date
DE102004051374A1 true DE102004051374A1 (de) 2005-06-02

Family

ID=34543863

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102004051374A Withdrawn DE102004051374A1 (de) 2003-10-30 2004-10-21 Galvanogeformtes Ionenimplantations-Strukturmaterial und Verfahren zur Herstellung des Strukturmaterials

Country Status (4)

Country Link
US (2) US20050092608A1 (ko)
KR (1) KR20050041893A (ko)
CN (1) CN100494481C (ko)
DE (1) DE102004051374A1 (ko)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62122714A (ja) * 1985-11-25 1987-06-04 Canon Inc 精密成形用複製金型
US4678680A (en) * 1986-02-20 1987-07-07 Xerox Corporation Corrosion resistant aperture plate for ink jet printers
US4673467A (en) * 1986-09-02 1987-06-16 Cbs Inc. Method of manufacturing fine-grained copper substrate for optical information carrier
US4915746A (en) * 1988-08-15 1990-04-10 Welsch Gerhard E Method of forming high temperature barriers in structural metals to make such metals creep resistant at high homologous temperatures
US5516415A (en) * 1993-11-16 1996-05-14 Ontario Hydro Process and apparatus for in situ electroforming a structural layer of metal bonded to an internal wall of a metal tube
US5829240A (en) * 1997-03-17 1998-11-03 A. B. Carter, Inc. Spinning ring having improved traveler bearing surface
US7122760B2 (en) * 2002-11-25 2006-10-17 Formfactor, Inc. Using electric discharge machining to manufacture probes

Also Published As

Publication number Publication date
CN100494481C (zh) 2009-06-03
US20050092608A1 (en) 2005-05-05
KR20050041893A (ko) 2005-05-04
CN1611632A (zh) 2005-05-04
US20080237049A1 (en) 2008-10-02

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Legal Events

Date Code Title Description
R005 Application deemed withdrawn due to failure to request examination

Effective date: 20111022