DE10085115T1 - Method and device for coating a substrate in a vacuum - Google Patents

Method and device for coating a substrate in a vacuum

Info

Publication number
DE10085115T1
DE10085115T1 DE10085115T DE10085115T DE10085115T1 DE 10085115 T1 DE10085115 T1 DE 10085115T1 DE 10085115 T DE10085115 T DE 10085115T DE 10085115 T DE10085115 T DE 10085115T DE 10085115 T1 DE10085115 T1 DE 10085115T1
Authority
DE
Germany
Prior art keywords
vacuum
coating
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10085115T
Other languages
German (de)
Inventor
Gary L Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurt J Lesker Co
Original Assignee
Kurt J Lesker Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurt J Lesker Co filed Critical Kurt J Lesker Co
Publication of DE10085115T1 publication Critical patent/DE10085115T1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
DE10085115T 1999-10-22 2000-10-20 Method and device for coating a substrate in a vacuum Withdrawn DE10085115T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16109499P 1999-10-22 1999-10-22
PCT/US2000/029099 WO2001031081A1 (en) 1999-10-22 2000-10-20 Method and apparatus for coating a substrate in a vacuum

Publications (1)

Publication Number Publication Date
DE10085115T1 true DE10085115T1 (en) 2002-11-07

Family

ID=22579796

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10085115T Withdrawn DE10085115T1 (en) 1999-10-22 2000-10-20 Method and device for coating a substrate in a vacuum

Country Status (9)

Country Link
EP (1) EP1246951A4 (en)
JP (1) JP2003513169A (en)
KR (1) KR100495751B1 (en)
CN (1) CN1175126C (en)
AU (1) AU1339401A (en)
CA (1) CA2388178A1 (en)
DE (1) DE10085115T1 (en)
TW (1) TW574396B (en)
WO (1) WO2001031081A1 (en)

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TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
JP4704605B2 (en) * 2001-05-23 2011-06-15 淳二 城戸 Continuous vapor deposition apparatus, vapor deposition apparatus and vapor deposition method
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
KR100473485B1 (en) * 2002-03-19 2005-03-09 주식회사 이노벡스 Linear type evaporator for manufacturing elements of organic semiconductor device
US7309269B2 (en) 2002-04-15 2007-12-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US6749906B2 (en) 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US20040035360A1 (en) 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
TWI277363B (en) 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
US20040123804A1 (en) 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
US7211461B2 (en) 2003-02-14 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
JP4493926B2 (en) 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 Manufacturing equipment
US7211454B2 (en) 2003-07-25 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate
US8123862B2 (en) 2003-08-15 2012-02-28 Semiconductor Energy Laboratory Co., Ltd. Deposition apparatus and manufacturing apparatus
JP4551996B2 (en) * 2003-10-09 2010-09-29 グローバル・オーエルイーディー・テクノロジー・リミテッド・ライアビリティ・カンパニー Evaporator
US20050241585A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company System for vaporizing materials onto a substrate surface
ITMI20042279A1 (en) 2004-11-24 2005-02-24 Getters Spa ALKALINE METAL DISPENSER SYSTEM ABLE TO DELIVER HIGH QUANTITIES OF METALS
JP2006225757A (en) * 2005-01-21 2006-08-31 Mitsubishi Heavy Ind Ltd Vacuum vapor deposition apparatus
KR100635496B1 (en) * 2005-02-25 2006-10-17 삼성에스디아이 주식회사 side effusion type evaporation source and vapor deposion apparatus having the same
US7433141B2 (en) 2005-03-09 2008-10-07 Tandberg Data Corporation Data randomization for rewriting in recording/reproduction apparatus
JP4696710B2 (en) * 2005-06-15 2011-06-08 ソニー株式会社 Vapor deposition apparatus and vapor deposition source
KR100745619B1 (en) * 2006-04-11 2007-08-02 한국전기연구원 Plume shape controllable pulsed laser deposition system
KR101108152B1 (en) * 2009-04-30 2012-01-31 삼성모바일디스플레이주식회사 Deposition source
KR101094299B1 (en) 2009-12-17 2011-12-19 삼성모바일디스플레이주식회사 Linear Evaporating source and Deposition Apparatus having the same
KR102077803B1 (en) * 2013-05-21 2020-02-17 삼성디스플레이 주식회사 Deposition source and organic layer depositoin apparatus
CN104178734B (en) * 2014-07-21 2016-06-15 京东方科技集团股份有限公司 Evaporation coating device
KR102319998B1 (en) * 2015-01-22 2021-11-01 삼성디스플레이 주식회사 Deposition source having volume changeable type crucible
KR102488260B1 (en) * 2016-03-07 2023-01-13 삼성디스플레이 주식회사 Evaporation apparatus and method for manufacturing display device using the same
CN106148878B (en) * 2016-06-24 2018-06-08 中南大学 A kind of device and its application method for simulating high temperature metallization process

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DE970246C (en) * 1948-10-02 1958-08-28 Siemens Ag Device for continuous steaming of endless structures
GB685269A (en) * 1951-02-02 1952-12-31 Nat Res Corp Apparatus and process for coating a substrate with a metal
US3746502A (en) * 1971-12-20 1973-07-17 Xerox Corp Evaporation crucible
DE2436431B2 (en) * 1974-07-29 1978-07-27 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Evaporator and method for producing vapor-deposited layers, in particular from selenium
US4023523A (en) * 1975-04-23 1977-05-17 Xerox Corporation Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor
US4264803A (en) * 1978-01-10 1981-04-28 Union Carbide Corporation Resistance-heated pyrolytic boron nitride coated graphite boat for metal vaporization
US4332838A (en) * 1980-09-24 1982-06-01 Wegrzyn James E Particulate thin film fabrication process
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Also Published As

Publication number Publication date
CN1402800A (en) 2003-03-12
EP1246951A1 (en) 2002-10-09
EP1246951A4 (en) 2004-10-13
JP2003513169A (en) 2003-04-08
WO2001031081A1 (en) 2001-05-03
CA2388178A1 (en) 2001-05-03
KR100495751B1 (en) 2005-06-17
KR20020068039A (en) 2002-08-24
CN1175126C (en) 2004-11-10
AU1339401A (en) 2001-05-08
TW574396B (en) 2004-02-01

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Legal Events

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OP8 Request for examination as to paragraph 44 patent law
8139 Disposal/non-payment of the annual fee