TW574396B - Method and apparatus for coating a substrate in a vacuum - Google Patents

Method and apparatus for coating a substrate in a vacuum Download PDF

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Publication number
TW574396B
TW574396B TW89122148A TW89122148A TW574396B TW 574396 B TW574396 B TW 574396B TW 89122148 A TW89122148 A TW 89122148A TW 89122148 A TW89122148 A TW 89122148A TW 574396 B TW574396 B TW 574396B
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Taiwan
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source
patent application
scope
item
material source
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TW89122148A
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Chinese (zh)
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Gary L Smith
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Kurt J Lesker Company
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/543Controlling the film thickness or evaporation rate using measurement on the vapor source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Description

574396 案號 89122148 修正574396 Case No. 89122148 Amendment

五、發明說明(1) 士發明為有關於材料塗覆’更明確的說’1有 真二中以沈積材料塗覆於基材之上的裝置與方法。胃於在 =積材料塗覆於基材之上,一般先將沈積材直 皱度低於沈積材料蒸發後的溫度。 基材的 生產以有機材料為基底之=件 面、薄膜狀的基材上至少有一面需塗 ς小、平 J材料大都是有機物。基材的 ::塑:;士塗 子,外型大多是平面,但表面★二:玻瑀次疋塑膠/高分 於目前材料的技術限制,進行 ;:τ非平面。由 個平方英吋。 復暴材的大小一般都是幾 在塗覆以有機材料為基底 ― 為基底之發光二極體、以有機材二‘1底2 ,有機材料 等,一般是在真空的環境之下枓為基底之積體電路 第-圖所示點式材料源掛鋼A,或材,/Λ沈積材料’利用 掛鋼,將沈積材料塗覆於基材之*疋(式的點式材料源 發後的材料從點式材料源:上。在加熱材料之後’蒸 向外釋放。基材D一般夹持於出固口 ^晉狀釋放 釋放&柱C内旋轉,同時基材置或疋在餘夏i大 坩鍋A,一部份的材料於是塗千面側E朝向點式材料源 形成塗層。 ;土材D之平面側E上,而 在一些應用例上,所# (非均勾)流束分佈。點式源可以產生高斯 民點式源的例子包括Re D. $ 5頁 _案號891221糾 月 ㈡ 然V. Description of the invention (1) The invention of the invention relates to the material coating method, and more specifically, to the device and method for coating the substrate with a deposition material. Stomach coating material is coated on the substrate. Generally, the wrinkle of the deposition material is lower than the temperature after the deposition material evaporates. The production of substrates is based on organic materials. At least one side of the film-like substrate needs to be coated. Small and flat materials are mostly organic. The base material :: plastic :; coating, most of the appearance is flat, but the surface ★ two: glass, plastic, high scores, due to the current technical limitations of materials ,: τ non-planar. By square inches. The size of the composite material is generally coated with an organic material as the base-a light-emitting diode as the substrate, an organic material 2'1 and a base 2, organic materials, etc., generally under a vacuum environment. The integrated material circuit shown in Figure-the point-type material source hanging steel A, or material, / Λdeposited material 'Using the hanging steel, the deposition material is applied to the base material. The material is from a point source: up. After heating the material, it is' evaporated and released. The substrate D is generally clamped at the outlet ^ Jin release release & column C rotation, while the substrate is placed or held in the summer For the large crucible A, a part of the material is then coated to form a coating on the surface side E toward the point material source. On the plane side E of the earth material D, and in some application examples, all non-uniform hooks Beam distribution. Examples of point sources that can produce Gaussian point sources include Re D. $ 5 pages_case number 891221

574396 年 五、發明說明(2) M a t h i s船狀、κ n u d s e η細胞狀、感應爐的沈積材料源。$ 而’無論點式或者改良點式的材料源在其設計上都有缺 |點。首先’控制材料的蒸發率,需以低比熱及不良熱傳導 材料’靈敏且精確的控制材料溫度以及溫度梯度。點式/ I高斯材料源一般使用輻射狀反射器、絕熱材料、檔板裝 1置,使金屬及鹽類在1 〇〇〇至2 00 0°C間可產生良好的蒸發 I率。然而這種的材料源對於蒸發溫度較低(100至600°C )的 料將會自材料源;出過:=材料為基底的材 個真空系統需π f 破壞基材上已塗覆之塗層,此時整 個具::、死而v止以進行清理 於蒸發的材料細沓在a社A 1文衣力個問續在 出口孔之上,ίΐ 積於點式或改良點式沈積材料源的 使的已蒸發之積物將會改變或者甚至封閉出口孔, U,基材之塗屉回到加熱的坩鍋内部,再喷出到基材 '象也會使得塗‘的粗:土 ::此遭到破壞,θ為這種喷出現 I孔。出口孔的沈積物^曰加,甚或產生貫穿塗層的針 不均勻性。 、也θ改變流束釋放分佈,造成塗層的 I流束:式㈡掛鋼的另-項缺點是沒有均勻 ,才” ί大致均句的鋼’只有在小流束角度 石、r疋由點式材料源掛二如第二圖所示’流束角α、 線別到Ll、L乂钓:之出口孔至流束法線的延伸 柱’如第:角’其中Li、L2、L為餘 方法是增加點式 口所不。保持低户φ — ^才料源掛鍋心:束角,如…唯-_ 一基材平面側Ε之間的距離574396 V. Description of the invention (2) Ma t h i s ship shape, κ n u d s e η cell shape, source of deposition material of induction furnace. $ ’Both the point source and the improved point source have defects in their design. First, ‘to control the evaporation rate of the material, we need to control the material temperature and temperature gradient sensitively and accurately with low specific heat and poor thermal conductivity materials’. Point type / I Gaussian material sources generally use a radial reflector, thermal insulation materials, and baffle plates, so that metals and salts can produce a good evaporation I rate between 1000 and 2000 ° C. However, this material source will come from the material source for materials with a lower evaporation temperature (100 to 600 ° C); out of: = material is a substrate. A vacuum system needs π f to destroy the coating on the substrate. Layer, at this time the whole has ::, dead and v to clean up the evaporation of the material 沓 a a a company A 1 Wen Yili on the outlet hole, ΐ ΐ accumulated in the point type or improved point type deposition material The evaporated product of the source will change or even close the outlet hole. U, the coating drawer of the substrate is returned to the inside of the heated crucible, and then sprayed onto the substrate 'image will also make the coating' coarse: soil :: This is damaged, θ shows I holes for this spray. Deposits in the exit holes may increase, or even cause needle unevenness throughout the coating. 、 Also θ changes the release distribution of the stream beam, causing the I stream of the coating: Another disadvantage of the type ㈡ hanging steel is that it is not uniform. Point-type material source hanging as shown in the second figure 'stream beam angle α, line pin to Ll, L 乂 fishing: the extension hole from the exit hole to the stream beam normal column' such as: angle 'where Li, L2, L The way to do this is to increase the number of points. Keep the house low φ — ^ Only the source of the pot: the angle of the beam, such as ...

574396 修正574396 fix

案號 89122148 五、發明說明(4) :::的1費。第$ ’蒸發後的塗覆材料若未能沈積於基 ϊ =以:將著ΐ真空槽之璧上,因此塗覆製程需 材料’不僅價格昂貴而且具有 料® 。一次僅能裝填1到10立方公分的沈積材 枓二因此母次所裝填之沈積材料僅能塗覆少量的美、, 後就必須打開真空槽、清理直处 土 抽真空,成本勢必“:步;;槽壁、裝填掛鋼、然後再 f發明的-個目的即在於提供一種塗覆裝置盘方法, Ϊ 力:塗覆距離的情況下增加塗覆基;的尺 降低上料停機時間及清理時間 土材表面’ 為了解決傳統塗覆設備的缺點,本發人一 將沈積材料塗覆於基材上的真空 ^ ^種 備包括-真空#,與一位於真 。此真空塗覆設 料源包括沿縱向延伸的一本體,』 二積材料源。此材 材料源並形成一内部空穴以 長縱向的釋放構件;此 穴之出口孔。本發明並有一位^ 讓流體通過此内部空 -個將進行塗覆的基材1平=::近的熱源。 置於真空槽的内部,而當此寬體縱向軸的寬度可 孔的塗覆距離將保持不變。較加時,基材一側到出口 長縱向釋放構件的寬度等於式隋况下’材料源本體之 沈積材枓裝填入材料源本兑度 有機基底材料及有機化合物中=内°卩二八,沈積材料由 選出,沈積材料由熱源加以Case No. 89122148 V. Description of Invention (4) ::: 1 fee. If the coating material after evaporation has not been deposited on the substrate, the coating material is required for the coating process, which is not only expensive but also has material ®. Only 1 to 10 cubic centimeters of sedimentary material can be filled at one time. Therefore, the sedimentary material filled by the mother and the child can only be coated with a small amount of beauty. After that, the vacuum tank must be opened and the straight soil must be vacuumed. The purpose of the invention is to provide a coating device tray method. The force: increase the coating base in the case of coating distance; the ruler reduces the loading down time and cleans up. Time earth material surface 'In order to solve the disadvantages of traditional coating equipment, the author applied a vacuum coating material on the substrate ^ ^ Preparations include-vacuum #, and a vacuum source. This vacuum coating equipment source Including a body extending in the longitudinal direction, a source of two materials. This material source forms an internal cavity to release the member longitudinally; the exit hole of this hole. The present invention does not have a bit ^ to allow fluid to pass through this internal space- The substrate 1 to be coated is flat = :: near the heat source. It is placed inside the vacuum tank, and the coating distance of the hole when the width of the longitudinal axis of the wide body remains unchanged. Side to exit of long longitudinal release member The width is equal to the material source body ’s sedimentary material under the condition of the formula. The material source material is filled in the organic source material and organic compound = internal ° 卩 28. The deposition material is selected by the source material.

曰 修正 “、、,並沿著材料源 放出去。 、本體之長縱向釋放構件 '經由出口孔 側 料 材料源之本體為一 壁及〜對端壁,其崎口槽包括有兩個朝縱向延伸的 源之内部空&。# =向延伸的側壁及端壁間形成一材 =形成〜上端部與〜其=、之本體在出口孔與基部附近進一 端部的加熱元件數量;熱源則為-加熱線圈,置於上 沿著材料源本體之長二:基部的加熱元件數量。出口孔可 由材料源本體形成的內,釋放構件而連續延伸。肋板位於 材料源可包括第=穴之内。 以及可以讓流體通過此内;;::導管形成内部空穴, 形成之第-出口孔可與第:上之内部空穴。第-導管 或是第一導管形成之第_ s 之出口孔對正排列, 孔以不對正的方式排以 可一第二導管形成之出口 程序控制裝置可連接於材料源本體體的型式為何,一 驟:利用材料源及真空槽塗覆基材的一種方法包括下列步 延伸二.-將本材:\安袈於真空槽内。此材料源包括沿縱向 ί縱向之釋放構件;此材料源並形成-内。卩工八以及可以讓流體通過此内部空穴之出口孔. b.將—基材安置於真空槽内對著出口孔的位置’,此 出口孔由材料源本體所形成; C.將沈積材料裝填於由材料源本體所形成的内部空"Revision", ", and release it along the material source. The long longitudinal release member of the body 'through the outlet hole side material source body is a wall and ~ opposite end walls, and its sloping groove includes two longitudinally oriented The internal space of the extended source &#; forms a material between the extended side wall and the end wall = forming ~ upper end and ~ its =, the number of heating elements of the body that enters one end near the exit hole and the base; the heat source is The heating coil is placed along the second length of the material source body: the number of heating elements at the base. The outlet hole can be continuously extended by the inner part of the material source body and the release member. The rib plate is located at the material source and can include the first hole. And: the fluid can pass through it ;; :: the duct forms an internal cavity, and the formed-exit hole can be connected with the inner cavity of the upper part. The-duct or the _s outlet formed by the first duct The holes are aligned, the holes are arranged in an unaligned manner, and the outlet program control device that can be formed by a second conduit can be connected to the material source body. One step: a type of coating the substrate with a material source and a vacuum tank method Include the following steps to extend the second:-set the material in a vacuum tank. This material source includes a longitudinal release member in the longitudinal direction; this material source and formation-inside. The exit hole of the cavity. B. The substrate is placed in the vacuum tank facing the exit hole ', the exit hole is formed by the material source body; C. the deposition material is filled in the internal space formed by the material source body

574396574396

發明說明(6) 穴内 d·對真空槽抽取真空; 成 e·加熱沈積材料,此沈積材料位 的内部空穴内; 制盯碌本體所形 f·將已蒸發之沈積材料沿著材料 放構件釋放出去;以及 縱向釋 g·使基材向已蒸發之沈積材料移動。 基材可以一固定速度向已蒗發之 材塗覆完成後,基材可移到另一製:材=移動。當基 真空,然後重1上準備塗覆之基材與重新抽取 源,積==基材上的-種材料 者的混合體,包括兩個;體改鋼内;r 一可以讓流==空 女置於兩本體附近夕 體對齊一共同的縱軸而形成一 “、、源;而且兩本 制器可連接於材料泝@ ^ 、,’ σ釋放構件。一製程控 成之内部空穴設計成可以接受沈積 本體,,兩本體所形 機基底材料及有機化合物中選出。、χ ,此沈積材料由有 另:Ϊ可在真空環境中將沈積材料塗覆於某奸μ 枓源,包括-沿縱向延伸之本體,此本體2基:上的材 流體通過此内部空穴之出^,以及4=可以讓 文置於本體附近之Description of the invention (6) In the cavity, d · Extract a vacuum from the vacuum tank; e · Heat the deposition material, inside the internal cavity of this deposition material position; Make the body shape f · Release the evaporated deposition material along the material release member Go out; and longitudinal release g. Move the substrate towards the evaporated deposition material. After the substrate can be coated at a fixed speed to the material that has already been sprayed, the substrate can be moved to another system: material = moving. When the substrate is vacuum, then the substrate to be coated on the substrate is re-extracted, and the product is a mixture of two materials on the substrate, including two; the body is changed into steel; r can let the flow == The empty woman is placed near the two bodies, and the body is aligned with a common vertical axis to form a ",," source; and the two controllers can be connected to the material tracer @ ^ ,, 'σ release member. A process-controlled internal cavity Designed to accept the deposition body, which is selected from the base material and organic compounds of the two bodies., Χ, This deposition material consists of: 另 The deposition material can be applied to a source in a vacuum environment, including -The body that extends in the longitudinal direction, the base of the body 2: the material fluid on it passes out of this internal cavity ^, and 4 = the text can be placed near the body

第10頁 574396 _案號89122148_年月日_f^L·_ 五、發明說明(7) 熱源。出口孔可沿材料源本體之長縱向釋放構件而連續延 伸。肋板位於由材料源本體形成的内部空穴之内。材料源 包括一本體,此本體為一開口槽,有兩個縱向延伸的側壁 及一對端壁,其中縱向延伸的側壁及端壁間形成本體之一 内部空穴。Page 10 574396 _Case No. 89122148_year month_f ^ L · _ 5. Description of the invention (7) Heat source. The exit hole may extend continuously along the longitudinal release member of the material source body. The ribs are located within an internal cavity formed by the material source body. The material source includes a body, which is an open slot, and has two longitudinally extending side walls and a pair of end walls, wherein the longitudinally extending side walls and the end wall form an internal cavity between the bodies.

材料源也可包括第一導管,此第一導管形成内部空 穴,以及可以讓流體通過此内部空穴之第一出口孔。本體 為第二導管,此第二導管位於第一導管之該内部空穴。熱 源可安置於靠近第一導管或靠近第二導管,熱源包括第一 層的熱傳導性的絕緣材料、第二層的熱傳導性材料以及第 三層熱傳導性的絕緣材料。第一導管形成之第一出口孔可 與第二導管形成之出口孔對正排列,或是第一導管形成之 第一出口孔可與第二導管形成之出口孔以不對正的方式排 列。 本發明以上這些及其他的優點,將在本發明較佳實施 例之詳細說明中進一步說明,說明時將參考下列各圖,各 元件的代號將通用於全文之中。 圖式說明The source of material may also include a first conduit that forms an internal cavity and a first outlet hole through which fluid can pass through the internal cavity. The body is a second conduit which is located in the internal cavity of the first conduit. The heat source may be disposed near the first duct or near the second duct. The heat source includes a first layer of thermally conductive insulating material, a second layer of thermally conductive material, and a third layer of thermally conductive insulating material. The first exit hole formed by the first duct may be aligned with the exit hole formed by the second duct, or the first exit hole formed by the first duct may be aligned with the exit hole formed by the second duct in an unaligned manner. These and other advantages of the present invention will be further explained in the detailed description of the preferred embodiment of the present invention, and the following drawings will be referred to during the description, and the code of each element will be used throughout the text. Schematic description

第一圖為傳統點式材料源坩鍋之側視圖; 第二圖為第一圖的傳統點式材料源坩鍋之側視圖,但 將坩鍋附近的基材加以放大; 第三圖為本發明較佳實施例之材料源剖面之透視圖; 第四圖為第三圖材料源的剖面之端視圖; 第五圖為第三圖與第四圖材料源的剖面之側視圖;The first picture is a side view of a traditional point-type material source crucible; the second picture is a side view of the traditional point-type material source crucible, but the substrate near the crucible is enlarged; the third picture is A perspective view of a cross section of a material source according to a preferred embodiment of the present invention; a fourth view is an end view of a cross section of the material source of the third view; a fifth view is a side view of a cross section of the material source of the third and fourth views;

第11頁 743% 743% -- 五、發明說明 第六 此釋放流 伸; 第七 圖; 第八 移角度的 第九 第十 第十 加熱絲之 第十 視圖,第 第十 較佳 第三 10,第三 1 4。沈積 他適當的 之本體1 ( 所示,較 對的端壁 第三圖所 度;然而 第十 導管 三實 明 依本 槽形 底材 形坩 縱轴 16包 此三 下側 ,側 曰 五圖所示釋放流桎之上透視圖, 體之長縱向釋放構件而軸向延 仅於真空槽内兩材料源之上視 七圖所示位於真空槽内排列成偏 視圖; 實施例之多個材料源的上視圖; 例之材料源透視圖; 以及位於第一導管外表面之電阻 案號 89122U8 (8) 圖為第三圖至第 柱沿著材料源本 圖為第五圖所示 圖為第五圖至第 四個材料源之側 圖為本發明第二 圖本發明第三實 一圖為第一導管 透視圖; 一圖為第十圖與 二導管位於第一 三圖為本發明第 實施例之詳細說 圖至第八圖顯示 圖為材料源1 0的 材料1 4由有機基 材料中選出。槽 5,本體1 6乃沿著 佳的情況下本體 2 〇以及基部2 2, 示,較佳的情況 在較佳的情況下 i多正 一圖之第一導管之剖面之端 内部;以及 例之材料源剖面之側視圖。 發明之一實施例的材料源 掛鍋1 2,用以蒸發沈積材料 料及有機化合物中,或是其 鍋1 2—般包括一長形、上^ L延伸。如第三圖與第六圖 括有相對的縱向側壁1 8、相 件共同組成本體的組織。如 壁1 8與端壁2 0有相同的寬 壁18的長度SL大於較端壁2〇Page 11 743% 743%-V. Description of the invention 6th release release; 7th figure; 10th view of the 9th tenth tenth heating wire with an eighth shift angle, tenth preferred third 10 , The third one four. Deposit his proper body 1 (shown in the third figure of the opposite end wall; however, the tenth conduit three is clearly based on the trough-shaped substrate-shaped crucible longitudinal axis 16 to cover the three lower sides, and the side is five figures A perspective view of the release stream shown above, the body longitudinally releases the member and extends axially only above the two material sources in the vacuum tank, as shown in Figure 7, arranged in a partial view in the vacuum tank; multiple materials of the embodiment The top view of the source; the perspective view of the material source of the example; and the resistance case number 89122U8 located on the outer surface of the first conduit. (8) The picture shows the third to the first column along the material source. The picture shows the fifth picture. The fifth figure to the fourth material source are side views of the second figure of the present invention, the third real figure of the present invention is a perspective view of the first conduit; the first figure is the tenth figure and the second conduit is located at the first and third figures. The detailed description of the example to the eighth figure shows that the material 14 of the material source 10 is selected from organic-based materials. The groove 5, the body 16 are along the best case, the body 20 and the base 22 are shown, In the best case, in the better case, the first catheter is cut into one figure. The inside of the end; and a side view of the material source section of the example. The material source hanging pot 12 of one embodiment of the invention is used to evaporate and deposit material and organic compounds, or the pot 12 generally includes an elongated, The upper part L extends. For example, the third and sixth figures include the opposite longitudinal side walls 18, and the pieces together form the body structure. For example, the wall 18 and the end wall 20 have the same wide wall 18. The length SL is greater than End wall 2〇

$ 12頁 574396 修正 曰 8912214« 五、發明說明(9) 的長度EL,如第七圖所示。因為側壁丨8的長度SL較端壁2 0 的長度EL長’本體1 6有一個縱向較長而橫向較短的釋放構 件’其縱向長度約相當於端壁2 〇的長度EL。此外,在較佳 的情況下’槽形坩鍋丨2之側壁丨8長度大於將塗覆之基材 =4,例如塗覆1 2英吋見方之基材2 4時,側壁丨8的長度為i 5 英吋,如第七圖所示。 、 參考第三圖至第四圖,本體16之縱向側壁18、端壁20 以及基部2 2共同形成内部空穴2 6以及出口孔2 7 ;如第五圖 七圖所示’本體1 6之基部2 2進一步形成肋板28 ;肋板 附二於内部空穴2 6附近,肋板2 8亦位於基部2 2的第一表面 加工的在較佳的情況下’肋板2 8在側壁1 8間延伸。例如以 使、、少藉从去肋板2 8可與本體1 6結合成一體’如此可以 槽形坩鍋12泣ί 槽形掛鋼12時更加均句;亦可使 第六圖所示Γ 之垂直軸之垂直度更加準確。如第五圖與 材料可了 ,板2 8與沈積材料1 4的排列方式(此沈積 〆' 士 J 、|,、ι 、 較佳裝填量5、、少 料)。這使的槽形坩鍋1 2即使在裝填了 中心旋轉;此f積材料1 4,槽形坩鍋1 2仍可稍微以軸L2為 1 〇 〇立方公分之乂門佳沈積材料1 4的裝填量為大約介於5 0到 成’在較佳的作' °本體1 6與肋板28由熱傳導性的材料製 料是陶瓷,然^ =下,此材料可將熱均勻分佈,最佳的材 可塗覆各種材料,屬或是其他材料亦可接受。本體16表面 如第八圖所i以增加在本體1 6的性能及耐用性。 而旋轉,如此二j槽,掛鍋1 2也可稍微以縱向轴l為中 ^使裝填有不同沈積材料1 4 (此沈積材 574396$ 12 pages 574396 Correction 8912214 «V. The length EL of the description of the invention (9), as shown in the seventh figure. Because the length SL of the side wall 8 is longer than the length EL of the end wall 20 ', the body 16 has a release member which is longer in the longitudinal direction and shorter in the lateral direction, and its longitudinal length is approximately equivalent to the length EL of the end wall 20. In addition, in the best case, the length of the side wall of the grooved crucible 2 is longer than the substrate to be coated = 4, for example, when the 12 inch square substrate 2 is coated, the length of the side wall 8 is 8 I 5 inches, as shown in Figure 7. With reference to the third to fourth figures, the longitudinal side wall 18, the end wall 20, and the base 22 of the body 16 together form an internal cavity 26 and an outlet hole 2 7; as shown in the fifth figure and the seventh figure, the 'body 1 6 of The base 2 2 further forms a rib 28; the rib is attached to the inner cavity 26, and the rib 28 is also located on the first surface of the base 22. In the best case, the rib 2 8 is on the side wall 1 8 rooms extended. For example, the ribbed plate 2 8 can be combined with the main body 16 to reduce the cost of the ribbed plate 12 so that the trough-shaped crucible 12 can be evened out. The trough-shaped hanging steel 12 can be evened; The verticality of the vertical axis is more accurate. As shown in the fifth figure and the material, the arrangement of the plate 2 8 and the sedimentary material 14 (this deposition 〆 ′ J, | ,,, ι, the preferred loading amount 5, and less material). This makes the trough-shaped crucible 12 rotate even if it is filled at the center; the f-shaped material 1 4 and the trough-shaped crucible 12 can still slightly rotate with the axis L2 of 1000 square centimeters of the Mengate deposition material 14 The filling amount is approximately 50 to 50 ° C. In the best operation, the body 16 and the rib plate 28 are made of thermally conductive material. The material is ceramic. However, this material can evenly distribute the heat, and the best The material can be coated with a variety of materials, or other materials are acceptable. The surface of the main body 16 is as shown in FIG. 8 to increase the performance and durability of the main body 16. While rotating, such two j slots, the hanging pot 12 can also be slightly centered on the longitudinal axis l so that it is filled with different deposition materials 1 4 (this deposition material 574396

案號 89122148 五、發明說明(10) 料 可以是以無機材料為基底的材料)的多個槽妒掛。 :以沿r共同塗覆軸釋放蒸發後的材料。二;:2材 料可以在一混合區34進行混合,以更均勻地 ;;、%材 之上。可以使用孔3 6以在混合區3 4將沈積材料丨4導弓丨= 如第三圖至第四圖與第七圖至第八圖所示, 38位於本體1 6附近;在較佳的情況下,加執开' 杜σ二7^件 壁⑽外表面,使較集中的加熱元件38位;; 上緣40;側壁18位於出口孔27的附近。較 :^的外 ,=壁18的外上緣4〇以防止各種沈積 以件 曰曰、。冋樣地,以槽形坩鍋12之基部22為低溫 == :溫度:度可減少自基部22的噴出 兄直 下’加熱元件38可裝置於表面,⑮二^ 置於側壁1 8的附近。另_瑁柞$ ^ 了以裝於内部或是 示)提供,此時加4件離;可由加熱燈泡(未顯 U也可由電離槽形㈣12之基部22 - 偶溫度探針44置於;^ 線42連接於加熱元件38。一熱電 將熱電偶溫度探針?4=12:附近;在較佳的情況下, “連結於感測儀器』基部22的附近。熱電偶溫度探針 器4 5。 控制塗覆製程的其他製程控制儀 在適當的電源控制 值。適當的控制沈積松把下,沈積材料14可以升溫至預設 機頭進行控制,沈 '4 1 4的釋放,如利用石英晶體發動 持料14可依控制的速度地到達預設的Case No. 89122148 V. Description of the invention (10) The material can be hung from multiple grooves based on inorganic materials. : Release the evaporated material along a common coating axis along r. Two ;: 2 materials can be mixed in a mixing zone 34 to more uniformly ;;,% material above. Holes 3 6 can be used to deposit the material in the mixing zone 3 4 and guide the bows as shown in Figures 3 to 4 and Figures 7 to 8; 38 is located near the body 16; In the case, the outer surface of the niche of Du σ 2 7 ^ pieces was opened, so that the more concentrated heating element is 38; the upper edge 40; the side wall 18 is located near the exit hole 27. More than the outer side, the outer upper edge of the wall 18 is 40 to prevent various depositions. Similarly, the base 22 of the trough-shaped crucible 12 has a low temperature ==: temperature: the degree can reduce the ejection from the base 22. The heating element 38 can be installed on the surface, and placed near the side wall 18. Another _ 瑁 柞 $ ^ is provided in the interior or shown), plus 4 pieces at this time; can be heated by a bulb (not shown U can also be the base 22 of the ionization trough ㈣ 12-even temperature probe 44 placed; ^ The wire 42 is connected to the heating element 38. A thermoelectric thermocouple temperature probe? 4 = 12: nearby; in a better case, "connected to the sensing instrument" near the base 22. The thermocouple temperature probe 4 5 The other process controllers that control the coating process are under appropriate power control values. With proper control of the deposition handle, the deposition material 14 can be heated to a preset head for control, and the release of Shen 4 1 4 is used, such as the use of quartz crystals Starting holding material 14 can reach the preset speed at a controlled speed

第14頁 574396 年月日_ __案號 89122148 五、發明說明(12) 74位於第一導管56的外表面76之附近。Page 14 574396 _ __ Case No. 89122148 V. Description of the Invention (12) 74 is located near the outer surface 76 of the first duct 56.

如第十二圖所示’第二導管66或是其它可形成内部空 穴的結構,可形成一可以讓流體通過該内部空穴之出口 孔丄第=導管66位於第—導管56所形成之内部空穴68内。 第一導官6 6的設計以接受沈積材料1 4,此沈積材料可以是 以無機材料為基底或是其它材料;第二導管6 6一般可形成 一個第二内部空穴70,並有一可以讓流體通第二内部空穴 的第二出口孔27,,,。第一導管56與第二導管66皆由陶 瓷或其他適當材料所製成。第一導管與第二導管之擺設, 可將第—導f 56之中心轴C1與第:導管66之中心軸C2對準 或者偏移。第二出口孔27,,,可與由第一導管所形成之出 口孔2 ^對正排列;另一方法為,出口孔2 7,,,可與出口 孔2 7以一種不對正的方式排列,使的由第一導管5 6所形 成的,出口孔27’’及由第二導管66所形成的第二出口孔 27 之間’不會在接受的沈積材料1 4的第二導管66與基 材W之間存有一線型的小通道SP。為了幫助第一導管56與 1二導管66的對正,可選擇使用由石英或其他適當材料所 ^成的支撐桿72,將支撐桿72跨置於第一導管56之相對的 Τ Ϊ上8 ,、6 〇間。另外可以再使用一額外之第二導管6 6以讓 二導管=放流通過,此額外之第二導管66亦裝置於第 阻加ί!: L更:清楚顯示本發明第三個實施例’其中電 含第二> a # #代電阻加熱元件7[電阻加熱元件74,包 各第|為熱傳導性的絕緣材料78,像是氧化㉟,第二層As shown in the twelfth figure, the second duct 66 or other structure that can form an internal cavity can form an outlet hole through which the fluid can pass. Inside the cavity 68. The first guide 66 is designed to receive a deposition material 14, which can be based on an inorganic material or other materials; the second duct 66 can generally form a second internal cavity 70, and a The second outlet holes 27 ,, which flow through the second internal cavity. Both the first duct 56 and the second duct 66 are made of ceramic or other suitable materials. The arrangement of the first duct and the second duct can align or offset the central axis C1 of the first guide f 56 and the central axis C2 of the second guide duct 66. The second outlet holes 27 ,, may be aligned with the outlet holes 2 ^ formed by the first conduit; another method is that the outlet holes 27 ,, may be aligned with the outlet holes 27 in a misaligned manner. So that the exit hole 27 ″ formed by the first duct 56 and the second exit hole 27 formed by the second duct 66 ′ will not be between the second duct 66 of the accepted deposition material 1 4 and There are linear small channels SP between the substrates W. In order to help the alignment of the first duct 56 and the second duct 66, a support rod 72 made of quartz or other suitable materials can be selected, and the support rod 72 is placed on the opposite side of the first duct 56. 8 ,, 60. In addition, an additional second conduit 66 can be used to allow the second conduit = bleed through, and this additional second conduit 66 is also installed at the second block. L: The third embodiment of the present invention is clearly shown. Electric Contains a second > a ## 代 电阻 热热 器 7 [Resistance heating element 74, each of which is a thermally conductive insulating material 78, such as hafnium oxide, the second layer

第16頁 5?4396Page 16 5? 4396

五、發明說明(13) ίί鉻合金或疋其他適當材料的電阻加熱層80,第三層則 :=專導性的絕緣材料78,。如前面之說明,熱遮板“以 及、、邑熱鈕9何以置於第三層熱傳導性的絕緣材料附近。 再Γ續ίί第十三圖,第一導管56與第二導管66安置 中 s 56中對應端板之—的端板5 8與第二導管66 :!應端'反之一的編[α活動…合;而第二導管 繞之桿88,通過第一導;56二:二^° &。由襯套90所環 慕总 、昂 等吕5 6之翊板5 8,而由相對應之第二 吕=之j板84中延伸。第二桿88,,亦由襯套9〇,所環 第二導ί 過^一導管56之端板6〇, 由相對應之 支樓ΐ 延伸。第二桿88,是由-有凹槽的 ,支撐臂92連接于基座64之上。熱遮板“ 〇用^ ^ =熱遮板94的絕熱扣96已在稀前做過說明。 1 〇,,中;;^ =電極98通過本發明第三個實施例材料源 緣;此絕“I4二玉98以絕緣材料100與基座64保持絕 電阻加熱元件74,,以:陶瓷或是其他適當材料。電極98與 極98以活動方1 *、轰±源線42連接在—起。電夾1〇2將電 勒万式與連接於第一導管56。 覆;實施例’皆可以對基材24進行塗 材料源1〇、^〇障/兄:,採用槽形掛鍋12,中空導管56,,與 第-實例作說明 清楚起見’除有特別聲明外,將以 首先將沈積:圖所不-項的操作方法’塗覆製程時 積枓枓14置於材料源i。内,再將—個或者=材夺V. Description of the invention (13) 铬 Chromium alloy or other suitable materials of resistance heating layer 80, the third layer is: = conductive insulating material 78 ,. As explained above, why is the heat shield "and the heat button 9 placed near the third layer of thermally conductive insulating material. Further to the thirteenth figure, the first duct 56 and the second duct 66 are placed. The end plate 5 8 corresponding to the end plate in 56 and the second duct 66: the end of the opposite end of the pair [α activity ... combined; and the second duct is wound around the rod 88 through the first guide; 56 two: two ^ ° &. The cymbal plate 58, which is surrounded by the bush 90 and surrounded by the general manager, Ang et al. Lu 56, and extended from the corresponding second plate = j plate 84. The second rod 88, also by the lining The sleeve 90, the second guide looped through the end plate 60 of a duct 56, extends from the corresponding branch ridge. The second rod 88 is formed by a grooved support arm 92 connected to the base. 64. The heat shield "〇 用 ^ ^ = The heat shield 96 of the heat shield 94 has been explained before thinning. 10 ,, ;; ^ = electrode 98 passes the material source edge of the third embodiment of the present invention; this insulation "I4, two jade 98 with insulating material 100 and the base 64 to maintain the insulation resistance heating element 74, to: ceramic or Are other suitable materials. The electrodes 98 and 98 are connected together with a movable side 1 * and a source line 42. The electric clip 102 connects the electric Lewan type to the first conduit 56. Cover; Examples; The substrate 24 can be coated with a material source 10, ^ 〇 barrier / brother: using a trough-shaped hanging pot 12, a hollow tube 56, and the first example for the sake of clarity. Unless there is a special statement, the first Place the deposition: the operation method of the item in the figure 'The accumulation process 14 is placed in the material source i during the coating process, and then one or =

第17頁 574396 _案號89122148_年月日 修正 圖式簡單說明 1 0、1 0 ’、1 0 ’ ’ :材料源 1 2 :槽形坩鍋 1 4 :沈積材料 16、16’ :本體 1 8 :縱向側壁 20 :端壁 2 2 :基部 2 4 :基材 26、 68、70:内部空穴Page 17 574396 _Case No. 89122148_ Year, month, day, and correction diagrams Brief description 1 0, 1 0 ', 1 0' ': Source of material 1 2: Groove crucible 1 4: Deposition material 16, 16': Body 1 8: longitudinal side wall 20: end wall 2 2: base 2 4: base material 26, 68, 70: internal cavity

27、 27’、27’ ’、27’ ’ ’ :出口孔 2 8 :肋板 3 4 :混合區 3 6 :孔 3 8、3 8 ’ :加熱元件 4 0 :外上緣 4 2、4 2 ’ :電源線 4 4、4 4 ’ :熱電偶溫度探針 4 5 :控制儀器27, 27 ', 27' ', 27' '': Outlet hole 2 8: Rib plate 3 4: Mixing zone 3 6: Hole 3 8, 3 8 ': Heating element 4 0: Outer upper edge 4 2, 4 2 ': Power cord 4 4, 4 4': Thermocouple temperature probe 4 5: Control instrument

4 6 :點式材料源掛锅 48 :真空槽 5 2 :流柱 5 4 :上棱角 56 :第一導管 56’ ’ :中空導管4 6: Point-type material source hanging pot 48: Vacuum tank 5 2: Flow column 5 4: Upper corner 56: First duct 56 ’′: Hollow duct

第21頁 574396 案號89122148 年月日 修正 圖式簡單說明 58、 60、 84、 86:端板 6 2 :支撐桿 64 :基座 66 :第二導管 74、74’、74’’:電阻加熱元件 7 6 :外表面 78、78’ :熱傳導性的絕緣材料 8 0 :電阻加熱層 88:桿Page 21 574396 Case No. 89122148 Modified drawing simple description 58, 60, 84, 86: end plate 6 2: support rod 64: base 66: second conduit 74, 74 ', 74' ': resistance heating Element 76: Outer surface 78, 78 ': Thermally conductive insulating material 80: Resistance heating layer 88: Rod

8 8 ’ :第二桿 9 0、9 0 ’ :襯套 9 2 :支撐臂 9 4 :熱遮板 9 6 :絕熱鈕 9 8 ·電極 1 0 0 ·絕緣材料 1 02 :電夾8 8 ′: second rod 9 0, 9 0 ′: bushing 9 2: support arm 9 4: heat shield 9 6: thermal insulation button 9 8 · electrode 1 0 0 · insulating material 1 02: electric clamp

第22頁Page 22

Claims (1)

574396 _案號89122148_年月日__ 六、申請專利範圍 8. 如申請專利範圍第7項所述的真空塗覆裝置,其中該熱 源則為一在該本體之該上端部較該本體之該基部具有較多 加熱元件的加熱線圈。 9. 如申請專利範圍第1項所述的真空塗覆裝置,更包含一 程序控制裝置可連接於該材料源之該本體。 1 0.如申請專利範圍第1項所述的真空塗覆裝置,其中該 出口孔可沿著該本體之該長縱向釋放構件而連續延伸。 1 1.如申請專利範圍第1項所述的真空塗覆裝置,更包含 肋板,位於由該材料源之該本體的該内部空穴之内。574396 _Case No. 89122148_ Year Month Date__ VI. Patent Application Range 8. The vacuum coating device described in item 7 of the patent application range, wherein the heat source is a heat source at the upper end of the body that is larger than the body. This base has a heating coil with more heating elements. 9. The vacuum coating device according to item 1 of the scope of patent application, further comprising a program control device which can be connected to the body of the material source. 10. The vacuum coating device according to item 1 of the scope of patent application, wherein the outlet hole can continuously extend along the long longitudinal release member of the body. 1 1. The vacuum coating device according to item 1 of the scope of patent application, further comprising a rib plate located in the internal cavity of the body from the material source. 1 2.如申請專利範圍第1項所述的真空塗覆裝置,其中該 本體之形狀為一開口槽,包括有兩個朝縱向延伸的側壁及 一對端壁,其中縱向延伸的該側壁及該端壁間形成該本體 的該内部空六。 1 3 ·如申請專利範圍第1項所述的真空塗覆裝置,更包含 第一導管,該第一導管形成内部空穴,以及可以讓流體通 過該内部空穴之第一導管,該本體為第二導管,該第二導 管位於第一導管之該内部空穴。1 2. The vacuum coating device according to item 1 of the scope of patent application, wherein the shape of the body is an open groove, which includes two side walls extending in the longitudinal direction and a pair of end walls, wherein the side walls extending in the longitudinal direction and The inner space of the body is formed between the end walls. 1 3 · The vacuum coating device according to item 1 of the scope of patent application, further comprising a first duct, the first duct forming an internal cavity, and a first duct through which fluid can pass through the internal cavity. The body is A second conduit is located in the internal cavity of the first conduit. 1 4.如申請專利範圍第1 3項所述的真空塗覆裝置,其中該 第一導管形成之該第一出口孔可與該第二導管形成之該出 口孔對正排列。 1 5.如申請專利範圍第1 3項所述的真空塗覆裝置,其中該 第一導管形成之該第一出口孔可與該第二導管形成之該出 口孔以不對正的方式排列。 16. —種沈積材料塗覆於基材上的真空塗覆方法,其包括14. The vacuum coating device according to item 13 of the scope of the patent application, wherein the first outlet hole formed by the first conduit and the outlet hole formed by the second conduit are aligned with each other. 15. The vacuum coating device according to item 13 of the scope of the patent application, wherein the first outlet hole formed by the first conduit and the outlet hole formed by the second conduit may be arranged in an unaligned manner. 16. A vacuum coating method for coating a deposition material on a substrate, comprising: 第24頁 574396 _案號89122148_年月日__ 六、申請專利範圍 下列步驟: 將該材料源安裝於該真空槽内,該材料源具有一沿縱向 延伸的本體及一長縱向之釋放構件,並形成一内部空穴、 一可以讓流體通過該内部空穴之出口孔、一個與該出口孔 相鄰的一上端部與一基部; 將一基材置於該真空槽内對著該出口孔的位置,該出口 孔由該材料源之該本體所形成, 將沈積材料裝填於由該材料源之該本體之該内部空穴 内;Page 24 574396 _Case No. 89122148_Year_Month__ VI. Patent application scope The following steps: Install the material source in the vacuum tank, the material source has a body extending in the longitudinal direction and a long longitudinal release member And form an internal cavity, an outlet hole through which the fluid can pass, an upper end adjacent to the outlet hole, and a base portion; placing a substrate in the vacuum tank facing the outlet hole Position, the exit hole is formed by the body of the material source, and the deposition material is filled in the internal cavity of the body by the material source; 對該真空槽抽取真空; 加熱該沈積材料,以一熱源加熱上述位於該材料源之該 本體之該内部空穴内的沈積材料,其該熱源可使該材料源 該基部的溫度低於該材料源之該上端部的溫度,並於該材 料源内部生成一垂直向的溫度梯度; 將已蒸發之沈積材料沿著該本體之長縱向釋放構件釋放 出去;以及 使該基材經該已蒸發之該沈積材料而移動。 1 7.使用如申請專利範圍第1 6項所述的材料源及真空槽以 塗覆基材之方法,其中該基材可以一固定速度經該已蒸發 之沈積材料而移動。 1 8. —種沈積材料塗覆於基材上的材料源,該材料源包 括: 兩個本體,該兩個本體皆形成一内部空穴,以及至少有 一可以讓流體通過該内部空穴之出口孔,其中該兩本體對Vacuum is applied to the vacuum tank; the deposition material is heated, and the deposition material located in the internal cavity of the body of the material source is heated by a heat source, which can cause the temperature of the material source and the base portion to be lower than the material source The temperature of the upper end portion, and generate a vertical temperature gradient inside the material source; release the evaporated deposition material along the long longitudinal release member of the body; and pass the substrate through the evaporated Material is deposited while moving. 1 7. A method for coating a substrate using the material source and the vacuum tank described in item 16 of the scope of the patent application, wherein the substrate can be moved at a fixed speed through the evaporated deposition material. 1 8. A source of material coated on a substrate with a deposition material, the source of material comprising: two bodies, both bodies forming an internal cavity, and at least one outlet through which fluid can pass through the internal cavity Hole, where the two bodies pair 第25頁 574396 _案號89122148_年月日__ 六、申請專利範圍 齊一共同的縱軸而形成一長縱向的釋放構件,且該個兩本 體所形成之各該出口孔以不對正的方式排列;以及 一置於各該兩本體附近並可沿著各該兩本體延伸之熱 源。 1 9.如申請專利範圍第1 8項所述的材料源,其中該兩本體 為點式材料源掛鋼。 2 0 .如申請專利範圍弟1 8項所述的材料源,其中該兩本體 為改良點式材料源坩鍋。Page 25574396 _ Case No. 89122148 _ Month and Day __ VI. The scope of patent application is a common longitudinal axis to form a long longitudinal release member, and each of the exit holes formed by the two bodies is misaligned. Arranged in a manner; and a heat source placed near each of the two bodies and extending along each of the two bodies. 19. The material source according to item 18 of the scope of patent application, wherein the two bodies are point-type material source steel. 20. The material source as described in item 18 of the patent application scope, wherein the two bodies are improved point-type material source crucibles. 2 1 .如申請專利範圍第1 8項所述的材料源,更包含一製程 控制器可連接於該材料源之該兩個本體中的一個本體。 2 2 .如申請專利範圍第1 8項所述的材料源,其中該兩本體 所形成之該内部空穴設計成可以接受沈積材料;該沈積材 料由有機基底化學品及有機化合物中選出。2 1. The material source described in item 18 of the scope of patent application, further comprising a process controller that can be connected to one of the two bodies of the material source. 2 2. The material source according to item 18 of the scope of patent application, wherein the internal cavity formed by the two bodies is designed to accept a deposition material; the deposition material is selected from organic base chemicals and organic compounds. 第26頁Page 26
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