DD102824A5 - - Google Patents

Info

Publication number
DD102824A5
DD102824A5 DD167514A DD16751472A DD102824A5 DD 102824 A5 DD102824 A5 DD 102824A5 DD 167514 A DD167514 A DD 167514A DD 16751472 A DD16751472 A DD 16751472A DD 102824 A5 DD102824 A5 DD 102824A5
Authority
DD
German Democratic Republic
Application number
DD167514A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DD102824A5 publication Critical patent/DD102824A5/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DD167514A 1971-12-08 1972-12-07 DD102824A5 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20586071A 1971-12-08 1971-12-08

Publications (1)

Publication Number Publication Date
DD102824A5 true DD102824A5 (enExample) 1973-12-20

Family

ID=22763936

Family Applications (1)

Application Number Title Priority Date Filing Date
DD167514A DD102824A5 (enExample) 1971-12-08 1972-12-07

Country Status (10)

Country Link
JP (1) JPS5729694B2 (enExample)
AU (1) AU4971172A (enExample)
BE (1) BE792434A (enExample)
CA (1) CA976353A (enExample)
DD (1) DD102824A5 (enExample)
DE (1) DE2259768C2 (enExample)
FR (1) FR2162565A1 (enExample)
IL (1) IL40940A0 (enExample)
IT (1) IT971665B (enExample)
NL (1) NL7216710A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4379827A (en) * 1971-12-08 1983-04-12 Energy Conversion Devices, Inc. Imaging structure with tellurium metal film and energy sensitive material thereon
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
US4357616A (en) * 1979-03-26 1982-11-02 Hitachi, Ltd. Recording medium
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4544622A (en) * 1984-07-19 1985-10-01 Minnesota Mining And Manufacturing Company Negative-acting photoresist imaging system
JPH01122189A (ja) * 1987-11-05 1989-05-15 Kansai Paint Co Ltd プリント配線板フォトレジスト用電着塗料組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE679470C (de) * 1934-03-15 1939-08-07 Heidenhain Johannes Dr Verfahren zum Herstellen von Auswaschreliefs durch gerbende Entwicklung von Halogensilberkolloidschichten
NL280795A (enExample) * 1958-11-26
GB1031978A (en) * 1964-11-06 1966-06-02 Standard Telephones Cables Ltd Improvements in or relating to photolithographic masks
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
DE1904789A1 (de) * 1969-01-31 1970-09-10 Licentia Gmbh Maske zur Abbildung von Mustern auf lichtempfindlichen Schichten
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
JPS5022877B1 (enExample) * 1969-07-28 1975-08-02
JPS5139121B2 (enExample) * 1971-10-11 1976-10-26
JPS5520186B2 (enExample) * 1972-05-18 1980-05-31

Also Published As

Publication number Publication date
CA976353A (en) 1975-10-21
DE2259768C2 (de) 1984-01-26
BE792434A (fr) 1973-03-30
IT971665B (it) 1974-05-10
JPS4865927A (enExample) 1973-09-10
NL7216710A (enExample) 1973-06-13
DE2259768A1 (de) 1973-06-14
FR2162565B1 (enExample) 1977-01-14
JPS5729694B2 (enExample) 1982-06-24
FR2162565A1 (en) 1973-07-20
AU4971172A (en) 1974-06-06
IL40940A0 (en) 1973-01-30

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