CZ20227A3 - - Google Patents
Info
- Publication number
- CZ20227A3 CZ20227A3 CZ20227A CZ20227A CZ20227A3 CZ 20227 A3 CZ20227 A3 CZ 20227A3 CZ 20227 A CZ20227 A CZ 20227A CZ 20227 A CZ20227 A CZ 20227A CZ 20227 A3 CZ20227 A3 CZ 20227A3
- Authority
- CZ
- Czechia
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/418—Imaging electron microscope
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/50—Detectors
- G01N2223/505—Detectors scintillation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/50—Detectors
- G01N2223/507—Detectors secondary-emission detector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2443—Scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/24465—Sectored detectors, e.g. quadrants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
- H01J2237/281—Bottom of trenches or holes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2018/035048 WO2020059114A1 (ja) | 2018-09-21 | 2018-09-21 | 荷電粒子線装置 |
| JPPCT/JP2018/035048 | 2018-09-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CZ20227A3 true CZ20227A3 (cs) | 2021-05-05 |
| CZ309373B6 CZ309373B6 (cs) | 2022-10-12 |
Family
ID=69886770
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CZ2022-7A CZ309373B6 (cs) | 2018-09-21 | 2018-09-21 | Zařízení využívající svazky nabitých částic |
| CZ2021-87A CZ309147B6 (cs) | 2018-09-21 | 2018-09-21 | Zařízení využívající svazky nabitých částic |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CZ2021-87A CZ309147B6 (cs) | 2018-09-21 | 2018-09-21 | Zařízení využívající svazky nabitých částic |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11515120B2 (cs) |
| JP (1) | JP6984035B2 (cs) |
| CZ (2) | CZ309373B6 (cs) |
| DE (1) | DE112018007843B4 (cs) |
| IL (1) | IL281169B2 (cs) |
| WO (1) | WO2020059114A1 (cs) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ309373B6 (cs) * | 2018-09-21 | 2022-10-12 | Hitachi High-Tech Corporation | Zařízení využívající svazky nabitých částic |
| US12385861B2 (en) * | 2020-03-02 | 2025-08-12 | Hitachi High-Tech Corporation | Charged particle detector, charged particle ray device, radiation detector, and radiation detection device |
| DE102021125639A1 (de) * | 2021-10-04 | 2023-04-06 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlsystem |
| WO2024189834A1 (ja) | 2023-03-15 | 2024-09-19 | 株式会社日立ハイテク | 検出器、測定装置および荷電粒子線装置 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5419658U (cs) * | 1977-07-11 | 1979-02-08 | ||
| JPS5419658A (en) | 1977-07-14 | 1979-02-14 | Mitsubishi Electric Corp | Semiconductor device |
| JPS5419858A (en) | 1977-07-15 | 1979-02-14 | Kenji Nakamura | Toilet coating utensil of foundation and like |
| JPS58174855A (ja) | 1982-04-07 | 1983-10-13 | Nippon Tsushin Gijutsu Kk | 角加速度検出器 |
| JPS58174855U (ja) * | 1982-05-17 | 1983-11-22 | 株式会社日立製作所 | ２次電子検出装置 |
| DE3500903A1 (de) | 1985-01-12 | 1986-07-17 | Fa. Carl Zeiss, 7920 Heidenheim | Detektor fuer rueckstreuelektronen |
| DE3925949A1 (de) | 1989-08-05 | 1991-02-07 | Herbert Dr Specht | Elektronenrastermikroskop mit nachruestmodul |
| GB2314926B (en) * | 1996-07-01 | 1999-08-25 | K E Developments Ltd | Detector devices |
| EP1063677B1 (en) * | 1999-06-23 | 2005-03-16 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device |
| US7373197B2 (en) * | 2000-03-03 | 2008-05-13 | Intramedical Imaging, Llc | Methods and devices to expand applications of intraoperative radiation probes |
| EP1299897B1 (de) * | 2000-07-07 | 2008-04-09 | Carl Zeiss NTS GmbH | Detektor für variierende druckbereiche und elektronenmikroskop mit einem entsprechenden detektor |
| US6803583B2 (en) * | 2001-03-21 | 2004-10-12 | M.E. Taylor Engineering Inc. | Scintillator for electron microscope and method of making |
| US6775452B2 (en) * | 2001-05-18 | 2004-08-10 | Applied Materials, Inc. | Phosphor coated waveguide for efficient collection of electron-generated photons |
| US6768836B2 (en) * | 2001-11-02 | 2004-07-27 | Applied Materials, Inc. | Phosphor coated waveguide for the efficient collection of electron-generated photons |
| US7919757B2 (en) * | 2006-04-04 | 2011-04-05 | Shimadzu Corporation | Radiation detector |
| US7872236B2 (en) * | 2007-01-30 | 2011-01-18 | Hermes Microvision, Inc. | Charged particle detection devices |
| WO2010021012A1 (en) * | 2008-08-20 | 2010-02-25 | Advantest Corporation | Electron detection device and scanning electron microscope |
| DE102010026169B4 (de) | 2010-07-06 | 2014-09-04 | Carl Zeiss Microscopy Gmbh | Partikelstrahlsystem |
| WO2015002281A1 (ja) * | 2013-07-04 | 2015-01-08 | コニカミノルタ株式会社 | シンチレータパネル及びその製造方法 |
| CN105308712A (zh) * | 2013-07-31 | 2016-02-03 | 株式会社日立高新技术 | 带电粒子束装置 |
| JP6316578B2 (ja) | 2013-12-02 | 2018-04-25 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡システム及びそれを用いたパターン計測方法並びに走査電子顕微鏡 |
| JP6169506B2 (ja) | 2014-02-19 | 2017-07-26 | 株式会社日立ハイテクノロジーズ | 試料ホルダ、観察システム、および画像生成方法 |
| US10910193B2 (en) * | 2015-09-03 | 2021-02-02 | El-Mul Technologies Ltd. | Particle detection assembly, system and method |
| JP6739207B2 (ja) * | 2016-03-31 | 2020-08-12 | 株式会社日立ハイテク | 荷電粒子線装置 |
| US10302774B2 (en) * | 2016-04-25 | 2019-05-28 | Morpho Detection, Llc | Detector assembly for use in CT imaging systems |
| US10365383B2 (en) * | 2016-09-09 | 2019-07-30 | Minnesota Imaging And Engineering Llc | Structured detectors and detector systems for radiation imaging |
| US10509135B2 (en) * | 2016-09-09 | 2019-12-17 | Minnesota Imaging And Engineering Llc | Structured detectors and detector systems for radiation imaging |
| JP6857511B2 (ja) * | 2017-02-23 | 2021-04-14 | 日本電子株式会社 | 走査電子顕微鏡 |
| US10525285B1 (en) * | 2018-08-06 | 2020-01-07 | Integrated Sensors, Llc | Ionizing-radiation beam monitoring system |
| CZ309373B6 (cs) * | 2018-09-21 | 2022-10-12 | Hitachi High-Tech Corporation | Zařízení využívající svazky nabitých částic |
| US11031210B2 (en) * | 2019-03-06 | 2021-06-08 | El-Mul Technologies Ltd. | Charged particle detection system |
| US11239048B2 (en) * | 2020-03-09 | 2022-02-01 | Kla Corporation | Arrayed column detector |
-
2018
- 2018-09-21 CZ CZ2022-7A patent/CZ309373B6/cs unknown
- 2018-09-21 US US17/269,424 patent/US11515120B2/en active Active
- 2018-09-21 DE DE112018007843.4T patent/DE112018007843B4/de active Active
- 2018-09-21 WO PCT/JP2018/035048 patent/WO2020059114A1/ja active Application Filing
- 2018-09-21 IL IL281169A patent/IL281169B2/en unknown
- 2018-09-21 JP JP2020547574A patent/JP6984035B2/ja active Active
- 2018-09-21 CZ CZ2021-87A patent/CZ309147B6/cs unknown
-
2022
- 2022-10-10 US US17/962,915 patent/US11694873B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| DE112018007843B4 (de) | 2024-05-29 |
| US11515120B2 (en) | 2022-11-29 |
| CZ309373B6 (cs) | 2022-10-12 |
| WO2020059114A1 (ja) | 2020-03-26 |
| IL281169A (en) | 2021-04-29 |
| CZ309147B6 (cs) | 2022-03-09 |
| IL281169B1 (en) | 2024-09-01 |
| CZ202187A3 (cs) | 2021-05-05 |
| US20230030651A1 (en) | 2023-02-02 |
| JP6984035B2 (ja) | 2021-12-17 |
| JPWO2020059114A1 (ja) | 2021-08-30 |
| IL281169B2 (en) | 2025-01-01 |
| US20210183614A1 (en) | 2021-06-17 |
| DE112018007843T5 (de) | 2021-04-01 |
| US11694873B2 (en) | 2023-07-04 |