CN221149146U - Manual double-station photoetching machine - Google Patents
Manual double-station photoetching machine Download PDFInfo
- Publication number
- CN221149146U CN221149146U CN202322925505.6U CN202322925505U CN221149146U CN 221149146 U CN221149146 U CN 221149146U CN 202322925505 U CN202322925505 U CN 202322925505U CN 221149146 U CN221149146 U CN 221149146U
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- Prior art keywords
- station
- light source
- frame
- platform
- manual
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Links
- 238000001259 photo etching Methods 0.000 title abstract description 10
- 238000001459 lithography Methods 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052710 silicon Inorganic materials 0.000 abstract description 14
- 239000010703 silicon Substances 0.000 abstract description 14
- 230000000712 assembly Effects 0.000 abstract description 3
- 238000000429 assembly Methods 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 23
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model belongs to the technical field of photoetching machines and discloses a manual double-station photoetching machine which comprises a frame, wherein a fixed platform and a rotary platform are arranged on the frame, a portal frame and a light source mounting frame are arranged on the fixed platform, a left alignment lens and a right alignment lens are arranged on the portal frame, parallel light sources are arranged on the light source mounting frame, two station assemblies are symmetrically arranged on the rotary platform, and when one station assembly is positioned below the parallel light sources, the other station assembly is positioned below the portal frame. When the manual double-station photoetching machine is used, a silicon wafer is manually placed on the first station assembly and is aligned with a mark, the first station assembly rotates 180 degrees to the lower part of the parallel light source to expose, an operator repeats the operation of the first station assembly on the second station assembly while exposing, the exposed first station assembly rotates 180 degrees, and the exposed silicon wafer is taken out.
Description
Technical Field
The utility model belongs to the technical field of lithography machines, and particularly relates to a manual double-station lithography machine.
Background
The photoetching machine, namely a mask alignment exposure machine, an exposure system, a photoetching system and the like, is core equipment for manufacturing chips, but the existing manual photoetching machine generally has only one station, an operator needs to wait for the exposure of a silicon wafer and then take down the silicon wafer, and a new silicon wafer is reinstalled, so that the efficiency is lower, and the improvement is needed.
Disclosure of utility model
The present utility model aims to solve the above technical problems at least to some extent. To this end, the utility model aims to provide a manual double-station lithography machine.
The technical scheme adopted by the utility model is as follows:
The utility model provides a manual duplex position lithography machine, includes the frame, is equipped with fixed platform and revolving platform in the frame, is equipped with portal frame and light source mounting bracket on the fixed platform, is equipped with left counterpoint camera lens and right counterpoint camera lens on the portal frame, is equipped with parallel light source on the light source mounting bracket, and the symmetry is equipped with two station components on the revolving platform, and when one station component was located parallel light source below, another station component was located the portal frame below.
Preferably, the station assembly comprises an XYQ adjusting mechanism, a mask plate mechanism, a feeding mechanism, a floating mechanism and a lifting mechanism, wherein the lifting mechanism is connected with the floating mechanism, the feeding mechanism is arranged on the floating mechanism, the mask plate mechanism is arranged on the XYQ adjusting mechanism, and the mask plate mechanism is arranged above the feeding mechanism.
Preferably, the rotary platform is circular, the two station assemblies are a first station assembly and a second station assembly respectively, and the first station assembly and the second station assembly are arranged on the same diameter of the rotary platform.
Preferably, the fixed platform is provided with a left panel and a right panel, and the left panel and the right panel are respectively provided with an operation button.
The beneficial effects of the utility model are as follows:
When the manual double-station photoetching machine provided by the utility model is used, the wafer carrying table of the feeding mechanism is automatically leveled through the floating mechanism, the silicon wafer is manually placed on the wafer carrying table and pushed into place, then the lifting mechanism is lifted into place, the first station component is rotated 180 degrees to the lower part of the parallel light source for exposure through the manual alignment mark of the alignment lens, meanwhile, an operator repeats the operation of the first station component on the second station component, the exposed first station component is rotated 180 degrees, the wafer carrying table is manually pulled out, and the exposed silicon wafer is taken out.
Drawings
FIG. 1 is an elevation view of a manual dual-station lithographic machine of the present utility model.
FIG. 2 is a top view of the manual dual station lithographic machine of the present utility model.
FIG. 3 is a side view of the manual dual-station lithographic machine of the present utility model.
FIG. 4 is a perspective view of a manual dual-station lithographic machine of the present utility model.
In the figure: 1-a frame; 2-a fixed platform; 3-left panel; a 4-X adjustment unit; 5-portal frames; 6-left alignment lens; 7-a light source mounting rack; 8-parallel light sources; 9-right alignment lens; 10-mask plate mechanism; 11-a feeding mechanism; 12-a floating mechanism; a 13-Q adjustment unit; 14-right panel; 15-Y adjusting unit; 16-lifting mechanism; 17-a first station assembly; 18-a second station assembly; 19-a rotary platform.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative and intended to explain the present utility model and should not be construed as limiting the utility model. The components of the embodiments of the present utility model generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
In the present utility model, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements.
The utility model will be further described with reference to the drawings and specific examples.
As shown in fig. 1 to 4, the manual duplex position lithography machine of this embodiment includes a frame 1, a fixed platform 2 and a rotary platform 19 are disposed on the frame 1, the rotary platform 19 is installed at the center position of the fixed platform 2, the rotary platform 19 is circular, and the rotary platform 19 can rotate. The fixed platform 2 is provided with a portal frame 5 and a light source mounting frame 7, the portal frame 5 is provided with a left alignment lens 6 and a right alignment lens 9, the light source mounting frame 7 is provided with a parallel light source 8, the rotary platform 19 is symmetrically provided with two station components, and when one station component is positioned below the parallel light source 8, the other station component is positioned below the portal frame 5.
The two station components are a first station component 17 and a second station component 18 respectively, the structures of the first station component 17 and the second station component 18 are identical, and the first station component 17 and the second station component 18 are respectively provided with the same diameter of the rotary platform 19, so that when the rotary platform 19 rotates 180 degrees, the positions of the first station component 17 and the second station component 18 can be interchanged.
Specifically, the station assembly comprises an XYQ adjusting mechanism, a mask plate mechanism 10, a feeding mechanism 11, a floating mechanism 12 and a lifting mechanism 16, wherein the lifting mechanism 16 is connected with the floating mechanism 12, the feeding mechanism 11 is arranged on the floating mechanism 12, the lifting mechanism 16 can drive the feeding mechanism 11 and the floating mechanism 12 to move up and down together, the floating mechanism 12 is used for leveling a silicon wafer, the feeding mechanism 11 comprises a wafer carrying platform, and the wafer carrying platform is used for placing the silicon wafer and can pull out and push in, so that the silicon wafer can be placed and taken out manually. The mask plate mechanism 10 is installed on the XYQ adjusting mechanism, and the mask plate mechanism 10 is located above the feeding mechanism 11, and the XYQ adjusting mechanism is in the prior art and comprises an X adjusting unit 4, a Q adjusting unit 13 and a Y adjusting unit 15, so that the adjustment in the XYQ direction can be realized.
The fixed platform 2 is provided with a left panel 3 and a right panel 14, the left panel 3 and the right panel 14 are respectively provided with an operation button, and an operation system and the operation buttons adopt the prior art and can be set according to the requirements of practical applications.
The manual double-station photoetching machine of the embodiment has the following operation processes and principles: the lifting mechanism of the first station assembly 17 automatically lifts in place, the floating mechanism automatically levels, then the lifting mechanism automatically drops in place, a silicon wafer is placed on the wafer bearing table after the wafer bearing table of the feeding mechanism is pulled out manually, the wafer bearing table is pushed in place, the lifting mechanism is lifted in place again, the left alignment lens and the right alignment lens are manually adjusted to perform alignment marks, and after alignment is completed, the rotary platform 19 automatically rotates 180 degrees, so that the silicon wafer of the first station assembly 17 is automatically exposed; meanwhile, an operator operates the second station assembly 18 in the same way as the first station assembly 17, when the second station assembly 18 is operated, the rotary platform 19 automatically rotates 180 degrees, the silicon wafers of the second station assembly 18 are automatically exposed, meanwhile, the wafer carrying table of the first station assembly is automatically lowered to the proper position when the wafers are exposed, the exposed silicon wafers are manually taken away after the wafer carrying table is manually pulled out, and then the alternate exposure of the two station assemblies can be realized by repeating the operation on the first station assembly.
The utility model is not limited to the above-described alternative embodiments, and any person who may derive other various forms of products in the light of the present utility model, however, any changes in shape or structure thereof, all falling within the technical solutions defined in the scope of the claims of the present utility model, fall within the scope of protection of the present utility model.
Claims (5)
1. A manual double-station lithography machine, characterized by: including frame (1), be equipped with fixed platform (2) and revolving platform (19) on frame (1), be equipped with portal frame (5) and light source mounting bracket (7) on fixed platform (2), be equipped with left counterpoint camera lens (6) and right counterpoint camera lens (9) on portal frame (5), be equipped with parallel light source (8) on light source mounting bracket (7), the symmetry is equipped with two station components on revolving platform (19), when one station component is located parallel light source (8) below, another station component is located portal frame (5) below.
2. The manual dual-station lithographic apparatus of claim 1, wherein: the station assembly comprises an XYQ adjusting mechanism, a mask plate mechanism (10), a feeding mechanism (11), a floating mechanism (12) and a lifting mechanism (16), wherein the lifting mechanism (16) is connected with the floating mechanism (12), the feeding mechanism (11) is arranged on the floating mechanism (12), the mask plate mechanism (10) is arranged on the XYQ adjusting mechanism, and the mask plate mechanism (10) is arranged above the feeding mechanism (11).
3. The manual double station lithography machine of claim 2, wherein: the XYQ adjusting mechanism comprises an X adjusting unit (4), a Q adjusting unit (13) and a Y adjusting unit (15).
4. A manual duplex position lithography machine according to any one of claims 1-3, wherein: the rotary platform (19) is circular, the two station components are a first station component (17) and a second station component (18), and the first station component (17) and the second station component (18) are respectively provided with the same diameter of the rotary platform (19).
5. A manual duplex position lithography machine according to any one of claims 1-3, wherein: the fixed platform (2) is provided with a left panel (3) and a right panel (14), and the left panel (3) and the right panel (14) are respectively provided with an operation button.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322925505.6U CN221149146U (en) | 2023-10-30 | 2023-10-30 | Manual double-station photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322925505.6U CN221149146U (en) | 2023-10-30 | 2023-10-30 | Manual double-station photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN221149146U true CN221149146U (en) | 2024-06-14 |
Family
ID=91415876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322925505.6U Active CN221149146U (en) | 2023-10-30 | 2023-10-30 | Manual double-station photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN221149146U (en) |
-
2023
- 2023-10-30 CN CN202322925505.6U patent/CN221149146U/en active Active
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