CN218158730U

CN218158730U - Photoetching machine reflector support frame

Info

Publication number: CN218158730U
Application number: CN202222252726.7U
Authority: CN
Inventors: 陈建强; 朱俊杰
Original assignee: Suzhou Jinghua Zhizao Technology Co ltd
Current assignee: Suzhou Jinghua Zhizao Technology Co ltd
Priority date: 2022-08-25
Filing date: 2022-08-25
Publication date: 2022-12-27
Anticipated expiration: 2032-08-25

Abstract

The application discloses a support frame of a light reflecting shade of a photoetching machine, which comprises a support base, a first support mechanism and a second support mechanism, wherein a balancing weight is embedded at the bottom of the support base, and a clamping groove is formed in one side of the balancing weight; the first supporting mechanism comprises a limiting sleeve, a limiting block and an adjusting wheel, the limiting sleeve is sleeved at the top of the adjusting rod, the adjusting rod is connected with the loop bar through threads, the loop bar is fixedly connected to the top of the backing plate, the limiting block is arranged on the outer side of the backing plate, and the adjusting wheel is arranged on one side of the limiting block; the second supporting mechanism is installed on the supporting base, a supporting disk is clamped in the clamping groove, and a reflector body is arranged above the supporting disk. The limiting sleeve and the limiting block can limit the reflector body, so that the reflector body can be stably placed on the top of the supporting base, the reflector body can be rotatably adjusted, the processing and the maintenance of the surface of the reflector body are assisted, and the practicability is high; the support bars and the cross bars can assist the reflector body in adjusting the placement direction and position, and the illumination blocks and the balancing weights can increase the functionality of the support base.

Description

Photoetching machine reflector support frame

Technical Field

The application relates to the field of photoetching machines, in particular to a photoetching machine reflecting shade support frame.

Background

Lithography machines are also known as: a mask alignment exposure machine, an exposure system, a photolithography system, etc., are core equipment for manufacturing a chip. The technology similar to photo development is adopted, fine patterns on a mask plate are printed on a silicon chip through light exposure, and a reflecting cover is indispensable when a photoetching machine is used.

When the reflector was placed on the support frame, both sides lacked limit structure about, and difficult stable the placing, the difficult rotation was adjusted after placing, and the practicality is not enough, and the direction and the position that the reflector was placed on the support frame are comparatively fixed, influence the holistic effect of placing of reflector. Therefore, the supporting frame for the reflector of the lithography machine is provided for solving the problems.

Disclosure of Invention

The utility model provides a photoetching machine reflector support frame is provided in this embodiment for when solving among the prior art reflector and placing on the support frame, upper and lower both sides lack limit structure, and difficult stable placing is difficult for rotating the regulation after placing, and the practicality is not enough, and the direction and the position that the reflector was placed on the support frame are comparatively fixed, influence the holistic problem of placing the effect of reflector.

According to one aspect of the application, a support frame of a light reflecting cover of a lithography machine is provided, and comprises a support base, a first support mechanism and a second support mechanism, wherein a balancing weight is embedded at the bottom of the support base, and a clamping groove is formed in one side of the balancing weight; the first supporting mechanism comprises a limiting sleeve, a limiting block and an adjusting wheel, the limiting sleeve is sleeved at the top of the adjusting rod, the adjusting rod is connected with the sleeve rod through threads, the sleeve rod is fixedly connected to the top of the base plate, the limiting block is arranged on the outer side of the base plate, and the adjusting wheel is arranged on one side of the limiting block; the second supporting mechanism is installed on the supporting base, the clamping groove is circular, the supporting disc is clamped in the clamping groove, the reflecting shade body is arranged above the supporting disc, and the reflecting shade body is clamped at the top of the limiting block.

Further, backing plate bottom rigid coupling has the supporting disk, the supporting disk block rotates in the draw-in groove and is connected between the draw-in groove, the supporting disk top rigid coupling has the stopper, the stopper is the arc.

Furthermore, the supporting disk is in meshed connection with the adjusting wheel, the bottom of the adjusting wheel is sleeved on the supporting base and is in rotating connection with the supporting base, and the diameter of the adjusting wheel is smaller than that of the supporting disk.

Furthermore, the supporting base is embedded with lighting blocks, the lighting blocks are positioned on one side, away from the adjusting wheel, of the supporting plate, and the number of the lighting blocks is two.

Further, the second supporting mechanism comprises a supporting bar, an extending rod and an installation block, wherein the installation block is fixedly connected to the two sides of the bottom of the supporting bar, and the installation block is installed on the supporting base through a bolt.

Furthermore, one side of the supporting bar close to the adjusting wheel is spliced with a cross bar, the cross bar is connected with the extension rod through threads, a blocking strip is arranged at the bottom of the cross bar, and the blocking strip is fixedly connected to the side wall of the supporting bar.

Through the above-mentioned embodiment of this application, first supporting mechanism and second supporting mechanism have been adopted, when the reflector was placed on the support frame, both sides lack limit structure from top to bottom, difficult stable placing, the difficult rotation of placing the back is adjusted, the practicality is not enough, and the direction and the position that the reflector was placed on the support frame are comparatively fixed, influence the problem of the holistic placement effect of reflector, spacing structure has been had on having obtained the support frame, the stable placing of the reflector of being convenient for, the reflector after the placing can rotate the regulation, the direction and the position of placing of reflector on the support frame are adjustable, can carry out vertical and horizontal placing, the placement effect of reflector on the support frame is improved.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the description below are only some embodiments of the present application, and for those skilled in the art, other drawings can be obtained according to the drawings without inventive labor.

FIG. 1 is a schematic perspective view of an embodiment of the present application;

FIG. 2 is a schematic diagram of an overall structure of an embodiment of the present application;

FIG. 3 is a schematic top view of an adjustment wheel structure according to an embodiment of the present application;

fig. 4 is a schematic view illustrating an installation of a counterweight structure according to an embodiment of the present application.

In the figure: 1. a position limiting sleeve; 2. a loop bar; 3. a limiting block; 4. a support disc; 5. a backing plate; 6. a support base; 7. a reflector body; 8. adjusting a rod; 9. a supporting strip; 10. an extension rod; 11. an adjustment wheel; 12. a cross bar; 13. mounting blocks; 14. an illumination block; 15. and a balancing weight.

Detailed Description

In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only partial embodiments of the present application, but not all embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without making any creative effort shall fall within the protection scope of the present application.

It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It should be understood that the data so used may be interchanged under appropriate circumstances in order to facilitate the description of the embodiments of the application herein. Moreover, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

In this application, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings. These terms are used primarily to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to a particular orientation or to be constructed and operated in a particular orientation.

Moreover, some of the above terms may be used to indicate other meanings besides the orientation or positional relationship, for example, the term "on" may also be used to indicate some kind of attachment or connection relationship in some cases. The specific meaning of these terms in this application will be understood by those of ordinary skill in the art as the case may be.

Furthermore, the terms "mounted," "disposed," "provided," "connected," and "coupled" are to be construed broadly. For example, it may be a fixed connection, a removable connection, or a unitary construction; can be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements or components. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

Referring to fig. 1-4, a support frame for a reflector of a lithography machine comprises a support base 6, a first support mechanism and a second support mechanism, wherein a counterweight 15 is embedded at the bottom of the support base 6, and a clamping groove is formed in one side of the counterweight 15, so that the counterweight 15 can be conveniently installed and used at the bottom of the support base 6; the first supporting mechanism comprises a limiting sleeve 1, a limiting block 3 and an adjusting wheel 11, the limiting sleeve 1 is sleeved at the top of an adjusting rod 8, the adjusting rod 8 is connected with a loop bar 2 through threads, the loop bar 2 is fixedly connected to the top of a base plate 5, the limiting block 3 is arranged on the outer side of the base plate 5, the adjusting wheel 11 is arranged on one side of the limiting block 3, and the bottom and the top of the reflector body 7 can be limited conveniently; the second supporting mechanism is installed on the supporting base 6, the clamping groove is circular, the supporting disc 4 is clamped in the clamping groove, the reflecting shade body 7 is arranged above the supporting disc 4, the reflecting shade body 7 is clamped at the top of the limiting block 3, and the supporting disc 4 is convenient for supporting the bottom of the reflecting shade body 7.

The bottom of the backing plate 5 is fixedly connected with a supporting disc 4, the supporting disc 4 is clamped in the clamping groove and is in rotating connection with the clamping groove, the top of the supporting disc 4 is fixedly connected with a limiting block 3, and the limiting block 3 is arc-shaped and is convenient for connection of the limiting block 3 and the supporting disc 4; the supporting disk 4 is in meshed connection with the adjusting wheel 11, the bottom of the adjusting wheel 11 is sleeved on the supporting base 6 and is in rotary connection with the supporting base 6, and the diameter of the adjusting wheel 11 is smaller than that of the supporting disk 4, so that the adjusting wheel 11 can drive the supporting disk 4 to rotate and adjust conveniently; the supporting base 6 is embedded with the illuminating blocks 14, the illuminating blocks 14 are positioned on one side, away from the adjusting wheel 11, of the supporting plate 4, and the number of the illuminating blocks 14 is two, so that the illuminating blocks 14 can be conveniently installed and used on the supporting base 6; the second supporting mechanism comprises a supporting bar 9, an extension rod 10 and mounting blocks 13, the mounting blocks 13 are fixedly connected to two sides of the bottom of the supporting bar 9, and the mounting blocks 13 are mounted on the supporting base 6 through bolts, so that the mounting blocks 13 are convenient for assisting in mounting the supporting bar 9 on the supporting base 6; one side that support bar 9 is close to regulating wheel 11 is pegged graft and is had horizontal pole 12, pass through threaded connection between horizontal pole 12 and the extension rod 10, horizontal pole 12 bottom is provided with the blend stop, the blend stop rigid coupling is on the 9 lateral walls of support bar, and the blend stop of being convenient for supports reflector body 7 bottom lateral walls.

This application is when using, the equal external intercommunication power and the control switch of electrical components that appear in this application when using, at first with 7 bottom blocks of reflector body that use on the photoetching machine on the stopper 3, adjust 8 top installation stop collar 1 of pole, it is spacing to 7 tops of reflector body, utilize regulating wheel 11 to drive supporting disk 4 and reflector body 7 rotation regulation, be convenient for observe reflector body 7 surface, illumination piece 14 can be to reflector body 7 surface illumination, when reflector body 7 transversely places, rotate extension rod 10 in horizontal pole 12 one end, adjust the overall length behind horizontal pole 12 and the combination of extension rod 10, cup joint reflector body 7 on horizontal pole 12, reflector body 7 one side lateral wall and blend stop overlap joint, realize placing of reflector body 7 in support bar 9 one side, balancing weight 15 can reduce the focus of support base 6, keep the stability of whole support frame bottom.

The application has the advantages that:

1. the operation of the application is simple, the limiting sleeve 1 and the limiting block 3 can respectively limit the upper side and the lower side of the reflecting shade body 7, the reflecting shade body 7 can be placed on the top of the supporting base 6 stably, the reflecting shade body 7 can be adjusted in a rotating mode, the processing and the maintenance of the surface of the reflecting shade body 7 are assisted, and the practicability is high;

2. this application is rational in infrastructure, and support bar 9 and horizontal pole 12 all can be dismantled, and the regulation of direction and position can be placed to supplementary reflector body 7 to the installation and change of being convenient for, and the support effect to reflector body 7 is guaranteed to the functional of

illumination piece

14 and 15 multiplicable support bases 6 of balancing weight.

It is well within the skill of those in the art to implement, without undue experimentation, the present application is not directed to software and process improvements, as they relate to circuits and electronic components and modules.

The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. The utility model provides a lithography machine reflector support frame which characterized in that: the support device comprises a support base (6), a first support mechanism and a second support mechanism, wherein a balancing weight (15) is embedded at the bottom of the support base (6), and a clamping groove is formed in one side of the balancing weight (15); the first supporting mechanism comprises a limiting sleeve (1), a limiting block (3) and an adjusting wheel (11), the limiting sleeve (1) is sleeved on the top of an adjusting rod (8), the adjusting rod (8) is connected with a loop bar (2) through threads, the loop bar (2) is fixedly connected to the top of a base plate (5), the limiting block (3) is arranged on the outer side of the base plate (5), and the adjusting wheel (11) is arranged on one side of the limiting block (3); the second supporting mechanism is installed on the supporting base (6), the clamping groove is circular, the supporting disc (4) is clamped in the clamping groove, the reflecting shade body (7) is arranged above the supporting disc (4), and the reflecting shade body (7) is clamped at the top of the limiting block (3).

2. The support frame for the reflector of the lithography machine as claimed in claim 1, wherein: backing plate (5) bottom rigid coupling has supporting disk (4), supporting disk (4) block rotate in the draw-in groove and between the draw-in groove and be connected, supporting disk (4) top rigid coupling has stopper (3), stopper (3) are the arc.

3. The support frame for the reflective shade of the lithography machine according to claim 1, characterized in that: the supporting disk (4) is meshed with the adjusting wheel (11), the bottom of the adjusting wheel (11) is sleeved on the supporting base (6) and is rotatably connected with the supporting base (6), and the diameter of the adjusting wheel (11) is smaller than that of the supporting disk (4).

4. The support frame for the reflector of the lithography machine as claimed in claim 1, wherein: the support base (6) is embedded with lighting blocks (14), the lighting blocks (14) are positioned on one side, away from the adjusting wheel (11), of the support plate (4), and the number of the lighting blocks (14) is two.

5. The support frame for the reflective shade of the lithography machine according to claim 1, characterized in that: the second supporting mechanism comprises a supporting bar (9), an extending rod (10) and an installation block (13), wherein the installation block (13) is fixedly connected to the two sides of the bottom of the supporting bar (9), and the installation block (13) is installed on the supporting base (6) through bolts.

6. The support frame for the reflector of the lithography machine as claimed in claim 5, wherein: one side that support bar (9) is close to regulating wheel (11) is pegged graft and is had horizontal pole (12), pass through threaded connection between horizontal pole (12) and extension rod (10), horizontal pole (12) bottom is provided with the blend stop, the blend stop rigid coupling is on support bar (9) lateral wall.