CN218825147U

CN218825147U - Alignment device of double-sided overlay lithography machine

Info

Publication number: CN218825147U
Application number: CN202222769576.7U
Authority: CN
Inventors: 傅舰艇; 林世超; 邓嘉乐
Original assignee: Suzhou Zhongte Microelectronics Technology Co ltd
Current assignee: Suzhou Zhongte Microelectronics Technology Co ltd
Priority date: 2022-10-20
Filing date: 2022-10-20
Publication date: 2023-04-07
Anticipated expiration: 2032-10-20

Abstract

The utility model discloses an aligning device of a double-sided overlay lithography machine, which relates to the technical field of aligning devices of lithography machines, the utility model comprises a base and a movable clamping component, wherein a mounting groove is arranged in the base, a chute is arranged at the center of the top of the mounting groove, and the movable clamping component is arranged in the chute; remove centre gripping subassembly and include electric telescopic handle, installation pole, pivot, installation piece, lead screw, holding piece and calibration lamp, the fixed relative both sides that set up in the mounting groove of electric telescopic handle, electric telescopic handle's output respectively with the tip fixed connection of installation pole, the fixed pivot that is provided with in top central point of installation pole position. The utility model relates to an alignment device of two-sided overlay lithography machine, through setting up electric telescopic handle, installation pole, pivot, installation piece, lead screw, holding piece and calibration lamp, it is quick to aim at convenient operation, and objective removes conveniently, has improved the alignment efficiency of device.

Description

Alignment device of double-sided overlay lithography machine

Technical Field

The utility model relates to a lithography machine aligning device technical field, in particular to aligning device of two-sided overlay lithography machine.

Background

Mask Aligner (Mask Aligner), also known as Mask Aligner, exposure system, lithography system, etc., are key devices in the fabrication of mems, photonics, and bipolar lsi.

The method is divided into two types, one type is a contact photoetching machine with a template and a pattern in the same size, and the template is tightly attached to a wafer during exposure; the other is a stepper or scanner that uses short wavelength laser and similar projector principles to obtain a smaller exposure pattern than the template.

The existing device usually fixes the objective lens during alignment and realizes double-sided lithography by adjusting the position of the wafer, but the adjustment space of the wafer is limited during the use process, and the existing objective lens is difficult to adjust and move, so that the alignment process is complicated and the alignment efficiency is low.

In the current market, the existing device has the problem that the alignment adjustment of the objective lens and the wafer is complex, and therefore, the alignment device of the double-sided overlay lithography machine is provided.

SUMMERY OF THE UTILITY MODEL

A primary object of the present invention is to provide an alignment apparatus for a double-sided overlay lithography machine, which can effectively solve the problem of the prior art that the alignment adjustment of the objective lens and the wafer is complicated.

In order to achieve the above purpose, the utility model adopts the following technical scheme: an alignment device of a double-sided overlay lithography machine comprises a base and a movable clamping assembly, wherein a mounting groove is formed in the base, a sliding groove is formed in the center of the top of the mounting groove, and the movable clamping assembly is arranged in the sliding groove;

remove centre gripping subassembly includes electric telescopic handle, installation pole, pivot, installation piece, lead screw, holding piece and calibration lamp, the fixed relative both sides that set up in the mounting groove of electric telescopic handle, electric telescopic handle's output respectively with the tip fixed connection of installation pole, the fixed pivot that is provided with in top central point position of installation pole, the pivot is located the spout, the fixed installation piece that is provided with in pivot top, the lead screw activity sets up in the installation piece, the both ends at the lead screw are established to the holding piece cover, the centre gripping groove has been seted up to one side of holding piece, every the relative both sides of holding piece are the fixed calibration lamp that is provided with respectively. Through setting up electric telescopic handle, the installation pole, the apparatus further comprises a rotating shaft, the installation piece, the lead screw, holding piece and calibration lamp, place unlimited conjugate microscope objective between two holding pieces, control servo motor rotates, servo motor rotates and drives the lead screw and rotate, thereby the lead screw rotates and drives the holding piece and remove unlimited conjugate microscope objective centre gripping, place the mask plate in the standing groove again, utilize the calibration lamp to make its alignment, then take out the mask plate, place the standing groove with the wafer in, simultaneous control electric telescopic handle is flexible to adjust unlimited conjugate microscope objective to best operating position, it is convenient quick to aim at convenient operation, objective removes conveniently, the alignment efficiency of device has been improved.

The infinite conjugate microscope objective has the following principles and advantages: the numerical aperture is the most main factor for determining the resolution of the system, the working distance of the objective lens can be shorter under the same numerical aperture, the total length of the objective lens is far smaller than that of a common lens under the same numerical aperture, meanwhile, in order to meet the requirement that a wafer to be etched needs to be inserted after alignment in actual use, the working distance of the lens needs to be readjusted to the optimal working distance, and the infinite conjugate microscope objective lens cannot influence the image quality when moving back and forth along the optical axis.

Preferably, the opposite sides of the sliding groove are respectively provided with a sliding rail, and the sliding rails are in sliding fit with the placing part, so that the adjusting device is convenient.

Preferably, the placing part comprises a sliding block, a supporting rod and a placing table, the sliding block is in sliding fit with the sliding rail, the supporting rod is fixedly arranged at the top of the sliding block, the placing table is fixedly arranged at the top of the supporting rod, the calibrating hole is formed in the placing table, and a placing groove is formed in the bottom of one side of the placing table, so that wafers can be placed conveniently.

Preferably, the placing parts are arranged in two groups, and the two groups of placing parts are respectively positioned at two ends of the sliding groove, so that the double-sided photoetching effect of the device is ensured.

Preferably, the calibration holes are provided with two, the two calibration holes are arranged at equal intervals, and the calibration holes are matched with the calibration lamp, so that the wafer and the objective lens can be aligned conveniently.

Preferably, a servo motor is fixedly arranged on one side of the mounting block, the type of the servo motor is FL42STH33-0956MA, and the output end of the servo motor penetrates through one side of the mounting block and is fixedly connected with the screw rod, so that the clamping piece can be adjusted conveniently.

Preferably, the cross-sections of the clamping pieces and the cross-sections of the clamping grooves are both arc-shaped, so that the clamping effect is guaranteed.

Compared with the prior art, the utility model discloses following beneficial effect has:

the utility model discloses in, through setting up electric telescopic handle, the installation pole, the apparatus further comprises a rotating shaft, the installation piece, the lead screw, holding piece and calibration lamp, place unlimited conjugate microscope objective between two holding pieces, control servo motor rotates, servo motor rotates and drives the lead screw and rotates, thereby the lead screw rotates and drives the holding piece and remove unlimited conjugate microscope objective centre gripping, place the mask plate in the standing groove again, utilize the calibration lamp to make it aim at, then take out the mask plate, place the wafer in the standing groove, simultaneous control electric telescopic handle is flexible to adjust unlimited conjugate microscope objective to best operating position, it is quick to aim at convenient operation, objective removes conveniently, the alignment efficiency of device has been improved.

Drawings

FIG. 1 is a schematic structural view of an alignment device of a double-sided overlay lithography machine according to the present invention;

FIG. 2 is a front plan view of an alignment device of a double-sided overlay lithography machine according to the present invention;

FIG. 3 is a side plan view of an alignment apparatus of a double-sided overlay lithography machine according to the present invention;

FIG. 4 is a top plan view of an alignment apparatus of a double-sided overlay lithography machine according to the present invention;

fig. 5 is an enlarged view of a portion a in fig. 1.

In the figure: 1. a base; 2. mounting grooves; 3. a slider; 4. a placing table; 5. a slide rail; 6. calibrating the hole; 7. an electric telescopic rod; 8. mounting a rod; 9. a rotating shaft; 10. mounting blocks; 11. a chute; 12. a support bar; 13. a placement groove; 14. a clamping piece; 15. calibrating the lamp; 16. a servo motor; 17. a screw rod; 18. a clamping groove.

Detailed Description

In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.

In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front end", "rear end", "both ends", "one end", "the other end" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element to which the reference is made must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "disposed," "connected," and the like are to be construed broadly, and for example, "connected" may be either fixedly connected or detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Referring to fig. 1-5, the present invention relates to an alignment device for a double-sided overlay lithography machine, which comprises a base 1 and a movable clamping assembly, wherein the base 1 is provided with a mounting groove 2, the top center of the mounting groove 2 is provided with a sliding groove 11, and the movable clamping assembly is arranged in the sliding groove 11;

remove the centre gripping subassembly and include electric telescopic handle 7, installation pole 8, pivot 9, installation piece 10, lead screw 17, supporting piece 14 and alignment lamp 15, the fixed relative both sides that set up in mounting groove 2 of electric telescopic handle 7, electric telescopic handle 7's output respectively with the tip fixed connection of installation pole 8, the fixed pivot 9 that is provided with in top central point position of installation pole 8, pivot 9 is located spout 11, the fixed installation piece 10 that is provided with in pivot 9 top, the activity of lead screw 17 sets up in installation piece 10, the 14 covers of supporting piece establish the both ends at lead screw 17, clamping groove 18 has been seted up to one side of supporting piece 14, the relative both sides of every supporting piece 14 are fixed respectively and are provided with alignment lamp 15.

Wherein, slide rail 5 has been seted up respectively to the relative both sides of spout 11, and slide rail 5 and the sliding fit of placing portion are convenient for adjusting device.

The placing part comprises a slider 3, a supporting rod 12 and a placing table 4, the slider 3 is in sliding fit with the sliding rail 5, the supporting rod 12 is fixedly arranged at the top of the slider 3, the placing table 4 is fixedly arranged at the top of the supporting rod 12, the calibrating hole 6 is formed in the placing table 4, a placing groove 13 is formed in the bottom of one side of the placing table 4, and wafers are convenient to place.

Wherein, the placing parts are provided with two groups, and the two groups of placing parts are respectively positioned at two ends of the sliding chute 11, so that the double-sided photoetching effect of the device is ensured.

Wherein, the alignment hole 6 has been seted up two, and two alignment holes 6 are equidistant to be arranged, and alignment hole 6 and calibration lamp 15 looks adaptation, the wafer of being convenient for aligns with the objective.

Wherein, one side of the mounting block 10 is fixedly provided with a servo motor 16, and the output end of the servo motor 16 penetrates through one side of the mounting block 10 to be fixedly connected with a screw rod 17, so that the clamping piece 14 can be conveniently adjusted.

The cross section of the clamping piece 14 and the cross section of the clamping groove 18 are both arc-shaped, so that the clamping effect is ensured.

The utility model discloses a theory of operation does: placing an infinite conjugate microscope objective between two clamping pieces 14, controlling a servo motor 16 to rotate, driving a screw rod 17 to rotate by the rotation of the servo motor 16, driving the clamping pieces 14 to move by the rotation of the screw rod 17 so as to clamp the infinite conjugate microscope objective, then placing a mask plate into a placing groove 13, aligning the mask plate by using a calibration lamp 15, then taking out the mask plate, placing a wafer into the placing groove 13, and simultaneously controlling an electric telescopic rod 7 to stretch and adjust the infinite conjugate microscope objective to an optimal working position.

The basic principles and the main features of the invention and the advantages of the invention have been shown and described above. It will be understood by those skilled in the art that the present invention is not limited to the above embodiments, and that the foregoing embodiments and descriptions are provided only to illustrate the principles of the present invention without departing from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims

1. The utility model provides an aligning device of two-sided overlay lithography machine which characterized in that: the clamping device comprises a base (1) and a movable clamping assembly, wherein an installation groove (2) is formed in the base (1), a sliding groove (11) is formed in the center of the top of the installation groove (2), and the movable clamping assembly is arranged in the sliding groove (11);

remove centre gripping subassembly includes electric telescopic handle (7), installation pole (8), pivot (9), installation piece (10), lead screw (17), centre gripping piece (14) and calibration lamp (15), electric telescopic handle (7) is fixed to be set up the relative both sides in mounting groove (2), the output of electric telescopic handle (7) respectively with the tip fixed connection of installation pole (8), the top central point of installation pole (8) puts fixed pivot (9) that is provided with, pivot (9) are located spout (11), the fixed installation piece (10) that is provided with in pivot (9) top, lead screw (17) activity sets up in installation piece (10), centre gripping piece (14) cover is established at the both ends of lead screw (17), centre gripping groove (18), every have been seted up to one side of centre gripping piece (14) the relative both sides of centre gripping piece (14) are fixed calibration lamp (15) that are provided with respectively.

2. The alignment device of a double-sided overlay lithography machine according to claim 1, wherein: the two opposite sides of the sliding groove (11) are respectively provided with a sliding rail (5), and the sliding rails (5) are in sliding fit with the placing part.

3. The alignment device of a double-sided overlay lithography machine according to claim 2, wherein: the placing part comprises a sliding block (3), a supporting rod (12) and a placing table (4), the sliding block (3) is in sliding fit with a sliding rail (5), the supporting rod (12) is fixedly arranged at the top of the sliding block (3), the placing table (4) is fixedly arranged at the top of the supporting rod (12), a calibration hole (6) is formed in the placing table (4), and a placing groove (13) is formed in the bottom of one side of the placing table (4).

4. The alignment device of a double-sided overlay lithography machine according to claim 3, wherein: the placing parts are provided with two groups, and the two groups of placing parts are respectively positioned at two ends of the sliding groove (11).

5. The alignment device of a double-sided overlay lithography machine according to claim 3, wherein: two calibration holes (6) are formed, the two calibration holes (6) are arranged at equal intervals, and the calibration holes (6) are matched with the calibration lamp (15).

6. The alignment device of a double-sided overlay lithography machine according to claim 1, wherein: one side of the mounting block (10) is fixedly provided with a servo motor (16), and the output end of the servo motor (16) penetrates through one side of the mounting block (10) and is fixedly connected with the screw rod (17).

7. The alignment device of a double-sided overlay lithography machine according to claim 1, wherein: the cross section of the clamping piece (14) and the cross section of the clamping groove (18) are both arranged in an arc shape.