CN221039787U - Semi-automatic single-sided exposure photoetching machine - Google Patents
Semi-automatic single-sided exposure photoetching machine Download PDFInfo
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- CN221039787U CN221039787U CN202322861465.3U CN202322861465U CN221039787U CN 221039787 U CN221039787 U CN 221039787U CN 202322861465 U CN202322861465 U CN 202322861465U CN 221039787 U CN221039787 U CN 221039787U
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- lens
- mask
- sided exposure
- light source
- alignment
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- 238000001259 photo etching Methods 0.000 title abstract description 8
- 238000001459 lithography Methods 0.000 claims description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model belongs to the technical field of photoetching machines, and discloses a semiautomatic single-sided exposure photoetching machine, which comprises a frame, wherein a workbench is arranged on the frame, a lower left lens, an upper left lens, a parallel light source, an upper right lens, a mask mechanism, a lower right lens and an alignment mechanism are arranged on the workbench, the upper left lens and the upper right lens are respectively positioned at the left side and the right side above the mask mechanism, the lower left lens and the lower right lens are respectively positioned at the left side and the right side below the mask mechanism, the parallel light source is positioned right above the mask mechanism, and the alignment mechanism is positioned below the mask mechanism; the alignment mechanism is connected with a leveling mechanism and a feeding mechanism, the frame is provided with a lifting mechanism, and the lifting mechanism is connected with the leveling mechanism. According to the semi-automatic single-sided exposure photoetching machine, a silicon wafer is manually placed on the carrying platform of the feeding mechanism, the carrying platform is pushed to the center, then the alignment and single-sided exposure are automatically operated, the exposed silicon wafer is manually taken out, and the semi-automatic photoetching operation can be realized by repeating the circulation.
Description
Technical Field
The utility model belongs to the technical field of lithography machines, and particularly relates to a semi-automatic single-sided exposure lithography machine.
Background
The lithography machine is also called a mask alignment exposure machine, an exposure system, a lithography system and the like, is core equipment for manufacturing chips, but most single-sided exposure lithography machines currently adopt one or two cameras for alignment, so that the alignment speed and the accuracy cannot meet the requirements, the product production efficiency is influenced, and the improvement is needed.
Disclosure of utility model
The present utility model aims to solve the above technical problems at least to some extent. Therefore, the utility model aims to provide a semi-automatic single-sided exposure lithography machine.
The technical scheme adopted by the utility model is as follows:
The semi-automatic single-sided exposure lithography machine comprises a frame, wherein a workbench is arranged on the frame, a lower left lens, an upper left lens, a parallel light source, an upper right lens, a mask mechanism, a lower right lens and an alignment mechanism are arranged on the workbench, the upper left lens and the upper right lens are respectively positioned on the left side and the right side above the mask mechanism, the lower left lens and the lower right lens are respectively positioned on the left side and the right side below the mask mechanism, the parallel light source is positioned right above the mask mechanism, and the alignment mechanism is positioned below the mask mechanism; the alignment mechanism is connected with a leveling mechanism and a feeding mechanism, the frame is provided with a lifting mechanism, and the lifting mechanism is connected with the leveling mechanism.
Preferably, the upper left lens, the upper right lens, the lower left lens and the lower right lens are all mounted on an XYZ three-axis motion mechanism. The workbench is provided with a light source mounting frame, and the parallel light source is mounted on the light source mounting frame.
The beneficial effects of the utility model are as follows:
According to the semi-automatic single-sided exposure photoetching machine provided by the utility model, the silicon wafer is manually placed on the carrying platform of the feeding mechanism, the carrying platform is pushed to the center, then the alignment and single-sided exposure are automatically operated, the exposed silicon wafer is manually taken out, and the semi-automatic photoetching operation can be realized by repeating the above cycle.
Drawings
FIG. 1 is a front view of a semi-automatic single-sided exposure lithography machine of the present utility model.
FIG. 2 is a perspective view of a semi-automatic single-sided exposure lithography machine of the present utility model.
In the figure: 1-a frame; 2-a workbench; 3-lower left lens; 4-leveling mechanism; 5-upper left lens; 6-a light source mounting rack; 7-parallel light sources; 8-upper right lens; 9-a feeding mechanism; 10-masking mechanism; 11-lower right lens; 12-aligning mechanism; 13-a lifting mechanism; 14-XYZ three-axis motion mechanism.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative and intended to explain the present utility model and should not be construed as limiting the utility model. The components of the embodiments of the present utility model generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
In the present utility model, unless explicitly specified and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements.
The utility model will be further described with reference to the drawings and specific examples.
As shown in fig. 1 and 2, the semiautomatic single-sided exposure lithography machine of the present embodiment includes a frame 1, where the frame 1 is a base for mounting each component, a horizontal workbench 2 is provided on the frame 1, a lower left lens 3, an upper left lens 5, a parallel light source 7, an upper right lens 8, a mask mechanism 10, an upper right lens 11, and an alignment mechanism 12 are provided on the workbench 2, the upper left lens 5 and the upper right lens 8 are respectively located at the left and right sides above the mask mechanism 10, the lower left lens 3 and the lower right lens 11 are respectively located at the left and right sides below the mask mechanism 10, the upper left lens 5, the upper right lens 8, the lower left lens 3, and the lower right lens 11 are respectively mounted on an XYZ triaxial motion mechanism 14, which drives each lens in place when alignment is required, and after the alignment is completed, the XYZ triaxial motion mechanism runs reversely, moves each lens away from the mask mechanism 10 to avoid affecting exposure, and image recognition and alignment is performed simultaneously by the upper left lens 5, the upper right lens 8, the lower left lens 3, and the lower right lens 11, and the alignment accuracy is high.
The alignment mechanism 12 is positioned below the mask mechanism 10; the alignment mechanism 12 is connected with the leveling mechanism 4 and the feeding mechanism 9, the leveling mechanism 4 is in the prior art, leveling can be automatically realized, the feeding mechanism 9 comprises a slide holder, and the slide holder can be slidably pulled out and pushed in under the mask mechanism 10, so that a silicon wafer can be conveniently placed on the slide holder manually. The frame 1 is provided with a lifting mechanism 13, the lifting mechanism 13 is connected with the leveling mechanism 4, the lifting mechanism 13 is used for driving the leveling mechanism 4 to lift and descend, and the leveling mechanism 4 is close to the mask mechanism 10 during lifting.
The workbench 2 is provided with a light source mounting frame 6, a parallel light source 7 is mounted on the light source mounting frame 6, the parallel light source 7 is positioned right above the mask mechanism 10, and the periphery of the parallel light source 7 is also provided with a protective cover.
The operation flow of the semiautomatic single-sided exposure lithography machine in this embodiment is as follows: lifting mechanism 13 rises in place, leveling mechanism 4 automatically levels the mask plate, lifting mechanism 13 descends in place, the leveled slide holder is pulled out manually, the silicon wafer is placed on the slide holder, and then the slide holder is pushed in place; the lifting mechanism 13 is lifted in place again, the upper left lens 5, the upper right lens 8, the lower left lens 3 and the lower right lens 11 are driven by the XYZ three-axis motion mechanism to move in place, the lenses automatically align the marks of the mask plate, and after the alignment is successful, the upper left lens 5, the upper right lens 8, the lower left lens 3 and the lower right lens 11 are driven by the XYZ three-axis motion mechanism to retract to the original point; after the silicon wafer is exposed, the lifting mechanism 13 descends again to the proper position, and the slide holder is pulled out manually to take the silicon wafer.
The utility model is not limited to the above-described alternative embodiments, and any person who may derive other various forms of products in the light of the present utility model, however, any changes in shape or structure thereof, all falling within the technical solutions defined in the scope of the claims of the present utility model, fall within the scope of protection of the present utility model.
Claims (4)
1. A semi-automatic single-sided exposure lithography machine is characterized in that: the device comprises a frame (1), wherein a workbench (2) is arranged on the frame (1), a lower left lens (3), an upper left lens (5), a parallel light source (7), an upper right lens (8), a mask mechanism (10), a lower right lens (11) and an alignment mechanism (12) are arranged on the workbench (2), the upper left lens (5) and the upper right lens (8) are respectively positioned at the left side and the right side above the mask mechanism (10), the lower left lens (3) and the lower right lens (11) are respectively positioned at the left side and the right side below the mask mechanism (10), the parallel light source (7) is positioned right above the mask mechanism (10), and the alignment mechanism (12) is positioned below the mask mechanism (10); the alignment mechanism (12) is connected with the leveling mechanism (4) and the feeding mechanism (9), the frame (1) is provided with the lifting mechanism (13), and the lifting mechanism (13) is connected with the leveling mechanism (4).
2. The semiautomatic single-sided exposure lithography machine of claim 1, wherein: the upper left lens (5), the upper right lens (8), the lower left lens (3) and the lower right lens (11) are all installed on the XYZ three-axis movement mechanism (14).
3. The semiautomatic single-sided exposure lithography machine of claim 1, wherein: the workbench (2) is provided with a light source mounting frame (6), and a parallel light source (7) is mounted on the light source mounting frame (6).
4. The semiautomatic single-sided exposure lithography machine of claim 1, wherein: the feeding mechanism (9) comprises a slide holder which can be pulled out and pushed in a sliding manner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322861465.3U CN221039787U (en) | 2023-10-23 | 2023-10-23 | Semi-automatic single-sided exposure photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322861465.3U CN221039787U (en) | 2023-10-23 | 2023-10-23 | Semi-automatic single-sided exposure photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN221039787U true CN221039787U (en) | 2024-05-28 |
Family
ID=91173050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322861465.3U Active CN221039787U (en) | 2023-10-23 | 2023-10-23 | Semi-automatic single-sided exposure photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN221039787U (en) |
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2023
- 2023-10-23 CN CN202322861465.3U patent/CN221039787U/en active Active
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