CN219793101U - Physical vapor deposition equipment - Google Patents
Physical vapor deposition equipment Download PDFInfo
- Publication number
- CN219793101U CN219793101U CN202321179309.2U CN202321179309U CN219793101U CN 219793101 U CN219793101 U CN 219793101U CN 202321179309 U CN202321179309 U CN 202321179309U CN 219793101 U CN219793101 U CN 219793101U
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- CN
- China
- Prior art keywords
- chamber
- cleaning
- vapor deposition
- physical vapor
- water
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Links
- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 47
- 238000004140 cleaning Methods 0.000 claims abstract description 39
- 238000009504 vacuum film coating Methods 0.000 claims abstract description 15
- 238000007789 sealing Methods 0.000 claims abstract description 9
- 238000007664 blowing Methods 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 7
- 238000011084 recovery Methods 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 5
- 239000002699 waste material Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 210000002489 tectorial membrane Anatomy 0.000 description 5
- 238000000151 deposition Methods 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses physical vapor deposition equipment, which comprises a shell, wherein a vacuum film coating chamber, a cleaning chamber and a water storage chamber are sequentially arranged in the shell from bottom to top; an adjusting component for rotating and lifting the workpiece is arranged on the inner side of the vacuum film coating chamber; a through hole is formed between the vacuum film covering chamber and the cleaning chamber, a storage groove is formed in the inner side of the through hole, a sealing plate is connected in the storage groove in a sliding manner, and a second electric push rod for controlling the sealing plate to move is fixedly arranged outside the shell; the cleaning chamber is internally provided with a cleaning assembly for cleaning the workpiece. The utility model integrates the cleaning and film covering of the workpiece, does not need to waste time in transferring, and also avoids the non-uniform vapor deposition caused by pollution of the workpiece.
Description
Technical Field
The utility model relates to the technical field of vapor deposition equipment, in particular to physical vapor deposition equipment.
Background
Physical vapor deposition means a technique of gasifying a material source, a solid or liquid surface into gaseous atoms, molecules or partially ionizing into ions by a physical method under a vacuum condition, and depositing a thin film with a certain special function on a substrate surface by a low-pressure gas (or plasma) process, and the main methods of physical vapor deposition include vacuum evaporation, sputtering coating, arc plasma coating, ion coating, molecular beam epitaxy and the like, and the physical vapor deposition technique can be developed to the present day, and can be used for depositing not only metal films, alloy films, but also compounds, ceramics, semiconductors, polymer films and the like.
In the prior art, general physical vapor deposition equipment can only singly carry out object surface coating film, and the function is single, at present, the object need wash object surface before the coating film, gets rid of object surface impurity and dirt to the coating film can be pressed close to better, still need transfer to vacuum coating machine after clean the object and carry out the tectorial membrane, and the in-process of transfer is easily polluted, leads to vapor deposition inhomogeneous, has reduced the effect of tectorial membrane.
Disclosure of Invention
The utility model aims to solve the defects in the prior art, and provides physical vapor deposition equipment which integrates the cleaning and film covering of a workpiece, does not need to waste time in transferring, and also avoids the non-uniform vapor deposition caused by the pollution of the workpiece.
In order to achieve the above purpose, the present utility model adopts the following technical scheme:
the physical vapor deposition equipment comprises a shell, wherein a vacuum film coating chamber, a cleaning chamber and a water storage chamber are sequentially arranged in the shell from bottom to top;
an adjusting component for rotating and lifting the workpiece is arranged on the inner side of the vacuum film coating chamber;
a through hole is formed between the vacuum film covering chamber and the cleaning chamber, a storage groove is formed in the inner side of the through hole, a sealing plate is connected in the storage groove in a sliding manner, and a second electric push rod for controlling the sealing plate to move is fixedly arranged outside the shell;
a cleaning assembly for cleaning the workpiece is arranged in the cleaning chamber;
the upper end of the shell is provided with a water inlet for adding water into the water storage chamber.
Preferably, a recovery chamber for collecting clean water is formed at the left end of the vacuum film-covered chamber through a partition plate, and a water outlet is arranged between the vacuum film-covered chamber and the cleaning chamber.
Preferably, the adjusting component comprises a first electric push rod fixedly installed on the bottom of the vacuum film coating chamber, a fixed plate is fixedly installed at the telescopic end of the first electric push rod, the upper end of the fixed plate is rotationally connected with a rotary table, and a driving motor for driving the rotary table is fixedly installed at the lower end of the fixed plate.
Preferably, the cleaning assembly comprises a water pump fixedly installed on the top of the cleaning chamber, the water inlet end of the water pump extends into the water storage chamber, a water spraying disc is fixedly installed on the inner top of the cleaning chamber, and the output end of the water pump is communicated with the water spraying disc.
Preferably, a fan is fixedly arranged at the upper end of the shell, a blowing disc is fixedly arranged at the inner top of the cleaning chamber, and the fan is communicated with the blowing disc through a pipeline.
Preferably, the air outlet direction of the air blowing disc faces to the through hole.
The utility model has the following beneficial effects:
1. the position of the workpiece can be adjusted through the design of the adjusting component so as to facilitate cleaning treatment, the workpiece can be rotated, and the workpiece can be better coated;
2. through the design of vacuum tectorial membrane room, clean room, reservoir for the cleanness of work piece tectorial membrane integration need not to transport waste time, also avoids the work piece to receive the pollution, leads to vapor deposition inhomogeneous.
Drawings
FIG. 1 is a schematic cross-sectional view of a physical vapor deposition apparatus according to the present utility model;
fig. 2 is a schematic diagram of a front structure of a physical vapor deposition apparatus according to the present utility model.
In the figure: 1 shell, 2 vacuum tectorial membrane rooms, 3 clean rooms, 4 water storage room, 5 baffles, 6 first electric putter, 7 driving motor, 8 fixed plates, 9 carousel, 10 closing plate, 11 second electric putter, 12 blowing dish, 13 water spray dish, 14 water pump, 15 fans, 16 water inlets.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments.
In the description of the present utility model, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "top," "bottom," "inner," "outer," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate description of the present utility model and to simplify the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present utility model.
Referring to fig. 1-2, a physical vapor deposition device comprises a shell 1, wherein a vacuum film coating chamber 2, a cleaning chamber 3 and a water storage chamber 4 are sequentially arranged in the shell 1 from bottom to top;
the left end of the vacuum film coating chamber 2 forms a recovery chamber for collecting clean water through a baffle plate 5, and a water outlet is arranged between the vacuum film coating chamber 2 and the cleaning chamber 3;
the inner side of the vacuum film coating chamber 2 is provided with an adjusting component for rotating and lifting a workpiece, the adjusting component comprises a first electric push rod 6 fixedly arranged on the inner bottom of the vacuum film coating chamber 2, a fixed plate 8 is fixedly arranged at the telescopic end of the first electric push rod 6, the upper end of the fixed plate 8 is rotationally connected with a rotary table 9, and the lower end of the fixed plate 8 is fixedly provided with a driving motor 7 for driving the rotary table 9;
a through hole is arranged between the vacuum film coating chamber 2 and the cleaning chamber 3, a storage groove is formed in the inner side of the through hole, a sealing plate 10 is connected in the storage groove in a sliding manner, and a second electric push rod 11 for controlling the sealing plate 10 to move is fixedly arranged outside the shell 1;
the cleaning assembly for cleaning the workpiece is arranged in the cleaning chamber 3, the cleaning assembly comprises a water pump 14 fixedly arranged on the inner top of the cleaning chamber 3, the water inlet end of the water pump 14 extends into the water storage chamber 4, a water spraying disc 13 is fixedly arranged on the inner top of the cleaning chamber 3, the output end of the water pump 14 is communicated with the water spraying disc 13, a fan 15 is fixedly arranged at the upper end of the shell 1, a blowing disc 12 is fixedly arranged on the inner top of the cleaning chamber 3, the fan 15 is communicated with the blowing disc 12 through a pipeline, and the air outlet direction of the blowing disc 12 faces to the through hole;
the upper end of the shell 1 is provided with a water inlet 16 for adding water into the water storage chamber 4.
Working principle:
when the device works, a workpiece is placed on the rotary table 9, then the second electric push rod 11 pulls the sealing plate 10 to be retracted into the accommodating groove, the through hole is opened, at the moment, the first electric push rod 6 pushes the fixing plate 8 to move upwards to move the workpiece into the cleaning chamber 3, the water pump 14 is opened, water in the water storage chamber 4 is pumped out and sprayed out from the water spraying disc 13, the object can be washed, after washing, the fan 15 is opened, the fan 15 generates wind power to blow out the workpiece from the blowing disc 12 through the pipeline, the workpiece can be air-dried, so that the subsequent film coating treatment is facilitated, the first electric push rod 6 and the second electric push rod 11 are sequentially contracted, the purpose of resetting is achieved, the driving motor 7 is opened during film coating, the rotary table 9 can be driven to rotate, the workpiece can be enabled to be better coated.
The present utility model is not limited to the above-mentioned embodiments, and any person skilled in the art, based on the technical solution of the present utility model and the inventive concept thereof, can be replaced or changed within the scope of the present utility model.
Claims (6)
1. Physical vapor deposition apparatus comprising a housing (1), characterized in that:
the inside of the shell (1) is sequentially provided with a vacuum film coating chamber (2), a cleaning chamber (3) and a water storage chamber (4) from bottom to top;
an adjusting component for rotating and lifting the workpiece is arranged on the inner side of the vacuum film coating chamber (2);
a through hole is formed between the vacuum film coating chamber (2) and the cleaning chamber (3), a storage groove is formed in the inner side of the through hole, a sealing plate (10) is connected in the storage groove in a sliding mode, and a second electric push rod (11) for controlling the sealing plate (10) to move is fixedly arranged outside the shell (1);
a cleaning assembly for cleaning the workpiece is arranged in the cleaning chamber (3);
the upper end of the shell (1) is provided with a water inlet (16) for adding water into the water storage chamber (4).
2. A physical vapor deposition apparatus according to claim 1, characterized in that the left end of the vacuum coating chamber (2) forms a recovery chamber for collecting clean water by a partition (5), and a drain port is provided between the vacuum coating chamber (2) and the cleaning chamber (3).
3. The physical vapor deposition device according to claim 1, wherein the adjusting assembly comprises a first electric push rod (6) fixedly installed on the inner bottom of the vacuum film coating chamber (2), a fixed plate (8) is fixedly installed at the telescopic end of the first electric push rod (6), a turntable (9) is rotatably connected to the upper end of the fixed plate (8), and a driving motor (7) for driving the turntable (9) is fixedly installed at the lower end of the fixed plate (8).
4. A physical vapor deposition apparatus according to claim 1, wherein the cleaning assembly comprises a water pump (14) fixedly mounted on the inner top of the cleaning chamber (3), the water inlet end of the water pump (14) extends into the water storage chamber (4), a water spraying disc (13) is fixedly mounted on the inner top of the cleaning chamber (3), and the output end of the water pump (14) is communicated with the water spraying disc (13).
5. The physical vapor deposition device according to claim 4, wherein a fan (15) is fixed at the upper end of the housing (1), a blowing disc (12) is fixedly installed at the inner top of the cleaning chamber (3), and the fan (15) is communicated with the blowing disc (12) through a pipeline.
6. A physical vapor deposition apparatus according to claim 5, wherein the air outlet direction of the air-blowing tray (12) is directed toward the through hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321179309.2U CN219793101U (en) | 2023-05-16 | 2023-05-16 | Physical vapor deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321179309.2U CN219793101U (en) | 2023-05-16 | 2023-05-16 | Physical vapor deposition equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219793101U true CN219793101U (en) | 2023-10-03 |
Family
ID=88179031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321179309.2U Active CN219793101U (en) | 2023-05-16 | 2023-05-16 | Physical vapor deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219793101U (en) |
-
2023
- 2023-05-16 CN CN202321179309.2U patent/CN219793101U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |