CN218565931U - Overturning limiting mechanism of wafer box frame and wafer drying machine - Google Patents

Overturning limiting mechanism of wafer box frame and wafer drying machine Download PDF

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Publication number
CN218565931U
CN218565931U CN202222355829.6U CN202222355829U CN218565931U CN 218565931 U CN218565931 U CN 218565931U CN 202222355829 U CN202222355829 U CN 202222355829U CN 218565931 U CN218565931 U CN 218565931U
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Prior art keywords
wafer
box frame
rack
wafer cassette
limiting
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CN202222355829.6U
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Chinese (zh)
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欧阳小泉
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Quanxin Semiconductor Technology Wuxi Co ltd
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Quanxin Semiconductor Technology Wuxi Co ltd
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Abstract

The utility model discloses a upset stop gear and wafer drier of wafer box frame, this upset stop gear of wafer box frame includes swivel mount and film cassette frame, the one end opening of film cassette frame, film cassette frame can assemble on the swivel mount through two minor axiss with overturning, spacing hole has been seted up on the lateral wall of a minor axis at least in two minor axiss, the spacing round pin of at least elasticity is installed in the swivel mount in the cooperation, the elasticity of spring is overcome to the bottom of elasticity spacing round pin and is leaned on the lateral wall of minor axis and on being in the same cross section of minor axis with spacing hole. The overturning limiting mechanism of the wafer cassette rack realizes automatic positioning of the wafer cassette rack after overturning through the matching of the elastic limiting pin and the limiting hole. The structure is simple, the realization is easy, and the design is ingenious; and the cost is low, the collision between the limiting mechanism and the rotating frame is thoroughly avoided, and the safe and reliable operation of the wafer spin dryer is ensured.

Description

Overturning limiting mechanism of wafer box frame and wafer drying machine
Technical Field
The utility model belongs to wafer auxiliary processing equipment especially relates to a upset stop gear and wafer drier of wafer box frame.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because it has a circular shape. Various circuit element structures can be processed and manufactured on the silicon wafer to form electronic component products with specific electrical functions. As the size of the integrated circuit on the semiconductor wafer is developed to the micron level, the requirement for cleaning the semiconductor wafer in the manufacturing process is higher and higher, and particularly, the semiconductor wafer is polluted by dust particles and metal in the manufacturing process, which easily causes the damage of the circuit function in the wafer, the short circuit or the open circuit, and the like, thereby causing the failure of the integrated circuit and the formation of the geometric characteristics. Therefore, in the manufacturing process, in addition to the removal of external pollution sources, cleaning is also required to effectively remove impurities such as micro-dust, metal ions, and organic matters remaining on the wafer by using chemical solution or gas without damaging the surface characteristics and electrical characteristics of the wafer.
The wet cleaning process is a commonly used cleaning process for wafers, the wafer needs to be dried after the cleaning process is completed, and the wafer drying machine is used for drying the surfaces of the wet wafers through rotation and drying. The wafer spin dryer generally comprises a wafer box frame which can be arranged in the spin dryer in a turnover mode, a wafer box filled with wafers is placed in the wafer box frame for spin drying, and after spin drying is completed, an opening of the wafer box frame needs to be turned upwards and positioned so that the wafer box can be taken out conveniently.
At present, the automatic tilting mechanism that is used for the automatic upset of film box frame all installs additional mostly in current wafer drier, and automatic tilting mechanism carries on spacingly through the gag lever post to film box frame, but has following shortcoming in specific use:
1) The structure is complex and the cost is high;
2) The limiting rod has the risk of colliding with a rotating frame of the spin dryer due to misoperation, and the wafer is damaged.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a upset stop gear and wafer drier of wafer box holder to there is the problem that the structure is complicated, with high costs and exist and take place the striking with the swivel mount of drier in the automatic tilting mechanism who solves among the prior art wafer drier.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a upset stop gear of wafer box frame, its includes swivel mount and piece box frame, the one end opening of piece box frame, piece box frame through two minor axiss can assemble in with overturning on the swivel mount, wherein, spacing hole has been seted up on the lateral wall of at least a minor axis in two minor axiss, the cooperation spacing hole in install an at least elasticity spacer pin on the swivel mount, the elasticity that the spring was overcome in the bottom of elasticity spacer pin support lean on in on the lateral wall of minor axis and with spacing hole is in on the same cross section of minor axis.
Furthermore, a handle convenient for turning operation is installed on one side wall of the film box frame facing to an operator.
Furthermore, the handle is integrally in a U-shaped structure and integrally formed by bending steel bars, and two ends of the handle are welded and fixed on the side wall of the sheet box frame.
Furthermore, an assembly frame used for installing the piece box frame is fixed on the rotating frame, shaft holes are correspondingly formed in the two side plates of the assembly frame, and two short shafts on the piece box frame are installed in the corresponding shaft holes.
Furthermore, a plastic bushing is arranged between the short shaft and the shaft hole, so that direct friction between metal between the short shaft and the shaft hole is avoided, and control of granularity in the spin dryer is facilitated.
Furthermore, one of the two short shafts is provided with a limiting hole, and an elastic limiting pin is arranged on the rotating frame correspondingly.
A wafer spin dryer comprises the overturning limiting mechanism of the wafer box frame.
The beneficial effects of the utility model are that, compare with prior art the upset stop gear of wafer box rack passes through the cooperation of elasticity spacer pin with spacing hole, realizes the automatic positioning after the upset of piece box rack. The structure is simple, the realization is easy, and the design is ingenious; and the cost is low, the collision between the limiting mechanism and the rotating frame is thoroughly avoided, and the safe and reliable operation of the wafer spin dryer is ensured.
Drawings
Fig. 1 is a schematic structural view of a turn-over limiting mechanism of a wafer cassette rack according to an embodiment of the present invention.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the accompanying drawings. The preferred embodiments of the present invention are shown in the drawings. The invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete. It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not represent the only embodiments. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a turn-over limiting mechanism of a wafer cassette rack according to an embodiment of the present invention.
In this embodiment, a upset stop gear of wafer box frame includes swivel mount 1 and wafer box frame 2, the one end opening of wafer box frame 2, when spin-drying, the open end of wafer box frame 2 is inboard towards, be fixed with assembly jig 3 that is used for installing wafer box frame 2 on the swivel mount 1, all correspond on two blocks of curb plates of assembly jig 3 and seted up the shaft hole, be fixed with two minor axes 4 on the wafer box frame 2, two minor axes 4 of wafer box frame 2 are installed in the shaft hole that corresponds the side, so that wafer box frame 2 can be done the upset action in assembly jig 3. Because the short shaft 4 and the assembly frame 3 are metal parts and can cause great influence on the granularity control in the spin dryer after being rubbed relatively, a plastic bushing 5 is arranged between the short shaft 4 and the corresponding shaft hole.
Spacing hole 6 has been seted up on one of them minor axis 4's of same piece of box holder 2 lateral wall, an elasticity spacer pin 7 is installed in the corresponding position of swivel mount 1 in cooperation spacing hole 6, the elasticity that the spring was overcome in the bottom of elasticity spacer pin 7 supports to lean on the lateral wall of minor axis 4 and be in on the same cross section of minor axis 4 with spacing hole 6 to guarantee that minor axis 4 rotates in-process elasticity spacer pin 7 in the spacing hole 6 that corresponds of automatic insertion under the effect of spring force.
In order to facilitate the operation of overturning the sheet box frame 2 by an operator, a handle 8 is fixed on one side wall of the sheet box frame 2 close to the operator, the handle 8 is integrally in a U-shaped structure and is integrally formed by bending and molding reinforcing steel bars, and two ends of the handle 8 are welded and fixed on the side wall of the sheet box frame 2.
When the spin dryer works, the opening end of the wafer box frame faces the inner side, after spin-drying operation is completed, the spin dryer stops, an operator holds the handle 8 to overturn the wafer box frame 2 to the outer side, when the spin dryer overturns to the opening end of the wafer box frame 2 right upwards, the elastic limiting pin 7 is just automatically inserted into the limiting hole 6 to limit the position of the wafer box frame 2, and the operator can take out a wafer box in the wafer box frame 2 conveniently.
The above embodiments have been merely illustrative of the basic principles and features of the present invention, and the present invention is not limited by the above embodiments, and does not depart from the spirit and scope of the present invention. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims (7)

1. The utility model provides a upset stop gear of wafer box frame, its includes swivel mount and piece box frame, the one end opening of piece box frame, piece box frame through two minor axiss can assemble with overturning on the swivel mount, its characterized in that, spacing hole has been seted up on the lateral wall of at least a minor axis in two minor axiss, the cooperation spacing hole in install an at least elasticity spacer pin on the swivel mount, the elasticity of spring is overcome to the bottom of elasticity spacer pin support lean on in on the lateral wall of minor axis and with spacing hole is in on the same cross section of minor axis.
2. The wafer cassette rack turning limit mechanism as claimed in claim 1, wherein a handle for turning operation is installed on a side wall of the cassette rack facing an operator.
3. The wafer cassette holder turning and limiting mechanism as claimed in claim 2, wherein the handle is integrally formed in a "U" shape by bending a steel bar, and both ends of the handle are welded to the side walls of the cassette holder.
4. The wafer cassette rack turning and limiting mechanism as claimed in claim 1, wherein a mounting rack for mounting the wafer cassette rack is fixed on the rotating rack, two side plates of the mounting rack are respectively provided with a corresponding shaft hole, and two short shafts on the wafer cassette rack are mounted in the corresponding shaft holes.
5. The wafer cassette holder flip stop mechanism as claimed in claim 4, wherein a plastic bushing is disposed between the stub shaft and the shaft hole.
6. The wafer cassette rack turning and limiting mechanism as claimed in claim 1, wherein one of the two short shafts is provided with a limiting hole, and an elastic limiting pin is installed on the corresponding rotating rack.
7. A wafer spin dryer comprising a mechanism for limiting the turnover of a wafer cassette rack as claimed in any of claims 1 to 6.
CN202222355829.6U 2022-09-05 2022-09-05 Overturning limiting mechanism of wafer box frame and wafer drying machine Active CN218565931U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202222355829.6U CN218565931U (en) 2022-09-05 2022-09-05 Overturning limiting mechanism of wafer box frame and wafer drying machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202222355829.6U CN218565931U (en) 2022-09-05 2022-09-05 Overturning limiting mechanism of wafer box frame and wafer drying machine

Publications (1)

Publication Number Publication Date
CN218565931U true CN218565931U (en) 2023-03-03

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116974141A (en) * 2023-09-22 2023-10-31 贵州华龙电子设备有限公司 Multi-specification wafer spin-drying device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116974141A (en) * 2023-09-22 2023-10-31 贵州华龙电子设备有限公司 Multi-specification wafer spin-drying device
CN116974141B (en) * 2023-09-22 2023-12-15 贵州华龙电子设备有限公司 Multi-specification wafer spin-drying device

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