CN217360549U - Nano-imprinting base station capable of avoiding heating of ultraviolet radiation - Google Patents
Nano-imprinting base station capable of avoiding heating of ultraviolet radiation Download PDFInfo
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- CN217360549U CN217360549U CN202220655828.0U CN202220655828U CN217360549U CN 217360549 U CN217360549 U CN 217360549U CN 202220655828 U CN202220655828 U CN 202220655828U CN 217360549 U CN217360549 U CN 217360549U
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Abstract
The utility model provides a nanometer impression base station of avoiding ultraviolet radiation to generate heat, includes that the base is fixed the unit, and the fixed unit of work mould exposes the unit, the unit of airing exhaust, five major part constitutions of casing. Air cooling is replaced by main water cooling, and air circulation is used for further heat dissipation and air replacement. The long-time ultraviolet irradiation is avoided, the ultraviolet lamp and the base station are caused to generate heat, so that the deformation of the imprinting material is avoided, the deformation of the nano structure is avoided, the imprinting precision of the nano imprinting equipment is improved, and the product yield is improved. Compared with air cooling and other modes, the water circulation cooling avoids the vibration of the base platform, and is beneficial to improving the precision of the nano-imprinting equipment. Meanwhile, the air circulation of the dust-free chamber is not influenced by water circulation cooling, and the improvement of cleanliness is facilitated, so that the product yield is improved.
Description
Technical Field
The utility model relates to a nanoimprint lithography technical field specifically is a nanoimprint lithography base station that avoids ultraviolet radiation to generate heat.
Background
The nanoimprint technology was first proposed by the professor Stephen Y Chou in 1995, and is a brand new pattern transfer technology different from the traditional lithography technology in the manufacturing process of a micro-nano device, wherein a photoresist is formed by sensitization without using light or irradiation, and a nano-sized pattern is directly constructed on a silicon substrate or other substrates by utilizing a physical mechanism. Due to the great prospect of the application of the nano-imprinting technology, the nano-imprinting technology is generally regarded by governments and scientists of various countries since being proposed, and the rapid development of the nano-imprinting technology has been caused in the last ten years, so that the nano-imprinting technology becomes one of the current hot research fields.
The ultraviolet nano-imprint technology is an imprint lithography technology using ultraviolet cured macromolecules, which is proposed by m.bender and m.otto. The technical contents of ultraviolet nano-imprinting are as follows: firstly, coating ultraviolet photoresist on a substrate, placing the substrate under a mold with a nano microstructure pattern, applying mechanical force to the mold to imprint the ultraviolet photoresist, curing an imprinted region by ultraviolet light after imprinting is finished, and then demolding. Compared with the hot embossing technology which needs to be processed by high temperature, high pressure and cooling, the ultraviolet nano embossing has the advantage of working in the environment of room temperature and low pressure.
However, in the actual production process, the ultraviolet lamp and the imprinting base station are heated by long-time ultraviolet irradiation, and the ultraviolet curing nanoimprint material adsorbed on the base station is heated, so that the material is deformed, the accuracy of the nanostructure is reduced, and the yield of the product is reduced. In order to avoid the deformation of the imprinting material caused by the heating of ultraviolet radiation and improve the yield of products, the nano-imprinting base station capable of avoiding the heating of ultraviolet radiation is provided.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide an avoid nano-imprint base station that ultraviolet radiation generated heat to solve the problem that proposes in the above-mentioned background art.
In order to achieve the above object, the utility model provides a following technical scheme: a nano-imprinting base station capable of avoiding heating of ultraviolet radiation comprises a shell, wherein a substrate fixing unit, a working mold fixing unit, an exposure unit and an exhaust unit are arranged in the shell; the substrate fixing unit comprises a first vacuum groove, an overflow groove, a first cooling water path, a supporting block, a lifting block, a motor and a first water tank;
the upper surface of the substrate fixing unit is provided with a first vacuum groove, and the bottom of the first vacuum groove is provided with a first vacuum hole;
an overflow groove is arranged outside the first vacuum groove of the substrate fixing unit;
the first cooling water channel is arranged inside the base fixing unit, one end of the first cooling water channel is connected with the water tank, the other end of the first cooling water channel is connected with a first water pump arranged in the first water tank, cooling circulation is completed through the first water pump, and the first water tank is filled with water through a first water inlet formed in the first water tank;
the supporting block is located the bottom of basement fixed unit, and the supporting block passes through the removal of lifting block and motor completion upper and lower direction.
Preferably, the working mold fixing unit comprises a vacuum hole, a second vacuum groove, a working mold positioning auxiliary groove, an electromagnetic fixing block, a vacuum pump and a transparent quartz plate;
a transparent quartz plate is arranged in the center of the working die fixing unit;
the lower surface of the working mold fixing unit is provided with a square second vacuum groove on the outer side of the transparent quartz plate, a vacuum hole is arranged in the second vacuum groove, the second vacuum hole is connected with a vacuum pump through a gas circuit, and the first vacuum hole is connected with the vacuum pump through the gas circuit;
a positioning auxiliary groove is arranged outside the second vacuum groove, and the depth of the positioning auxiliary groove is lower than that of the second vacuum groove;
the electromagnetic fixing blocks are arranged at two ends of the working die fixing unit, the first fixing block is fixedly installed inside the shell, and the working die fixing unit is fixed on the first fixing block through the electromagnetic fixing blocks.
Preferably, the exposure unit is positioned above the working mold fixing unit and comprises a second cooling water channel, a UV lamp, a second fixing block, a second water tank, a second water pump and a second water inlet;
the UV lamp is fixed on the equipment shell through the second fixing block and can emit ultraviolet light to cure the nanoimprint lithography material;
UV lamp top is located to the second cooling water route, and cooling cycle is accomplished through the second water pump to second cooling water route and second water tank, and the second water tank is equipped with the second water inlet.
Preferably, the exhaust unit comprises an FFU filter unit and an exhaust fan;
the FFU filter unit in the exhaust unit sucks air in the environment, the air is blown into the equipment downwards after being filtered layer by layer, and the air circulation in the equipment is kept from top to bottom in cooperation with the exhaust fan, and is kept in positive pressure relatively to the environment.
Preferably, a first leakage detector is arranged between the vacuum pump and the first water tank.
Preferably, a second leakage detector is arranged between the first water tank and the second water tank.
Preferably, handles are arranged at two ends of the working die fixing unit.
Preferably, a peaker alarm lamp is arranged above the shell, a controller is arranged in the shell, and the peaker alarm lamp, the first liquid leakage detector and the second liquid leakage detector are all connected to the controller through electric conductors.
Preferably, the bottom of the shell is provided with more than three universal wheels and feet.
Preferably, a partition plate is installed inside the shell.
Compared with the prior art, the beneficial effects of the utility model are that: avoided long-time ultraviolet irradiation, aroused ultraviolet lamp and base station to generate heat to avoid the deformation of impression material, and then avoided the nanostructure to take place deformation, improved the impression precision of nanometer impression equipment, water circulative cooling has avoided the vibrations of base station for modes such as forced air cooling, is favorable to improving the precision of nanometer impression equipment. Meanwhile, the air circulation of the dust-free chamber is not influenced by water circulation cooling, and the improvement of cleanliness is facilitated, so that the product yield is improved.
Drawings
FIG. 1: a nanoimprint equipment appearance diagram;
FIG. 2: a schematic structural diagram of a nanoimprint base;
FIG. 3: top view of the substrate single fixing unit 1;
FIG. 4: a schematic structural view of the cooling water channel 14 inside the substrate fixing unit;
FIG. 5 is a schematic view of: a bottom view of the working die fixing unit 2;
fig. 6 to 9: schematic diagrams of different time periods of the working process of the nanoimprint base.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts all belong to the protection scope of the present invention.
Referring to fig. 1-9, the present invention provides a technical solution: a nanometer impression base station for avoiding ultraviolet radiation heating comprises a shell 5, wherein a substrate fixing unit 1, a working mold fixing unit 2, an exposure unit 3 and an exhaust unit 4 are arranged in the shell 5; the substrate fixing unit 1 comprises a first vacuum tank 12, an overflow tank 13, a first cooling water path 14, a supporting block 15, a lifting block 16, a motor 17 and a first water tank 18;
the upper surface of the substrate fixing unit 1 is provided with a first vacuum groove 12, and the bottom of the first vacuum groove 12 is provided with a first vacuum hole 11;
an overflow groove 13 is arranged outside the first vacuum groove 12 of the substrate fixing unit 1;
the first cooling water path 14 is arranged inside the substrate fixing unit 1, one end of the first cooling water path 14 is connected with the water tank 18, the other end of the first cooling water path is connected with a first water pump 181 arranged in the first water tank 18, a cooling cycle is completed through the first water pump 181, and the first water tank 18 is added with water through a first water inlet 182 arranged on the first water tank 18;
the supporting block 15 is located at the bottom of the substrate fixing unit 1, and the supporting block 15 is moved up and down by the elevating block 16 and the motor 17.
The working mold fixing unit 2 comprises a vacuum hole 21, a second vacuum groove 22, a working mold positioning auxiliary groove 23, an electromagnetic fixing block 24, a first fixing block 25, a vacuum pump 26 and a transparent quartz plate 27;
a transparent quartz plate 27 is arranged at the center of the working die fixing unit 2;
a square second vacuum groove 22 is formed in the outer side of the transparent quartz plate 27 on the lower surface of the working mold fixing unit 2, a vacuum hole 21 is formed in the second vacuum groove 22, the second vacuum hole 21 is connected with a vacuum pump 26 through an air path, and the first vacuum hole 11 is connected with the vacuum pump 26 through an air path;
a positioning auxiliary groove 23 is arranged outside the second vacuum groove 22, and the depth of the positioning auxiliary groove 23 is lower than that of the second vacuum groove 22;
the electromagnetic fixing blocks 24 are arranged at two ends of the working die fixing unit 2, the first fixing block 25 is fixedly installed inside the shell 5, and the working die fixing unit 2 is fixed on the fixing blocks 25 through the electromagnetic fixing blocks 24.
The exposure unit 3 is positioned above the working mold fixing unit 2 and comprises a second cooling water path 31, a UV lamp 32, a second fixing block 33, a second water tank 34, a second water pump 341 and a second water inlet 342;
the UV lamp 32 is fixed on the equipment shell 5 through a second fixing block 33 and can emit ultraviolet light to cure the nanoimprint lithography material;
the second cooling water path 31 is disposed above the UV lamp, the second cooling water path 31 and the second water tank 34 complete a cooling cycle through the second water pump 341, and the second water tank 34 is provided with a second water inlet 342.
The exhaust unit 4 comprises an FFU filter unit 41 and an exhaust fan 42;
the FFU filter unit in the exhaust unit 4 sucks air in the environment, the air is blown into the equipment downwards after being filtered layer by layer, and the air circulation in the equipment is kept from top to bottom by matching with the exhaust fan 42 and is kept at positive pressure relatively to the environment.
A first leakage detector 19 is arranged between the vacuum pump 26 and the first water tank 18.
And a second leakage detector 35 is arranged between the first water tank 18 and the second water tank 34.
And the two leakage detectors perform leakage detection when leakage is detected. The equipment stops running. The peaker warning lamp 51 gives a warning.
A peaker warning lamp 51 is arranged above the shell 5, a controller is arranged in the shell, and the peaker warning lamp 51, the first liquid leakage detector 19 and the second liquid leakage detector 35 are all connected to the controller through electric conductors.
The bottom of the shell 5 is provided with more than three universal wheels 52 and feet 53.
The housing 5 is internally provided with a partition plate 54.
An internally mounted spacer 54 separates the nanoimprinting base from devices such as a vacuum pump water tank.
The working process of the nano-imprinting base station comprises the following steps:
S1：
two water inlets of the first water tank 18 and the second water tank 34 are opened, and an appropriate amount of deionized water is added.
S2：
The units of the nanoimprinting station are reset to the home position, as shown in fig. 6, and are ready to begin imprinting.
S3: feeding material
The upper surface of the substrate fixing unit 1 is pressed against the substrate 6, the vacuum pump 26 starts to pump vacuum, and after the vacuum path is opened, a negative pressure is formed in the vacuum chamber 12, thereby fixing the substrate 6 to the fixing unit 1.
The working mold 7 is positioned through the auxiliary positioning groove 23, and after the positioning is completed, the vacuum gas path of the working mold fixing unit 2 is opened, and negative pressure is formed in the vacuum groove 22, so that the working mold 7 is fixed on the fixing unit 2. The working mold structure faces the substrate 6.
S4：
The nanoimprint material is dotted at the center on the upper surface of the substrate 6, as shown in fig. 7.
S5：
The supporting block 15 moves upwards through the lifting block 16 and the motor 17, so that the substrate 6 is driven to move upwards, and the position of the working die 7 is fixed. As the substrate 6 moves upwards, the nanoimprint material is gradually spread out and fills the nanostructures in the surface of the working mold 7.
S6：
The first and second water pumps 181 and 341 are activated to circulate cooling water in the two cooling water paths to cool the UV lamp 32 and the substrate fixing unit.
S7：
The UV lamp emits UV light through the transparent quartz plate 27 and the working mold 7 cures the nanoimprint material. During the curing process, heat emitted from the UV lamp is taken away by the cooling water in the second cooling water path 31. Since the substrate fixing device is irradiated with ultraviolet rays, heat is also generated, and the heat is taken away by the cooling water in the first cooling water path 14.
After the cooling water is circulated back to the respective tanks, the heat is removed by the suction fan 42.
S8：
The supporting block 15 moves downwards through the lifting block 16 and the motor 17, so that the substrate 6 is driven to move downwards, and the position of the working die 7 is fixed. And (3) performing tackifying treatment on the surface of the substrate 6, and moving the nanoimprint material and the substrate 6 downwards together to finish demoulding.
S9：
After the nanoimprint action is completed, all the units return to the original point, and the water pump stops working.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. The utility model provides an avoid nano-imprint base station that ultraviolet radiation generates heat, includes casing (5), its characterized in that: a substrate fixing unit (1), a working mold fixing unit (2), an exposure unit (3) and an exhaust unit (4) are arranged in the shell (5);
the substrate fixing unit (1) comprises a first vacuum groove (12), an overflow groove (13), a first cooling water path (14), a supporting block (15), a lifting block (16), a motor (17) and a first water tank (18);
the upper surface of the substrate fixing unit (1) is provided with a first vacuum groove (12), and the bottom of the first vacuum groove (12) is provided with a first vacuum hole (11);
an overflow groove (13) is arranged outside the first vacuum groove (12) of the substrate fixing unit (1);
the first cooling water channel (14) is arranged inside the substrate fixing unit (1), one end of the first cooling water channel (14) is connected with the water tank (18), the other end of the first cooling water channel is connected with a first water pump (181) arranged in the first water tank (18), cooling circulation is completed through the first water pump (181), and the first water tank (18) is filled with water through a first water inlet (182) formed in the first water tank (18);
the supporting block (15) is positioned at the bottom of the substrate fixing unit (1), and the supporting block (15) completes the movement in the up-and-down direction through the lifting block (16) and the motor (17).
2. The nanoimprint lithography platform configured to avoid heating from ultraviolet radiation, as recited in claim 1, further comprising: the working mold fixing unit (2) comprises a vacuum hole (21), a second vacuum groove (22), a working mold positioning auxiliary groove (23), an electromagnetic fixing block (24), a fixing block (25), a vacuum pump (26) and a transparent quartz plate (27);
a transparent quartz plate (27) is arranged at the center of the working die fixing unit (2);
the lower surface of the working mold fixing unit (2), the outer side of the transparent quartz plate (27) is provided with a square second vacuum groove (22), a vacuum hole (21) is arranged in the second vacuum groove (22), the second vacuum hole (21) is connected with a vacuum pump (26) through an air path, and the first vacuum hole (11) is connected with the vacuum pump (26) through the air path;
a positioning auxiliary groove (23) is arranged outside the second vacuum groove (22), and the depth of the positioning auxiliary groove (23) is lower than that of the second vacuum groove (22);
the electromagnetic fixing blocks (24) are arranged at two ends of the working die fixing unit (2), the first fixing block (25) is fixedly installed inside the shell (5), and the working die fixing unit (2) is fixed on the first fixing block (25) through the electromagnetic fixing blocks (24).
3. The nanoimprint lithography stage of claim 2 that avoids heating from ultraviolet radiation, wherein: the exposure unit (3) is positioned above the working mold fixing unit (2) and comprises a second cooling water channel (31), a UV lamp (32), a second fixing block (33), a second water tank (34), a second water pump (341) and a second water inlet (342);
the UV lamp (32) is fixed on the equipment shell (5) through a second fixing block (33) and can emit ultraviolet light to cure the nano imprinting material;
the second cooling water path (31) is arranged above the UV lamp, the second cooling water path (31) and the second water tank (34) complete cooling circulation through the second water pump (341), and the second water tank (34) is provided with a second water inlet (342).
4. The nanoimprint submount for avoiding heating by ultraviolet radiation of claim 3, wherein: the exhaust unit (4) comprises an FFU filter unit (41) and an exhaust fan (42);
the FFU filter unit in the exhaust unit (4) sucks air in the environment, the air is blown into the equipment downwards after being filtered layer by layer, and the air circulation in the equipment is kept from top to bottom in cooperation with the exhaust fan (42) and kept in positive pressure relatively to the environment.
5. The nanoimprint submount for avoiding heating by ultraviolet radiation of claim 4, wherein: a first leakage detector (19) is arranged between the vacuum pump (26) and the first water tank (18).
6. The nanoimprint lithography stage of claim 5 that avoids heating from ultraviolet radiation, wherein: and a second liquid leakage detector (35) is arranged between the first water tank (18) and the second water tank (34).
7. The nanoimprint bench designed to avoid heating from ultraviolet radiation of claim 6, wherein: handles (28) are arranged at two ends of the working die fixing unit (2).
8. The nanoimprint submount for avoiding heating by ultraviolet radiation of claim 7, wherein: a peaker alarm lamp (51) is arranged above the shell (5), a controller is arranged in the shell, and the peaker alarm lamp (51), the first liquid leakage detector (19) and the second liquid leakage detector (35) are all connected to the controller through electric conductors.
9. The nanoimprint lithography platform of claim 8, wherein the nanoimprint lithography platform is configured to avoid heating from ultraviolet radiation, and the nanoimprint lithography platform further comprises: the bottom of the shell (5) is provided with more than three universal wheels (52) and feet (53).
10. The nanoimprint lithography stage of claim 9 that avoids heating from ultraviolet radiation, wherein: a partition plate (54) is arranged in the shell (5).
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220655828.0U CN217360549U (en) | 2022-03-24 | 2022-03-24 | Nano-imprinting base station capable of avoiding heating of ultraviolet radiation |
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| CN202220655828.0U CN217360549U (en) | 2022-03-24 | 2022-03-24 | Nano-imprinting base station capable of avoiding heating of ultraviolet radiation |
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| CN217360549U true CN217360549U (en) | 2022-09-02 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115933311A (en) * | 2022-12-30 | 2023-04-07 | 青岛天仁微纳科技有限责任公司 | A feed mechanism for nanometer impression equipment |
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2022
- 2022-03-24 CN CN202220655828.0U patent/CN217360549U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115933311A (en) * | 2022-12-30 | 2023-04-07 | 青岛天仁微纳科技有限责任公司 | A feed mechanism for nanometer impression equipment |
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