CN115933311A - A feed mechanism for nanometer impression equipment - Google Patents

A feed mechanism for nanometer impression equipment Download PDF

Info

Publication number
CN115933311A
CN115933311A CN202211731522.XA CN202211731522A CN115933311A CN 115933311 A CN115933311 A CN 115933311A CN 202211731522 A CN202211731522 A CN 202211731522A CN 115933311 A CN115933311 A CN 115933311A
Authority
CN
China
Prior art keywords
shell
air
unit
conveying
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202211731522.XA
Other languages
Chinese (zh)
Inventor
冀然
李铭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Germanlitho Co ltd
Original Assignee
Germanlitho Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Germanlitho Co ltd filed Critical Germanlitho Co ltd
Priority to CN202211731522.XA priority Critical patent/CN115933311A/en
Publication of CN115933311A publication Critical patent/CN115933311A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The application relates to the technical field of nanoimprint lithography, and discloses a feeding mechanism for nanoimprint lithography equipment, which comprises a shell unit, a conveying unit, a safety door unit and a cleaning unit, wherein the shell unit comprises a shell, a conveying opening is formed in the shell, an air suction structure is arranged at the top of the shell, and a negative pressure air suction structure is arranged at the lower part of the shell; the conveying unit is movably arranged in the middle of the shell and comprises a fixed plate and a moving structure, and the fixed plate is arranged on the moving structure; the safety door unit is arranged on the side part of the shell and corresponds to the conveying opening; the cleaning unit is installed above the transfer unit. The feed mechanism of this disclosure can regard as the buffers of nanometer impression equipment, reduces the cleanliness factor that human factor influences the impression intracavity, still can improve the precision of material loading simultaneously, and feed mechanism can also get rid of material static in addition and avoid electrostatic pollution, improves the cleanliness factor of impression material.

Description

A feed mechanism for nanometer impression equipment
Technical Field
The application relates to the technical field of nano-imprinting, for example to a feeding mechanism for nano-imprinting equipment.
Background
The feature size of lithography has been decreasing over decades, presenting new challenges to the manufacturing technology. In order to obtain a higher resolution structure, it is required to use light with a shorter wavelength as a light source for exposure, and conventional lithography has reached its limit, so that next-generation lithography technologies have come up, and technologies such as Electron Beam Lithography (EBL), ion Beam Lithography (IBL), extreme ultraviolet lithography (EUV), and the like have appeared. Although electron beam lithography has high resolution, it has low throughput and high processing cost, and can only be used to process critical layers. X-ray lithography requires high levels of light sources and fabrication, while high energy radiation can rapidly damage many materials in masks and lenses, resulting in increased lithography costs. The extreme ultraviolet lithography technology must adopt a reflective optical system with extremely high precision, which also brings about a sharp increase in cost.
In 1995, professor Stephen y.chou of university of princeton nano structure laboratory proposed nano imprint lithography technology, which opened a new direction, a high-precision imprint technology with low cost, simple operation and high work efficiency. The nano-imprint lithography technology is to smear photoresist on a substrate and apply mechanical force to a template with nano-patterns to imprint the nano-patterns in equal proportion to colloid on the substrate. Compared with the photoetching and etching technology, the nano-imprinting technology is not limited by the optical photoetching wavelength. Due to the great prospect of the application of the nano-imprinting technology, the nano-imprinting technology has been generally regarded by governments and scientists of various countries since being proposed, so that the rapid development of the nano-imprinting technology in the last ten years becomes one of the current popular research fields.
In the technical field of micro-nano processing, the requirement on cleanliness is high. Meanwhile, unlike projection lithography, nanoimprint is physical contact type imprint, so that when a substrate drops a dust particle, a large-area nanostructure is affected, which results in loss of multiple groups of structures and is not beneficial to improvement of yield. It is therefore particularly important to ensure cleanliness of the device interior and the nanoimprint material.
It is to be noted that the information disclosed in the above background section is only for enhancement of understanding of the background of the present application and therefore may include information that does not constitute prior art known to a person of ordinary skill in the art.
Disclosure of Invention
The following presents a simplified summary in order to provide a basic understanding of some aspects of the disclosed embodiments. This summary is not an extensive overview and is intended to neither identify key/critical elements nor delineate the scope of such embodiments, but is intended to be a prelude to the more detailed description that is presented later.
The embodiment of the disclosure provides a feeding mechanism for nanoimprint equipment, so as to improve the success rate of nanoimprint.
In some embodiments, the feeding mechanism for the nanoimprinting apparatus includes a housing unit, a conveying unit, a safety door unit and a cleaning unit, the housing unit includes a housing, an air suction structure and a negative pressure air suction structure, the housing is provided with a conveying opening, the air suction structure is arranged at the top of the housing, and the negative pressure air suction structure is arranged at the lower part of the housing; the conveying unit is movably arranged in the middle of the shell and comprises a fixed plate and a moving structure, the fixed plate is arranged on the moving structure and used for fixing the soft membrane, and the conveying unit is used for conveying the soft membrane; the safety door unit is arranged on the side part of the shell, corresponds to the position of the conveying opening, and is used for closing the conveying opening when the door is closed and enabling the conveying unit to enter and exit the shell through the conveying opening when the door is opened; the cleaning unit is installed above the transfer unit, and is used for removing static electricity of the soft film and cleaning the soft film.
Optionally, the fixing plate is provided with a central hole for reducing the contact area of the fixing plate and the soft membrane; the upper surface of fixed plate is provided with vacuum gas groove, and vacuum gas groove passes through trachea and vacuum pump intercommunication, and vacuum gas groove is used for adsorbing the mantle.
Optionally, the vacuum gas groove comprises a first gas groove and a second gas groove, the first gas groove is arranged around the periphery of the central hole; the second air groove is positioned at the periphery of the first air groove and communicated with the first air groove; the first air groove is communicated with the second air groove through a vacuum hole, and the air pipe is communicated with the first air groove and the second air groove through the vacuum hole.
Optionally, an alignment slot is disposed on the upper surface of the fixing plate, the alignment slot is located outside the vacuum slot, and the alignment slot is used for positioning the flexible membrane.
Optionally, the safety door unit comprises a door body, a transmission structure and a first lifting structure, wherein the door body is arranged at an opening on the side part of the shell in a lifting manner and is used for closing the opening when the door is closed; the transmission structure comprises a connecting rod and a connecting block, the connecting rod is connected with the bottom of the door body, and the connecting block is connected with the connecting rod; the first lifting structure is connected with the connecting block and used for driving the transmission structure to lift so as to enable the door body to be opened and closed.
Optionally, the safety door unit includes a detection structure, and the detection structure is installed on the outer side of the door body and used for detecting whether an object exists outside the door body.
Optionally, the housing unit comprises a first orifice plate, a second orifice plate and an air duct housing, the first orifice plate being located below the transport unit; the second orifice plate is positioned below the first orifice plate; the air duct housing is positioned between the first orifice plate and the second orifice plate.
Optionally, the air duct housing is of hourglass configuration.
Optionally, the housing unit further comprises a docking port and a second lifting structure, the docking port is disposed at one side of the housing, and the docking port is located opposite to the transfer opening; the second lifting structure is connected with the shell and used for lifting the feeding mechanism.
Optionally, the cleaning unit comprises a deionization generator, an air knife, a support rod and an angle adjusting block; the ions generated by the deionization generator are blown to the soft film through an air knife and are used for removing static electricity on the soft film: the deionization generator and the air knife are arranged on the upper part of the shell through a supporting rod and are positioned above the conveying unit, and the angle adjusting block is used for adjusting the angle between the air knife and the soft film.
The feeding mechanism for the nanoimprint equipment provided by the embodiment of the disclosure can realize the following technical effects:
the feed mechanism of this disclosure can regard as the buffers of nanometer impression equipment, with feed mechanism and nanometer impression chamber butt joint when using, can reduce nanometer impression chamber and environment direct contact. Then, the material can be earlier material loading to feed mechanism, cleans the back at feed mechanism, carries to the impression chamber again, can reduce the cleanliness factor that human factor influences the impression intracavity, still can improve the precision of material loading simultaneously.
On nanometer impression material loading to feed mechanism's fixed plate, go static and clean back through clean unit, can get rid of material static and avoid electrostatic pollution, improve the cleanliness factor of impression material, and then improve the cleanliness factor of impression product.
The foregoing general description and the following description are exemplary and explanatory only and are not restrictive of the application.
Drawings
One or more embodiments are illustrated by way of example in the accompanying drawings, which correspond to the accompanying drawings and not in limitation thereof, in which elements having the same reference numeral designations are shown as like elements and not in limitation thereof, and wherein:
FIG. 1 is a schematic front view of a loading mechanism provided in embodiments of the present disclosure;
FIG. 2 is a schematic view of an internal structure of a loading mechanism according to an embodiment of the disclosure;
FIG. 3 is a schematic side view of a loading mechanism provided by embodiments of the present disclosure;
FIG. 4 is a schematic side view of another feeding mechanism provided by embodiments of the present disclosure;
FIG. 5 is a schematic top view of a transfer unit provided by embodiments of the present disclosure;
fig. 6 is a schematic side view of a transfer unit provided in embodiments of the present disclosure.
Reference numerals:
11. a fixing plate; 111. a vacuum gas tank; 112. a vacuum hole; 113. aligning the wire grooves; 114. a connecting frame; 115. a central bore; 12. a sliding block; 13. a slide rail;
21. a fan filter structure; 22. a secondary filtering structure;
31. a deionizing generator; 32. an air knife; 33. a support bar; 34. an angle adjusting block;
41. a door body; 42. a connecting rod; 43. connecting blocks; 44. a lead screw; 45. a lead screw motor; 46. a safety grating emission end; 47. a safety grating receiving end;
51. a negative pressure air draft structure; 52. an air duct housing; 53. an orifice plate; 54. an alarm signal lamp; 55. a second lifting structure; 56. a bottom wheel; 561. a locking structure; 57. a housing; 58. a butt joint port;
6. and (3) a soft film.
Detailed Description
So that the manner in which the features and elements of the disclosed embodiments can be understood in detail, a more particular description of the disclosed embodiments, briefly summarized above, may be had by reference to the embodiments, some of which are illustrated in the appended drawings. In the following description of the technology, for purposes of explanation, numerous details are set forth in order to provide a thorough understanding of the disclosed embodiments. However, one or more embodiments may be practiced without these details. In other instances, well-known structures and devices may be shown in simplified form in order to simplify the drawing.
The terms "first," "second," and the like in the description and in the claims, and the above-described drawings of embodiments of the present disclosure, are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It should be understood that the data so used may be interchanged under appropriate circumstances such that embodiments of the present disclosure described herein may be made. Furthermore, the terms "comprising" and "having," as well as any variations thereof, are intended to cover non-exclusive inclusions.
In the embodiments of the present disclosure, the terms "upper", "lower", "inner", "middle", "outer", "front", "rear", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings. These terms are used primarily to better describe the disclosed embodiments and their examples and are not intended to limit the indicated devices, elements or components to a particular orientation or to be constructed and operated in a particular orientation. Moreover, some of the above terms may be used to indicate other meanings besides the orientation or positional relationship, for example, the term "on" may also be used to indicate some kind of attachment or connection relationship in some cases. The specific meanings of these terms in the embodiments of the present disclosure can be understood by those of ordinary skill in the art as appropriate.
In addition, the terms "disposed," "connected," and "secured" are to be construed broadly. For example, "connected" may be a fixed connection, a detachable connection, or a unitary construction; can be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements or components. Specific meanings of the above terms in the embodiments of the present disclosure can be understood by those of ordinary skill in the art according to specific situations.
The term "plurality" means two or more unless otherwise specified.
In the embodiment of the present disclosure, the character "/" indicates that the preceding and following objects are in an or relationship. For example, A/B represents: a or B.
The term "and/or" is an associative relationship that describes objects, meaning that three relationships may exist. For example, a and/or B, represents: a or B, or A and B.
It should be noted that, in the case of no conflict, the embodiments and features in the embodiments of the present disclosure may be combined with each other.
As shown in fig. 1 to 6, an embodiment of the present disclosure provides a feeding mechanism for a nanoimprinting apparatus, including a housing unit, a conveying unit, a security gate unit, and a cleaning unit.
The housing unit comprises a housing 57, an air suction structure and a negative pressure air suction structure 51, wherein the housing 57 is provided with a conveying opening, the air suction structure is arranged at the top of the housing 57, and the negative pressure air suction structure 51 is arranged at the lower part of the housing 57.
The transfer unit is movably installed at the middle portion of the housing 57, and includes a fixed plate 11 and a moving structure, the fixed plate 11 is installed on the moving structure, the fixed plate 11 is used for fixing the soft membrane 6, and the transfer unit is used for transferring the soft membrane 6.
A safety door unit is installed at a side of the housing 57 corresponding to the transfer opening in position, and is used to close the transfer opening when the door is closed and to allow the transfer unit to enter and exit the housing 57 through the transfer opening when the door is opened.
A cleaning unit is installed above the transfer unit for removing static electricity of the flexible film 6 and cleaning the flexible film 6.
Adopt the feed mechanism for nanometer impression equipment that this disclosed embodiment provided, can regard as nanometer impression equipment's buffer, dock feed mechanism and nanometer impression chamber when using, can reduce nanometer impression chamber and environment direct contact. Then, the material can be earlier material loading to feed mechanism, cleans the back at feed mechanism, carries to the impression chamber again, can reduce the cleanliness factor that human factor influences the impression intracavity, still can improve the precision of material loading simultaneously.
On nanometer impression material loading to feed mechanism's fixed plate 11, go static and clean back through clean unit, can get rid of material static and avoid electrostatic pollution, improve the cleanliness factor of impression material, and then improve the cleanliness factor of impression product.
As an example, the housing 57 is provided with a docking structure for docking with the imprint apparatus.
As another example, the moving structure includes a connecting frame 114, a sliding block 12, and a sliding rail 13, the connecting frame 114 is connected to the fixing plate 11, the sliding block 12 is mounted on the connecting frame 114, the sliding rail 13 is horizontally disposed in the housing 57, and the sliding rail 13 is slidably engaged with the sliding block 12, so that the fixing plate 11 can slide in the horizontal direction.
Optionally, the fixing plate 11 is provided with a central hole 115 for reducing the contact area of the fixing plate 11 and the soft membrane 6 to prevent the damage of the nano-structure on the surface of the soft membrane 6; the upper surface of the fixing plate 11 is provided with a vacuum air groove 111, the vacuum air groove 111 is communicated with a vacuum pump through an air pipe, and the vacuum air groove 111 is used for forming negative pressure on the surface of the fixing plate 11 so as to adsorb the soft membrane 6.
Optionally, the vacuum gas grooves 111 include a first gas groove and a second gas groove, the first gas groove being disposed around the outer circumference of the central hole 115; the second air groove is positioned at the periphery of the first air groove and communicated with the first air groove; the communication position of the first air groove and the second air groove is provided with a vacuum hole 112, and the air pipe is communicated with the first air groove and the second air groove through the vacuum hole 112.
As an example, the central hole 115 is a circular hole, the first air groove is a circular groove disposed around the central hole 115, the second air groove is disposed outside the first air groove and is a rectangular groove near the edge of the fixing plate 11, the first air groove and the second air groove are communicated through a channel, a vacuum hole 112 is disposed at the communication position, and the vacuum hole 112 is connected to the vacuum pump through an air pipe, so that the first air groove and the second air groove can form a negative pressure on the upper surface of the fixing plate 11.
Optionally, the upper surface of the fixing plate 11 is provided with an alignment line slot 113, the alignment line slot 113 is located outside the vacuum air slot 111, and the alignment line slot 113 is used for positioning the flexible film 6.
Optionally, the safety door unit includes a door body 41, a transmission structure, and a first lifting structure, the door body 41 is mounted on the opening on the side of the housing 57 in a lifting manner, and the door body 41 is used for closing the opening when the door is closed; the transmission structure comprises a connecting rod 42 and a connecting block 43, the connecting rod 42 is connected with the bottom of the door body 41, and the connecting block 43 is connected with the connecting rod 42; the first lifting structure is connected with the connecting block 43 and is used for driving the transmission structure to lift so as to open and close the door 41.
As an example, the first lifting structure includes a lead screw 44 and a lead screw motor 45, a first end of the lead screw 44 is connected with the connection block 43; the screw motor 45 is installed below a conveying opening of the shell 57, the screw motor 45 comprises an output shaft, the output shaft is connected with a second end of the screw 44, two through holes are formed in the connecting block 43, an internal thread matched with the screw 44 is arranged in one of the through holes, so that the connecting block 43 can move up and down on the screw 44, the other through hole is used for being connected and fixed with the connecting rod 42, and a guide groove is formed in the shell 57 and used for guiding the movement of the door body 41.
Alternatively, the safety door unit includes a detection structure installed at an outer side of the door body 41 for detecting the presence or absence of an object outside the door body 41.
As an example, the detection structure includes a security grating emitting end 46 and a security grating receiving end 47, and the security grating emitting end 46 and the security grating receiving end 47 are disposed correspondingly.
Optionally, the air suction structure comprises a fan, a fan filter structure 21 and a secondary filter structure 22, the fan is mounted on the top of the housing 57; the fan filtering structure 21 is arranged at an air outlet of the fan; the secondary filter structure 22 is located at the outlet of the fan filter structure 21.
It can be understood that the feeding mechanism is provided with the fan filtering structure 21 above, air filtered layer by layer flows downwards from above and is finally discharged outwards, the fan can keep positive pressure with the environment, so that pollutants in the environment are prevented from entering the buffer zone, and meanwhile, pollutants of materials are prevented from spreading in the shell 57 and are blown to the lower part of the shell 57;
optionally, the housing unit comprises a first orifice plate 53, a second orifice plate 53 and a duct housing 52, the first orifice plate 53 being located below the transfer unit; the second orifice plate 53 is positioned below the first orifice plate 53; the duct housing 52 is positioned between the first and second orifice plates 53, 53.
Optionally, the air duct housing 52 is an hourglass configuration. This facilitates noise reduction of the air flow and prevents dust particles from adhering to the inside of the housing 57 and being blown back to the conveying unit.
Optionally, the housing unit further comprises a docking port 58 and a second lifting structure 55, the docking port 58 being arranged at one side of the housing 57, the docking port 58 being located opposite the transport opening; the second lifting structure 55 is connected to the housing 57 for lifting the feeding mechanism. This enables the height of the docking port 58 to be adjusted by the second elevation structure 55. Wherein the docking interface 58 is used to dock with a stamping device or other device.
As an example, the bottom of the housing 57 is provided with a bottom wheel 56 for movement of the feeding mechanism, and after the fixed position, the position can be fixed by a locking structure 561, and then the level can be adjusted.
As another example, the docking interface 58 is an open docking interface 58 for docking with a stamping device or other device.
Alternatively, the cleaning unit includes a deionizer 31, an air knife 32, a support bar 33, and an angle adjusting block 34; the ions generated by the deionization generator 31 are blown toward the flexible film 6 by the air knife 32, and are used for removing static electricity on the flexible film 6: the deionizer 31 and the air knife 32 are installed on the upper portion of the housing 57 through a support bar 33 and positioned above the transfer unit, and an angle adjusting block 34 is used to adjust the angle between the air knife 32 and the soft film 6.
As an example, a warning signal lamp 54 is provided on the top of the housing 57.
The use method of the feeding mechanism for the nano-imprinting equipment mainly comprises the following steps:
1. positioning and fixing the soft membrane;
2. the conveying unit moves the flexible film;
3. the cleaning unit cleans the soft membrane;
4. device movement and docking.
Wherein, the fixed process of mantle location includes: the soft membrane 6 is arranged above the fixing plate 11, and the edge of the soft membrane 6 is aligned with the alignment line groove 113, so that the positioning process is completed. The soft membrane 6 covers the vacuum air groove 111, the vacuum pump starts to work, air in the vacuum air groove 111, the vacuum holes 112 and the connected air path is pumped out, a pressure difference is formed between the upper part and the lower part of the soft membrane, and the soft membrane 6 is fixed on the fixing plate 11.
The process of moving the soft film by the conveying unit comprises the following steps: the fixed plate 11 is moved in a horizontal direction along the slide rail 13 by the slide block 12.
The cleaning unit cleaning the soft film process comprises: the deionization generator 31 generates positive and negative ions which are blown to the soft film 6 by air pressure to neutralize the static electricity of the soft film 6, so that the material is removed, the static electricity pollution is avoided, the cleanliness of the imprinting material is improved, and the cleanliness of the imprinting product is further improved; the angle between the air knife 32 and the soft membrane 6 is adjusted by the angle adjusting block 34, so that the air knife is ensured to blow cleaning air to the soft membrane 6 in a certain angle inclination, and the cleaning effect is achieved.
In this in-process, blow into the equipment top after the secondary filtration structure 22 filters once more after fan filtration 21 blows in the filtration of the air in the environment, makes casing and environment keep the malleation through the fan, avoids the pollutant in the environment to enter the buffer zone, avoids the pollutant of material to stretch at the buffer zone simultaneously, and the pollutant is blown to the buffer zone below. The hourglass-shaped air duct shell 52 is arranged at the bottom of the shell, so that airflow noise reduction is facilitated, dust particles are prevented from being adhered to the inside of the equipment shell and blown back to the conveying unit 1, and finally, gas is discharged through the negative-pressure air draft structure 51, so that gas circulation inside the equipment is completed.
The moving and docking process of the device includes fixing the position of the device by the locking structure 561 after the fixing position, then adjusting the level, and adjusting the height of the docking port 58 by the second elevating structure 55.
The above description and the drawings sufficiently illustrate embodiments of the disclosure to enable those skilled in the art to practice them. Other embodiments may include structural and other changes. The examples merely typify possible variations. Individual components and functions are optional unless explicitly required, and the sequence of operations may vary. Portions and features of some embodiments may be included in or substituted for those of others. The embodiments of the present disclosure are not limited to the structures that have been described above and shown in the drawings, and various modifications and changes may be made without departing from the scope thereof. The scope of the present disclosure is limited only by the appended claims.

Claims (10)

1. A feed mechanism for a nanoimprint apparatus, comprising:
the shell unit comprises a shell, an air suction structure and a negative pressure air suction structure, wherein the shell is provided with a conveying opening, the air suction structure is arranged at the top of the shell, and the negative pressure air suction structure is arranged at the lower part of the shell;
the conveying unit is movably arranged in the middle of the shell and comprises a fixed plate and a moving structure, the fixed plate is arranged on the moving structure and used for fixing the soft membrane, and the conveying unit is used for conveying the soft membrane;
the safety door unit is arranged on the side part of the shell, corresponds to the position of the conveying opening, and is used for closing the conveying opening when the door is closed and enabling the conveying unit to enter and exit the shell through the conveying opening when the door is opened;
and a cleaning unit installed above the transfer unit, for removing static electricity of the soft film and cleaning the soft film.
2. A loading mechanism according to claim 1,
the fixing plate is provided with a central hole which is used for reducing the contact area of the fixing plate and the soft membrane;
the upper surface of fixed plate is provided with vacuum gas groove, vacuum gas groove passes through trachea and vacuum pump intercommunication, vacuum gas groove is used for adsorbing the mantle.
3. The loading mechanism of claim 2, wherein the vacuum air slot comprises:
the first air groove is arranged around the periphery of the central hole;
the second air groove is positioned on the periphery of the first air groove and communicated with the first air groove;
the first air groove is communicated with the second air groove through a vacuum hole, and the air pipe is communicated with the first air groove and the second air groove through the vacuum hole.
4. A loading mechanism according to claim 2,
the upper surface of fixed plate is provided with the counterpoint wire casing, the counterpoint wire casing is located the outside in vacuum gas groove, the counterpoint wire casing is used for the location of mantle.
5. The loading mechanism according to claim 1, wherein the safety door unit comprises:
the door body is arranged on the opening on the side part of the shell in a lifting manner and used for closing the conveying opening when the door is closed;
the transmission structure comprises a connecting rod and a connecting block, the connecting rod is connected with the bottom of the door body, and the connecting block is connected with the end part of the connecting rod;
and the first lifting structure is connected with the connecting block and used for driving the transmission structure to lift so as to enable the door body to be opened and closed.
6. The loading mechanism according to claim 5, wherein the safety door unit comprises:
and the detection structure is arranged on the outer side of the door body and is used for detecting whether an object exists outside the door body or not.
7. A loading mechanism as claimed in any one of claims 1 to 6, wherein the housing unit comprises:
a first orifice plate located below the transfer unit;
a second orifice plate located below the first orifice plate;
and the air duct shell is positioned between the first orifice plate and the second orifice plate.
8. A feeding mechanism according to any one of claims 1 to 6,
the air duct shell is of an hourglass-shaped structure.
9. The loading mechanism of any one of claims 1 to 6, wherein the air suction structure comprises:
the fan is arranged at the top of the shell;
the fan filtering structure is arranged at the air outlet of the fan;
and the secondary filtering structure is positioned at the outlet of the fan filtering structure.
10. The loading mechanism of claim 9,
the cleaning unit comprises a deionization generator, an air knife, a supporting rod and an angle adjusting block;
the ions generated by the deionization generator are blown to the soft film through an air knife, and are used for removing static electricity on the soft film:
the deionization generator and the air knife are installed on the upper portion of the shell through the supporting rod and are located above the conveying unit, and the angle adjusting block is used for adjusting the angle between the air knife and the soft film.
CN202211731522.XA 2022-12-30 2022-12-30 A feed mechanism for nanometer impression equipment Pending CN115933311A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211731522.XA CN115933311A (en) 2022-12-30 2022-12-30 A feed mechanism for nanometer impression equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211731522.XA CN115933311A (en) 2022-12-30 2022-12-30 A feed mechanism for nanometer impression equipment

Publications (1)

Publication Number Publication Date
CN115933311A true CN115933311A (en) 2023-04-07

Family

ID=86557680

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211731522.XA Pending CN115933311A (en) 2022-12-30 2022-12-30 A feed mechanism for nanometer impression equipment

Country Status (1)

Country Link
CN (1) CN115933311A (en)

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202245207U (en) * 2011-09-21 2012-05-30 丰田合成(张家港)塑料制品有限公司 Closed static-removing automatic conveying device
CN207150971U (en) * 2017-08-29 2018-03-27 众华电子科技(太仓)有限公司 Electrostatic equipment is removed in a kind of online dedusting of electronic circuit board
CN209543001U (en) * 2019-01-03 2019-10-25 苏州市星光精密机械有限公司 VR cleaning equipment
CN111774375A (en) * 2020-07-03 2020-10-16 苏州市星光精密机械有限公司 Screen surface dust collector
CN212821374U (en) * 2020-06-25 2021-03-30 常州捷佳创精密机械有限公司 Cleaning machine
CN213103603U (en) * 2020-08-05 2021-05-04 厦门恺成精密机械有限公司 Cleaning device capable of efficiently removing dust and ion dust removing device
CN213645182U (en) * 2020-09-23 2021-07-09 苏州通富超威半导体有限公司 Product testing device
CN214375809U (en) * 2021-02-03 2021-10-08 青岛天仁微纳科技有限责任公司 Nano-imprinting equipment with self-cleaning structure
CN216582624U (en) * 2021-11-29 2022-05-24 楚天科技股份有限公司 Bottle arranging and conveying device
CN217360548U (en) * 2022-03-24 2022-09-02 青岛天仁微纳科技有限责任公司 Nano-imprinting working mold workstation
CN217360549U (en) * 2022-03-24 2022-09-02 青岛天仁微纳科技有限责任公司 Nano-imprinting base station capable of avoiding heating of ultraviolet radiation
CN115110096A (en) * 2022-07-26 2022-09-27 陕西顶众环保科技有限公司 Titanium alloy pickling all-in-one

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202245207U (en) * 2011-09-21 2012-05-30 丰田合成(张家港)塑料制品有限公司 Closed static-removing automatic conveying device
CN207150971U (en) * 2017-08-29 2018-03-27 众华电子科技(太仓)有限公司 Electrostatic equipment is removed in a kind of online dedusting of electronic circuit board
CN209543001U (en) * 2019-01-03 2019-10-25 苏州市星光精密机械有限公司 VR cleaning equipment
CN212821374U (en) * 2020-06-25 2021-03-30 常州捷佳创精密机械有限公司 Cleaning machine
CN111774375A (en) * 2020-07-03 2020-10-16 苏州市星光精密机械有限公司 Screen surface dust collector
CN213103603U (en) * 2020-08-05 2021-05-04 厦门恺成精密机械有限公司 Cleaning device capable of efficiently removing dust and ion dust removing device
CN213645182U (en) * 2020-09-23 2021-07-09 苏州通富超威半导体有限公司 Product testing device
CN214375809U (en) * 2021-02-03 2021-10-08 青岛天仁微纳科技有限责任公司 Nano-imprinting equipment with self-cleaning structure
CN216582624U (en) * 2021-11-29 2022-05-24 楚天科技股份有限公司 Bottle arranging and conveying device
CN217360548U (en) * 2022-03-24 2022-09-02 青岛天仁微纳科技有限责任公司 Nano-imprinting working mold workstation
CN217360549U (en) * 2022-03-24 2022-09-02 青岛天仁微纳科技有限责任公司 Nano-imprinting base station capable of avoiding heating of ultraviolet radiation
CN115110096A (en) * 2022-07-26 2022-09-27 陕西顶众环保科技有限公司 Titanium alloy pickling all-in-one

Similar Documents

Publication Publication Date Title
US20190094708A1 (en) Exposure apparatus and device manufacturing method
CN1212643C (en) Cleaning device of on-line laser wafer bearing
JP5389236B2 (en) Ablation method and apparatus
TWI224808B (en) Lithographic apparatus and device manufacturing method
TWI330762B (en) Seal of a lithographic apparatus, lithographic apparatus, device manufacturing method and data storage medium
US6198792B1 (en) Wafer chamber having a gas curtain for extreme-UV lithography
JP4848003B2 (en) Immersion lithography system with tilted showerhead and immersion lithography method
JP2000058443A (en) Lithographic projection apparatus and manufacture of device
EP1600819A1 (en) Lithographic apparatus having a gas flushing device
KR20090052274A (en) Exposure apparatus
US8084757B2 (en) Contamination prevention in extreme ultraviolet lithography
JP2009246046A (en) Exposure device and device manufacturing method
US11460787B2 (en) Apparatus and a method of forming a particle shield
CN115933311A (en) A feed mechanism for nanometer impression equipment
CN109782551A (en) Mask plate foreign body eliminating apparatus
US6259509B1 (en) Exposure apparatus and device manufacturing method
US7554648B2 (en) Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
TWI345683B (en) Lithographic apparatus and device manufacturing method
KR20090103847A (en) Exposure apparatus and device manufacturing method
TW201300967A (en) Filter box, filter device, and exposure device
CN115362607A (en) Catheter system, radiation source, lithographic apparatus and method
US11392041B2 (en) Particle removal device and method
TWI778641B (en) Lithography system, and apparatus for generating laminar flow in lithography system
CN212276215U (en) Laser light energy recovery type photoetching machine
CN1550890A (en) Method for manufacturing lithographic pringting apparatus and equipment

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination