CN217191170U

CN217191170U - Convenient to use's carborundum wafer belt cleaning device

Info

Publication number: CN217191170U
Application number: CN202123240944.0U
Authority: CN
Inventors: 周杰; 李有群; 贺贤汉; 殷雪苑; 卓世异
Original assignee: Shanghai Shenhe Investment Co ltd
Current assignee: Shanghai Shenhe Investment Co ltd
Priority date: 2021-12-22
Filing date: 2021-12-22
Publication date: 2022-08-16
Anticipated expiration: 2031-12-22

Abstract

The utility model relates to the technical field of silicon carbide wafers, in particular to a silicon carbide wafer cleaning device with convenient use, which comprises a base, an upper frame fixedly arranged at the top of the base, a plurality of limiting holes respectively arranged at the two sides of the top of the upper frame, a shifting mechanism, a taking mechanism, a washing mechanism and a drying mechanism, wherein the shifting mechanism is arranged at the top of the upper frame and comprises a mounting groove arranged at one side of the upper frame and two screw rod sliding tables respectively and fixedly arranged at the two sides of the inner wall of the mounting groove, the utility model discloses a shifting mechanism and a drying mechanism are arranged, a connecting plate is fixedly arranged at one side of the upper frame through a fixing block, a dryer is fixedly arranged at the top of the connecting plate, after the wafers in the cleaning basket are cleaned, a sliding block of the screw rod sliding table is opened to drive the cleaning basket to move, so that the cleaning basket is moved to the lower part of an air outlet pipe, and opening the dryer to blow out the air of the dryer through the air outlet pipe, and simultaneously dripping water stains on the surface of the wafer into the water collecting tank.

Description

Convenient to use's carborundum wafer belt cleaning device

Technical Field

The utility model relates to a silicon carbide wafer technical field especially relates to a convenient to use's silicon carbide wafer belt cleaning device.

Background

The main application areas of silicon carbide wafers are LED solid state lighting and high frequency devices. The material has the excellent characteristics of forbidden band, drift velocity, breakdown voltage, heat conductivity, high temperature resistance and the like which are several times higher than those of the traditional silicon, has irreplaceable advantages in the electronic application fields of high temperature, high pressure, high frequency, high power, photoelectricity, radiation resistance, microwave performance and the like and the extreme environment applications of aerospace, military industry, nuclear energy and the like, and the silicon carbide wafer needs to be cleaned after being processed to remove chemical preparations on the surface so as to be convenient for subsequent use.

The belt cleaning device who uses at present can't be more convenient quick when using generally adjusts the position to silicon carbide wafer, can't be quick after wasing the completion dry with the moisture on wafer surface, needs the manual work to shift, and it is not convenient enough to use.

Accordingly, there is a need to design a silicon carbide wafer cleaning apparatus that can solve one or more of the above problems with convenient use.

SUMMERY OF THE UTILITY MODEL

In order to solve one or more problems existing in the prior art, the utility model provides a silicon carbide wafer cleaning device with convenient use.

The utility model discloses a reach the technical scheme that above-mentioned purpose adopted and be: the utility model provides a convenient to use's carborundum wafer belt cleaning device, includes base, fixed mounting at the roof-rack at base top and a plurality of spacing hole of seting up respectively in roof-rack top both sides, still includes shifting mechanism, the mechanism of taking, washes mechanism and air-drying mechanism, shifting mechanism sets up at the roof-rack top, shifting mechanism is including seting up at the mounting groove of roof-rack one side, two respectively fixed mounting at the lead screw slip table of mounting groove inner wall both sides, two respectively fixed mounting in the backup pad of the sliding block one side of two lead screw slip tables and fixed mounting in the washing basket of two backup pads bottoms, wash the inside fixed mounting of basket and have separating mechanism, the mechanism of taking sets up in washing basket one side, wash mechanism fixed mounting at the roof-rack top, air-drying mechanism fixed mounting is in roof-rack one side.

Preferably, the separating mechanism comprises a plurality of supporting blocks fixedly mounted on two sides of the inner wall of the cleaning basket respectively, a plurality of grooves formed in one side of the supporting blocks respectively, and a plurality of partition plates mounted on the inner sides of the grooves in a matched manner respectively.

Preferably, the separating mechanism further comprises a plurality of protective pads fixedly installed on both sides of the plurality of partition plates, respectively.

Preferably, the taking mechanism comprises a movable door and two pin shafts which are respectively and fixedly installed on one side of the outer wall of the cleaning basket, and the movable door is fixedly installed on one side of the two pin shafts.

Preferably, the flushing mechanism comprises a water tank, a mounting plate, a plurality of limiting rods which are respectively fixedly mounted on two sides of the bottom of the water tank, three connecting pipes which are respectively fixedly connected to the bottom of the water tank, three connecting blocks which are respectively fixedly mounted on the top of the mounting plate and three nozzles which are respectively fixedly mounted on the bottom of the three connecting blocks, the water tank is movably mounted on the top of the top frame, and the mounting plate is fixedly mounted on the bottom of the top frame.

Preferably, air-drying mechanism includes backup pad, drying-machine, play tuber pipe, header tank and two fixed blocks of difference fixed mounting in roof-rack outer wall both sides, connecting plate fixed mounting is in two fixed block one sides, drying-machine fixed mounting is at the connecting plate top, it is in the drying-machine bottom to go out tuber pipe fixed mounting, header tank fixed mounting is in base one side.

The utility model has the advantages that:

one is as follows: the utility model discloses a be provided with shift mechanism and air-drying mechanism, pass through fixed block fixed mounting in roof-rack one side with the connecting plate, again with drying-machine fixed mounting in the connecting plate top, after the wafer washing of washing basket inside is accomplished, open lead screw slip table and make the sliding block of lead screw slip table drive the washing basket and move, make the washing basket move to the play tuber pipe below, open the drying-machine again and make the wind of drying-machine blow off through going out the tuber pipe, the water stain on wafer surface drips to the header tank inside simultaneously, carry out subsequent unified clearance, the setting of mounting groove, lead screw slip table, the setting of backup pad and washing basket, can more convenient and faster move the position of wafer, need not the manual work and shift, can carry out follow-up operation to the wafer more convenient, effectively promoted the availability factor of device, fixed block, connecting plate, drying-machine, play tuber pipe and water collecting tank simultaneously, can be more quick convenient water stain with wafer surface clear up, quick carry out drying process with the wafer, inside water stain drip to the header tank of wafer surface simultaneously, the clearance is unified to the faster going on, has promoted the availability factor of device greatly.

Drawings

Fig. 1 is a schematic perspective view of the present invention;

FIG. 2 is a schematic structural view of the flushing mechanism of the present invention;

fig. 3 is a schematic structural view of the separating mechanism of the present invention;

fig. 4 is an enlarged schematic structural diagram of a in fig. 1 according to the present invention.

Description of the reference numerals: 1. a base; 2. a top frame; 3. a displacement mechanism; 31. mounting grooves; 32. a screw rod sliding table; 33. a support plate; 34. cleaning a basket; 4. a separating mechanism; 41. a support block; 42. a groove; 43. a partition plate; 44. a protective pad; 5. a fetching mechanism; 51. a pin shaft; 52. a movable door; 6. a limiting hole; 7. a flushing mechanism; 71. a water tank; 72. a limiting rod; 73. a connecting pipe; 74. mounting a plate; 75. connecting blocks; 76. a nozzle; 8. an air drying mechanism; 81. a fixed block; 82. a connecting plate; 83. a dryer; 84. an air outlet pipe; 85. a water collection tank.

Detailed Description

In order to make the above objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, as those skilled in the art will be able to make similar modifications without departing from the spirit and scope of the present invention.

As shown in figures 1 to 4, the utility model provides a silicon carbide wafer cleaning device with convenient use, which comprises a base 1, a top frame 2 fixedly arranged at the top of the base 1, a plurality of limiting holes 6 respectively arranged at the two sides of the top frame 2, a shifting mechanism 3 and a taking mechanism 5, washing mechanism 7 and air-dry mechanism 8, shifting mechanism 3 sets up at roof-rack 2 top, shifting mechanism 3 is including seting up the mounting groove 31 in roof-rack 2 one side, two respectively fixed mounting are at the lead screw slip table 32 of mounting groove 31 inner wall both sides, two respectively fixed mounting are at the backup pad 33 of the sliding block one side of two lead screw slip tables 32 and fixed mounting are at the washing basket 34 of two backup pad 33 bottoms, wash the inside fixed mounting of basket 34 and have separating mechanism 4, the mechanism 5 of taking sets up in washing basket 34 one side, wash 7 fixed mounting in roof-rack 2 top of mechanism, air-dry mechanism 8 fixed mounting is in roof-rack 2 one side.

The above-described specific embodiment: open lead screw slip table 32 and make the sliding block of lead screw slip table 32 drive and wash basket 34 and remove, make wash basket 34 and remove to going out tuber pipe 84 below, can be more convenient quick remove the position of wafer, need not the manual work and shift, can be more convenient carry out follow-up operation to the wafer, effectively promoted the availability factor of device.

Specifically, separating mechanism 4 includes a plurality of supporting shoes 41 of fixed mounting in washing basket 34 inner wall both sides respectively, a plurality of recess 42 and a plurality of baffle 43 of installing in a plurality of recesses 42 inboard of cooperation respectively that set up in a plurality of supporting shoes 41 one side respectively, through being provided with supporting shoe 41, recess 42 and baffle 43, can be more convenient separate the shelves according to the size and dimension of wafer between to the wafer, ensure that each wafer can all obtain effectual washing, it is more convenient to use.

Specifically, separating mechanism 4 still includes a plurality of respectively fixed mounting at the protection pad 44 of a plurality of baffle 43 both sides, through being provided with protection pad 44, can be more convenient protect wafer both sides, prevents that the wafer from receiving the pressure of water and rocking in the cleaning process, leads to the damage of wafer both sides, influences subsequent use.

Specifically, mechanism 5 of taking includes dodge gate 52, two respectively fixed mounting at the round pin axle 51 of wasing basket 34 outer wall one side, dodge gate 52 fixed mounting in two round pin axle 51 one sides, through being provided with round pin axle 51 and dodge gate 52, can be more convenient overhaul the change to the part of wasing basket 34 inside, simultaneously can be more convenient quick take the wafer.

Specifically, the flushing mechanism 7 includes a water tank 71, a mounting plate 74, a plurality of gag lever posts 72 of fixed mounting respectively in water tank 71 bottom both sides, three connecting pipes 73 of fixed connection respectively in the water tank 71 bottom, three connecting blocks 75 of fixed mounting respectively at mounting plate 74 top and three nozzles 76 of fixed mounting respectively in three connecting blocks 75 bottom, water tank 71 movable mounting is at the top of roof rack 2, mounting plate 74 fixed mounting is in the 2 bottoms of roof rack, through being provided with water tank 71, gag lever post 72, connecting pipe 73, mounting plate 74, connecting block 75 and nozzles 76, can be more convenient quick carry out even washing to a plurality of wafers, wash more evenly, simultaneously the setting of gag lever post 72 can be more convenient installs the dismantlement to water tank 71.

Specifically, air drying mechanism 8 includes connecting plate 82, drying-machine 83, go out tuber pipe 84, header tank 85 and two fixed block 81 of difference fixed mounting in roof-rack 2 outer wall both sides, connecting plate 82 fixed mounting is in two fixed block 81 one sides, drying-machine 83 fixed mounting is at connecting plate 82 top, it is in the drying-machine 83 bottom to go out tuber pipe 84 fixed mounting, header tank 85 fixed mounting is in base 1 one side, through being provided with fixed block 81, connecting plate 82, drying-machine 83, it goes out tuber pipe 84 and header tank 85, can be more quick convenient clear up the water stain on wafer surface, the quick drying process that carries out the wafer, the water stain on wafer surface drips inside header tank 85 simultaneously, the more quick clearance of unifying, the availability factor of device has been promoted greatly.

To sum up, the utility model discloses a: firstly, an external power supply is switched on, the movable door 52 is pulled to drive the pin shaft 51 to rotate and open, the supporting blocks 41 are fixedly arranged at two sides of the inner wall of the cleaning basket 34, the partition plates 43 are arranged between the supporting blocks 41, then the wafer is arranged between the partition plates 43, the limiting rod 72 at the bottom of the water tank 71 is inserted into the limiting hole 6 to fix the water tank 71, the valve of the water tank 71 is opened to spray cleaning liquid in the water tank through the nozzle 76 to clean the wafer, the connecting plate 82 is fixedly arranged at one side of the top frame 2 through the fixing block 81, then the dryer 83 is fixedly arranged at the top of the connecting plate 82, after the wafer in the cleaning basket 34 is cleaned, the sliding block of the screw rod sliding table 32 is opened to drive the cleaning basket 34 to move, the cleaning basket 34 is moved to the lower part of the air outlet pipe 84, and finally the dryer 83 is opened to blow air out of the dryer 83 through the air outlet pipe 84, simultaneously inside water stain drippage to header tank 85 on wafer surface, carry out subsequent unified clearance, wherein the model of lead screw slip table 32 is: PKH40, model number of dryer 83: CNT-18G.

The above-described embodiments are merely illustrative of one or more embodiments of the present invention, and the description thereof is more specific and detailed, but the scope of the invention is not limited thereto. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims

1. The utility model provides a convenient to use's carborundum wafer belt cleaning device, includes base (1), fixed mounting in roof-rack (2) and a plurality of the spacing hole (6) of seting up respectively in roof-rack (2) top both sides at base (1) top, its characterized in that: still include displacement mechanism (3), take mechanism (5), wash mechanism (7) and air-dry mechanism (8), displacement mechanism (3) sets up at roof-rack (2) top, displacement mechanism (3) are including seting up mounting groove (31), two respectively fixed mounting lead screw slip tables (32) in mounting groove (31) inner wall both sides, two respectively fixed mounting in backup pad (33) and the washing basket (34) of fixed mounting in two backup pad (33) bottoms of sliding block one side of two lead screw slip tables (32), wash the inside fixed mounting of basket (34) and have separating mechanism (4), it sets up in washing basket (34) one side to take mechanism (5), wash mechanism (7) fixed mounting at roof-rack (2) top, air-dry mechanism (8) fixed mounting in roof-rack (2) one side.

2. A silicon carbide wafer cleaning apparatus as claimed in claim 1, wherein: the separating mechanism (4) comprises a plurality of supporting blocks (41) which are respectively and fixedly arranged on two sides of the inner wall of the cleaning basket (34), a plurality of grooves (42) which are respectively arranged on one side of the supporting blocks (41) and a plurality of partition plates (43) which are respectively arranged on the inner sides of the grooves (42) in a matching way.

3. A silicon carbide wafer cleaning apparatus as claimed in claim 2, wherein: the separating mechanism (4) also comprises a plurality of protective pads (44) which are respectively fixedly arranged on two sides of the plurality of partition plates (43).

4. A silicon carbide wafer cleaning apparatus as claimed in claim 1, wherein: the taking mechanism (5) comprises a movable door (52) and two pin shafts (51) which are respectively and fixedly installed on one side of the outer wall of the cleaning basket (34), and the movable door (52) is fixedly installed on one side of the two pin shafts (51).

5. A silicon carbide wafer cleaning apparatus as claimed in claim 1, wherein: flushing mechanism (7) include water tank (71), mounting panel (74), a plurality of gag lever post (72) of fixed mounting respectively in water tank (71) bottom both sides, three connecting pipe (73) of fixed connection in water tank (71) bottom respectively, three connecting block (75) and three nozzle (76) of fixed mounting respectively in three connecting block (75) bottom at mounting panel (74) top respectively, water tank (71) movable mounting is at roof-rack (2) top, mounting panel (74) fixed mounting is in roof-rack (2) bottom.

6. A silicon carbide wafer cleaning apparatus as claimed in claim 1, wherein: air-dry mechanism (8) including connecting plate (82), drying-machine (83), play tuber pipe (84), header tank (85) and two fixed block (81) of difference fixed mounting in roof-rack (2) outer wall both sides, connecting plate (82) fixed mounting is in two fixed block (81) one sides, drying-machine (83) fixed mounting is at connecting plate (82) top, it is in drying-machine (83) bottom to go out tuber pipe (84) fixed mounting, header tank (85) fixed mounting is in base (1) one side.