CN216191930U - Purple double-silver low-emissivity coated glass - Google Patents
Purple double-silver low-emissivity coated glass Download PDFInfo
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Abstract
The application provides two silver-colored low emissivity coated glass of purple relates to coated glass's technical field, including the glass substrate, one side of glass substrate has set gradually basic unit's first dielectric layer, basic unit's second dielectric layer, first silver rete, first barrier layer, middle first dielectric layer, middle second dielectric layer, second silver rete, second barrier layer and protective layer, its characterized in that from inside to outside: the protective layer comprises an upper first dielectric layer, an upper second dielectric layer and an upper third dielectric layer which are sequentially stacked; the upper first dielectric layer is laid on the surface, back to the second silver film layer, of the second barrier layer, the upper first dielectric layer has an anti-oxidation property, the upper second dielectric layer is used for improving toughness, and the upper third dielectric layer has the characteristics of scratch resistance, wear resistance and corrosion resistance; the technical problem that the protective layer protection intensity on the surface of the coated glass is not enough in the prior art is mainly solved.
Description
Technical Field
The application belongs to the field of glass, and particularly relates to purple double-silver low-emissivity coated glass.
Background
Low emissivity glass, also known as Low-E glass, is a film-system product formed by coating multiple layers of metals or other compounds including silver layers on the surface of the glass. Because the silver layer has the characteristic of low radiation, the low-radiation glass has higher transmissivity to visible light, has higher reflectivity to infrared rays and has good heat-insulating property.
Compared with single-silver low-emissivity glass, the double-silver low-emissivity glass has higher reflectivity to infrared rays and stronger heat-insulating property while maintaining higher transmissivity to visible light.
The film structure of the double-silver low-emissivity coated glass produced by adopting a vacuum magnetron sputtering method is generally as follows: glass/base dielectric layer/first functional silver layer/first barrier layer/intermediate dielectric layer/second functional silver layer/second barrier layer/upper protective layer, etc.
However, in the development and production of the traditional double-silver low-emissivity film, most common products are green, gray, silver gray, blue gray, silver blue or gold, while the purple double-silver product which can be decomposed into white light is rare, and the difference between the glass surface color and the film surface color of most products is large, so that the two surfaces are difficult to be consistent. In order to meet the market demand, a purple double-silver low-emissivity coated glass needs to be developed.
Secondly, the protective layer on the surface of the existing coated glass has the defect of insufficient protective strength, and the surface of the coated glass is often damaged in the transportation process after the coated glass is processed in different places.
SUMMERY OF THE UTILITY MODEL
The embodiment of the application aims to provide purple double-silver low-emissivity coated glass so as to solve the technical problem that the protective strength of a protective layer on the surface of the coated glass in the prior art is not enough.
In order to achieve the purpose, the technical scheme adopted by the application is as follows: the purple double-silver low-emissivity coated glass comprises a glass substrate, wherein a base layer first dielectric layer, a base layer second dielectric layer, a first silver film layer, a first barrier layer, a middle first dielectric layer, a middle second dielectric layer, a second silver film layer, a second barrier layer and a protective layer are sequentially arranged on one side of the glass substrate from inside to outside; the protective layer comprises an upper first dielectric layer, an upper second dielectric layer and an upper third dielectric layer which are sequentially stacked; the upper first dielectric layer is paved on one surface, back to the second silver film layer, of the second barrier layer, the upper first dielectric layer has an anti-oxidation characteristic, the upper second dielectric layer is used for improving toughness, and the upper third dielectric layer has the characteristics of scratch resistance, wear resistance and corrosion resistance.
In one embodiment, the first dielectric layer of the base layer is a SiZrOx layer, a TiO layer2Layer, SiO2Layer, Ta2O5Layer, SiNxOy layer, BiO2Layer of Al2O3Layer, Nb2O5Layer, Si3N4And the thickness of the base layer first dielectric layer is 20-40 nm.
In one embodiment, the base layer and the second dielectric layer are ZnSnOx layer and SnO layer2Layer, ZnO layer or Al2O3And the thickness of the second dielectric layer of the base layer is 10-15 nm.
In one embodiment, the first barrier layer and the second barrier layer are both a nickel-chromium layer, a nickel-chromium oxide layer or a nickel-chromium nitride layer, and the thickness of each of the first barrier layer and the second barrier layer is 1-5 nm.
In one embodiment, the intermediate first dielectric layer is a ZnSnOx layer, SnO2Layer, ZnO layer or Al2O3And the thickness of the middle first dielectric layer is 60-70 nm.
In one embodiment, the intermediate second dielectric layer is a ZnSnOx layer, SnO2Layer, ZnO layer or Al2O3And the thickness of the middle second dielectric layer is 10-15 nm.
In one embodiment, the upper first dielectric layer is a ZnSnOx layer, SnO2Layer, ZnO layer or Al2O3And the thickness of the upper first dielectric layer is 5-10 nm.
In one embodiment, the upper second dielectric layer is SiO2Layer, Ta2O5Layer, SiNxOy layer or Si3N4And the thickness of the upper second dielectric layer is 15-25 nm.
In one embodiment, the upper third dielectric layer is TiO2Layer, BiO2Layer, Nb2O5And the thickness of the upper third dielectric layer is 5-10 nm.
In one embodiment, the base first dielectric layer is Si3N4The layer thickness is 25-28 nm; the base layer second dielectric layer is a ZnO layer and has a thickness of 10-12 nm; the thickness of the first silver film layer is 11-14 nm; the first barrier layer is a NiCr layer and has a thickness of 1.5-3 nm; the middle first dielectric layer is SnO2Layer and thickness of 62-65 nm; the middle second dielectric layer is a ZnO layer and has a thickness of 10-12 nm; the thickness of the second silver film layer is 12-15 nm; the second barrier layer is a NiCr layer and has the thickness of 2.5-4 nm; the upper first dielectric layer is a ZnO layer and has a thickness of 6-8 nm; the upper second dielectric layer is Si3N4The layer thickness is 15-18 nm; the upper third dielectric layer is TiO2The layer has a thickness of 5 to 7 nm.
Compared with the prior art, the purple double-silver low-emissivity coated glass provided by the application has the beneficial effects that:
this application designs into three-layer structure to the protective layer for the membrane system is on original basis, and performance such as anti-oxidant, resistant fish tail and wear resistance is strengthened by a wide margin, and this just makes has huge advantage in later stage processing, can make two silver-colored coated glass change implementation in different place processing, reduces the defective work loss in the transportation, reduction in production cost and increase profit.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is a schematic structural diagram of a purple double-silver low-emissivity coated glass of the utility model;
FIG. 2 is a schematic view of the production process of the purple double-silver low-emissivity coated glass of the utility model.
Wherein, in the figures, the respective reference numerals:
1. a glass substrate; 2. a base first dielectric layer; 3. a base layer second dielectric layer; 4. a first silver film layer; 5. a first barrier layer; 6. an intermediate first dielectric layer; 7. an intermediate second dielectric layer; 8. a second silver film layer; 9. a second barrier layer; 10. an upper first dielectric layer; 11. an upper second dielectric layer; 12. An upper third dielectric layer.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
Referring to fig. 1 and fig. 2 together, a description will now be given of a purple double-silver low-emissivity coated glass provided by an embodiment of the present application. The purple double-silver low-emissivity coated glass comprises a glass substrate 1, a base layer first dielectric layer 2, a base layer second dielectric layer 3, a first silver film layer 4, a first barrier layer 5, an intermediate first dielectric layer 6, an intermediate second dielectric layer 7, a second silver film layer 8, a second barrier layer 9 and a protective layer which are sequentially designed in a laminated manner. Since the protective layer is the outermost layer, the protective layer is designed to have oxidation resistance, high toughness, scratch resistance, wear resistance, and corrosion resistance. In the present embodiment, the protective layer is designed into three layers, namely an upper first dielectric layer 10, an upper second dielectric layer 11 and an upper third dielectric layer 12, wherein the upper first dielectric layer 10 is laid on the side of the second barrier layer 9 facing away from the second silver film layer 8. Wherein the upper first dielectric layer 10 has an oxidation resistant property, avoiding the second silver film layer 8 to be oxidized, wherein the upper second dielectric layer 11 is used for improving the toughness of the glass as a whole, wherein the upper third dielectric layer 12 has scratch, wear and corrosion resistant properties, in particular:
the glass substrate 1 is preferably white glass.
The first dielectric layer 2 of the base layer is made of a non-metallic nitride or oxide, such as SiZrOx, TiO2、SiO2、Ta2O5、SiNxOy、BiO2、Al2O3、Nb2O5、Si3N4AZO, and the like. The thickness of the base first dielectric layer 2 is 20 to 40 nm. The base dielectric layer 2 plays a role in enhancing firmness with the glass substrate 1, and the base first dielectric layer 2 makes the film layer and the glass substrate 1 easier to connect by utilizing the characteristic of similar melting of materials and glass component structures.
The base second dielectric layer 3 is made of metal oxide, such as ZnSnOx, SnO2、ZnO、Al2O3And the like. The thickness of the base layer second dielectric layer 3 is 10-15 nm. The base layer second dielectric layer 3 plays a role of effectively connecting the base layer first dielectric layer 2 and the first silver film layer 4, and the base layer second dielectric layer 3 utilizes ZnSnOx, SnO2、ZnO、Al2O3The bonding property of the materials with nitride and silver is better, and the base layer second dielectric layer 3 is used as a film layer of oxideThe base layer second dielectric layer 3 also functions to prevent the first silver film layer 4 from being oxidized due to the characteristic of effectively preventing the penetration of O2.
The thickness of the first silver film layer 4 is 10-20 nm.
The material of the first barrier layer 5 is one of nickel chromium, nickel chromium oxide or nickel chromium nitride. The thickness of the first barrier layer 5 is 1 to 5 nm. The first barrier layer 5 can prevent the first silver film layer 4 from being oxidized.
The intermediate first dielectric layer 6 is made of an oxide of a metal, such as ZnSnOx, SnO2、ZnO、Al2O3And the like. The thickness of the middle dielectric layer 6 is 60-70 nm. The middle first dielectric layer 6 plays the role of energy saving and consumption reduction, and ZnSnOx and SnO utilized by the middle first dielectric layer2、ZnO、Al2O3The material is similar to the material of the intermediate second dielectric layer 7, but the sputtering efficiency is 1.5 times to 2 times of the material of the intermediate second dielectric layer 7, and the power consumption is less when the material of the intermediate dielectric layer 6 is used under the condition of the same sputtering thickness. Therefore, only the material of the second dielectric layer 7 with the necessary thickness can be deposited, and the material of the middle dielectric layer 6 is used for replacing the rest part for sputtering, thereby achieving the effects of saving energy and reducing consumption.
The intermediate second dielectric layer 7 is made of an oxide of a metal, such as ZnSnOx, SnO2、ZnO、Al2O3And the like. The thickness of the intermediate second dielectric layer 7 is 10-15 nm. The middle second dielectric layer 7 plays a role in reducing the emissivity of the glass under the same silver consumption, and the 7 th layer utilizes ZnSnOx and SnO2、ZnO、Al2O3The ZnO film layer formed by sputtering and depositing the materials is smoother than other materials, and is the most suitable material connected with the silver. Therefore, after the second silver film layer 8 is connected with the second silver film layer, the silver layer deposited under the same sputtering power is smoother, and the resistance is smaller, so that the effect of reducing the radiance of the glass under the same silver consumption is achieved.
The thickness of the second silver film layer 8 is 10-20 nm.
The material of the second barrier layer 9 is one of nickel chromium, nickel chromium oxide or nickel chromium nitride, and the single-layer thickness of the second barrier layer 9 is 1-5 nm. The second barrier layer 9 can prevent the second silver film layer 8 from being oxidized.
The upper first dielectric layer 10 is made of metal oxide, such as ZnSnOx, SnO2、ZnO、Al2O3And the like. The thickness of the upper first dielectric layer 10 is 5 to 10 nm.
The upper second dielectric layer 11 is made of a non-metallic nitride or oxide, such as SiO2、Ta2O5、SiNxOy、Si3N4And the like. The thickness of the upper second dielectric layer 11 is 15 to 25 nm.
The upper third dielectric layer 12 is composed of a non-metallic oxide or oxide, such as TiO2、BiO2、Nb2O5AZO, and the like. The thickness of the upper third dielectric layer 12 is 5 to 10 nm.
The following is a preferable film structure of the application example of the purple double-silver low-emissivity coated glass provided by the embodiment:
the film structure of the preferred embodiment comprises a glass substrate, Si, which are laminated in this order3N4Layer, ZnO layer, silver film layer, NiCr layer, SnO2Layer, ZnO layer, silver film layer, NiCr layer, ZnO layer, Si3N4A layer and a TiO layer.
Namely, the main material of the base layer first dielectric layer 2 is silicon nitride (Si) with adjustable nitrogen content3N4) The thickness of the film layer is 25-28 nm.
Namely, the main material of the second dielectric layer 3 of the base layer is zinc oxide (ZnO) with adjustable oxygen content, and the thickness of the film layer is 10-12 nm.
The thickness of the first functional silver layer 4 is preferably 11-14 nm according to the specific materials of each layer and the required conditions for preparing the purple coated glass.
Namely, the main material of the first barrier layer 5 is nickel chromium (NiCr), and the thickness of the film layer is 1.5-3 nm.
Namely, the main material of the middle dielectric layer 6 is tin oxide (SnO) with adjustable oxygen content2) The thickness of the film layer is 62-65 nm.
Namely, the main material of the middle second dielectric layer 7 is zinc oxide (ZnO) with adjustable oxygen content, and the thickness of the film layer is 10-12 nm.
The thickness of the second functional silver layer 8 is preferably 12-15 nm according to the specific materials of each layer and the required conditions for preparing the purple coated glass.
Namely, the main material of the second barrier layer 9 is nickel chromium (NiCr), and the thickness of the film layer is 2.5-4 nm.
Namely, the main material of the upper first dielectric layer 10 is zinc oxide (ZnO) with adjustable oxygen content, and the thickness of the film layer is 6-8 nm.
That is, the main material of the upper second dielectric layer 11 is silicon nitride (Si) with adjustable nitrogen content3N4) The thickness of the film layer is 15-18 nm.
That is, the main material of the upper third dielectric layer 12 is titanium oxide (TiOx) with adjustable oxygen content, and the thickness of the layer is 5 to 7 nm.
The processing technology of the purple double-silver low-emissivity coated glass with the preferable film structure comprises the following steps:
sputtering and depositing all the silicon nitride layers in an argon nitrogen atmosphere by adopting a medium-frequency power supply and a rotating cathode, wherein the power is 100-180 kw, and the frequency of the medium-frequency power supply is 30-50 kHz;
sputtering and depositing all metal oxide layers in an argon-oxygen atmosphere by adopting a medium-frequency power supply and a rotating cathode, wherein the power is 20-50 kw, and the frequency of the medium-frequency power supply is 30-40 kHz;
sputtering and depositing all the nonmetal oxide layers in an argon-oxygen atmosphere by adopting a medium-frequency power supply and a rotating cathode, wherein the power is 10-30 kw, and the frequency of the medium-frequency power supply is 30-40 kHz;
sputtering nickel-chromium alloy planar targets on all the nickel-chromium layers in an argon atmosphere, wherein the power is 2-10 kw;
depositing all silver film layer plane cathodes or rotating cathodes, direct current or direct current plus pulse magnetron sputtering in an argon atmosphere, wherein the power is 3-15 kw;
sputtering chromium plane target materials on all the chromium layers in an argon atmosphere, wherein the power is 5-10 kw;
the purple double-silver low-emissivity coated glass and the production process thereof provided by the utility model are characterized in that:
1. the treatment of the film layer of the utility model. The base layer first dielectric layer 2 and the base layer second dielectric layer 3 are antireflection film layers, play a role in connecting the glass substrate 1 and the silver film layer, require good bonding performance between the film layers and glass, and relieve the internal stress of the whole low-emissivity film. The middle two dielectric layers play a role in protecting the first silver film layer 4 and the second silver film layer 8, the polarization color can be adjusted, and red color cast effects of different degrees can be obtained according to the adjustment of the thickness of the polarization color. The toughness, scratch resistance, wear resistance, oxidation resistance and corrosion resistance of the product are directly influenced by the upper three dielectric layers, the oxidation resistance is mainly solved by the upper first dielectric layer 10, the toughness problem is solved by the upper second dielectric layer 11, and the scratch resistance, wear resistance and corrosion resistance are mainly solved by the upper third dielectric layer 12.
2. The purple double-silver low-emissivity coated glass provided by the utility model is added with an upper third dielectric layer 12 made of a novel material on the treatment of the dielectric layer, the hardness of the selected material is very high, and the material is deposited on the outermost layer of the film layer through magnetron sputtering, so that the hardness of the film layer is enhanced. So that the performances of scratch resistance, wear resistance and the like of the film system are strengthened on the original basis. Therefore, the method has great advantages in later processing, the allochthonous processability of the double silver is easier to implement, the loss of unqualified products in the process is reduced, the cost is reduced, and the profit is increased.
3. The emissivity of the glass is effectively reduced to be below 0.03 by controlling the deposition thickness of the first silver film layer 4 and the second silver film layer 8. Therefore, the heat insulation performance of the product is well ensured, and the concept of environmental protection and energy saving is better met.
4. According to the technical scheme, through mutual matching of the dielectric layers, the silver film layers and the barrier layers and through controlling the thickness of each film layer, sunlight is refracted and interfered after passing through each film layer, and finally the bright and bright purple (a can reach 12, b can reach-16) double-silver low-radiation coated glass is deposited. In the current double-silver low-emissivity coated glass market, most common products are green, gray, silver gray, blue gray, silver blue and golden, and few double-silver products which can be decomposed into white light are purple. The utility model fills the market gap and expands the selectable range of the double-silver low-emissivity coated glass. Moreover, the purple double-silver low-emissivity coated glass has stable optical performance, bright color and easy adjustment, is very practical in performance and appearance, and can be popularized to civil buildings and commercial buildings.
The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. The utility model provides a two silver low emissivity coated glass of purple, includes the glass substrate, one side of glass substrate has set gradually basic unit's first dielectric layer, basic unit's second dielectric layer, first silver rete, first barrier layer, middle first dielectric layer, middle second dielectric layer, second silver rete, second barrier layer and protective layer, its characterized in that from inside to outside: the protective layer comprises an upper first dielectric layer, an upper second dielectric layer and an upper third dielectric layer which are sequentially stacked; the upper first dielectric layer is paved on one surface, back to the second silver film layer, of the second barrier layer, the upper first dielectric layer has an anti-oxidation characteristic, the upper second dielectric layer is used for improving toughness, and the upper third dielectric layer has the characteristics of scratch resistance, wear resistance and corrosion resistance.
2. The purple double-silver low-emissivity coated glass of claim 1, wherein: the first dielectric layer of the base layer is a SiZrOx layer or a TiO layer2Layer, SiO2Layer, Ta2O5Layer, SiNxOy layer, BiO2Layer of Al2O3Layer, Nb2O5Layer, Si3N4And the thickness of the base layer first dielectric layer is 20-40 nm.
3. The purple double-silver low-emissivity coated glass of claim 1, wherein: the second dielectric layer of the base layer is a ZnSnOx layer or SnO2Layer, ZnO layer or Al2O3And the thickness of the second dielectric layer of the base layer is 10-15 nm.
4. The purple double-silver low-emissivity coated glass of claim 1, wherein: the first blocking layer and the second blocking layer are nickel-chromium layers, nickel-chromium oxide layers or nickel-chromium nitride layers, and the thickness of the first blocking layer and the thickness of the second blocking layer are both 1-5 nm.
5. The purple double-silver low-emissivity coated glass of claim 1, wherein: the middle first dielectric layer is a ZnSnOx layer or SnO2Layer, ZnO layer or Al2O3And the thickness of the middle first dielectric layer is 60-70 nm.
6. The purple double-silver low-emissivity coated glass of claim 1, wherein: the middle second dielectric layer is a ZnSnOx layer or SnO2Layer, ZnO layer or Al2O3And the thickness of the middle second dielectric layer is 10-15 nm.
7. The purple double-silver low-emissivity coated glass of claim 1, wherein: the upper first dielectric layer is ZnSnOx layer or SnO2Layer, ZnO layer or Al2O3And the thickness of the upper first dielectric layer is 5-10 nm.
8. The purple double-silver low-emissivity coated glass of claim 1, wherein: the upper second dielectric layer is SiO2Layer, Ta2O5Layer, SiNxOy layer or Si3N4And the thickness of the upper second dielectric layer is 15-25 nm.
9. The purple double-silver low-emissivity coated glass of claim 1, wherein: the upper third dielectric layer is TiO2Layer, BiO2Layer, Nb2O5Layer orAnd the thickness of the upper third dielectric layer is 5-10 nm.
10. The purple double-silver low-emissivity coated glass of claim 1, wherein:
the first dielectric layer of the base layer is Si3N4The layer thickness is 25-28 nm;
the base layer second dielectric layer is a ZnO layer and has a thickness of 10-12 nm;
the thickness of the first silver film layer is 11-14 nm;
the first barrier layer is a NiCr layer and has a thickness of 1.5-3 nm;
the middle first dielectric layer is SnO2Layer and thickness of 62-65 nm;
the middle second dielectric layer is a ZnO layer and has a thickness of 10-12 nm;
the thickness of the second silver film layer is 12-15 nm;
the second barrier layer is a NiCr layer and has the thickness of 2.5-4 nm;
the upper first dielectric layer is a ZnO layer and has a thickness of 6-8 nm;
the upper second dielectric layer is Si3N4The layer thickness is 15-18 nm;
the upper third dielectric layer is TiO2The layer has a thickness of 5 to 7 nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202122373338.XU CN216191930U (en) | 2021-09-28 | 2021-09-28 | Purple double-silver low-emissivity coated glass |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202122373338.XU CN216191930U (en) | 2021-09-28 | 2021-09-28 | Purple double-silver low-emissivity coated glass |
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| CN216191930U true CN216191930U (en) | 2022-04-05 |
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