CN215680625U - 刻蚀槽结构以及刻蚀机 - Google Patents
刻蚀槽结构以及刻蚀机 Download PDFInfo
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- CN215680625U CN215680625U CN202122031911.9U CN202122031911U CN215680625U CN 215680625 U CN215680625 U CN 215680625U CN 202122031911 U CN202122031911 U CN 202122031911U CN 215680625 U CN215680625 U CN 215680625U
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- etching
- liquid
- groove
- pipeline
- silicon wafer
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- 238000005530 etching Methods 0.000 title claims abstract description 379
- 239000007788 liquid Substances 0.000 claims abstract description 271
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 111
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 111
- 239000010703 silicon Substances 0.000 claims abstract description 111
- 239000007921 spray Substances 0.000 claims abstract description 18
- 238000005507 spraying Methods 0.000 claims abstract description 9
- 230000001502 supplementing effect Effects 0.000 claims description 30
- 230000007246 mechanism Effects 0.000 claims description 15
- 238000001514 detection method Methods 0.000 claims description 9
- 238000003825 pressing Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 30
- 239000013589 supplement Substances 0.000 abstract description 9
- 230000009286 beneficial effect Effects 0.000 abstract description 8
- 235000012431 wafers Nutrition 0.000 description 105
- 230000008569 process Effects 0.000 description 29
- 239000000243 solution Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 238000010790 dilution Methods 0.000 description 7
- 239000012895 dilution Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
Description
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202122031911.9U CN215680625U (zh) | 2021-08-26 | 2021-08-26 | 刻蚀槽结构以及刻蚀机 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202122031911.9U CN215680625U (zh) | 2021-08-26 | 2021-08-26 | 刻蚀槽结构以及刻蚀机 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN215680625U true CN215680625U (zh) | 2022-01-28 |
Family
ID=79956349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202122031911.9U Active CN215680625U (zh) | 2021-08-26 | 2021-08-26 | 刻蚀槽结构以及刻蚀机 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN215680625U (zh) |
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2021
- 2021-08-26 CN CN202122031911.9U patent/CN215680625U/zh active Active
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 314417 No. 1 Jisheng Road, Jiaxing City, Zhejiang Province Patentee after: Zhengtai Xinneng Technology Co.,Ltd. Address before: 314417 No. 1 Jisheng Road, Jiaxing City, Zhejiang Province Patentee before: HAINING ASTRONERGY TECHNOLOGY Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 314417 No. 1 Jisheng Road, Jiaxing City, Zhejiang Province Patentee after: Zhengtai Xinneng Technology Co.,Ltd. Address before: 314417 No. 1 Jisheng Road, Jiaxing City, Zhejiang Province Patentee before: Zhengtai Xinneng Technology Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder |