CN214254441U - Flow equalizing plate - Google Patents

Flow equalizing plate Download PDF

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Publication number
CN214254441U
CN214254441U CN202023316451.6U CN202023316451U CN214254441U CN 214254441 U CN214254441 U CN 214254441U CN 202023316451 U CN202023316451 U CN 202023316451U CN 214254441 U CN214254441 U CN 214254441U
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China
Prior art keywords
cylinder
handle
flow
plate
support
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Active
Application number
CN202023316451.6U
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Chinese (zh)
Inventor
林佳继
庞爱锁
朱太荣
林依婷
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Laplace New Energy Technology Co ltd
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Shenzhen Laplace Energy Technology Co Ltd
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Priority to CN202023316451.6U priority Critical patent/CN214254441U/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The utility model relates to a flow equalizing plate, which is characterized by comprising a flow equalizing cylinder and a bracket; the flow equalizing cylinder is arranged on the bracket; the flow equalizing cylinder comprises a ventilation plate, and ventilation holes are formed in the ventilation plate; the uniform flow cylinder is arranged at one end of the air inlet pipe of the furnace pipe, so that the reaction gas input by the air inlet pipe firstly passes through the uniform flow cylinder and is uniformly led to a product to be processed in the furnace pipe through the uniform flow effect of the ventilating plate, and the uniform reaction gas flow in the furnace pipe is ensured.

Description

Flow equalizing plate
Technical Field
The utility model relates to a semiconductor manufacturing and solar photovoltaic cell make the field, especially relate to an even flow plate.
Background
The current mainstream process for manufacturing the solar cell by the silicon wafer comprises the following steps: texturing, diffusion, etching, film coating, printing, sintering and the like. The conventional diffusion method comprises the steps of conveying a silicon wafer into a quartz boat, pushing the quartz boat carrying the silicon wafer into a tubular diffusion furnace tank, heating the diffusion furnace to a first preset temperature, introducing process gas into the diffusion furnace, and keeping the temperature for a certain time; and stopping introducing the process gas until the source is deposited, adjusting the intermediate temperature to be the second preset temperature, and performing the source diffusion process. In the diffusion, oxidation and other processes, various gaseous reactions are involved, and reaction gas enters a reaction cavity from a vacuum pipeline after passing through a flowmeter and a valve controller. The process of the reaction gas entering the cavity is generally that the reaction gas enters the large cavity from a pipeline with a small pipe diameter, and the reaction gas is easy to form concentration at the inlet of the pipeline and on the path of the gas flow direction of the pipeline, so that the reaction on the product is not uniform; in addition, the concentrated impact of the airflow can influence the local temperature in the furnace tube, so that the local temperature difference is generated in the furnace tube. There is therefore a need for an even flow plate that is capable of breaking up the airflow.
Disclosure of Invention
The utility model aims at solving the defects of the prior art and providing the uniform flow plate which has simple structure and convenient use.
The flow homogenizing plate is characterized by comprising a flow homogenizing cylinder and a support; the flow equalizing cylinder is arranged on the bracket; the even flow cylinder comprises a ventilation plate, and ventilation holes are formed in the ventilation plate.
Further, the support comprises a handle and a supporting pipe, and the handle is arranged at one end of the supporting pipe.
Furthermore, the number of the supporting pipes is two, and the two supporting pipes are arranged in parallel.
Furthermore, the handle is linear, the two ends of the handle are provided with protruding structures, and the protrusions face the same direction; the protruding structure of handle is connected with the stay tube, and stay tube and handle vertical setting.
Furthermore, the even flow cylinder also comprises a cylinder, the cylinder is tubular, and the air permeable plate is arranged at one end inside the cylinder.
Furthermore, the even flow cylinder is arranged on the support, and one end of the air permeable plate is far away from the handle.
Furthermore, the support is arranged in the furnace tube, and the horizontal plane of the handle is higher than the horizontal plane of the support tube.
Further, the bracket is arranged close to one end of the air inlet pipe of the furnace tube; the handle of the bracket faces the air inlet pipe or faces away from the air inlet pipe.
Furthermore, the diameter of the supporting tube plus one half of the outer diameter of the cylinder is equal to one half of the inner diameter of the furnace tube.
Further, the minimum distance between the tail discharge pipe of the furnace tube and the axis of the furnace tube is more than half of the outer diameter of the cylinder; the diameters of the air holes on the same air permeable plate are consistent.
The utility model has the advantages that:
the uniform flow cylinder is arranged at one end of the gas inlet pipe of the furnace pipe, so that the reaction gas input by the gas inlet pipe firstly passes through the uniform flow cylinder and is uniformly led to the product to be processed in the furnace pipe through the uniform flow action of the gas permeable plate, and the uniform reaction gas flow in the furnace pipe is ensured;
through setting up the support, realize supporting to the even section of thick bamboo that flows to through the handle of support, can conveniently adjust the position that even section of thick bamboo was located.
Drawings
FIG. 1 is a schematic view of a uniform flow tube disposed in a furnace tube according to an embodiment of the present invention;
fig. 2 is a schematic view of a uniform flow tube disposed on a support according to an embodiment of the present invention;
fig. 3 is a schematic view of a uniform flow tube disposed on a furnace tube and a handle of a bracket deviating from an air inlet tube according to an embodiment of the present invention;
fig. 4 is a perspective view of a uniform flow tube disposed in a furnace tube according to an embodiment of the present invention.
The attached drawings indicate the following: the device comprises a uniform flow cylinder 1, a ventilation plate 11, ventilation holes 12, a cylinder 13, a support 2, a handle 21, a convex structure 22, a support pipe 23, an air inlet pipe 3 and a tail discharge pipe 4.
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will be readily apparent to those skilled in the art from the disclosure herein. The present invention can also be implemented or applied through other different specific embodiments, and various details in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic concept of the present invention, and the components related to the present invention are only shown in the drawings rather than drawn according to the number, shape and size of the components in actual implementation, and the form, amount and ratio of the components in actual implementation may be changed at will, and the layout of the components may be more complicated.
The first embodiment is as follows:
as shown in fig. 1 and 2, the flow equalizing plate comprises a flow equalizing cylinder 1 and a bracket 2; the uniform flow cylinder 1 is arranged on the bracket 2; the support 2 is arranged inside the furnace tube. The flow equalizing cylinder 1 comprises a ventilating plate 11, and the ventilating plate 11 is provided with a ventilating hole 12; the apertures of the air holes 12 on the same air permeable plate 11 are consistent, and the apertures of the air holes 12 on different air permeable plates 11 are different. The air holes 12 on the air permeable plate 11 are uniformly arranged.
The bracket 2 includes a handle 21 and a support tube 23, and the handle 21 is disposed at one end of the support tube 23. In this example, the number of the support pipes 23 is two, and the two support pipes 23 are arranged in parallel. The handle 21 is linear, and the two ends of the handle 21 are provided with protruding structures 22, and the protrusions face the same direction. A support tube 23 is connected to the protruding structure 22 of the handle 21, and the support tube 23 is vertically disposed with respect to the handle 21. When the device is arranged, the two support pipes 23 are combined with the handle 21, and the support pipes 23 are contacted with the inner wall of the furnace tube, so that the bracket 2 is supported in the furnace tube. Wherein the horizontal plane of the handle 21 is higher than that of the support tube 23, so that when the flow homogenizing cylinder 1 is erected on the bracket 2, the handle 21 can block the flow homogenizing cylinder 1; on the other hand, the position of the bracket 2 in the furnace tube can be adjusted by grasping the handle 21.
As shown in fig. 3, the uniform flow cylinder 1 further includes a cylinder 13, the cylinder 13 is tubular, and the air-permeable plate 11 is disposed at one end inside the cylinder 13. The outer diameter of the cylinder 13 is smaller than the inner diameter of the furnace tube. When the uniform flow cylinder 1 is arranged on the bracket 2, one end of the air permeable plate 11 is far away from the handle 21, so that the air holes 12 on the air permeable plate 11 are not shielded by the handle 21. The support 2 sets up in the intraductal one end that is close to intake pipe 3 of stove, and wherein the handle 21 of support 2 is towards intake pipe 3 or be dorsad intake pipe 3, because in two kinds of handle 21 setting modes, ventilative board 11 homoenergetic contacts and even flows to the air current of intake pipe 3.
As shown in fig. 4, the end of the furnace tube where the air inlet tube 3 is arranged is usually provided with a tail discharge tube 4, the tail discharge tube 4 is arranged at the bottom of the furnace tube, and the tail discharge tube 4 is arranged parallel to the axis of the furnace tube. The minimum distance between the tail discharge pipe 4 and the axis of the furnace tube is greater than half of the outer diameter of the cylinder 13, so that when the uniform flow cylinder 1 is arranged in the furnace tube, the air flow discharged by the tail discharge pipe 4 does not pass through the ventilating plate 11 as far as possible, and the tail gas does not need to be uniformly flowed.
The pipe diameter of the supporting pipe 23 is related to the outer diameter of the cylinder 13, and the diameter of the supporting pipe 23 plus half of the outer diameter of the cylinder 13 is equal to half of the inner diameter of the furnace pipe, so that when the supporting pipe 23 supports the uniform flow cylinder 1, the center of the air permeable plate 11 can be positioned on the axis of the furnace pipe, and uniform flow is realized.
In the implementation process, the reaction gas input from the gas inlet pipe 3 of the furnace tube firstly passes through the uniform flow cylinder 1 and the uniform flow action of the gas permeable plate 11, so that the reaction gas uniformly flows to the product to be processed in the furnace tube, and the concentration uniformity of the reaction gas in the furnace tube is ensured; through setting up support 2, realize supporting to flow equalizing section of thick bamboo 1 to through the handle 21 of support 2, can conveniently adjust the position that flow equalizing section of thick bamboo 1 was located.
The above description is only one specific example of the present invention and does not constitute any limitation to the present invention. It will be apparent to those skilled in the art that various modifications and variations in form and detail may be made without departing from the principles and structures of the invention without departing from the spirit and scope of the invention, but such modifications and variations are within the purview of the appended claims.

Claims (10)

1. The flow homogenizing plate is characterized by comprising a flow homogenizing cylinder and a support; the flow equalizing cylinder is arranged on the bracket; the even flow cylinder comprises a ventilation plate, and ventilation holes are formed in the ventilation plate.
2. The flow distribution plate of claim 1, wherein the support comprises a handle and a support tube, the handle being disposed at one end of the support tube.
3. The flow distribution plate of claim 2 wherein there are two support tubes, the two support tubes being arranged in parallel.
4. The flow distributing plate of claim 3, wherein the handle is linear, and the two ends of the handle are provided with protruding structures, and the protrusions face the same direction; the protruding structure of handle is connected with the stay tube, and stay tube and handle vertical setting.
5. The flow distribution plate of claim 2, wherein the flow distribution cylinder further comprises a cylinder having a tubular shape, and the gas permeable plate is disposed at one end of the interior of the cylinder.
6. The flow distribution plate of claim 5 wherein the distribution cylinder is mounted to the support frame and the air permeable plate is mounted at an end distal to the handle.
7. The flow distribution plate of claim 6, wherein the support is disposed within the furnace tube, and the handle is disposed at a level higher than a level at which the support tube is disposed.
8. The flow distribution plate according to claim 7, wherein the support is disposed near one end of the gas inlet pipe of the furnace tube; the handle of the bracket faces the air inlet pipe or faces away from the air inlet pipe.
9. The flow distribution plate of claim 8, wherein the diameter of the support tube plus one half of the outer diameter of the cylinder is equal to one half of the inner diameter of the furnace tube.
10. The flow distribution plate of claim 9, wherein the minimum distance between the tail pipe of the furnace tube and the axis of the furnace tube is greater than half of the outer diameter of the cylinder; the diameters of the air holes on the same air permeable plate are consistent.
CN202023316451.6U 2020-12-31 2020-12-31 Flow equalizing plate Active CN214254441U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202023316451.6U CN214254441U (en) 2020-12-31 2020-12-31 Flow equalizing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202023316451.6U CN214254441U (en) 2020-12-31 2020-12-31 Flow equalizing plate

Publications (1)

Publication Number Publication Date
CN214254441U true CN214254441U (en) 2021-09-21

Family

ID=77722998

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202023316451.6U Active CN214254441U (en) 2020-12-31 2020-12-31 Flow equalizing plate

Country Status (1)

Country Link
CN (1) CN214254441U (en)

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Address after: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province

Patentee after: Laplace New Energy Technology Co.,Ltd.

Address before: No.1, Jikang Road, Kengzi street, Pingshan District, Shenzhen City, Guangdong Province

Patentee before: SHENZHEN LAPLACE ENERGY TECHNOLOGY Co.,Ltd.