CN213037871U - Gantry type plasma nano polishing system - Google Patents
Gantry type plasma nano polishing system Download PDFInfo
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- CN213037871U CN213037871U CN202021976193.1U CN202021976193U CN213037871U CN 213037871 U CN213037871 U CN 213037871U CN 202021976193 U CN202021976193 U CN 202021976193U CN 213037871 U CN213037871 U CN 213037871U
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Abstract
The utility model relates to a gantry type plasma nano polishing system; the polishing device comprises a nano ion polishing device, a polishing workpiece conveying device and a portal frame, wherein a movable plate is also arranged above the nano ion polishing device and is connected with the portal frame through a moving mechanism, a hydraulic cylinder is arranged on the lower plate surface of the movable plate, one end of a telescopic rod of the hydraulic cylinder is fixedly connected with a lifting plate, the lower plate of the lifting plate is provided with an extension arm, a polishing workpiece conducting clamp is arranged on the extension arm, and longitudinal guide rods extending downwards are symmetrically arranged at two ends of the movable plate; positioning lap beams are arranged below two ends of the lifting plate, and two ends of each positioning lap beam are fixedly connected with the portal frame respectively; the lifting plate is provided with an inclination sensor, and the positioning lap beam is provided with a weight sensor; the gantry type plasma nano-polishing system can polish workpieces with enlarged loads; in the polishing process, the polishing device does not shake, can ensure the stability of a polishing workpiece, and has good polishing effect and high working efficiency.
Description
Technical Field
The utility model belongs to the technical field of the polishing equipment technique and specifically relates to a planer-type plasma nanometer polishing system is related to.
Background
The plasma nano polishing technology uses a low-concentration salt solution as a working medium, uses clean electric energy as power, and removes burrs on the surface of the metal by utilizing the characteristic that plasma discharge is preferentially produced on the tip convex part. Compared with the traditional polishing method, the technology solves the problem that dust and corrosive waste liquid in a production workshop are discharged to pollute the environment, and simultaneously reduces the equipment cost and simplifies the operation process and the processing procedure.
However, the plasma polishing equipment sold in the market at present has small load, and cannot polish workpieces with large load; in the polishing process, the polishing device is easy to shake, the stability of a polishing workpiece cannot be guaranteed, the polishing effect is poor, and the working efficiency is low.
Therefore, to the above-mentioned problem the utility model discloses urgent need provides a planer-type plasma nanometer polishing system.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a gantry type plasma nano polishing system, which solves the problems that the plasma polishing equipment sold in the market at present has small load and cannot polish workpieces with increased load in the prior art through the design of the gantry type plasma nano polishing system; in the polishing process, the polishing device is easy to shake, the stability of a polishing workpiece cannot be guaranteed, the polishing effect is poor, and the working efficiency is low.
The utility model provides a pair of planer-type plasma nanometer polishing system, including nanometer ion burnishing device and polishing work piece conveyer, nanometer ion burnishing device and polishing work piece conveyer's top is equipped with the portal frame, nanometer ion burnishing device top still is equipped with the movable plate, the movable plate passes through moving mechanism and is connected with the portal frame, can be at nanometer ion burnishing device and polishing work piece conveyer reciprocating motion, the pneumatic cylinder is installed to the lower plate face of movable plate, the telescopic link one end downwardly extending of pneumatic cylinder is connected fixedly with the lifter plate, the lower plate face of lifter plate has laid a plurality of extension arms that extend downwards along length direction interval, install polishing work piece conductive fixture on each extension arm, the movable plate both ends symmetry is equipped with the vertical guide bar of downwardly extending, vertical guide bar bottom passes the lifter plate and downwardly extending; the lower part at lifter plate both ends all is equipped with the location overlap joint roof beam, and two location overlap joint roof beams are located the coplanar, and each location overlap joint roof beam both ends respectively with the portal frame rigid coupling.
The polishing device comprises a lifting plate, a positioning lapping beam, a controller, an inclination sensor, a weight sensor, a moving mechanism, a hydraulic cylinder, a polishing workpiece conductive clamp, a nano ion polishing device and a polishing workpiece conveying device, wherein the inclination sensor and the alarm are arranged on the lifting plate, the positioning lapping beam is provided with the weight sensor, the inclination sensor and the weight sensor are electrically connected with the controller, and the alarm, the moving mechanism, the hydraulic cylinder, the polishing workpiece conductive clamp, the nano ion polishing device and.
Furthermore, the lower plate surface of the lifting plate is provided with lap joint clamping grooves correspondingly clamped with the positioning lap joint beams, and the width of each lap joint clamping groove is larger than that of each positioning lap joint beam.
Furthermore, the portal frame comprises a square frame body horizontally arranged with the nano ion polishing device up and down, and each end corner of the square frame body is provided with a support leg extending downwards.
The moving mechanism comprises two oppositely arranged positioning plates arranged above the square frame body, a screw rod is arranged between the positioning plates, one end of the screw rod is connected with one of the positioning plates through a bearing, the other end of the screw rod penetrates out of the other positioning plate and is connected with a rotating shaft of the motor through the bearing, a nut is sleeved on the screw rod, the moving plate is positioned below the nut, the moving plate and the nut are fixedly connected into a whole, the moving mechanism also comprises positioning rods respectively arranged at two sides of the screw rod, each positioning rod penetrates through the moving plate, and two ends of each positioning rod are fixedly connected with the square frame body respectively; the motor is electrically connected with the controller.
Furthermore, the moving plate and each positioning overlapping beam are made of metal.
Furthermore, the material of the longitudinal guide rod is metal.
Further, the lifting plate is integrally cast and molded.
Furthermore, the portal frame is made of metal.
Furthermore, the bottom of the portal frame is provided with universal wheels.
The utility model provides a pair of planer-type plasma nanometer polishing system compares with prior art and has following progress:
1. the utility model provides a pair of planer-type plasma nanometer polishing system, through including nanometer ion burnishing device and polishing work piece conveyer, nanometer ion burnishing device and polishing work piece conveyer's top are equipped with the portal frame, nanometer ion burnishing device top still is equipped with the movable plate, the movable plate passes through moving mechanism and is connected with the portal frame, can be at nanometer ion burnishing device and polishing work piece conveyer reciprocating motion, the pneumatic cylinder is installed to the lower plate face of movable plate, the telescopic link one end downwardly extending of pneumatic cylinder is connected fixedly with the lifter plate, the lower plate face of lifter plate has laid a plurality of extension arms that extend downwards along length direction interval, install polishing work piece conductive fixture on each extension arm, the movable plate both ends symmetry is equipped with the vertical guide bar of downwardly extending, vertical guide bar bottom passes the lifter plate and downwardly extending; the lower parts of the two ends of the lifting plate are respectively provided with a positioning overlapping beam, the two positioning overlapping beams are positioned on the same plane, the two ends of each positioning overlapping beam are fixedly connected with the portal frame, and the movable plate can move up and down along the longitudinal guide rod in the ascending and descending processes, so that the inclination of the movable plate is avoided, and the stable grabbing, placing and polishing processes are ensured; the positioning overlapping beam is arranged according to the grabbing height and the polishing height of the nano ion polishing device and the polishing workpiece conveying device, the lifting plate is lowered to the position where the lifting plate is grabbed or the polishing height is formed, the lifting plate is connected with the positioning overlapping beam in an overlapping mode, certain support is provided for the lifting plate, the grabbing and polishing process is guaranteed to be stable, workpieces with the weight being more than 40 kilograms can be borne, the polishing effect is guaranteed, and the working efficiency is improved.
2. The utility model provides a pair of planer-type plasma nanometer polishing system through still including the controller, installs in the slope sensor and the alarm of lifter plate, is equipped with weighing transducer on the location overlap joint roof beam, and slope sensor, weighing transducer are connected with the controller electricity, and alarm, moving mechanism, pneumatic cylinder, the electrically conductive anchor clamps of polishing work piece, nanometer ion burnishing device and the design that polishing work piece conveyer all is connected with the controller electricity can realize snatching the work piece automatically and polish the work piece automatically, provides work efficiency.
3. The utility model provides a pair of planer-type plasma nanometer polishing system, the lower facial features through the lifter plate is equipped with the overlap joint draw-in groove that corresponds the joint with each location overlap joint roof beam, and the width of overlap joint draw-in groove is greater than the design of the width of location overlap joint roof beam, guarantees that the lifter plate is received on the location overlap joint roof beam, avoids the lifter plate horizontal float.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural view (perspective view) of a gantry-type plasma nano-polishing system according to the present invention;
FIG. 2 is a block diagram of the electrical connections between the devices of the gantry-type plasma nano-polishing system of the present invention;
fig. 3 is a schematic structural view (front view) of the lifting plate according to the present invention.
Description of reference numerals:
1. a nano-ion polishing device; 12. a polished workpiece transport device; 2. a gantry; 3. moving the plate; 4. a moving mechanism; 5. a hydraulic cylinder; 6. a lifting plate; 7. an extension arm; 8. polishing the conductive fixture of the workpiece; 9. a longitudinal guide bar; 10. positioning the lap beam; 11. lapping the clamping grooves; 41. positioning a plate; 42. a screw; 43. a motor; 44. a nut; 45. positioning a rod; 201. a square frame body; 202. and (7) supporting legs.
Detailed Description
The technical solution of the present invention will be described clearly and completely with reference to the accompanying drawings, and obviously, the described embodiments are some, but not all embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
As shown in fig. 1, the embodiment provides a gantry type plasma nano-polishing system, which comprises a nano-ion polishing apparatus 1 and a polished workpiece conveying apparatus 12, a gantry 2 is arranged above the nano-ion polishing apparatus 1 and the polished workpiece conveying apparatus 12, a moving plate 3 is further arranged above the nano-ion polishing apparatus 1, the moving plate 3 is connected with the gantry 2 through a moving mechanism 4, the polishing device can move back and forth between the nano-ion polishing device 1 and the polishing workpiece conveying device 12, a hydraulic cylinder 5 is installed on the lower plate surface of the moving plate 3, one end of a telescopic rod of the hydraulic cylinder 5 extends downwards to be connected and fixed with the lifting plate 6, a plurality of extending arms 7 extending downwards are arranged on the lower plate surface of the lifting plate 6 at intervals along the length direction, a polishing workpiece conducting clamp 8 is installed on each extending arm 7, longitudinal guide rods 9 extending downwards are symmetrically arranged at two ends of the moving plate 3, and the bottom ends of the longitudinal guide rods 9 penetrate through the lifting plate 6 and extend downwards; the lower part at 6 both ends of lifter plate all is equipped with location overlap joint roof beam 10, and two location overlap joint roof beams 10 are located the coplanar, and each location overlap joint roof beam 10 both ends respectively with portal frame 2 rigid coupling.
The conductive clamp 8 for polishing the workpiece is the existing equipment, and can be pneumatically grasped by a mechanical hand of Jiean MHZ2-32D or other mechanical hands produced by other manufacturers, so that the workpiece to be polished can be automatically grasped, and the specific structure of the conductive clamp 7 for polishing the workpiece is not described again here.
The nano-ion polishing apparatus 1 is disclosed in the patent cn201911376154.x, and is not described herein.
The polishing workpiece transfer device 12 is a horizontal belt conveyor manufactured by baodingwei mechanical equipment manufacturing limited, or another belt conveyor manufactured by another manufacturer, and can be customized according to a required length.
The utility model provides a gantry type plasma nano polishing system, which comprises a nano ion polishing device 1 and a polishing workpiece conveying device 12, wherein a portal frame 2 is arranged above the nano ion polishing device 1 and the polishing workpiece conveying device 12, a movable plate 3 is also arranged above the nano ion polishing device 1, the movable plate 3 is connected with the portal frame 2 through a moving mechanism 4, the polishing device can move back and forth between the nano-ion polishing device 1 and the polishing workpiece conveying device 12, a hydraulic cylinder 5 is installed on the lower plate surface of the moving plate 3, one end of a telescopic rod of the hydraulic cylinder 5 extends downwards to be connected and fixed with the lifting plate 6, a plurality of extending arms 7 extending downwards are arranged on the lower plate surface of the lifting plate 6 at intervals along the length direction, a polishing workpiece conducting clamp 8 is installed on each extending arm 7, longitudinal guide rods 9 extending downwards are symmetrically arranged at two ends of the moving plate 3, and the bottom ends of the longitudinal guide rods 9 penetrate through the lifting plate 6 and extend downwards; the positioning overlapping beams 10 are arranged below two ends of the lifting plate 6, the two positioning overlapping beams 10 are positioned on the same plane, two ends of each positioning overlapping beam 10 are fixedly connected with the portal frame 2, and the movable plate 3 can move up and down along the longitudinal guide rod 9 in the lifting and descending processes, so that the inclination of the movable plate 3 is avoided, and the stable grabbing, placing and polishing processes are ensured; location overlap joint roof beam 10 picks height and polishing height and sets up according to nanometer ion burnishing device 1 and polishing work piece conveyer 12, descends lifter plate 6 to pick or polishing height after for 6 laps of lifter plate are in location overlap joint roof beam 10, give lifter plate 6 certain support, guarantee grabbing with polishing process's firm, can bear the work piece of weight more than 40 kilograms, guarantee polishing effect, improve work efficiency.
As shown in fig. 2, the present embodiment further includes a controller, an inclination sensor and an alarm installed on the lifting plate, a weight sensor is installed on the positioning overlapping beam 10, the inclination sensor and the weight sensor are electrically connected to the controller, and the alarm, the moving mechanism 4, the hydraulic cylinder 5, the conductive fixture 8 for polishing workpiece, the nano ion polishing apparatus 1, and the transmission apparatus 12 for polishing workpiece are electrically connected to the controller.
The utility model discloses a still include the controller, install in the slope sensor and the alarm of lifter plate, be equipped with weighing sensor on the location overlap joint roof beam 10, slope sensor, weighing sensor are connected with the controller electricity, and alarm, moving mechanism 4, pneumatic cylinder 5, the electrically conductive anchor clamps of polishing work piece 8, nanometer ion burnishing device 1 and polishing work piece conveyer 12 all with the design of controller electricity connection, can realize snatching the work piece automatically and polish work piece automatically, improve work efficiency. Specifically, the controller can control the moving mechanism 4 to drive the moving plate 3 to move above the polishing workpiece conveying device 12, then control the hydraulic cylinder 5 to lower the lifting plate 6 to a certain height, control the conductive fixture 8 of the polishing workpiece to grab the workpiece to be polished, after grabbing, the hydraulic cylinder 5 raises the lifting plate 6 to a certain height, move the moving plate 3 to the position above the polishing workpiece conveying device 12 through the moving mechanism 4, the controller controls the hydraulic cylinder 5 to start up, so that the lifting plate 6 descends, when the lifting plate 6 touches the positioning overlapping beam 10, the weight sensor detects the weight, the controller can control the hydraulic cylinder 5 to close, at the moment, the descending height of the lifting plate 6 meets the polishing height, the controller starts the nano ion polishing device 1, the workpiece to be polished is polished, after polishing, the controller can control the hydraulic cylinder 5 to start, and after the lifting plate 6 rises to a certain height, after the moving mechanism 4 is controlled to move the moving plate 3 to the position above the polished workpiece conveying device 12, the hydraulic cylinder 5 is controlled to lower the lifting plate 6 to a certain height, the polished workpiece is placed on the polished workpiece conveying device 12 to convey the next processing device by controlling the polished workpiece conductive clamp 8; when the inclination sensor detects the inclination of the lifting plate 6, the controller controls the alarm of the alarm, the alarm can select the alarm lamp, and after the alarm is found, a worker can immediately adjust the alarm lamp without influencing the polishing of a workpiece.
The controller of the present invention can be a general processor, such as a processor of X86 or ARM system, and especially can be a processor of ARM system such as haisi series, rui-core micro series, etc.
The utility model discloses a weight sensor, the tilt sensor the controller the alarm, its structure and function are publicly known, the utility model discloses aim at protecting the scheme behind the whole electricity of above-mentioned electrical part is connected, above-mentioned electrical part is only the process of accomplishing signal transmission, and does not do the processing on the software to signal itself.
As shown in fig. 3, the lower plate surface of the lifting plate 6 of this embodiment is provided with lap joint slots 11 correspondingly engaged with the positioning lap beams 10, and the width of the lap joint slots 11 is greater than that of the positioning lap beams 10.
The utility model discloses a hypoplastron face of lifter plate 6 is equipped with the overlap joint draw-in groove 11 that corresponds the joint with each location overlap joint roof beam 10, and the width of overlap joint draw-in groove 11 is greater than the design of the width of location overlap joint roof beam 10, guarantees that 6 joints of lifter plate avoid lifter plate 6 horizontal drunkenness on to location overlap joint roof beam 10.
As shown in fig. 1, the gantry 2 of the present embodiment includes a square frame 201 disposed horizontally to the upper and lower sides of the nano-ion polishing apparatus 1, and each end corner of the square frame 201 is provided with a leg 202 extending downward.
The utility model discloses a portal frame 2 include with the square frame body 201 of the upper and lower level setting of nanometer ion burnishing device 1, each end angle of square frame body 201 is equipped with downwardly extending's landing leg 202's design, makes things convenient for moving mechanism 4's installation fixed, guarantees the height of movable plate 3 and lifter plate 6 to guarantee removal and the polishing to polishing piece.
As shown in fig. 1, the moving mechanism 4 of this embodiment includes two opposite positioning plates 41 disposed above the square frame 201, a screw 42 is disposed between the positioning plates 41, one end of the screw 42 is connected to one of the positioning plates 41 through a bearing, and the other end of the screw passes through the other positioning plate 41 and is connected to a rotating shaft of the motor 43 through a bearing, the screw 42 is sleeved with a nut 44, the moving plate 3 is disposed below the nut 44, the moving plate 3 is fixedly connected to the nut 44, the moving plate 3 further includes positioning rods 45 respectively disposed at two sides of the screw 42, each positioning rod 45 is mounted on the moving plate 3 in a penetrating manner, and two ends of each positioning rod 45 are respectively fixedly connected to the square frame; the motor 43 is electrically connected to the controller.
The utility model discloses a moving mechanism 4 is including locating the double-phase locating plate 41 that sets up relatively of square frame 201 top, be equipped with screw rod 42 between locating plate 41, bearing and one of them locating plate 41 are passed through to screw rod 42 one end, the other end is from another locating plate 41, wear out to be connected through the pivot of bearing and motor 43, cup jointed on the screw rod 42 with nut 44, movable plate 3 is located nut 44 below, movable plate 3 and nut 44 fixed connection in an organic whole, still locate the locating lever 45 of screw rod 42 both sides including dividing, each locating lever 45 wears to adorn on movable plate 3, each locating lever 45 both ends respectively with square frame 201 rigid coupling, the design that motor 43 and controller electricity are connected, realize the lateral shifting of movable plate 3.
The utility model discloses a movable plate 3 and the material of each location overlap joint roof beam 10 are the metal, guarantee movable plate 3 and the rigidity of each location overlap joint roof beam 10 to can guarantee the bearing to the work piece.
The utility model discloses the material of vertical guide bar 9 is the metal.
The utility model discloses lifter plate 6 integrated into one piece.
The utility model discloses the material of portal frame 2 is the metal.
The utility model discloses 2 bottoms of portal frame are equipped with the universal wheel, and the convenient removal, the universal wheel is for having weighing transducer's universal wheel, after bearing certain weight, can the automatic locking.
The working process of the gantry type plasma nano-polishing system,
firstly, the controller controls the moving mechanism 4 to drive the moving plate 3 to move above the polishing workpiece conveying device 12, then controls the hydraulic cylinder 5 to lower the lifting plate 6 to a certain height, controls the polishing workpiece conductive clamp 8 to grab a workpiece to be polished, after grabbing, the hydraulic cylinder 5 raises the lifting plate 6 to a certain height, and moves the moving plate 3 to the position above the polishing workpiece conveying device 12 through the moving mechanism 4, the controller controls the hydraulic cylinder 5 to start up, so that the lifting plate 6 descends, when the lifting plate 6 touches the positioning overlapping beam 10, the weight sensor can detect the weight, the controller can control the hydraulic cylinder 5 to close, at the moment, the descending height of the lifting plate 6 meets the polishing height, and the controller starts the nano ion polishing device 1 to polish the workpiece to be polished.
And thirdly, after the polishing of the workpiece is finished, the controller controls the hydraulic cylinder 5 to be started, the lifting plate 6 is lifted to a certain height, the moving plate 3 is moved to the position above the polished workpiece conveying device 12 by controlling the moving mechanism 4, and after the lifting plate 6 is lowered to a certain height by controlling the hydraulic cylinder 5, the polished workpiece is placed on the polished workpiece conveying device 12 to convey the next processing device by controlling the polished workpiece conductive clamp 8.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention.
Claims (10)
1. A planer-type plasma nanometer polishing system which characterized in that: the polishing device comprises a nano ion polishing device (1) and a polishing workpiece conveying device (12), a portal frame (2) is arranged above the nano ion polishing device (1) and the polishing workpiece conveying device (12), a movable plate (3) is further arranged above the nano ion polishing device (1), the movable plate (3) is connected with the portal frame (2) through a moving mechanism (4) and can move back and forth between the nano ion polishing device (1) and the polishing workpiece conveying device (12), a hydraulic cylinder (5) is arranged on the lower plate surface of the movable plate (3), one end of a telescopic rod of the hydraulic cylinder (5) extends downwards and is fixedly connected with a lifting plate (6), a plurality of extending arms (7) extending downwards are arranged on the lower plate surface of the lifting plate (6) at intervals along the length direction, a polishing workpiece conductive clamp (8) is arranged on each extending arm (7), longitudinal guide rods (9) extending downwards are symmetrically arranged at two ends of the movable plate (3), the bottom end of the longitudinal guide rod (9) penetrates through the lifting plate (6) and extends downwards; the lower parts of the two ends of the lifting plate (6) are respectively provided with a positioning overlapping beam (10), the two positioning overlapping beams (10) are positioned on the same plane, and the two ends of each positioning overlapping beam (10) are respectively fixedly connected with the portal frame (2).
2. The gantry-type plasma nano-polishing system of claim 1, wherein: the polishing device is characterized by further comprising a controller, an inclination sensor and an alarm which are installed on the lifting plate, wherein a weight sensor is arranged on the positioning overlapping beam (10), the inclination sensor and the weight sensor are electrically connected with the controller, and the alarm, the moving mechanism (4), the hydraulic cylinder (5), the polishing workpiece conductive clamp (8), the nano ion polishing device (1) and the polishing workpiece conveying device (12) are electrically connected with the controller.
3. The gantry-type plasma nano-polishing system of claim 2, wherein: the lower plate surface of the lifting plate (6) is provided with lap joint clamping grooves (11) correspondingly clamped with the positioning lap joint beams (10), and the width of each lap joint clamping groove (11) is larger than that of each positioning lap joint beam (10).
4. The gantry-type plasma nano-polishing system of claim 3, wherein: the portal frame (2) comprises a square frame body (201) which is horizontally arranged with the upper part and the lower part of the nano ion polishing device (1), and each end angle of the square frame body (201) is provided with a support leg (202) which extends downwards.
5. The gantry-type plasma nano-polishing system of claim 4, wherein: the moving mechanism (4) comprises two oppositely arranged positioning plates (41) arranged above the square frame body (201), a screw rod (42) is arranged between the positioning plates (41), one end of the screw rod (42) is connected with one of the positioning plates (41) through a bearing, the other end of the screw rod (42) penetrates out of the other positioning plate (41) and is connected with a rotating shaft of a motor (43) through a bearing, the screw rod (42) is sleeved with a nut (44), the moving plate (3) is positioned below the nut (44), the moving plate (3) is fixedly connected with the nut (44) into a whole, the moving mechanism further comprises positioning rods (45) respectively arranged on two sides of the screw rod (42), each positioning rod (45) penetrates through the moving plate (3), and two ends of each positioning rod (45) are fixedly connected with; the motor (43) is electrically connected with the controller.
6. The gantry-type plasma nano-polishing system of claim 5, wherein: the moving plate (3) and each positioning overlapping beam (10) are made of metal.
7. The gantry-type plasma nano-polishing system of claim 6, wherein: the material of the longitudinal guide rod (9) is metal.
8. The gantry-type plasma nano-polishing system of claim 7, wherein: the lifting plate (6) is integrally cast and formed.
9. The gantry-type plasma nano-polishing system of claim 8, wherein: the portal frame (2) is made of metal.
10. The gantry-type plasma nano-polishing system of claim 9, wherein: the bottom of the portal frame (2) is provided with universal wheels.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021976193.1U CN213037871U (en) | 2020-09-10 | 2020-09-10 | Gantry type plasma nano polishing system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021976193.1U CN213037871U (en) | 2020-09-10 | 2020-09-10 | Gantry type plasma nano polishing system |
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| CN213037871U true CN213037871U (en) | 2021-04-23 |
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| CN202021976193.1U Active CN213037871U (en) | 2020-09-10 | 2020-09-10 | Gantry type plasma nano polishing system |
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