CN212955331U - Substrate evaporation bearing disc and vacuum evaporation instrument - Google Patents
Substrate evaporation bearing disc and vacuum evaporation instrument Download PDFInfo
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- CN212955331U CN212955331U CN202021825837.7U CN202021825837U CN212955331U CN 212955331 U CN212955331 U CN 212955331U CN 202021825837 U CN202021825837 U CN 202021825837U CN 212955331 U CN212955331 U CN 212955331U
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Abstract
The utility model relates to the technical field of machinery, a substrate coating by vaporization bears dish and vacuum evaporation appearance is specifically disclosed. The utility model provides a substrate evaporation bears substrate baffle and substrate dish in the dish and mask dish stack and set up, the occupation space of substrate baffle has been saved to the at utmost, the substrate baffle sets up in mask dish below and whether shelters from the evaporation coating figure through rotatory switching, make the action range of substrate baffle reduce, before rotatory substrate baffle, separate mask dish and substrate baffle earlier, be favorable to the quick rotatory substrate baffle, and then the action that has reduced the substrate baffle is to the gaseous disturbance of evaporation coating, thereby the influence that the action that has reduced the substrate baffle read crystal oscillator probe speed, the precision of rete thickness when having improved vacuum coating.
Description
Technical Field
The utility model relates to the technical field of machinery, especially, relate to a substrate coating by vaporization bears dish and vacuum evaporation appearance.
Background
The vacuum thermal evaporation coating technology is widely applied to the manufacturing of flat panel displays such as organic light emitting display screens, and the technology is also widely applied to the industrialization of corresponding thin film devices. The basic principle is that the raw material to be formed into the film is heated and evaporated by a heating means, the raw material is changed into a gas phase from condensation phase, molecules or atoms of the raw material are gasified and escaped from the surface to form a steam flow, the steam flow is incident to the surface of a base plate (substrate), and finally the evaporated molecules or atoms are deposited on the base plate (substrate) and condensed to form a solid film.
In the organic light emitting display device, an organic light emitting layer emitting visible light and an organic layer adjacent to the organic light emitting layer are formed by using various methods. Especially, the vacuum deposition method is frequently used due to its simple process. In the vacuum deposition method, a deposition material in a powder or solid state is filled into a furnace, and a deposition film is formed on a desired region by heating the furnace.
At present, a substrate disc is required to bear a substrate during vacuum coating, a substrate baffle plate is used for effectively shielding the substrate which does not work to ensure that the substrate is not polluted, and an accurate film layer is obtained to prepare a semiconductor device with a multilayer film. Among the prior art, the substrate baffle is mostly the metal or alloy baffle through the screw fixation substrate dish lower surface, through the flexible shaft coupling that drives of cylinder and guiding axle come control substrate baffle open and closed, but the screw is not hard up behind the switch that relapse many times, the substrate baffle very easily takes place the skew can not effectually shelter from the substrate, simultaneously when carrying out the device coating by vaporization of large tracts of land, great substrate will require bigger substrate dish and bigger substrate baffle, consequently can occupy bigger cavity space, when carrying out the coating by vaporization, the speed reading that the speed of crystal oscillator probe can be influenced to the fast switch of substrate baffle, can have very big influence to the regulation and control of speed under automatic control (PID control), cause great speed fluctuation, lead to the rete thickness deviation, the device performance reduces.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a substrate coating by vaporization bears dish and vacuum evaporation appearance, has reduced the switching range of substrate baffle, has reduced the influence that the substrate baffle read crystal oscillator probe speed when rotatory switching, has improved the precision of coating film thickness.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides a substrate coating by vaporization bears dish, includes stack in proper order and coaxial substrate dish, mask dish and the substrate baffle that sets up, be equipped with a plurality of bearing parts that are used for placing the substrate on the substrate dish, be equipped with the coating by vaporization figure on the mask dish, the substrate dish with the mask dish is connected with the hoisting unit, the hoisting unit is used for making the substrate dish with the separation of mask dish is in order to rotate the switching of mask dish the coating by vaporization figure or make the mask dish with the separation of substrate baffle is in order to rotate the substrate baffle switches right the state of sheltering from of coating by vaporization figure.
Preferably, one of the substrate disc and the mask disc is provided with a first positioning pin, and the other one of the substrate disc and the mask disc is provided with a first positioning groove, wherein the first positioning pin can be inserted into the first positioning groove;
one of the mask disc and the substrate baffle is provided with a second positioning pin, the other one is provided with a second positioning groove, and the second positioning pin can be inserted into the second positioning groove.
Preferably, the lifting unit includes:
a lift drive assembly;
one end of the first lifting cylinder is connected with the surface of the substrate disc, the other end of the first lifting cylinder is connected with the lifting driving assembly, the first lifting cylinder is coaxial with the substrate disc, and the lifting driving assembly drives the first lifting cylinder to lift;
one end of the second lifting cylinder penetrates through the first lifting cylinder and the substrate disc and is connected with the surface of the mask disc, the other end of the second lifting cylinder is higher than the first lifting cylinder, and a baffle is arranged at the end of the second lifting cylinder.
Preferably, the lift drive assembly comprises:
the axial direction of the lifting rod is the same as the lifting direction of the substrate disc;
one end of the lifting frame is connected with the first lifting cylinder, and the other end of the lifting frame is vertically connected with one end of the lifting rod;
the driver is connected with the other end of the lifting rod and drives the lifting rod to lift.
Preferably, the driver includes:
a lifting drive motor;
one end of the screw rod is connected with the output end of the lifting driving motor;
the screw is arranged on the screw rod, and the other end of the lifting rod is connected with the screw.
Preferably, promote drive assembly still include the first mounting panel of vertical setting and with the perpendicular second mounting panel of connecting of first mounting panel, the driver install in on the first mounting panel, the other end of lift bar is worn to establish the second mounting panel is connected with the third mounting panel, the third mounting panel with the driver is connected, the third mounting panel with between the second mounting panel the cover is equipped with the elasticity bellows on the lift bar, just the both ends of elasticity bellows respectively with the second mounting panel with third mounting panel sealing connection.
Preferably, the substrate baffle plate is provided with a rotary driving assembly for driving the substrate baffle plate to rotate, and the output end of the rotary driving assembly is connected with the substrate baffle plate.
Preferably, the rotation driving assembly comprises a rotation driving motor and a rotating shaft, an output end of the rotation driving motor is connected with one end of the rotating shaft, and the other end of the rotating shaft penetrates through the centers of the substrate disc and the mask disc in sequence and is connected with the center of the substrate baffle.
Preferably, the substrate baffle plate is provided with a vapor deposition hole.
A vacuum evaporation instrument comprises the substrate evaporation bearing disc.
The utility model has the advantages that: the substrate baffle is arranged in an overlapping mode with the substrate disc and the mask disc, the occupied space of the substrate baffle is saved to the greatest extent, the substrate baffle is arranged below the mask disc and can be used for shielding evaporation patterns through rotary switching, the action range of the substrate baffle is reduced, the mask disc is separated from the substrate baffle before the substrate baffle is rotated, the substrate baffle can be rotated quickly, the disturbance of the action of the substrate baffle on evaporation gas is reduced, the influence of the action of the substrate baffle on the reading of the speed of a crystal oscillator probe is reduced, and the precision of the film thickness during vacuum coating is improved.
Drawings
Fig. 1 is a schematic view of an overall structure of a substrate evaporation loading tray according to an embodiment of the present invention;
fig. 2 is an exploded view of a substrate evaporation loading tray according to an embodiment of the present invention;
fig. 3 is an exploded schematic view of a lifting unit according to an embodiment of the present invention.
In the figure:
1. a substrate tray; 11. a bearing part; 12. a first positioning pin;
2. a mask disk; 21. evaporating and plating patterns; 22. a first positioning groove; 23. a second positioning groove;
3. a substrate baffle; 31. evaporating and plating holes; 32. a second positioning pin;
4. a lifting unit; 41. a lift drive assembly; 411. a lifting bar; 412. a hoisting frame; 413. a driver; 4131. a lifting drive motor; 4132. a screw rod; 4133. a nut; 42. a first lift cylinder; 43. a second lift cylinder; 431. a baffle plate; 44. a first mounting plate; 45. a second mounting plate; 46. a third mounting plate; 47. an elastic bellows;
5. a rotary drive assembly; 51. a rotary drive motor; 52. a rotating shaft.
Detailed Description
In order to make the technical problem solved by the present invention, the technical solutions adopted by the present invention and the technical effects achieved by the present invention clearer, the following will be described in further detail with reference to the accompanying drawings, and obviously, the described embodiments are only some embodiments of the present invention, but not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by the skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, detachably connected, or integral to one another; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
As shown in fig. 1-3, the present embodiment provides a substrate evaporation coating bearing disc, which includes a substrate disc 1, a mask disc 2, and a substrate baffle 3 that are sequentially stacked and coaxially disposed, a plurality of bearing portions 11 for placing substrates are disposed on the substrate disc 1, an evaporation coating pattern 21 is disposed on the mask disc 2, the substrate disc 1 and the mask disc 2 are connected to a lifting unit 4, and the lifting unit 4 is configured to separate the substrate disc 1 from the mask disc 2 to switch the evaporation coating pattern 21 by rotating the mask disc 2, or separate the mask disc 2 from the substrate baffle 3 to switch a shielding state of the evaporation coating pattern 21 by rotating the substrate baffle 3. In this embodiment, the substrate baffle 3, the substrate disc 1 and the mask disc 2 are stacked, the occupied space of the substrate baffle 3 is saved to the greatest extent, the substrate baffle 3 is arranged below the mask disc 2 and is switched to shield the evaporation pattern 21 through rotation, the action range of the substrate baffle 3 is reduced, before the substrate baffle 3 is rotated, the mask disc 2 is separated from the substrate baffle 3, it is ensured that the switch action of the substrate baffle 3 cannot affect the positions of the mask disc 2 and the substrate disc 1, meanwhile, the substrate baffle 3 is arranged below the mask disc 2, the probe position is kept away from the substrate baffle 3, and then the disturbance of the action of the substrate baffle 3 on evaporation gas is reduced, thereby the influence of the action of the substrate baffle 3 on the reading of the crystal oscillator probe speed is reduced, and the precision of the film thickness during vacuum coating is improved.
The substrate disc 1, the mask disc 2 and the substrate baffle 3 are all circular discs, so that the occupied space is saved to the greatest extent, the action amplitude of the substrate baffle 3 is further reduced, the flow quantity of airflow caused by the action of the substrate baffle 3 is reduced, and the influence of the action of the substrate baffle 3 on the speed reading of the crystal oscillator probe is reduced.
In this embodiment, one of the substrate tray 1 and the mask tray 2 is provided with a first positioning pin 12, and the other is provided with a first positioning slot 22, and the first positioning pin 12 can be inserted into the first positioning slot 22 to fix the relative positions of the substrate tray 1 and the mask tray 2 so that the substrate tray 1 and the mask tray 2 cannot rotate relatively. Specifically, the edge of the surface of the substrate tray 1 is provided with a plurality of first positioning pins 12, and the mask tray 2 is provided with first positioning grooves 22 corresponding to the first positioning pins 12.
One of the mask disc 2 and the substrate baffle 3 is provided with a second positioning pin 32, the other one is provided with a second positioning groove 23, the second positioning pin 32 can be inserted into the second positioning groove 23 to fix the relative positions of the mask disc 2 and the substrate baffle 3, so that the mask disc 2 and the substrate baffle 3 cannot rotate relatively, and the position of the substrate baffle 3 is ensured to be consistent when the substrate baffle is used each time. Specifically, the middle portion of the substrate shutter 3 is provided with a plurality of second positioning pins 32 around the center of the substrate shutter 3, and the mask tray 2 is provided with second positioning grooves 23 corresponding to the second positioning pins 32.
In this embodiment, the substrate baffle 3 is provided with a vapor deposition hole 31, so that vapor deposition of a substrate can be completed at the same time. The substrate shutter 3 may be provided with a plurality of evaporation holes 31, but the number of the evaporation holes 31 is smaller than the number of the carrying portions 11 of the substrate tray 1, so as to selectively switch the evaporation patterns 21.
In this embodiment, the lifting unit 4 includes a lifting driving assembly 41, a first lifting cylinder 42 and a second lifting cylinder 43, one end of the first lifting cylinder 42 is connected to the surface of the substrate tray 1, the other end is connected to the lifting driving assembly 41, the first lifting cylinder 42 is coaxial with the substrate tray 1, and the lifting driving assembly 41 drives the first lifting cylinder 42 to lift. The through-hole has been seted up at the center of substrate dish 1, and the through-hole at first lift section of thick bamboo 42 and substrate dish 1 center is worn to establish by the one end of second lift section of thick bamboo 43 is connected with the surface of mask dish 2, and the other end is higher than the setting of first lift section of thick bamboo 42 (the difference in height is greater than the height of second locating pin 32), and the tip is equipped with baffle 431, and second lift section of thick bamboo 43 can be for first lift section of thick bamboo 42 free rotation. When the lift driving unit 41 drives the first lift cylinder 42 to move up, the substrate tray 1 moves up along with the first lift cylinder 42, the first positioning pins 12 are disengaged from the first positioning grooves 22, the mask tray 2 can be rotated to switch the deposition patterns 21, and the substrate shutter 3 also rotates along with the mask tray 2 when the mask tray 2 rotates. The first lifting cylinder 42 is further lifted upwards, the top end of the first lifting cylinder 42 contacts with the surface of the baffle 431 on the second lifting cylinder 43, and along with the lifting of the first lifting cylinder 42, the second lifting cylinder 43 is lifted therewith, so as to drive the mask disc 2 to lift, the second positioning pin 32 on the substrate baffle 3 is separated from the second positioning slot 23 on the mask disc 2, and at this time, the substrate baffle 3 can be rotated to switch whether to shield the evaporation pattern 21.
After the position of the substrate baffle 3 is adjusted, the mask disc 2 and the substrate disc 1 can fall down in sequence, the first positioning pin 12 is embedded into the first positioning groove 22, and the second positioning pin 32 is embedded into the second positioning groove 23, so that the uniformity of the thickness of the vapor deposition film is improved.
Further, the lift driving assembly 41 includes a lift lever 411, a lift frame 412 and a driver 413, the axial direction of the lift lever 411 is the same as the lifting direction of the substrate disk 1, one end of the lift frame 412 is connected to the first lift cylinder 42, the other end is vertically connected to one end of the lift lever 411, the other end of the lift lever 411 is connected to the driver 413, and the driver 413 drives the lift lever 411 to lift, which is simple in structure and easy to implement.
Promote drive assembly 41 and still include the first mounting panel 44 of vertical setting and the second mounting panel 45 of being connected perpendicularly with first mounting panel 44, driver 413 is installed on first mounting panel 44, the other end of lift bar 411 wears to establish second mounting panel 45 and is connected with third mounting panel 46, third mounting panel 46 is connected with driver 413, the elastic bellows 47 is equipped with to the cover on the lift bar 411 between third mounting panel 46 and the second mounting panel 45, and the both ends of elastic bellows 47 respectively with second mounting panel 45 and third mounting panel 46 sealing connection. When the driver 413 drives the lifting rod 411 to ascend or descend, the elastic bellows 47 is compressed or stretched, and the elastic bellows 47 is arranged to enable the lifting rod 411 to stably operate in a vacuum environment.
In this embodiment, the driver 413 includes a lifting driving motor 4131, a screw 4132, and a nut 4133, one end of the screw 4132 is connected to an output end of the lifting driving motor 4131, the nut 4133 is disposed on the screw 4132, the other end of the lifting rod 411 is connected to the nut 4133, and specifically, the third mounting plate 46 is connected to the nut 4133. The driver 413 has a simple structure and good operation stability. The two ends of the screw 4132 are also provided with guide rails, and the screw 4133 is connected with the guide rails, so that the running stability of the driver 413 is further improved. In other embodiments, the actuator 413 may also be an air cylinder, and a piston rod of the air cylinder is connected to the third mounting plate 46 to drive the lifting rod 411 to ascend and descend.
The substrate evaporation bearing disc also comprises a rotary driving assembly 5 for driving the substrate baffle 3 to rotate, and the output end of the rotary driving assembly 5 is connected with the substrate baffle 3 so as to realize the automatic adjustment of the positions of the mask disc 2 and the substrate baffle 3.
In this embodiment, the rotation driving assembly 5 includes a rotation driving motor 51 and a rotation shaft 52, an output end of the rotation driving motor 51 is connected to one end of the rotation shaft 52, and the other end of the rotation shaft 52 sequentially penetrates through centers of the substrate tray 1 and the mask tray 2 to be connected to a center of the substrate baffle 3. The rotary driving component 5 has simple structure, can directly drive the substrate baffle 3 to rotate, and is easy to implement.
The embodiment also provides a vacuum evaporation instrument which comprises the substrate evaporation bearing disc. This vacuum evaporation appearance can rotate substrate baffle 3 fast, ensures that the switch action of substrate baffle 3 can not influence the position of mask dish 2 and substrate dish 1, sets up substrate baffle 3 simultaneously and makes substrate baffle 3 keep away from the probe position in mask dish 2 below, and then has reduced the action of substrate baffle 3 and to the gaseous disturbance of coating by vaporization to the action of having reduced substrate baffle 3 to the influence that crystal oscillator probe speed read, the precision of rete thickness when having improved vacuum coating.
It is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (10)
1. The utility model provides a substrate evaporation bears dish, its characterized in that, includes substrate dish (1), mask dish (2) and substrate baffle (3) that superpose in proper order and coaxial setting, be equipped with a plurality of bearing parts (11) that are used for placing the substrate on substrate dish (1), be equipped with evaporation coating figure (21) on mask dish (2), substrate dish (1) with mask dish (2) are connected with hoisting unit (4), hoisting unit (4) are used for making substrate dish (1) with mask dish (2) separation is in order to rotate mask dish (2) switch evaporation coating figure (21) or make mask dish (2) with substrate baffle (3) separation is in order to rotate substrate baffle (3) switch to the state of sheltering from of evaporation coating figure (21).
2. The substrate vapor deposition carrier plate according to claim 1, wherein one of the substrate plate (1) and the mask plate (2) is provided with a first positioning pin (12), and the other one is provided with a first positioning groove (22), and the first positioning pin (12) can be inserted into the first positioning groove (22);
one of the mask disc (2) and the substrate baffle (3) is provided with a second positioning pin (32), the other one is provided with a second positioning groove (23), and the second positioning pin (32) can be inserted into the second positioning groove (23).
3. Substrate vapor deposition carrier tray according to claim 2, characterized in that the lifting unit (4) comprises:
a lift drive assembly (41);
a first lifting cylinder (42), wherein one end of the first lifting cylinder (42) is connected with the surface of the substrate disc (1), the other end of the first lifting cylinder is connected with the lifting driving component (41), the first lifting cylinder (42) is coaxial with the substrate disc (1), and the lifting driving component (41) drives the first lifting cylinder (42) to lift;
one end of the second lifting cylinder (43) penetrates through the first lifting cylinder (42) and the substrate disc (1) to be connected with the surface of the mask disc (2), the other end of the second lifting cylinder is higher than the first lifting cylinder (42), and a baffle (431) is arranged at the end of the second lifting cylinder.
4. A substrate evaporation carrier tray according to claim 3, wherein the lifting drive assembly (41) comprises:
a lifting rod (411), wherein the axial direction of the lifting rod (411) is the same as the lifting direction of the substrate disc (1);
a lifting frame (412), one end of the lifting frame (412) is connected with the first lifting cylinder (42), and the other end is vertically connected with one end of the lifting rod (411);
the driver (413), the driver (413) is connected with the other end of the lifting rod (411), and the driver (413) drives the lifting rod (411) to lift.
5. Substrate vapor deposition carrier disk according to claim 4, characterized in that the driver (413) comprises:
a lift drive motor (4131);
the screw rod (4132), one end of said screw rod (4132) is connected with the output end of said lifting driving motor (4131);
and a nut (4133) provided on the screw (4132), and the other end of the lift lever (411) is connected to the nut (4133).
6. A substrate vapor deposition carrier tray according to claim 4, wherein the lifting drive assembly (41) further comprises a vertically arranged first mounting plate (44) and a second mounting plate (45) vertically connected to the first mounting plate (44), the actuator (413) is mounted on the first mounting plate (44), the other end of the lifting rod (411) penetrates through the second mounting plate (45) and is connected to a third mounting plate (46), the third mounting plate (46) is connected to the actuator (413), an elastic bellows (47) is sleeved on the lifting rod (411) between the third mounting plate (46) and the second mounting plate (45), and two ends of the elastic bellows (47) are respectively connected to the second mounting plate (45) and the third mounting plate (46) in a sealing manner.
7. The substrate vapor deposition carrier plate according to claim 1, further comprising a rotary driving assembly (5) for driving the substrate baffle (3) to rotate, wherein an output end of the rotary driving assembly (5) is connected with the substrate baffle (3).
8. The substrate vapor deposition carrier plate according to claim 7, wherein the rotary driving assembly (5) comprises a rotary driving motor (51) and a rotating shaft (52), an output end of the rotary driving motor (51) is connected with one end of the rotating shaft (52), and the other end of the rotating shaft (52) is sequentially inserted through centers of the substrate plate (1) and the mask plate (2) and connected with a center of the substrate baffle (3).
9. The substrate vapor deposition carrier plate according to claim 1, wherein the substrate baffle plate (3) is provided with a vapor deposition hole (31).
10. A vacuum evaporation apparatus, comprising the substrate evaporation carrier tray according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021825837.7U CN212955331U (en) | 2020-08-27 | 2020-08-27 | Substrate evaporation bearing disc and vacuum evaporation instrument |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021825837.7U CN212955331U (en) | 2020-08-27 | 2020-08-27 | Substrate evaporation bearing disc and vacuum evaporation instrument |
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| CN212955331U true CN212955331U (en) | 2021-04-13 |
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| CN202021825837.7U Active CN212955331U (en) | 2020-08-27 | 2020-08-27 | Substrate evaporation bearing disc and vacuum evaporation instrument |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114752885A (en) * | 2022-04-06 | 2022-07-15 | 重庆臻宝实业有限公司 | Texture baffle capable of reducing stress residue of semiconductor coating film |
-
2020
- 2020-08-27 CN CN202021825837.7U patent/CN212955331U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114752885A (en) * | 2022-04-06 | 2022-07-15 | 重庆臻宝实业有限公司 | Texture baffle capable of reducing stress residue of semiconductor coating film |
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