CN212681966U - 一种双抛机载具清洗用固定装置 - Google Patents
一种双抛机载具清洗用固定装置 Download PDFInfo
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- CN212681966U CN212681966U CN202020969094.4U CN202020969094U CN212681966U CN 212681966 U CN212681966 U CN 212681966U CN 202020969094 U CN202020969094 U CN 202020969094U CN 212681966 U CN212681966 U CN 212681966U
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- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 239000000969 carrier Substances 0.000 claims abstract description 23
- 238000005406 washing Methods 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 2
- 230000006978 adaptation Effects 0.000 abstract 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 31
- 229910003460 diamond Inorganic materials 0.000 description 9
- 239000010432 diamond Substances 0.000 description 9
- 238000005498 polishing Methods 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- QNRATNLHPGXHMA-XZHTYLCXSA-N (r)-(6-ethoxyquinolin-4-yl)-[(2s,4s,5r)-5-ethyl-1-azabicyclo[2.2.2]octan-2-yl]methanol;hydrochloride Chemical compound Cl.C([C@H]([C@H](C1)CC)C2)CN1[C@@H]2[C@H](O)C1=CC=NC2=CC=C(OCC)C=C21 QNRATNLHPGXHMA-XZHTYLCXSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000012050 conventional carrier Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 244000017160 saligot Species 0.000 description 1
- 235000009165 saligot Nutrition 0.000 description 1
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Application Number | Priority Date | Filing Date | Title |
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CN202020969094.4U CN212681966U (zh) | 2020-06-01 | 2020-06-01 | 一种双抛机载具清洗用固定装置 |
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CN202020969094.4U CN212681966U (zh) | 2020-06-01 | 2020-06-01 | 一种双抛机载具清洗用固定装置 |
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CN212681966U true CN212681966U (zh) | 2021-03-12 |
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CN202020969094.4U Active CN212681966U (zh) | 2020-06-01 | 2020-06-01 | 一种双抛机载具清洗用固定装置 |
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CN (1) | CN212681966U (zh) |
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Address after: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Area (outside the ring) Hai Tai Road 12 inside. Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region after: China Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Address before: No.12 Haitai East Road, Huayuan Industrial Zone, Binhai New Area, Tianjin Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region before: China Patentee before: Zhonghuan leading semiconductor materials Co.,Ltd. |