CN211412984U - Full-automatic ultrasonic cleaning machine for semiconductor products - Google Patents
Full-automatic ultrasonic cleaning machine for semiconductor products Download PDFInfo
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- CN211412984U CN211412984U CN201922101898.2U CN201922101898U CN211412984U CN 211412984 U CN211412984 U CN 211412984U CN 201922101898 U CN201922101898 U CN 201922101898U CN 211412984 U CN211412984 U CN 211412984U
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Abstract
The utility model relates to a full-automatic ultrasonic cleaner of semiconductor product. The cleaning machine comprises a rack, wherein a manipulator lifting mechanism, a manipulator translation mechanism, a plurality of material lifting manipulators, a plurality of cleaning tanks and a cleaning agent cooling system are arranged on the rack. The manipulator lifting mechanism is used for driving the manipulator translation mechanism and the plurality of material lifting manipulators to lift. The manipulator translation mechanism is used for driving the plurality of material lifting manipulators to move horizontally. The material lifting manipulators are sequentially arranged on the manipulator translation mechanism and are used for hooking the cleaning basket in the cleaning tank and driving the cleaning basket to translate or lift. A plurality of washing tanks are located the below of carrying material manipulator, are equipped with ultrasonic oscillator on the outer wall of the bottom of washing tank. The utility model discloses a plurality of material lifting manipulators can synchronous translation and lift to can carry out material, blowing, move the material operation to a plurality of cleaning baskets in step, thereby promote holistic cleaning efficiency.
Description
Technical Field
The utility model relates to a semiconductor cleaning machine equipment field, in particular to full-automatic ultrasonic cleaning machine of semiconductor product.
Background
The semiconductor packaging field adopts sintering process more, and sintering process can use a solder paste to bond chip, wire jumper and frame, and in high temperature welding process, the solder paste can produce a large amount of residues, and the residue has serious hidden danger to the product electrical property after the encapsulation, consequently, the residue sanitization in the welding process has decisive key effect to the electrical property of semiconductor product.
The traditional cleaning process is to remove the residues on the surface of the chip by adopting single-groove or multi-groove ultrasonic cleaning, and the cleaning process is approximately as follows: the product is manually placed into an ultrasonic cleaning tank for cleaning, the cleaning current and time are adjusted, and after the cleaning is finished, the product is manually lifted. The above cleaning process has the following problems:
the first problem is that: the process is tedious, wastes a large amount of manpower and efficiency is slow.
The second problem is that: because the cleaning solvent is easy to volatilize, a large amount of cleaning solvent is easy to volatilize in the cleaning process, and the cleaning cost is increased.
The third problem is that: the cleaning cleanliness is not sufficient.
The fourth problem is that: because the cleaning agent is an organic solvent, potential safety hazards exist in manual feeding and cleaning.
SUMMERY OF THE UTILITY MODEL
The utility model aims to overcome above-mentioned prior art have the cleaning efficiency low, not enough, and provide a simple structure, reasonable, can wash, the full-automatic ultrasonic cleaner of semiconductor product that cleaning efficiency is high in step to a plurality of washing baskets.
The purpose of the utility model is realized like this:
the utility model provides a full-automatic ultrasonic cleaner of semiconductor product, includes the frame, be equipped with manipulator elevating system, manipulator translation mechanism, a plurality of material lifting manipulator, a plurality of washing tanks and cleaner cooling system in the frame.
The manipulator lifting mechanism is arranged on the rack and used for driving the manipulator translation mechanism and the plurality of material lifting manipulators to lift.
The manipulator translation mechanism is arranged on the rack and used for driving the plurality of material lifting manipulators to move horizontally.
The material lifting manipulators are sequentially arranged on the manipulator translation mechanism and are used for hooking the cleaning basket in the cleaning tank and driving the cleaning basket to translate or lift.
The cleaning tanks are arranged on the rack and located below the material lifting manipulator, and ultrasonic oscillators are arranged on the outer walls of the bottoms of the cleaning tanks. And a cleaning agent for cleaning grease and soldering flux on the surface of the product is arranged in the cleaning tank.
The purpose of the utility model can also adopt the following technical measures to solve:
be equipped with cleaner cooling system in the frame, cleaner cooling system is the refrigerant circulation refrigeration circuit who constitutes by compressor, condenser, throttling arrangement and evaporimeter connect gradually, the evaporimeter is located in the washing tank, the evaporimeter can reduce ultrasonic cleaning tank solvent temperature to realize reducing the solvent and volatilize, reach reduction material cost purpose.
The manipulator elevating system includes that lift servo motor removes the seat with going up and down, the seat is removed in the lift slides from top to bottom and sets up in the frame, manipulator translation mechanism locates on the seat is removed in the lift, lift servo motor locates in the frame to remove a screw drive with going up and down and be connected, thereby realize that many material lifting machine hands go up and down in step.
Manipulator translation mechanism includes horizontal migration servo motor and horizontal migration seat, horizontal migration seat horizontal slip sets up on the lift removal seat, horizontal migration servo motor locates on the lift removal seat to be connected with horizontal migration seat screw drive, many lifting manipulator locate in proper order on the horizontal migration seat, thereby realize the synchronous translation of many lifting manipulator.
The plurality of material lifting manipulators are sequentially arranged on the horizontal moving seat at equal intervals.
The plurality of cleaning tanks are arranged on the rack in sequence at equal intervals.
The cleaning tank is characterized in that a cover plate assembly is arranged above the cleaning tank and comprises a sliding cover plate, a cover plate sliding cylinder, a sliding seat and a cover plate locking cylinder, the sliding seat is horizontally arranged above the cleaning tank in a sliding mode, the cover plate locking cylinder is arranged on the sliding seat, the sliding cover plate is arranged on a cylinder rod of the cover plate locking cylinder, the cover plate sliding cylinder drives the sliding cover plate to horizontally slide, and the cover plate locking cylinder drives the sliding cover plate to vertically slide so as to close or open an opening of the cleaning tank.
The bottom surface of the sliding cover plate is provided with an anti-corrosion sealing ring, so that the cleaning agent in the cleaning tank is effectively prevented from volatilizing outwards.
The material lifting manipulator is a hook, therefore the utility model discloses a material lifting manipulator simple structure mentions easily and breaks away from the washing basket.
The utility model has the advantages as follows:
(one) the utility model discloses a plurality of lifting manipulator can synchronous translation and lift to can carry out lifting, blowing, move the material operation to a plurality of cleaning baskets in step, thereby promote holistic cleaning efficiency. The utility model discloses a cleaning operation is full automated control, and no manual operation, the utility model has the advantages of simple structure, the reliable operation, the security is good, and the installation cost is low, and convenient operation reduces the cost of labor, has improved the security.
(two) moreover, the utility model discloses a set up the evaporimeter in the washing tank, the evaporimeter can refrigerate to the cleaner to reduce ultrasonic cleaning tank solvent temperature effectively, thereby realize reducing the solvent and volatilize, reach reduction material cost purpose.
In addition, after the cleaning basket is placed in place and leaves the cleaning tank by the material lifting manipulator, the sliding cover plate can automatically close the opening of the cleaning tank, so that the solvent in the cleaning tank is effectively prevented from volatilizing.
(IV) also, the utility model discloses a cleaning operation is full automated control, does not have the manual operation to effectively promote the washing cleanliness factor of processing equipment and operational safety nature, product.
Drawings
Fig. 1 is a schematic structural view of the full-automatic ultrasonic cleaning machine for semiconductor products of the present invention.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and examples.
As shown in fig. 1, the full-automatic ultrasonic cleaning machine for semiconductor products comprises a frame 1, wherein a manipulator lifting mechanism 2, a manipulator translation mechanism 3, a plurality of material lifting manipulators 4, a plurality of cleaning tanks 6 and a cleaning agent cooling system 8 are arranged on the frame.
And the manipulator lifting mechanism 2 is arranged on the rack 1 and used for driving the manipulator translation mechanism and the plurality of material lifting manipulators to lift.
And the manipulator translation mechanism 3 is arranged on the rack 1 and is used for driving a plurality of material lifting manipulators to move horizontally.
And the material lifting manipulators 4 are sequentially arranged on the manipulator translation mechanism 3 and used for hooking the cleaning basket 5 in the cleaning tank and driving the cleaning basket 5 to translate or lift.
The cleaning tanks 6 are arranged on the rack 1 and located below the material lifting manipulator 4, and ultrasonic oscillators 7 are arranged on the outer walls of the bottoms of the cleaning tanks 6. And a cleaning agent for cleaning grease and soldering flux on the surface of the product is arranged in the cleaning tank 6.
As a more specific technical solution of the present invention.
The cleaning agent cooling system 8 is a refrigerant circulation refrigeration loop formed by sequentially connecting a compressor 81, a condenser 82, a throttling device 83 and an evaporator 84, and the evaporator 84 is arranged in the cleaning tank 6.
The manipulator lifting mechanism 2 comprises a lifting servo motor 21 and a lifting moving seat 22, the lifting moving seat 22 is arranged in the rack 1 in a vertical sliding mode, the lifting servo motor 21 is arranged on the rack 1 and is connected with the lifting moving seat 22 in a screw rod transmission mode, and the manipulator translation mechanism 3 is arranged on the lifting moving seat 22.
Manipulator translation mechanism 3 includes horizontal migration servo motor 31 and horizontal migration seat 32, horizontal migration seat 32 horizontal slip sets up on lift removal seat 22, horizontal migration servo motor 31 is located on lift removal seat 22 to be connected with horizontal migration seat 32 screw drive, many lifting manipulator 4 locate in proper order on horizontal migration seat 32.
The plurality of material lifting manipulators 4 are sequentially arranged on the horizontal moving seat 32 at equal intervals.
The plurality of cleaning tanks are arranged on the rack in sequence at equal intervals.
The cleaning tank is characterized in that a cover plate assembly 9 is arranged above the cleaning tank 6, the cover plate assembly 9 comprises a sliding cover plate 91, a cover plate sliding cylinder 92, a sliding seat 93 and a cover plate locking cylinder 94, the sliding seat 93 is horizontally arranged above the cleaning tank 6 in a sliding mode, the cover plate locking cylinder 94 is arranged on the sliding seat 93, the sliding cover plate 91 is arranged on a cylinder rod of the cover plate locking cylinder 94, the cover plate sliding cylinder 92 drives the sliding cover plate 91 to horizontally slide, and the cover plate locking cylinder 94 drives the sliding cover plate 91 to vertically slide so as to close or open an opening of the cleaning tank 6.
The bottom surface of the sliding cover plate 91 is provided with an anti-corrosion sealing ring, thereby effectively preventing the cleaning agent in the cleaning tank 6 from volatilizing outwards.
The material lifting manipulator 4 is a hook, therefore the utility model discloses a material lifting manipulator 4 simple structure mentions easily and breaks away from the handle 51 of cleaning basket 5.
The working principle of the utility model is
The utility model discloses a work flow is: robot or workman will treat that the washing product is put into after washing basket 5, will wash basket 5 and put into feeding station after that, follow and start the utility model discloses, lift servo motor 21 corotation, with drive lift removal seat 22, manipulator translation mechanism 3 and many lifting manipulators 4 descend to the settlement position, horizontal migration servo motor 31 corotation is followed, with drive horizontal migration seat 32, many lifting manipulators 4 translation one section distance, so that every lifting manipulator 4 all catches on the washing basket 5 of corresponding position, lift servo motor 21 reversal afterwards, with drive many lifting manipulators 4 and a plurality of washing basket 5 rise to a certain position together, afterwards, horizontal migration servo motor 31 reversal is with drive horizontal migration seat 32, many lifting manipulators 4, a plurality of washing basket 5 translation is to next washing tank top, then lift servo motor 21 drives many lifting manipulators 4, a plurality of lifting manipulators 4, start, The plurality of wash baskets 5 are lowered into the next wash tank 6, and then the plurality of lifting manipulators 4 are driven by the lifting servo motor 21 and the horizontal movement servo motor 31 to be separated from the corresponding wash basket 5 and lifted out of the wash tank 6.
Then, the cover plate sliding cylinder 92 on each cleaning tank 6 drives the respective sliding cover plate 91 to horizontally slide to the opening of the corresponding cleaning tank 6, the cover plate locking cylinder 94 drives the sliding cover plate 91 to move downwards, and the sliding cover plate 91 closes the opening of the cleaning tank 6. Thereafter, the utility model discloses an ultrasonic oscillator 7 and cleaner cooling system 8 can be opened to the controller, and ultrasonic oscillator 7 can make the interior product of waiting to wash of washing tank 6 and cleaner vibration washing, and meanwhile, the evaporimeter in the washing tank 6 begins to refrigerate the cleaner, reduces the interior cleaner temperature of ultrasonic washing tank 6, reduces the cleaner and volatilizees, reaches reduction material cost purpose.
After the ultrasonic oscillator 7 has cleaned the product to be cleaned, the cover plate sliding cylinder 92 and the cover plate locking cylinder 94 drive the sliding cover plate 91 to open.
The lifting servo motor 21 and the horizontal movement servo motor 31 drive the plurality of material lifting manipulators 4 to ascend, and the plurality of cleaning baskets 5 ascend out of the cleaning tank 6 and then move towards the next cleaning tank 6 for next cleaning.
The utility model discloses a plurality of lifting manipulators 4 can catch on in step or put down a plurality of cleaning baskets 5, so do reciprocal self-cleaning action. The utility model discloses can realize that many lifting manipulators 4 go on in step, carry out material, blowing, move operations such as material to a plurality of cleaning baskets 5 simultaneously, promote holistic cleaning efficiency.
Claims (9)
1. A full-automatic ultrasonic cleaning machine for semiconductor products, which is characterized in that,
a frame;
the manipulator lifting mechanism is arranged on the rack and used for driving the manipulator translation mechanism and the plurality of material lifting manipulators to lift;
the manipulator translation mechanism is arranged on the frame and used for driving the plurality of material lifting manipulators to move horizontally,
the plurality of material lifting manipulators are sequentially arranged on the manipulator translation mechanism and are used for hooking the cleaning basket in the cleaning tank and driving the cleaning basket to translate or lift;
and the plurality of cleaning tanks are arranged on the frame and positioned below the material lifting manipulator, and ultrasonic oscillators are arranged on the outer walls of the bottoms of the cleaning tanks.
2. The full-automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 1, wherein the frame is provided with a cleaning agent cooling system, the cleaning agent cooling system is a refrigerant circulating refrigeration loop formed by sequentially connecting a compressor, a condenser, a throttling device and an evaporator, and the evaporator is arranged in the cleaning tank.
3. The fully automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 2, wherein the material lifting manipulator is a hook.
4. The full-automatic ultrasonic cleaning machine for semiconductor products according to claim 2 or 3, wherein the manipulator elevating mechanism comprises an elevating servo motor and an elevating moving seat, the elevating moving seat is slidably disposed on the frame, the elevating servo motor is disposed on the frame and is in transmission connection with a lead screw of the elevating moving seat, and the manipulator translation mechanism is disposed on the elevating moving seat.
5. The full-automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 4, wherein said manipulator translation mechanism comprises a horizontal movement servo motor and a horizontal movement base, said horizontal movement base is horizontally slidably disposed on said elevation movement base, said horizontal movement servo motor is disposed on said elevation movement base and is in transmission connection with a lead screw of said horizontal movement base, and said plurality of material lifting manipulators are sequentially disposed on said horizontal movement base.
6. The full-automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 3, wherein said plurality of said material lifting manipulators are arranged in sequence on a horizontal moving seat at equal intervals.
7. The full-automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 6, wherein said plurality of cleaning tanks are arranged on the frame in sequence at equal intervals.
8. The full-automatic ultrasonic cleaning machine for semiconductor products as claimed in claim 1, wherein a cover plate assembly is disposed above the cleaning tank, the cover plate assembly comprises a sliding cover plate, a cover plate sliding cylinder, a sliding seat and a cover plate locking cylinder, the sliding seat is horizontally slidably disposed above the cleaning tank, the cover plate locking cylinder is disposed on the sliding seat, the sliding cover plate is disposed on a cylinder rod of the cover plate locking cylinder, and the cover plate locking cylinder drives the sliding cover plate to slide up and down.
9. The full-automatic ultrasonic cleaning machine for semiconductor products according to claim 8, wherein the bottom surface of the sliding cover plate is provided with an anti-corrosion sealing ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922101898.2U CN211412984U (en) | 2019-11-28 | 2019-11-28 | Full-automatic ultrasonic cleaning machine for semiconductor products |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922101898.2U CN211412984U (en) | 2019-11-28 | 2019-11-28 | Full-automatic ultrasonic cleaning machine for semiconductor products |
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| Publication Number | Publication Date |
|---|---|
| CN211412984U true CN211412984U (en) | 2020-09-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922101898.2U Active CN211412984U (en) | 2019-11-28 | 2019-11-28 | Full-automatic ultrasonic cleaning machine for semiconductor products |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547678A (en) * | 2020-12-11 | 2021-03-26 | 闽江学院 | Automatic shifting device suitable for ultrasonic cleaning machine and use method thereof |
| CN114449779A (en) * | 2020-10-30 | 2022-05-06 | 北京铁路信号有限公司 | Cleaning device |
| CN117160991A (en) * | 2023-11-02 | 2023-12-05 | 阳信东泰精密金属有限公司 | Small-size automatic groove type cleaning equipment |
| CN114449779B (en) * | 2020-10-30 | 2024-05-31 | 北京铁路信号有限公司 | Cleaning device |
-
2019
- 2019-11-28 CN CN201922101898.2U patent/CN211412984U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114449779A (en) * | 2020-10-30 | 2022-05-06 | 北京铁路信号有限公司 | Cleaning device |
| CN114449779B (en) * | 2020-10-30 | 2024-05-31 | 北京铁路信号有限公司 | Cleaning device |
| CN112547678A (en) * | 2020-12-11 | 2021-03-26 | 闽江学院 | Automatic shifting device suitable for ultrasonic cleaning machine and use method thereof |
| CN117160991A (en) * | 2023-11-02 | 2023-12-05 | 阳信东泰精密金属有限公司 | Small-size automatic groove type cleaning equipment |
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