CN112103217A - Centrifugal rotary cleaning machine for semiconductor - Google Patents
Centrifugal rotary cleaning machine for semiconductor Download PDFInfo
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- CN112103217A CN112103217A CN202011021850.1A CN202011021850A CN112103217A CN 112103217 A CN112103217 A CN 112103217A CN 202011021850 A CN202011021850 A CN 202011021850A CN 112103217 A CN112103217 A CN 112103217A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 106
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 43
- 238000003860 storage Methods 0.000 claims abstract description 39
- 238000001035 drying Methods 0.000 claims abstract description 10
- 239000008237 rinsing water Substances 0.000 claims abstract description 10
- 238000007599 discharging Methods 0.000 claims abstract description 7
- 239000002351 wastewater Substances 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 13
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 12
- 238000007789 sealing Methods 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 10
- 238000011068 loading method Methods 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 8
- 238000001223 reverse osmosis Methods 0.000 claims description 7
- 238000000108 ultra-filtration Methods 0.000 claims description 7
- 230000001939 inductive effect Effects 0.000 claims description 6
- 230000033001 locomotion Effects 0.000 claims description 6
- 238000012544 monitoring process Methods 0.000 claims description 6
- 238000006555 catalytic reaction Methods 0.000 claims description 5
- 238000005189 flocculation Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 description 22
- 238000000034 method Methods 0.000 description 18
- 239000007788 liquid Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000004506 ultrasonic cleaning Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000009297 electrocoagulation Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000016615 flocculation Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
- F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
- F26B11/181—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles the receptacle being a foraminous, perforated or open-structured drum or drum-like container, e.g. rotating around a substantially horizontal or vertical axis; the receptacle being multiple perforated drums, e.g. in superimposed arrangement
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a semiconductor centrifugal rotary cleaning machine applied to the field of semiconductor workpiece cleaning, which structurally comprises an equipment host, a feeding and discharging system and a tool basket for placing workpieces, wherein the equipment host comprises a comprehensive working cavity, a cleaning water storage tank and a rinsing water storage tank, and the comprehensive working cavity is provided with a cleaning cavity and a centrifugal control system; the middle part in clean chamber is provided with the position of bearing that is used for placing the frock basket to be provided with a plurality of clean nozzles and dry air knife in the inner wall, and install a plurality of ultrasonic transducer, centrifugal control system is in order to realize placing the rotatory drive in the frock basket that bears the position. The device collects supersound centrifugal cleaning, supersound centrifugal rinsing and air-cut drying process in an organic whole, has realized the equipment structure innovation in this semiconductor cleaning field, and this compact structure formula assembly has not only reduced its occupation of land space, and has effectively reduced and avoided the appearance at clean dead angle, has guaranteed the clean quality and the clean stability of work piece, has promoted application scope.
Description
Technical Field
The invention relates to the field of semiconductor workpiece cleaning, in particular to a centrifugal rotary cleaning machine for a semiconductor.
Background
The part cleaning operation in semiconductor production usually comprises a plurality of processes arranged in sequence, so that the cleaning effect and the processing quality are ensured, and the subsequent device configuration effect is guaranteed. Therefore, the cleaning devices for the workpieces are usually arranged side by side in a multi-station manner, so as to ensure the orderly cleaning operation. The station is surrounded by metal casing usually and is formed, sets up the operation position of work as the staff work of standing on one side of the casing of direction along the station to guarantee that the staff looks over and the auxiliary operation of washing process stability, and the installation side of opposite side conduct external equipment makes the external device of device and staff's both sides separation setting. However, the assembling mode of the equipment increases the application space requirement of the device, the whole assembly line needs a plurality of workers to check simultaneously, the stable real-time monitoring of each process can be guaranteed, and the application cost is improved. In the application process, the workpiece to be cleaned sequentially passes through the cleaning station under the transportation action of the conveying device, the relative position of the workpiece to be cleaned and the conveying device is unchanged, and the workpiece is cleaned, dried and the like only through the impact of the structural components in the cleaning device, so that the cleaning effect is poor, the attachment in the blind hole cannot be thoroughly cleaned, and the cleaning performance of the workpiece is reduced.
Disclosure of Invention
The invention aims to provide a semiconductor centrifugal rotary cleaning machine which improves the compactness and the cleaning application effect.
The technical scheme adopted by the invention for solving the technical problems is as follows:
the semiconductor centrifugal rotary cleaning machine comprises an equipment host, a feeding and discharging system and a tool basket for placing workpieces, wherein the equipment host comprises a comprehensive working cavity, a cleaning water storage tank and a rinsing water storage tank, the comprehensive working cavity is internally provided with the cleaning cavity for realizing the cleaning operation of the workpieces and a centrifugal control system, and the feeding and discharging system is used for realizing the conveying operation of the workpieces;
the tool basket is provided with a limiting hole along the axis, and is circumferentially provided with a plurality of workpiece placing positions for bearing and locking workpieces;
the cleaning cavity is provided with a working inlet for the entering of a tool basket, an openable transverse sealing door is arranged at the working inlet, a bearing position for placing the tool basket is arranged in the middle of the cleaning cavity, a plurality of cleaning nozzles and drying air knives are arranged on the inner wall of the cleaning cavity towards the bearing position, a water outlet is formed in the bottom of the cleaning cavity, a plurality of ultrasonic transducers are installed in the cleaning cavity and connected with an ultrasonic generator, the bearing position is a supporting round platform connected with a centrifugal control system, the supporting round platform is provided with a transmission rotating shaft with one end matched with a limiting hole along the axis, the other end of the transmission rotating shaft is connected with the centrifugal control system, and the centrifugal control system is used for realizing the rotation driving of the tool basket placed at the bearing round platform.
Further, go up unloading system includes conveying system and sideslip subassembly, conveying system is used for conveying the frock basket to synthesizing the working chamber and corresponding the position to form material loading platform, operation panel and unloading platform along direction of transfer, the sideslip subassembly is used for realizing the reciprocal operation of taking of frock basket at the operation panel with bear the weight of the position, the top in clean chamber is seted up to the work entry, the sideslip subassembly includes transverse drive subassembly, lift drive subassembly and the clamping jaw of taking, transverse drive subassembly erects in the top of clean chamber and operation panel, lift drive subassembly is installed in transverse drive subassembly and is realized reciprocal sideslip motion along its axis, the clamping jaw of taking sets up in lift drive subassembly's drive end.
Furthermore, induction stoppers are respectively arranged on two sides of the console.
Further, the transverse moving sealing door is parallel to the transverse driving assembly, and an electromagnetic safety lock is arranged between the transverse moving sealing door and the cleaning cavity.
Furthermore, a plurality of waterproof illuminating lamps are arranged in the comprehensive working cavity.
Further, the rinsing water storage tank and/or the cleaning water storage tank are/is provided with an online data monitoring system.
Further, the top of equipment host computer is provided with steam condenser, steam condenser is including the collection entry and the collection export that communicate in clean chamber, it links to each other with washing aqua storage tank or rinsing aqua storage tank to collect the export.
Further, the water outlet is arranged on one side of the bottom of the cleaning cavity, and the bottom of the cleaning cavity is inclined towards the water outlet.
Further, the outlet connection is in wastewater circulating system, wastewater circulating system includes that waste water keeps in and preliminary treatment groove, hydrogen peroxide tank, electro-catalytic reaction groove, electric flocculation reaction groove and ultrafiltration reverse osmosis unit, the outlet connection is in the water inlet that waste water kept in and preliminary treatment groove, the delivery port that waste water kept in and preliminary treatment groove, hydrogen peroxide tank is connected in the water inlet of electro-catalytic reaction groove, electric flocculation reaction groove and ultrafiltration reverse osmosis unit realize connecting gradually to link to each other with wasing aqua storage tank/or rinsing aqua storage tank.
The invention has the beneficial effects that:
the device realizes the forward and reverse rotation driving of a workpiece placed on a rotary circular table through a centrifugal control system, and is matched with a cleaning nozzle, a drying air knife and an ultrasonic transducer to realize the integration of ultrasonic centrifugal cleaning, ultrasonic centrifugal rinsing and air-cutting drying, thereby realizing the compact assembly of the structure, reducing the occupied space and improving the application range; the centrifugal cleaning operation prevents the accumulation of substances in the blind hole, reduces and avoids the occurrence of cleaning dead angles, ensures the cleaning quality and the cleaning stability of the workpiece, and is more suitable for cleaning attachments such as automobile parts, hydraulic parts, mechanical hardware parts, aviation, national defense weapons, clocks, bearings, precision parts, compressor fittings, rubber parts and the like with the blind hole; the device can be connected and assembled with a system in a full-automatic manner, technicians can allocate cleaning process flows according to requirements, the use environment of cleaning operation is guaranteed, one-key starting is realized, and convenience in operation and flexibility in regulation and control are guaranteed; the arrangement of the equipment structure and the functions enables the field of semiconductor cleaning to realize great structural innovation and improvement of cleaning quality, enables the semiconductor lead frame to meet high-quality cleaning requirements, and greatly promotes the cleaning quality and the processing stability of semiconductor workpieces.
Drawings
FIG. 1 is a schematic connection diagram of a semiconductor centrifugal spin washer according to the present invention;
FIG. 2 is a top view of the connection structure of the apparatus main body and the transfer system according to the present invention;
FIG. 3 is a top view of the construction of the tooling basket of the present invention;
FIG. 4 is a left side view of the connection structure of the host computer and the transfer system of the present invention;
FIG. 5 is a schematic illustration of the construction of the traversing assembly of the present invention;
FIG. 6 is a schematic view of the working positions of the cleaning chamber, centrifugal rotary motor and tool basket of the present invention;
FIG. 7 is a front view of the integrated working chamber and the electric control cabinet of the present invention;
labeled as: 1. a delivery system; 11. an inductive stopper; 2. a tooling basket; 21. a workpiece; 22. a circular base plate; 23. a limiting hole; 3. a comprehensive working chamber; 31. cleaning the cavity; 311. transversely moving the sealing door; 312. installing a storage position; 32. a transmission rotating shaft; 321. a centrifugal rotating motor; 322. a supporting circular table; 33. cleaning the nozzle; 34. an ultrasonic transducer; 35. a steam condenser; 36. a water outlet; 4. a traversing assembly; 41. a lateral drive assembly; 42. a lift drive assembly; 43. a three-touch manipulator; 5. an electric control cabinet; 51. a touch screen panel; 52. a control button; 6. cleaning the water storage tank; 7. rinsing the water storage tank; 8. an electrolyzer; 9. three-color lamp.
Detailed Description
The invention is further described with reference to the following figures and detailed description.
The structure of the semiconductor centrifugal rotary cleaning machine is shown in figure 1, and comprises an equipment host, a loading and unloading system, a tool basket 2 and a wastewater circulating system. The work piece 21 to be cleaned is placed on the tool basket 2 for ease of transport and cleaning positioning. As shown in fig. 3, the bottom of the tool basket 2 is a circular bottom plate 22 provided with a limiting hole 23 along the axis, and the workpiece placing position for installing the workpiece 21 surrounds the limiting hole 23 to be circumferentially arranged, so as to ensure the structural symmetry of the center of gravity and the operational stability. When the workpiece 21 is placed at the workpiece placing position, the locking piece is further used for locking and limiting, and the specific clamping and locking mode can be determined according to the shape of the part of a customer. The structural configuration of the tooling basket 2 can meet the requirements of workpieces with different structures, simultaneously avoids the damage to the quality of semiconductor workpieces in the cleaning process, ensures the production quality of the workpieces, ensures that the semiconductor lead frame can also be cleaned, and enlarges the application range. Above-mentioned equipment host computer is including synthesizing working chamber 3, wasing aqua storage tank 6 and rinsing aqua storage tank 7, for guaranteeing the inslot quality of water, this rinsing aqua storage tank 7 and/or washing aqua storage tank 6 are provided with a plurality of electrolyzers to form online data monitoring system through electrical components framework, but the current quality of water of visual display reminds the customer in time to change water and consumptive material, thereby guarantees the water quality, has ensured clean effect. The online data monitoring system can be constructed according to the field application environment and the required parameter monitoring. And a cleaning chamber for performing a cleaning operation of the work pieces 21 and a centrifugal control system are built in the integrated working chamber 3. The cleaning cavity 31 is provided with a working inlet for the tool basket 2 to enter, and the working inlet is provided with a transverse sealing door 311, so that the liquid or stain in the cleaning operation process is prevented from splashing outwards, and the application quality is ensured. The clean chamber 31 is correspondingly provided with a bearing position for bearing the tool basket 2, and the loading and unloading system moves the tool basket 2 in and out from the working inlet. Bear the position and set up in the middle part of clean chamber 31, and the inner wall orientation of clean chamber 31 bears the position and is provided with a plurality of clean nozzles 33 and dry air knife, clean nozzles 33 communicate with washing aqua storage tank 6 and rinsing aqua storage tank 7 respectively through the pipeline to can regulate and control its pipeline route according to the washing demand, guarantee to wash and rinse the steady progress of operation. The bearing position is a supporting circular table 322 connected with the centrifugal control system, in the application process, the tool basket 2 bearing the workpiece 21 is placed at the supporting circular table 322 through a working inlet, the supporting circular table 322 is provided with a transmission rotating shaft 32 along the axis, and one end of the transmission rotating shaft 32 is sleeved in the limiting hole 23, so that the tool basket 2 is fixedly installed. The shaft end of the centrifugal rotating motor 321 in the centrifugal control system is connected with the end of the transmission rotating shaft 32 through a shaft coupling, and then the centrifugal control system is used for realizing synchronous rotation driving of the tool basket 2. The top of the main machine of the equipment is provided with a steam condenser 35, the steam condenser 35 adopts the patented air-cooled coagulation technology, the collection inlet of the steam condenser 35 is communicated with the collection inlet of the cleaning cavity 31, the steam generated by the equipment can be collected and condensed, and then the steam is returned to the cleaning tank by the collection outlet. The steam condenser 35 can select the connecting groove of the collecting outlet according to actual requirements. The cleaning chamber 31 may be formed by a seamless weld enclosure and provided with a drain opening 36. To ensure the drainage quality, the bottom of the cleaning chamber 31 is tilted toward one side, and the drainage port 36 is disposed at the lowest position of the bottom, so as to ensure that the water is guided to the drainage port 36 along the bottom surface, thereby avoiding the accumulation of water. The drain port 36 is connected to a wastewater circulation system including a temporary wastewater storage and pretreatment tank, a hydrogen peroxide tank, an electrocatalytic reaction tank, an electrocoagulation reaction tank, and an ultrafiltration reverse osmosis apparatus. The water outlet 36 is connected to the water inlet of the temporary wastewater treatment tank, and the water outlets of the temporary wastewater treatment tank and the hydrogen peroxide tank are connected to the water inlet of the electrocatalysis reaction tank, so that the electrocatalysis reaction is carried out in the tank. And the electrocatalysis reaction tank, the electrocoagulation reaction tank and the ultrafiltration reverse osmosis device are sequentially connected, so that sequential purification and filtration reaction is realized, and the electrocatalysis reaction tank, the electrocoagulation reaction tank and the ultrafiltration reverse osmosis device are connected with the cleaning water storage tank 6 or the rinsing water storage tank 7, so that the recycling of deionized water is realized. The circulating water can be selected according to actual application conditions. Install a plurality of waterproof light in this washing chamber 31 to dispose toughened glass observation window in one side, synthesize working chamber 3 and carry out offering of corresponding window, and then make the inside operating condition in clean chamber 31 receive the eye ground completely, guarantee the work visibility.
As shown in fig. 2 and 4, the washing reservoir 6 and the rinsing reservoir 7 are disposed at one side of the cleaning chamber 31, while the transfer system of the loading and unloading system is disposed at the other side of the cleaning chamber 31, and the work entrance is opened above the cleaning chamber 31. The conveying system consists of a material rack, a chain, a speed regulating motor and an inductive switch. The speed regulating motor conveys the tool basket 2 to the corresponding position of the comprehensive working cavity 3 through a chain, and a feeding platform, an operating platform and a discharging platform are formed along the conveying direction. This inductive switch can respond to frock basket 2 on the conveyer, realizes automatic feeding and unloading operation. When the inductive switch starts, if the inductive switch does not react after the set time, the fault is prompted, and meanwhile, the setting of the protection program can be carried out, so that the collision of the tool basket 2 is prevented. The both sides of above-mentioned operation panel can be installed the response respectively and keep off piece 11 to carry out spacing blockking to frock basket 2, can prevent on the one hand the pan feeding to the influence of ejection of compact direction, on the other hand has also guaranteed going on steadily of washing operation, has avoided the emergence of hourglass washing or repeated clean situation. And the traversing component 4 in the loading and unloading system is used for realizing the reciprocating taking operation of the tooling basket on the operating platform and the bearing position, and comprises a transverse driving component 41, a lifting driving component 42 and a taking clamping jaw. The transverse driving assembly 41 is erected above the cleaning chamber 31 and the operating platform, and is used for driving the lifting driving assembly 42 to realize reciprocating displacement. The lifting driving assembly 42 is fixedly installed on the driving member of the transverse driving assembly 41 and performs reciprocating transverse movement along the axis thereof, and the gripping jaws are disposed at the driving end of the lifting driving assembly 42, thereby performing synchronous displacement, and performing gripping and placing operations while performing vertical displacement by the lifting driving assembly 42. The gripping jaw in this embodiment is a three-touch manipulator 43. In the clamping process, the rod piece forming the limiting hole 23 in the tooling basket 2 can be clamped by the three-touch manipulator 43, the whole outer package clamping can be carried out on the rod piece, and the clamping jaw models can be taken by workers according to requirements. The traverse sealing door 311 is parallel to the transverse driving component 41, realizes the reciprocating traverse operation above the cleaning cavity 31 and the water storage tank, and realizes the structural locking between the traverse sealing door 311 and the cleaning cavity 31 through an electromagnetic safety lock when in a working state.
The side or back of the single-chamber cleaning machine is provided with the electric control cabinet 5, and the touch screen panel 51 and the control buttons 52 are usually arranged on the right-hand side right in front of the machine, so that the machine is convenient for daily operation or can be placed according to the requirements of customers. The operator can debug the device and set the "process program" of the work through the touch screen panel 51, thereby realizing the single-step start-stop operation and time of each main work system and the setting of the upper and lower limit values of some sensors. The process program interface displayed in the touch screen panel 51 can display the working time set values of each key step of the current program and some parameters acquired in real time during the operation process, such as the temperature of a liquid storage tank, the centrifugal rotation time, the ultrasonic cleaning time, the rinsing time, the wind-cutting drying time, and the like. The process program can be divided into an operator and an administrator by setting two levels of operation levels according to different password settings, the administrator can modify the program setting parameters, and the operator can start and stop the process program by one key according to the program set by the administrator, so that the working quality is ensured. In addition, the touch screen panel 51 can also be used to manually control the start and stop of various components such as movement and heating, and to set some parameters in the system. The control mode of the system can also be divided into an automatic mode and a manual mode, and the implementation modes of the two modes can be set according to the requirements of customers, so that different use environments are met. The control buttons 52 may include a control state selection button, a reset button, and an emergency stop button. In order to improve the alarm quality of the device, a three-color alarm lamp 9 is installed on the top of the main body of the equipment, and comprises yellow, red and green. The mounting position of the three-color warning lamp 9 is close to the front close to the operation standing side of the worker, so that the worker can conveniently check the three-color warning lamp. The color indication meaning can be set by a client, such as running, alarming, stopping and other states. For improving the structural quality of three-color warning light 9, it adopts heat resistance carbon-poly PC raw and other materials preparation, and then promotes performances such as heat-resisting, high temperature, waterproof, dustproof, makes its non-deformable, and the color is beautiful, has further ensured the warning performance.
In the application process, the working process of the equipment can be divided into five stages of centrifugal cleaning, ultrasonic cleaning, centrifugal rinsing, ultrasonic rinsing and centrifugal spin-drying in sequence through a process program. When the work basket 2 containing the work 21 is placed on the loading table, it is moved to the operation table by the transfer system 1. At this time, the traverse motion assembly 4 clamps the tool basket 2 to the carrying position, the traverse motion sealing door 311 is closed, and the above cleaning procedure is started. In centrifugal cleaning and centrifugal rinsing processes, the centrifugal rotating motor 321 drives the tool basket 2 to perform 360-degree forward and reverse rotation, then the cleaning nozzle 33 performs centrifugal cleaning or rinsing operations on the workpiece 21 thereon, the specific number and model of the nozzles can be set according to actual requirements, and waste liquid flows into the waste liquid circulating system from the water outlet 36. The liquid in the cleaning water storage tank 6 and the rinsing water storage tank 7 is transmitted to the cleaning nozzle 33 by using centrifugal pumps, and the water storage tanks are provided with liquid level sensors, so that the liquid can be automatically replenished when the liquid needs to be replenished, and the system can send out an alarm signal when the liquid is lower than a limited position. In order to ensure the cleaning quality, the connecting pipeline of the centrifugal pump can be provided with a filtering component, the centrifugal pump can be filtered before conveying the cleaning liquid into the cleaning cavity 31 every time, and the filter element needs to be cleaned and replaced regularly. The filter element can adopt a 5 mu m multi-stage filter element. The ultrasonic cleaning and ultrasonic rinsing processes can close the water outlet 36, so as to soak the tool basket 2 in the cleaning cavity 31 with a cleaning agent or deionized water, and then to perform the ultrasonic cleaning operation with the ultrasonic transducer 34. When centrifugal drying is carried out, the tool basket 2 rotates forwards and backwards, and meanwhile, the drying air knife carries out hot air drying operation on the tool basket to thoroughly dry the workpiece 21, and the upper limit of the temperature can be set according to actual conditions. And the compressed air is sprayed out through the independent spray pipes, so that the temperature is reduced and the air circulation is facilitated. In addition to the above setting method, the process may include ultrasonic immersion cleaning, centrifugal spin cleaning, ultrasonic immersion rinsing, centrifugal spin rinsing, and air knife centrifugal drying, and the liquid in the cleaning water storage tank 6 is a specific cleaning agent, and the liquid in the rinsing water storage tank 7 is deionized water, so that the circulation of the deionized water is realized by the wastewater circulation system, and the water outlet is connected to the rinsing water storage tank 7. When the above-mentioned process is completed, the traverse unit 4 returns the gripper to the loading position, and moves to the blanking table by the conveying system 1, so as to flow into the next process. The overflowing parts in the equipment can be made of stainless steel 304, the internal materials are all mirror panels, the pipelines are all sanitary pipelines, the welding process adopts seamless welding, single-side welding and double-side forming are adopted, so that the inside of the tank body and the inside of the pipelines are clean, no color change or residue is caused, and the cleaning effect of the equipment is further ensured.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. The semiconductor centrifugal rotary cleaning machine is characterized by comprising an equipment host, a feeding and discharging system and a tooling basket (2) for placing a workpiece (21), wherein the equipment host comprises a comprehensive working cavity (3), a cleaning water storage tank (6) and a rinsing water storage tank (7), the comprehensive working cavity (3) is internally provided with the cleaning cavity for realizing the cleaning operation of the workpiece (21) and a centrifugal control system, and the feeding and discharging system is used for realizing the conveying operation of the workpiece (21);
the tool basket (2) is provided with a limiting hole (23) along the axis, and is circumferentially provided with a plurality of workpiece placing positions, and the workpiece placing positions are used for bearing and locking a workpiece (21);
the cleaning cavity (31) is provided with a working inlet for the tool basket (2) to enter, an openable transverse sealing door (311) is arranged at the working inlet, a bearing position for placing a tool basket (2) is arranged in the middle of the cleaning cavity (31), a plurality of cleaning nozzles (33) and drying air knives are arranged on the inner wall towards the bearing position, a water outlet (36) is arranged at the bottom of the cleaning cavity (31), the cleaning cavity (31) is provided with a plurality of ultrasonic transducers (34), the ultrasonic transducers (34) are connected with an ultrasonic generator, the bearing position is a supporting round table (322) connected with the centrifugal control system, the supporting round table (322) is provided with a transmission rotating shaft (32) with one end matched with the limiting hole (23) along the axial line, the other end of the transmission rotating shaft (32) is connected with a centrifugal control system, and the centrifugal control system is used for realizing the rotation driving of the tool basket placed at the bearing circular truncated cone (322).
2. The semiconductor centrifugal rotary cleaning machine as claimed in claim 1, characterized in that the loading and unloading system comprises a conveying system (1) and a traverse assembly (4), the conveying system (1) is used for conveying the tooling basket (2) to a position corresponding to the comprehensive working chamber (3) and forming a loading platform, an operating platform and a discharging platform along the conveying direction, the traverse assembly (4) is used for realizing the reciprocating taking operation of the tooling basket (2) at the operating platform and a bearing position, the working inlet is arranged above the cleaning chamber (31), the traverse assembly (4) comprises a transverse driving assembly (41), a lifting driving assembly (42) and a taking clamping jaw, the transverse driving assembly (41) is erected above the cleaning chamber (31) and the operating platform, the lifting driving assembly (42) is installed on the transverse driving assembly (41) and realizes the reciprocating traverse motion along the axis thereof, the taking clamping jaw is arranged at the driving end of the lifting driving component (42).
3. Semiconductor centrifugal spin washer according to claim 2, characterized in that the manipulation stage is provided with inductive stoppers (11) on both sides, respectively.
4. Semiconductor centrifugal spin washer according to claim 1, characterized in that the traverse sealing door (311) is parallel to the transverse drive assembly (41), an electromagnetic safety lock being provided between the traverse sealing door (311) and the cleaning chamber (31).
5. The centrifugal spin cleaning machine for semiconductors according to claim 1, characterized by the fact that the integrated working chamber (3) is built in with waterproof lighting lamps.
6. Semiconductor centrifugal spin washer according to claim 1, characterized in that the rinsing reservoir (7) and/or the washing reservoir (6) are provided with an online data monitoring system.
7. The semiconductor centrifugal spin cleaning machine according to claim 1, wherein a steam condenser (35) is disposed on the top of the main body, the steam condenser (35) comprises a collection inlet and a collection outlet communicated with the cleaning chamber (31), and the collection outlet is connected with the cleaning water storage tank (6) or the rinsing water storage tank (7).
8. The centrifugal spin washer according to claim 1, wherein the drain opening (36) is provided at a side of a bottom of the cleaning chamber (31), and the bottom of the cleaning chamber (31) is inclined toward the drain opening (36).
9. The centrifugal rotary semiconductor cleaning machine according to claim 8, wherein the water outlet (36) is connected to a wastewater circulating system, the wastewater circulating system comprises a wastewater temporary storage and pretreatment tank, a hydrogen peroxide tank, an electro-catalytic reaction tank, an electro-flocculation reaction tank and an ultrafiltration reverse osmosis device, the water outlet (36) is connected to a water inlet of the wastewater temporary storage and pretreatment tank, water outlets of the wastewater temporary storage and pretreatment tank and the hydrogen peroxide tank are connected to a water inlet of the electro-catalytic reaction tank, and the electro-catalytic reaction tank, the electro-flocculation reaction tank and the ultrafiltration reverse osmosis device are sequentially connected and connected with the cleaning water storage tank (6)/or the rinsing water storage tank (7).
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| CN113649379A (en) * | 2021-08-03 | 2021-11-16 | 上海观道生物科技有限公司 | Automatic cleaning and air drying method for container |
| CN114433557A (en) * | 2021-12-31 | 2022-05-06 | 深圳市壹帆自动化有限公司 | Ultrasonic cleaning machine |
| CN118218318A (en) * | 2024-05-23 | 2024-06-21 | 山东瑞烨新能源装备有限公司 | Cleaning line for workpiece and cleaning method thereof |
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