CN211182150U - Plasma processing device for realizing flat plate and turntable processing - Google Patents

Abstract

The utility model provides a plasma processing device for realizing the processing of a flat plate and a turntable, which comprises a shell component and an electrode component, wherein the electrode component is arranged in the shell component; wherein the housing assembly is used for obtaining a vacuum environment for plasma treatment; the electrode assembly is used for manufacturing plasma to realize plasma processing; the electrode assembly comprises a side plate, an electrode joint, an electrode plate and a rotary table module, the electrode plate is detachably connected to the shell assembly through the electrode joint, and the rotary table module is arranged at the bottom in the shell assembly. The utility model discloses set up two sets of plasma processing apparatus simultaneously in the cavity to make things convenient for the dismantlement and the installation of plate electrode through electrode joint, and then realized dull and stereotyped plasma treatment and carousel plasma treatment two kinds of modes's conversion.

Description

Plasma processing device for realizing flat plate and turntable processing

Technical Field

The utility model relates to a plasma treatment facility field, concretely relates to plasma processing apparatus who realizes dull and stereotyped and carousel processing.

Background

With the rapid development of high-tech industries, the technical requirements of various processes on products are higher and higher, and the appearance of plasma processing technology not only improves the product performance and improves the production efficiency, but also realizes the effect of safety and environmental protection. The plasma processing technology can be applied in the fields of material science, polymer science, biomedical materials science, microfluidics research, micro-electromechanical system research, optics, microscopy, dental medical treatment and the like.

The fourth state of the plasma, i.e., the substance, is an ionized gaseous substance composed of atoms from which some electrons are deprived and positive and negative electrons generated by ionization of the atoms. The ionized gas is composed of atoms, molecules, atomic groups, ions and electrons. The action of the cleaning agent on the surface of the object can realize ultra-clean cleaning, surface activation, etching, finishing and plasma surface coating of the object.

The plasma surface treatment technology is a dry treatment method, and has the following advantages by replacing the traditional wet treatment technology:

(1) the environmental protection technology comprises the following steps: the plasma reaction process is a gas-solid phase dry reaction, so that water resources are not consumed, and chemical agents are not required to be added;

(2) the efficiency is high: the whole process can be completed in a short time;

(3) the cost is low: the device is simple, easy to operate and maintain, a small amount of gas replaces expensive cleaning solution, and meanwhile, the cost for treating waste liquid is avoided;

(4) the treatment is more precise: the cleaning agent can penetrate into the inner parts of the tiny holes and the pits and complete cleaning tasks;

(5) the applicability is wide: the plasma surface treatment technology can treat most solid substances, so the application field is very wide.

In the prior art, a person skilled in the art needs to select different plasma processing methods according to different processing technical requirements, shapes and properties of workpieces to be processed. For example: for the condition that plasma treatment is not uniform due to the fact that factors such as plasma density at different positions in a cavity of a workpiece to be treated is not uniform, the shape of the workpiece and a plasma sheath layer affect the uniformity of a surface coating, a person skilled in the art can realize the plasma treatment of the workpiece to be treated through the rotatable target table and the unidirectional or reciprocating rotation of the target table in 360 degrees, but the rotating plasma treatment process is time-consuming, so that the person skilled in the art can directly select a flat plate treatment mode to carry out the plasma treatment on the workpiece aiming at the workpiece with low requirement on the uniformity of the plasma treatment so as to improve the treatment efficiency. Therefore, it is very inconvenient for a user who has many and complicated types of workpieces to prepare at least two types of plasma processing apparatuses.

Chinese patent (CN208857360U) discloses a plasma surface treatment all-round rotation work piece target platform, including unable adjustment base and the rotatory target platform of setting on unable adjustment base, rotatory target platform is equipped with the grafting through-hole along the circumferencial direction interval arrangement, each the swing joint has a runing rest in the grafting through-hole be equipped with the actuating mechanism who drives rotatory target platform, runing rest synchronous revolution respectively in the unable adjustment base, pending work piece centre gripping is in on each runing rest, when carrying out plasma surface treatment, and the runing rest is rotatory to make each runing rest rotate around the axis of rotatory target platform, forms "revolution", and simultaneously, each runing rest rotates around self axis, forms "rotation", through revolution and rotation combination. However, this patent can only realize the turntable processing, cannot realize the flat plate processing, and the target table has a complicated structure and low work efficiency.

Due to these problems, the conventional plasma processing apparatus has a single function and cannot meet various plasma processing requirements. Therefore, how to provide a plasma processing apparatus with convenient use and multiple functions is a technical problem to be solved by those skilled in the art.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a use convenient, the manifold plasma treatment facility of function to solve the problem among the prior art. The technical scheme is as follows:

a plasma processing apparatus for performing flat panel and turntable processing, the processing apparatus comprising a housing assembly and an electrode assembly disposed within the housing assembly; wherein

The shell component is used for obtaining a vacuum environment for plasma treatment;

the electrode assembly is used for manufacturing plasma to realize plasma processing; the electrode assembly comprises a side plate, an electrode joint, an electrode plate and a turntable module.

Preferably, the housing assembly comprises a cavity and a front cover;

the cavity is of a cavity structure with an opening on one surface; the front cover is arranged on the cavity and used for sealing and opening the opening end of the cavity.

Preferably, an O-ring is arranged between the cavity and the front cover to enhance the sealing property between the cavity and the front cover.

Preferably, a window is arranged on the front cover and used for observing the workpiece to be processed in the cavity by a worker.

Preferably, the cavity is provided with a motor fixing frame, supporting legs, an air exhaust hole and an electrode interface;

the motor fixing frame is arranged at the bottom of the cavity and used for mounting a motor and providing power for the turntable module in the cavity;

the supporting legs are arranged at the bottom of the cavity and used for leveling the cavity;

the air exhaust hole is externally connected with a vacuum pump to create a vacuum environment in the cavity;

the electrode interface is used for being externally connected with a power supply to realize the electrification of the electrode in the cavity.

Preferably, the number of the side plates is two, the two side plates are respectively and fixedly arranged on the inner sides of the left side wall and the right side wall of the cavity, and three guide fixing grooves are arranged at the same positions of the two side plates at intervals for fixing the electrode plate;

the three guide fixing grooves are a lower fixing groove, a middle fixing groove and an upper fixing groove from bottom to top in sequence.

Preferably, the electrode joints comprise two negative electrode joints and a positive electrode joint, and the three electrode joints are sequentially fixed on the inner side of the front side plate of the cavity from bottom to top; wherein the content of the first and second substances,

two negative electrode tabs respectively correspond to the lower fixing groove and the upper fixing groove, and one positive electrode tab corresponds to the middle fixing groove; the positive electrode joint is connected to the electrode interface to realize the electrification of the positive electrode joint.

Preferably, the electrode joint comprises an electrode back plate, a clamp spring seat, a switching piece and a clamp column; wherein the content of the first and second substances,

the electrode back plate is used for fixing the electrode joint on the inner side of the front side plate of the cavity;

the clamp spring seat is arranged on the outer side of the electrode back plate;

the adapter plate is arranged in the middle of the clamp spring seat, and the adapter plate can realize up-and-down displacement and reset through the elasticity of the clamp spring seat;

the clamping column is arranged on the bottom surface of the tail end of the adapter plate and used for fixing the electrode plate.

Preferably, the electrode plates comprise three electrode plates, the three electrode plates are respectively arranged between the two side plates along the guide fixing grooves, the tail ends of the electrode plates are respectively fixed on the electrode joints, the electrode plate connected with the negative electrode joint becomes a negative electrode plate, and the electrode plate connected with the positive electrode joint becomes a positive electrode plate;

and the tail end of the electrode plate is provided with a hole corresponding to the clamping column so as to fix the electrode plate and the electrode joint.

Preferably, the turntable module is arranged at the bottom of the cavity, connected to a motor on the motor fixing frame and used for rotating the workpiece to be processed.

The utility model discloses the beneficial technological effect who obtains:

(1) two sets of plasma processing devices are arranged in the cavity, and the electrode plate is convenient to detach and mount through the electrode joint, so that the conversion between two modes of flat-plate plasma processing and rotary-disc plasma processing is realized.

(2) The adapter plate is connected to the electrode back plate through the clamp spring seat, so that the adapter plate can move elastically, and the electrode plate is convenient to detach and mount.

The foregoing description is only an overview of the technical solutions of the present application, so that the technical means of the present application can be more clearly understood and the present application can be implemented according to the content of the description, and in order to make the above and other objects, features and advantages of the present application more clearly understood, the following detailed description is made with reference to the preferred embodiments of the present application and the accompanying drawings.

The above and other objects, advantages and features of the present application will become more apparent to those skilled in the art from the following detailed description of specific embodiments thereof, taken in conjunction with the accompanying drawings.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts. Throughout the drawings, like elements or portions are generally identified by like reference numerals. In the drawings, elements or portions are not necessarily drawn to scale.

Fig. 1 is a front view of a plasma processing apparatus of the present invention;

fig. 2 is a rear view of the plasma processing apparatus of the present invention;

FIG. 3 is an internal view of the plasma processing apparatus according to the present invention in a use state;

FIG. 4 is an internal view of another embodiment of the plasma processing apparatus of the present invention;

FIG. 5 is a front view of an electrode of the plasma processing apparatus of the present invention;

wherein, 11-cavity; 12-a front cover; 13-motor fixing frame; 14-supporting feet; 15-air extraction holes; 16-a motor interface; 17-O-ring; 18-side plate; 19-guiding fixing groove; 21-a turntable module; 22-negative electrode tab; 23-positive electrode tab; 24-an electrode plate; 231-an electrode backing plate; 232-jump ring seat; 233-switching sheet; 234-card column.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. In the following description, specific details such as specific configurations and components are provided only to help the embodiments of the present application be fully understood. Accordingly, it will be apparent to those skilled in the art that various changes and modifications may be made to the embodiments described herein without departing from the scope and spirit of the present application. In addition, descriptions of well-known functions and constructions are omitted in the embodiments for the sake of clarity and conciseness.

It should be appreciated that reference throughout this specification to "one embodiment" or "the embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present application. Thus, the appearances of the phrase "one embodiment" or "the present embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.

Example one

Referring to fig. 1-4, a plasma processing apparatus for performing flat panel and turntable processing includes a housing assembly and an electrode assembly. The electrode assembly is disposed within the housing assembly.

The shell component is used for obtaining a vacuum environment for plasma treatment; the electrode assembly is used to produce plasma to achieve plasma processing.

Wherein the content of the first and second substances,

the housing assembly comprises a cavity 11 and a front cover 12. The cavity 11 is a cavity structure with an opening on one surface; the front cover 12 is disposed on the cavity 11 and used for sealing and opening an opening end of the cavity 11.

Preferably, an O-ring 17 is disposed between the cavity 11 and the front cover 12 for enhancing the sealing performance between the cavity 11 and the front cover 12.

Preferably, a window is arranged on the front cover 12 and used for observing the workpiece to be processed in the cavity 11 by a worker.

The cavity 11 is provided with a motor fixing frame 13, supporting legs 14, an air suction hole 15 and an electrode interface 16.

The motor fixing frame 13 is arranged at the bottom of the cavity 11 and used for installing a motor and providing power for the turntable module in the cavity 11.

The supporting legs 14 are arranged at the bottom of the cavity 11 and used for leveling the cavity.

The air exhaust hole 15 is used for being externally connected with a vacuum pump to create a vacuum environment in the cavity 11.

The electrode interface 16 is used for being externally connected with a power supply to realize the electricity connection of the positive electrode.

The electrode assembly includes a side plate 18, an electrode tab, an electrode plate 24 and a turntable module 21,

the number of the side plates 18 is two, the two side plates 18 are respectively and fixedly arranged on the inner sides of the left and right side walls of the cavity 11, and three guide fixing grooves 19 are arranged at the same positions of the two side plates 18 at intervals for fixing the electrode plate 24.

Preferably, the side plates 18 are made of an insulating material to insulate the positive electrode plate from the negative electrode plate.

Preferably, the three guide fixing grooves 19 are a lower fixing groove, a middle fixing groove and an upper fixing groove in sequence from bottom to top.

The electrode tabs include two negative electrode tabs 22 and one positive electrode tab 23. The three electrode tabs are sequentially fixed on the inner side of the front side plate of the cavity 11 from bottom to top, wherein two negative electrode tabs 22 correspond to the lower fixing groove and the upper fixing groove respectively, and one positive electrode tab 23 corresponds to the middle fixing groove. The positive electrode connector 23 is connected to the electrode interface 16, so as to electrify the positive electrode connector 23.

Referring back to fig. 5, the electrode contact includes an electrode back plate 231, a clamp spring seat 232, an adapter plate 233, and a clamp post 234.

The electrode back plate 231 is used for fixing the electrode joint on the inner side of the front side plate of the cavity 11;

the clamp spring seat 232 is arranged on the outer side of the electrode back plate 231;

the adapter plate 233 is arranged in the middle of the clamp spring seat 232, and the adapter plate 233 can move up and down and reset through the elasticity of the clamp spring seat 232;

the locking column 234 is disposed on the bottom surface of the end of the adapter plate 233, and is used for fixing the electrode plate 24.

The electrode plates 24 include three electrode plates 24, the three electrode plates 24 are respectively installed between the two side plates 18 along the guide fixing grooves 19, ends of the electrode plates 24 are respectively fixed to the electrode tabs, the electrode plate 24 connected to the negative electrode tab 22 becomes a negative electrode plate, and the electrode plate 24 connected to the positive electrode tab 23 becomes a positive electrode plate.

The end of the electrode plate 24 is provided with a plurality of holes corresponding to the fastening posts 234 to fix the electrode plate 24 and the electrode connector.

Preferably, the electrode plates 24 are made of conductors.

During installation, the electrode plate 24 slides along the guide fixing groove 19 into the cavity 11; when the electrode plate 24 slides to the end of the guide fixing groove 19, the electrode plate 24 jacks up the adapter plate 233, and the adapter plate 233 presses the clamp spring seat 232, so that the clamp spring seat 232 deforms; the electrode plate 24 continues to move forward, and when the clamping column 234 aligns with the hole on the electrode plate 24, the adapter plate 233 moves downward under the elastic force of the clamping spring seat 232, so that the clamping column 234 is clamped into the hole on the electrode plate 24, and the electrode tab is fixed to the electrode plate 24.

The turntable module 21 is arranged at the bottom of the cavity 11, connected to the motor on the motor fixing frame 13, and used for rotating a workpiece to be processed.

Preferably, the height of the turntable module 21 is lower than that of the lower fixing groove.

It should be noted that the air suction hole 15, the electrode connector 16, the motor on the motor fixing frame, and the like need to penetrate through the cavity 11, and sealing devices (e.g., O-rings) are disposed in structures connected with elements in the cavity 11 to ensure the sealing performance of the cavity 11.

It is worth noting that the power plug, the switch, the controller, the pressure release valve and the like in the present invention and the circuit connection between the above components all belong to the common knowledge and the conventional technical means in the field, and the present invention is not described herein again.

Example two

On the basis of the first embodiment, the present embodiment further discloses a method for using a plasma processing apparatus for implementing flat panel and turntable processing according to the present invention, which is as follows.

When the flat plasma treatment is needed, a worker opens the front cover 12, installs the three electrode plates 24 between the two side plates 18 along the guide fixing grooves 19, and the ends of the electrode plates 24 are fixed to the electrode connectors, respectively, the electrode plate 24 connected with the negative electrode connector 22 becomes a negative electrode plate, the electrode plate 24 connected with the positive electrode connector 23 becomes a positive electrode plate, and the area between the positive electrode plate and the negative electrode plate is a treatment area; a worker places a workpiece to be processed in the processing area; the front cover 12 is closed and locked, a vacuum environment is created through the air exhaust hole 15, the positive electrode joint 23 is electrified through the electrode interface 16, the positive electrode joint 23 is electrified to the electrode plate 24 connected with the positive electrode joint, and the flat-plate plasma processing of the workpiece to be processed is realized. In this process, the turntable module 21 does not operate.

When the rotating plasma processing is needed, a worker opens the front cover 12, only one electrode plate 24 is installed between the two side plates 18 along the middle fixing groove, the tail end of the electrode plate 24 is fixed to the positive electrode connector 23, the electrode plate 24 is a positive electrode plate, and the area between the positive electrode plate and the turntable module 21 is a processing area; a worker places a workpiece to be processed on the turntable module 21; the front cover 12 is closed and locked, a vacuum environment is created through the air exhaust hole 15, the positive electrode joint 23 is electrified through the electrode interface 16, the positive electrode joint 23 is electrified to the electrode plate 24 connected with the positive electrode joint, and the flat-plate plasma processing of the workpiece to be processed is realized.

The previous description of all disclosed embodiments is provided to enable any person skilled in the art to make or use the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. A plasma processing apparatus for performing flat panel and turntable processing, the processing apparatus comprising a housing assembly and an electrode assembly disposed within the housing assembly; wherein

The shell component is used for obtaining a vacuum environment for plasma treatment;

the electrode assembly is used for manufacturing plasma to realize plasma processing; the electrode assembly comprises a side plate (18), an electrode joint, an electrode plate (24) and a turntable module (21); the electrode plate (24) is detachably connected in the housing assembly through an electrode joint.

2. A plasma processing apparatus for performing both flat and rotating disc processing according to claim 1, wherein the housing assembly comprises a chamber (11) and a front cover (12);

the cavity (11) is of a cavity structure with an opening on one surface; the front cover (12) is arranged on the cavity (11) and used for sealing and opening the opening end of the cavity (11).

3. A plasma processing apparatus for performing plate and turn table processing according to claim 2, wherein an O-ring (17) is disposed between the chamber (11) and the front cover (12) for enhancing the sealing between the chamber (11) and the front cover (12).

4. A plasma processing apparatus for implementing flat and rotary plate processing according to claim 2, characterized in that the front cover (12) is provided with a window for a worker to observe the workpiece to be processed in the chamber (11).

5. The plasma processing device for realizing the processing of the flat plate and the turntable as claimed in claim 2, wherein the cavity (11) is provided with a motor fixing frame (13), a supporting leg (14), an air suction hole (15) and an electrode interface (16);

the motor fixing frame (13) is arranged at the bottom of the cavity (11) and used for mounting a motor and providing power for the turntable module in the cavity (11);

the supporting legs (14) are arranged at the bottom of the cavity (11) and used for leveling the cavity;

the air exhaust hole (15) is externally connected with a vacuum pump to create a vacuum environment in the cavity (11);

the electrode interface (16) is used for being externally connected with a power supply to realize the electricity connection of the electrode in the cavity (11).

6. A plasma processing apparatus for realizing flat and rotary plate processing according to claim 1, wherein said side plates (18) are two, two side plates (18) are respectively fixed on the inner sides of the left and right side walls of the chamber (11), three guide fixing grooves (19) are arranged at the same positions of the two side plates (18) at intervals for fixing the electrode plate (24);

the three guide fixing grooves (19) are a lower fixing groove, a middle fixing groove and an upper fixing groove from bottom to top in sequence.

7. The plasma processing device for realizing flat and rotary disc processing according to claim 6, wherein the electrode connectors comprise two negative electrode connectors (22) and one positive electrode connector (23), and the three electrode connectors are sequentially fixed on the inner side of the front side plate of the cavity (11) from bottom to top; wherein the content of the first and second substances,

two negative electrode tabs (22) respectively correspond to the lower fixing groove and the upper fixing groove, and one positive electrode tab (23) corresponds to the middle fixing groove; the positive electrode joint (23) is connected to the electrode interface (16) to realize the electrification of the positive electrode joint (23).

8. The plasma processing device for realizing flat plate and turntable processing according to claim 7, wherein said electrode connector comprises an electrode back plate (231), a clamp spring seat (232), an adapter plate (233) and a clamp column (234); wherein the content of the first and second substances,

the electrode back plate (231) is used for fixing the electrode joint on the inner side of the front side plate of the cavity (11);

the clamp spring seat (232) is arranged on the outer side of the electrode back plate (231);

the adapter plate (233) is arranged in the middle of the clamp spring seat (232), and the adapter plate (233) can move up and down and reset through the elasticity of the clamp spring seat (232);

the clamping column (234) is arranged on the bottom surface of the tail end of the adapter sheet (233) and used for fixing the electrode plate (24).

9. A plasma processing apparatus for performing a flat and rotating disk process according to claim 8, wherein said electrode plates (24) comprise three, three electrode plates (24) are respectively installed between the two side plates (18) along the guide fixing grooves (19), and ends of the electrode plates (24) are respectively fixed to the electrode tabs, the electrode plate (24) connected to the negative electrode tab (22) becomes a negative electrode plate, and the electrode plate (24) connected to the positive electrode tab (23) becomes a positive electrode plate;

the tail end of the electrode plate (24) is provided with a hole corresponding to the clamping column (234) so as to fix the electrode plate (24) and the electrode joint.

10. The plasma processing device for realizing flat-plate and turntable processing according to claim 1, wherein the turntable module (21) is disposed at the bottom of the chamber (11) and connected to the motor on the motor fixing frame (13) for rotating the workpiece to be processed.

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