CN211159328U - Chemical liquid medicine mixing device and wet etching device - Google Patents

Chemical liquid medicine mixing device and wet etching device Download PDF

Info

Publication number
CN211159328U
CN211159328U CN201920391750.4U CN201920391750U CN211159328U CN 211159328 U CN211159328 U CN 211159328U CN 201920391750 U CN201920391750 U CN 201920391750U CN 211159328 U CN211159328 U CN 211159328U
Authority
CN
China
Prior art keywords
chemical liquid
liquid medicine
stirrer
wet etching
medicine mixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201920391750.4U
Other languages
Chinese (zh)
Inventor
王春伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Huali Microelectronics Corp
Original Assignee
Shanghai Huali Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Huali Microelectronics Corp filed Critical Shanghai Huali Microelectronics Corp
Priority to CN201920391750.4U priority Critical patent/CN211159328U/en
Application granted granted Critical
Publication of CN211159328U publication Critical patent/CN211159328U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The utility model relates to a wet cleaning process technical field in the integrated circuit makes especially relates to a chemical liquid medicine mixing arrangement and applied this kind of chemical liquid medicine mixing arrangement's wet etching device, and this kind of chemical liquid medicine mixing arrangement includes: the stirrer is arranged in a mixing container; and the output end of the engine is connected with the input end of the stirrer. The utility model discloses technical scheme's beneficial effect lies in: the device is used for rapidly stirring the chemical liquid medicine in the wet cleaning process so as to enable the chemical liquid medicine to reach stable concentration as soon as possible, thus not only improving the production efficiency, but also enabling the surface of the wafer to be smoother.

Description

Chemical liquid medicine mixing device and wet etching device
Technical Field
The utility model relates to a wet cleaning process technical field especially relates to a chemistry liquid medicine mixing arrangement and wet etching device in integrated circuit makes.
Background
In the semiconductor manufacturing process, a wet cleaning process is an essential part, and plays an important role in the applications of rinsing silicon oxide on the wafer surface, removing residues, surface peeling and large-size pattern corrosion. The wet cleaning process is to place the wafer in a cleaning tank mixed with various chemical liquid medicines and clean the wafer by adopting a soaking or spraying mode.
In the prior art, as a plurality of chemical liquid medicines are mixed and used in a wet cleaning process in real time, the mixed concentration of the chemical liquid medicines is unstable, and further, non-uniform etching can generate extra over-etching or little etching on a wafer, so that the surface of the wafer is uneven, and the growth of a subsequent film is adversely affected. Therefore, there is a need for a device that can rapidly stabilize the concentration of chemicals to better control the wet cleaning process.
Disclosure of Invention
In view of the above problems in the prior art, a chemical liquid mixing device is provided.
The specific technical scheme is as follows:
the utility model discloses a chemistry liquid medicine mixing arrangement is applied to wet etching device, include:
the stirrer is arranged in a mixing container;
and the output end of the engine is connected with the input end of the stirrer.
Preferably, one end of the mixing container is connected with a plurality of chemical liquid containers.
Preferably, the other end of the mixing container is connected with a cleaning groove.
Preferably, the input end of the engine is connected with an external power supply.
Preferably, the input end of the engine is further provided with a frequency modulator.
Preferably, the external power source comprises a direct current power source or an alternating current power source.
Preferably, the frequency modulator is connected with a control terminal.
The utility model discloses still include a wet etching device, include as above-mentioned anyone chemical liquid medicine mixing arrangement.
The utility model discloses technical scheme's beneficial effect lies in: the chemical liquid mixing device is used for rapidly stirring the chemical liquid in a wet cleaning process so as to enable the chemical liquid to reach stable concentration as soon as possible, so that the production efficiency can be improved, and the surface of a wafer can be smoother.
Drawings
Fig. 1 is a schematic structural diagram of a chemical liquid mixing device according to an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by a person of ordinary skill in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict.
The present invention will be further described with reference to the accompanying drawings and specific embodiments, but the present invention is not limited thereto.
The utility model discloses a chemical liquid medicine mixing arrangement, as shown in figure 1, include:
the stirrer 1 is arranged in a mixing container 2;
and the output end of the engine is connected with the input end of the stirrer 1.
Specifically, the cleaning liquids used in the wet cleaning process mainly include a sulfuric acid cleaning liquid, an SC1 cleaning liquid, an SC2 cleaning liquid, and the like. The sulfuric acid cleaning solution is a mixture of sulfuric acid and hydrogen peroxide, and has a function of removing photoresist residues or organic matters on the surface of the wafer 4. The SC1 cleaning solution is a mixture of ammonia, hydrogen peroxide and water, and functions to remove particulate impurities and polymers on the wafer 4. The SC2 cleaning solution is a mixture of hydrochloric acid, hydrogen peroxide and water, the SC2 cleaning solution has the main function of removing metal ions on the wafer, the cleaning mechanism is that the cleaning solution can provide an environment with a low pH value, alkaline metal ions and metal hydride can be dissolved in the SC2 cleaning solution, and the SC2 cleaning solution can easily remove metal on the surface of the wafer 4.
Furthermore, the cleaning liquid of the wet cleaning process is composed of at least two chemical liquid medicines, the at least two chemical liquid medicines are placed in the mixing container 2, and the chemical liquid medicines are stirred by the stirrer 1, so that the concentration of the mixed chemical liquid medicines can quickly reach a stable value. Furthermore, the device improves the uniformity of the surface of the wafer 4, and avoids the defects of the wafer 4 caused by unstable concentration of the cleaning liquid.
In a preferred embodiment, one end of the mixing container 2 is connected with a plurality of chemical liquid containers;
the other end of the mixing container 2 is connected with a cleaning tank 3.
Specifically, as shown in fig. 1, the present embodiment includes three chemical liquid containers, a first chemical liquid container C1, a second chemical liquid container C2, and a third chemical liquid container C3, where three different chemical liquid containers are respectively filled with three different chemical liquid, and one end of the mixing container 2 is respectively connected to the first chemical liquid container C1, the second chemical liquid container C2, and the third chemical liquid container C3 through three chemical liquid conveying pipes, so that the three different chemical liquid containers enter the mixing container 2.
Further, the stirrer 1 in the mixing container 2 is driven to rotate by the engine, so that the three chemical liquid medicines reach stable concentrations as soon as possible, cleaning liquid of a wet cleaning process is obtained after the stirrer 1 finishes stirring the chemical liquid medicines, the cleaning liquid is conveyed into the cleaning tank 3, and then the wafer 4 is placed into the cleaning tank 3, so that the surface flatness of the wafer 4 is further improved.
In a preferred embodiment, the input end of the engine is connected with an external power supply;
the external power supply comprises a direct current power supply or an alternating current power supply.
Specifically, the engine in this embodiment may be connected to 220V ac mains or a dc power supply, so as to improve the stability of the engine in use.
In a preferred embodiment, the input of the engine is further provided with a frequency modulator.
Specifically, the frequency modulator is used for adjusting the rotational speed of the engine, further adjusting the stirring speed of the stirrer 1, and the rotational speed of the stirrer 1 can be set according to different types of mixed liquid medicines and production requirements through the frequency modulator.
In a preferred embodiment, the frequency modulator is connected to a control terminal, as shown in fig. 1.
Specifically, control terminal includes the computer, and through being connected to the computer with the frequency modulator, the staff can carry out remote control to the frequency modulator through the computer, and further, can realize carrying out remote control to the rotational speed of agitator 1 through control terminal.
Through above-mentioned technical scheme, install additional on original wet etching device's basis the utility model discloses a chemical liquid medicine mixing arrangement reaches the purpose that makes the chemical liquid medicine mix the quick homogenization of sour, and the device can adjust stirring ability and mode according to user's needs, and the practicality is stronger. The device can be used on the traditional groove type wet cleaning equipment and can also be applied to emerging single-chip wet cleaning equipment, and the device has a wide application range and high plasticity.
The utility model discloses technical scheme's beneficial effect lies in: the chemical liquid medicine mixing device is used for quickly stirring chemical liquid medicine in a mixing container, so that the chemical liquid medicine can reach stable concentration as soon as possible, the production efficiency can be improved, and the surface of a wafer can be smoother.
The above description is only an example of the preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and those skilled in the art should be able to realize the equivalent alternatives and obvious variations of the present invention.

Claims (6)

1. A chemical liquid medicine mixing device is applied to a wet etching device and is characterized by comprising:
the stirrer is arranged in a mixing container, one end of the mixing container is connected with a plurality of chemical liquid containers, and the other end of the mixing container is connected with a cleaning tank;
and the output end of the engine is connected with the input end of the stirrer.
2. A chemical liquid mixing device according to claim 1, wherein an input of said engine is connected to an external power source.
3. A chemical liquid mixing device according to claim 1, wherein said motor input is further provided with a frequency modulator.
4. The chemical liquid mixing device of claim 2, wherein the external power source comprises a dc power source or an ac power source.
5. The chemical liquid mixing device according to claim 3, wherein the frequency modulator is connected to a control terminal.
6. A wet etching apparatus comprising the chemical liquid mixing apparatus according to any one of claims 1 to 5.
CN201920391750.4U 2019-03-26 2019-03-26 Chemical liquid medicine mixing device and wet etching device Active CN211159328U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201920391750.4U CN211159328U (en) 2019-03-26 2019-03-26 Chemical liquid medicine mixing device and wet etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201920391750.4U CN211159328U (en) 2019-03-26 2019-03-26 Chemical liquid medicine mixing device and wet etching device

Publications (1)

Publication Number Publication Date
CN211159328U true CN211159328U (en) 2020-08-04

Family

ID=71787405

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201920391750.4U Active CN211159328U (en) 2019-03-26 2019-03-26 Chemical liquid medicine mixing device and wet etching device

Country Status (1)

Country Link
CN (1) CN211159328U (en)

Similar Documents

Publication Publication Date Title
CN104766790B (en) A kind of phosphorus, boron liquid source perfect diffusion technique
KR970067681A (en) Cleaning method and cleaning device
CA2388815A1 (en) Silicon nanoparticle and method for producing the same
CN103537453A (en) Method for ultrasonic cleaning of polished sapphire substrate wafer
CN103922602A (en) TFT (thin film transistor) glass substrate reducer, preparation method thereof and TFT glass substrate reducing process
WO2020039764A1 (en) System for producing washing water for electronic components, and operating method for system for producing washing water for electronic components
CN211159328U (en) Chemical liquid medicine mixing device and wet etching device
US20040151062A1 (en) Automatic chemical mixing system
US20030116174A1 (en) Semiconductor wafer cleaning apparatus and cleaning method using the same
CN103897862A (en) Photovoltaic silicon wafer cleaning agent and cleaning method thereof
CN102569036B (en) Silicon wafer cleaning technology
CN214477360U (en) Substrate cleaning device
CN104277944A (en) TFT (thin film transistor) liquid crystal glass substrate cleaning fluid and cleaning method thereof
KR100981285B1 (en) Production method to useing ozone functional water production system and ozone functional water production system equal concentration for siliconwafer
CN113257660B (en) Method for cleaning silicon wafer with no-end treatment corresponding to edge
CN112522723A (en) Water-soluble precision cleaning solution and preparation method thereof
CN203862609U (en) Semiconductor wafer cleaning device
JP2001102343A (en) Cleaning method of semiconductor wafer
JP2005051099A (en) Method of cleaning substrate
JPH04130629A (en) Etchant mixer
CN218797733U (en) Semiconductor wet cleaning equipment
CN111180363A (en) Cleaning liquid generating device and method
CN208717043U (en) A kind of ammonia nitrogen electric polarization processing integration apparatus
JP2005051101A (en) Method of cleaning substrate
CN217962387U (en) Treating agent spraying device for sewage treatment

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant