CN210341063U - Automatic liquid supplementing system for chemical plating - Google Patents
Automatic liquid supplementing system for chemical plating Download PDFInfo
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- CN210341063U CN210341063U CN201920922769.7U CN201920922769U CN210341063U CN 210341063 U CN210341063 U CN 210341063U CN 201920922769 U CN201920922769 U CN 201920922769U CN 210341063 U CN210341063 U CN 210341063U
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Abstract
The utility model relates to the technical field of surface treatment, and discloses an automatic liquid supplementing system for chemical plating, which comprises a plating bath and a liquid supplementing device, wherein the liquid supplementing device comprises a liquid storage container and a metering pump, an output port of the liquid storage container is connected with an input port of the metering pump, an auxiliary bath is arranged between the plating bath and the liquid supplementing device, an input port of the auxiliary bath is connected with an output port of the metering pump, and an output port of the auxiliary bath is connected with an input port of the plating bath; a pH meter electrically connected with a control electric box is arranged in the auxiliary tank or the plating tank, the signal output end of the pH meter is electrically connected with the control electric box, and the control electric box is electrically connected with the metering pump. The utility model discloses chemical plating automatic fluid infusion system can realize simultaneously detecting and automatic fluid infusion through the pH detection method, in time adjusts the composition and the pH valve of coating bath plating bath.
Description
Technical Field
The utility model relates to a surface treatment technical field, concretely relates to automatic fluid infusion system of chemical plating.
Background
Electroless plating, also known as electroless plating, is a plating method in which metal ions in a plating solution are reduced to metal by means of a suitable reducing agent in the absence of an applied current and deposited on the surface of various materials or parts. Compared with electroplating, chemical plating has the characteristics of uniform plating layer, small pin hole, no need of direct-current power supply equipment, capability of depositing on a non-conductor, no limitation of size and shape of a plated part and the like.
The deposition rate of the chemical plating solution is mainly influenced by the operation temperature, the concentration of metal ions in the plating solution, the concentration of a reducing agent and the pH value of the plating solution during plating. In order to ensure the deposition rate of the plating solution and prolong the service life of the plating solution, the components of the plating solution need to be reasonably and effectively adjusted to ensure timely replenishment of the consumed components of the plating solution such as metal ions, reducing agents and the like. If the chemical plating automation is to be realized, a set of targeted chemical plating automatic liquid supplementing system needs to be designed, so that the plating, the detection and the liquid supplementing can be automatically and synchronously carried out. However, the prior art lacks the automatic liquid replenishing system for the chemical plating with pertinence, so that the plating, the detection and the liquid replenishing can be automatically and synchronously carried out.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that overcome above prior art's shortcoming: the chemical plating automatic liquid supplementing system with pertinence is provided, and detection and automatic liquid supplementing can be achieved simultaneously.
The technical solution of the utility model is as follows: an automatic liquid supplementing system for chemical plating comprises a plating tank and a liquid supplementing device, wherein the liquid supplementing device comprises a liquid storage container and a metering pump, an output port of the liquid storage container is connected with an input port of the metering pump, an auxiliary tank is arranged between the plating tank and the liquid supplementing device, an input port of the auxiliary tank is connected with an output port of the metering pump, and an output port of the auxiliary tank is connected with an input port of the plating tank; a pH meter electrically connected with a control electric box is arranged in the auxiliary tank or the plating tank, the signal output end of the pH meter is electrically connected with the control electric box, and the control electric box is electrically connected with the metering pump.
The utility model discloses the working process is as follows:
the chemical plating automatic liquid supplementing system is characterized in that a pH meter is arranged in an auxiliary tank or a plating tank, a control electronic box is arranged outside the auxiliary tank or the plating tank and comprises a PLC (programmable logic controller), the pH meter is tightly matched with the control electronic box, the pH meter reflects the detected real-time pH value of the plating solution through an electric signal, the PLC calculates the received electric signal by comparing the pH value to obtain the required liquid supplementing amount, and the control electronic box sends a corresponding control signal to a metering pump to command the metering pump to work; when the metering pump is started, the metering pump extracts the liquid medicine from the storage container, the liquid medicine enters the plating tank from the auxiliary tank, so that the supplemented liquid medicine circulates and circulates between the plating tank and the auxiliary tank, and meanwhile, the pH value of the plating solution is timely adjusted.
The utility model discloses chemical plating automatic fluid infusion system has following advantage:
the method for detecting the plating solution by the pH meter can be called as a pH detection method, the pH value of the plating solution can be accurately detected by adopting the pH detection method for chemical plating, and a solution supplementing mode is improved in the detection process because the control electric box plays a key role of an intermediate bridge, the PLC can accurately calculate the consumption of various reactants in the chemical plating solution according to the detected pH value, then sends a corresponding control signal to the metering pump, and accurately extracts the required amount of liquid medicine by the metering pump for supplementing the liquid, so that the detection and the fluid supplementing in the process can be simply, quickly and synchronously completed. The pH detection method does not depend on color to detect the light transmission intensity, but detects the pH value of the plating solution, so the detection sensitivity and the detection accuracy are high. To sum up, the utility model discloses the detection of chemical plating automatic fluid infusion system only needs a pH data, and the control electronic box just can instruct the fluid infusion device to the replenishment of liquid medicine and to the regulation of pH for it can go on automatically in step to carry out to apply and plate, detect, fluid infusion, that is to say, the utility model discloses chemical plating automatic fluid infusion system can realize simultaneously detecting and automatic fluid infusion through the pH detection method, in time adjusts the composition and the pH valve of coating bath plating solution.
Preferably, a preheating device for heating the fluid infusion is arranged in front of the input port of the auxiliary tank, the input port of the preheating device is connected with the output port of the metering pump, and the output port of the preheating device is connected with the input port of the auxiliary tank. By adopting the structure, the replacement fluid is heated before being input into the auxiliary tank, so that the temperature of the replacement fluid conveyed to the plating tank is closer to the temperature of the plating solution, the excessive local temperature difference in the plating tank is avoided, the excessive local pH value in the plating solution is avoided, and the unstable factors of the plating solution are reduced. And the foam in the plating solution can be removed through the preheating process, so that the real-time detection effect of the pH meter is good, the accuracy is high, the sensitivity is high, and the measured pH value of the plating solution is more accurate.
Further preferably, the preheating device is a heat transfer pipe or a heat exchange pipe which is in direct contact with the liquid supplementing pipe. By adopting the preheating device, the liquid supplement is preheated while passing through the conveying process of the heat transfer pipe or the heat exchange pipe, the temperature entering the auxiliary tank reaches the preheating temperature, the local temperature difference is not too large, the local pH is not too high, and the detected pH is more accurate and stable.
It is also further preferred that the preheating device is a heating tank connected between the metering pump and the auxiliary tank. Because the heating tank has large capacity and low energy consumption, the heating and liquid supplementing are more rapid and efficient.
Preferably, a circulating pump and a filter are arranged between the auxiliary tank and the plating tank, an output port of the auxiliary tank is connected with an input port of the circulating pump, an output port of the circulating pump is connected with an input port of the filter, and an output port of the filter is connected with an input port of the plating tank. The filter is added, so that impurity dirt in the whole plating solution in the plating process can be filtered, and the interference of the impurities in the plating tank on the plating solution is reduced.
Further preferably, an overflow hopper is arranged in the plating tank, an input port of the overflow hopper is connected with an output port of the filter, and an output port of the overflow hopper is connected with an input port of the plating tank. By adopting the structure, the make-up fluid in the auxiliary tank firstly passes through the overflow hopper before being conveyed to the plating bath, namely the make-up fluid in the auxiliary tank is pumped into the filter by the circulating pump, after the liquid level in the overflow hopper is full, the make-up fluid overflows to flow into the plating bath, and thus the make-up fluid circulates between the plating bath and the auxiliary tank.
Preferably, the stock solution vessel includes a stock tank for storing the chemical solution a for adjusting the pH of the plating solution and a stock tank for storing the chemical solution B for adjusting the components of the plating solution.
Preferably, the liquid pump is one of a metering pump, a centrifugal pump and a diaphragm pump. All three pumps can pump liquid medicine.
Drawings
FIG. 1 is a schematic structural view of the chemical plating automatic solution replenishing system of the present invention.
FIG. 2 is a circuit diagram of the chemical plating automatic solution supplementing system of the present invention.
FIG. 3 is another circuit diagram of the chemical plating automatic solution replenishing system of the present invention.
The device comprises a liquid medicine A tank 1, a liquid medicine A tank 2, a first liquid pump 3, a liquid medicine A storage tank 4, a first metering pump 5, a liquid medicine B tank 6, a second liquid pump 7, a liquid medicine B storage tank 8, a second metering pump 9, a preheating device 10, an auxiliary tank 11, a circulating pump 12, a filter 13, a plating tank 14 and an overflow hopper.
Detailed Description
The present invention will be described in further detail with reference to the following specific examples, but the present invention is not limited to the following specific examples.
The following examples are not provided to limit the scope of the present invention, nor are the steps described to limit the order of execution. The present invention is not limited to the above embodiments, but may be modified in various ways.
The utility model relates to a multiple instrument, including pH meter, control electronic box, drawing liquid pump, measuring pump, circulating pump, filter, overflow fill, these instruments all can purchase through market, can adopt the online pH meter of the acid-fast alkali industry of high temperature resistant of market if the pH meter, and the control electronic box can adopt the electronic box that has the PLC controller of market.
Examples
As shown in fig. 1 to 3, an automatic solution replenishing system for electroless plating includes a plating tank 13, which is also called a main tank, and a solution replenishing device. The liquid supplementing device comprises a liquid storage container and a metering pump, and an output port of the liquid storage container is connected with an input port of the metering pump.
An auxiliary tank 10 is arranged between the plating tank 13 and the liquid supplementing device, an input port of the auxiliary tank 10 is connected with an output port of the metering pump, and an output port of the auxiliary tank 10 is connected with an input port of the plating tank 13.
The inner wall of the auxiliary tank 10 or the plating tank 13 is provided with a high-temperature-resistant pH meter electrically connected with a control electric box, the signal output end of the pH meter is electrically connected with the control electric box, and the control electric box is electrically connected with the metering pump. When the pH meter is disposed on the inner tank wall of the auxiliary tank 10, the control electric box may be disposed at a position close to the auxiliary tank 10; when the pH meter is provided on the inner tank wall of the plating tank 13, the control electric tank may be provided at a position close to the plating tank 13.
When the system works, a signal transmission route is auxiliary tank → pH meter → control electric box → metering pump, namely, the pH meter detects the pH value of the plating solution in the auxiliary tank, the detected pH value signal is converted into an electric signal and is transmitted to the control electric box, the control electric box receives the electric signal to calculate the required fluid infusion amount, and the electric signal is converted into a control signal and is transmitted to the metering pump to command the metering pump to work. The other signal transmission route is plating bath → pH meter → control electric box → metering pump, namely the pH meter detects the pH value of the plating solution in the plating bath, the detected pH value signal is converted into an electric signal and transmitted to the control electric box, the control electric box receives the electric signal to calculate the required fluid infusion amount, and the electric signal is converted into a control signal and transmitted to the metering pump to command the metering pump to work.
A preheating device 9 for heating and liquid supplementing is arranged in front of an input port of the auxiliary tank 10, the input port of the preheating device 9 is connected with an output port of the metering pump, and the output port of the preheating device 9 is connected with the input port of the auxiliary tank 10. The preheating device 9 can be a heat transfer pipe or a heat exchange pipe which is directly contacted with acid liquor or alkali liquor, and the preheating device 9 can also be a heating tank which is connected between the metering pump and the auxiliary tank 10.
A circulating pump 11 and a filter 12 are arranged between the auxiliary tank 10 and the plating tank 13, an output port of the auxiliary tank 10 is connected with an input port of the circulating pump 11, an output port of the circulating pump 11 is connected with an input port of the filter 12, and an output port of the filter 12 is connected with an input port of the plating tank 13.
An overflow hopper 14 is arranged on the inner tank wall of the plating tank 13, the input port of the overflow hopper 14 is connected with the output port of the filter 12, and the output port of the overflow hopper 14 is connected with the input port of the plating tank 13.
The liquid storage container comprises a liquid medicine A tank 1 and a liquid medicine A storage tank 3, wherein the liquid medicine A tank is used for storing liquid medicine A for adjusting the pH value of the plating solution. An output port of the liquid medicine A tank 1 is connected with an input port of the first liquid drawing pump 2, an output port of the first liquid drawing pump 2 is connected with an input port of the liquid medicine A storage tank 3, an output port of the liquid medicine A storage tank 3 is connected with an input port of the first metering pump 4, an output port of the first metering pump 4 is connected with an input port of the preheating device 9, and an output port of the preheating device 9 is connected with an input port of the auxiliary tank 10.
The liquid storage container further includes a liquid medicine B tank 5 and a liquid medicine B storage tank 7 for storing liquid medicine B for adjusting plating liquid components. An output port of the liquid medicine B tank 5 is connected with an input port of a second liquid drawing pump 6, an output port of the second liquid drawing pump 6 is connected with an input port of a liquid medicine B storage tank 7, an output port of the liquid medicine B storage tank 7 is connected with an input port of a second metering pump 8, an output port of the second metering pump 8 is connected with an input port of a preheating device 9, and an output port of the preheating device 9 is connected with an input port of an auxiliary tank 10.
The first liquid pump 2 is a centrifugal pump or a diaphragm pump, and the second liquid pump 6 is a centrifugal pump or a diaphragm pump.
The delivery route of the chemical liquid a is the chemical liquid a tank 1 → the first liquid drawing pump 2 → the chemical liquid a storage tank 3 → the first metering pump 4 → the preheating device 9 → the auxiliary tank 10 → the circulating pump 11 → the filtering machine 12 → the overflow hopper 14 → the plating tank 13. That is to say, first drawing liquid pump 2 pumps liquid medicine A in liquid medicine A jar 1 into liquid medicine A holding vessel 3, and the first measuring pump 4 is pumped into to liquid medicine A in liquid medicine A holding vessel 3, and first measuring pump 4 is taken out liquid medicine A according to required replenishment volume, and in the process preheating device 9 gets into auxiliary tank 10, circulating pump 11 pumps the liquid medicine A of auxiliary tank 10 into filter 12, then gets into overflow fill 14, treats that the liquid level is full in the overflow fill 14 after, liquid medicine A will spill over and come to flow in coating bath 13.
The delivery route of the chemical liquid B is the chemical liquid B tank 5 → the second liquid drawing pump 6 → the chemical liquid B storage tank 7 → the second metering pump 8 → the preheating device 9 → the auxiliary tank 10 → the circulating pump 11 → the filtering machine 12 → the overflow hopper 14 → the plating tank 13. That is to say, second drawing liquid pump 6 pumps liquid medicine B in liquid medicine B jar 5 into liquid medicine B holding vessel 7, and liquid medicine B in liquid medicine B holding vessel 7 pumps second measuring pump 8, and second measuring pump 8 is taken out liquid medicine B according to required replenishment, and in preheating device 9 gets into auxiliary tank 10, circulating pump 11 pumps the liquid medicine B of auxiliary tank 10 into filter 12, then gets into overflow fill 14, treats that the interior liquid level of overflow fill 14 is full back, and liquid medicine B will spill over and come the inflow coating bath 13.
It is easy to understand that in order to prevent the metal ions in the chemical liquid B from precipitating, the chemical liquid a and the chemical liquid B should enter the auxiliary tank through the corresponding metering pump and the preheating device, respectively, and then flow into the plating tank 13 through the circulating pump 11 → the filter 12 → the overflow hopper 14. If the temperature requirement of the plating solution in the plating tank is not high, a preheating device can be omitted, for example, the temperature of the plating solution is required to be 60 ℃, then the normal temperature of 25 ℃ is closer to the temperature of the plating solution, and thus, the local temperature difference is not too large. If the concentration of the liquid medicine A is lower, the liquid medicine A directly enters the auxiliary tank, so that local pH in the plating solution is not too high, and a preheating device is not needed. In a word, liquid medicine A and liquid medicine B divide two the tunnel and enter the auxiliary tank behind the measuring pump that corresponds separately, preheating device, this is the utility model discloses a preferred scheme.
The above are merely examples of the features of the present invention, and do not limit the scope of the present invention. All technical solutions formed by adopting equivalent exchanges or equivalent replacements fall within the protection scope of the present invention.
Claims (7)
1. An automatic liquid supplementing system for chemical plating comprises a plating tank (13) and a liquid supplementing device, wherein the liquid supplementing device comprises a liquid storage container and a metering pump, an output port of the liquid storage container is connected with an input port of the metering pump, and the automatic liquid supplementing system is characterized in that an auxiliary tank (10) is arranged between the plating tank (13) and the liquid supplementing device, the input port of the auxiliary tank (10) is connected with the output port of the metering pump, and the output port of the auxiliary tank (10) is connected with the input port of the plating tank (13); a pH meter electrically connected with a control electric box is arranged in the auxiliary tank (10) or the plating tank (13), the signal output end of the pH meter is electrically connected with the control electric box, and the control electric box is electrically connected with the metering pump.
2. The automatic liquid replenishing system for electroless plating according to claim 1, wherein a preheating device (9) for heating the liquid replenishing is arranged in front of the input port of the auxiliary tank (10), the input port of the preheating device (9) is connected with the output port of the metering pump, and the output port of the preheating device (9) is connected with the input port of the auxiliary tank (10).
3. The automatic liquid replenishing system for electroless plating according to claim 2, wherein the preheating device (9) is a heat transfer pipe or a heat exchange pipe which directly contacts the liquid replenishing.
4. The automatic liquid replenishing system for electroless plating according to claim 2, wherein the preheating device (9) is a heating tank connected between the metering pump and the auxiliary tank (10).
5. The automatic liquid replenishing system for electroless plating according to claim 1, wherein a circulating pump (11) and a filter (12) are arranged between the auxiliary tank (10) and the plating tank (13), an output port of the auxiliary tank (10) is connected with an input port of the circulating pump (11), an output port of the circulating pump (11) is connected with an input port of the filter (12), and an output port of the filter (12) is connected with an input port of the plating tank (13).
6. The automatic liquid replenishing system for the electroless plating according to claim 5, wherein an overflow hopper (14) is arranged in the plating tank (13), an input port of the overflow hopper (14) is connected with an output port of the filter (12), and an output port of the overflow hopper (14) is connected with an input port of the plating tank (13).
7. The automatic replenishment system for electroless plating according to claim 1, wherein the liquid storage vessel comprises a liquid medicine A storage tank for storing liquid medicine for adjusting pH of the plating solution and a liquid medicine B storage tank for storing liquid medicine for adjusting components of the plating solution.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920922769.7U CN210341063U (en) | 2019-06-19 | 2019-06-19 | Automatic liquid supplementing system for chemical plating |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201920922769.7U CN210341063U (en) | 2019-06-19 | 2019-06-19 | Automatic liquid supplementing system for chemical plating |
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| CN210341063U true CN210341063U (en) | 2020-04-17 |
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| CN201920922769.7U Active CN210341063U (en) | 2019-06-19 | 2019-06-19 | Automatic liquid supplementing system for chemical plating |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111733403A (en) * | 2020-08-10 | 2020-10-02 | 宁波纬诚科技股份有限公司 | Heating device of chemical plating auxiliary tank and plating tank system comprising same |
| CN114836813A (en) * | 2022-05-19 | 2022-08-02 | 武汉光目科技有限公司 | In-situ multifunctional electroplating bath device and working method |
-
2019
- 2019-06-19 CN CN201920922769.7U patent/CN210341063U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111733403A (en) * | 2020-08-10 | 2020-10-02 | 宁波纬诚科技股份有限公司 | Heating device of chemical plating auxiliary tank and plating tank system comprising same |
| CN111733403B (en) * | 2020-08-10 | 2020-12-08 | 宁波纬诚科技股份有限公司 | Heating device of chemical plating auxiliary tank and plating tank system comprising same |
| CN114836813A (en) * | 2022-05-19 | 2022-08-02 | 武汉光目科技有限公司 | In-situ multifunctional electroplating bath device and working method |
| CN114836813B (en) * | 2022-05-19 | 2024-04-19 | 武汉光目科技有限公司 | In-situ multifunctional electroplating bath device and working method |
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