CN2099135U

CN2099135U - Plasma film coating machine for columnar target

Info

Publication number: CN2099135U
Application number: CN 91230847
Authority: CN
Inventors: 陆国民
Original assignee: Individual
Current assignee: Individual
Priority date: 1991-10-26
Filing date: 1991-10-26
Publication date: 1992-03-18

Abstract

The utility model relates to a plasma film plating machine for a columnar target. A power supply having low voltage and heavy current is led between the columnar target and a vacuum chamber, argon gas or reaction gas is filled under certain vacuum condition, a striking arc device is used for causing a striking arc wire to contact the side surface of the columnar target for a short time in order to generate sparks, and the gas can be ionized to cause the columnar target to generate an electric arc which can discharge around the side surface of the columnar target and around a magnetic field in the columnar target in a spot type via accelerated rotation. The electric arc can move back and forth along a target shaft with the magnetic field in the columnar target, target plating metal materials can be gasified and evaporated, and the ions of plating materials ionized under the negative bias action of a working frame are formed into films on workpieces. Different reaction gas can be filled for making various kinds of reactive ion plating. Film layers of the plated workpieces are uniform and firm.

Description

Plasma film coating machine for columnar target

The utility model relates to a kind of coating equipment, particularly is suitable for the plasma film coating machine of Style Columu Talget formula.

The plasma accelerator evaporating and ionizing source of existing coating equipment is the end face evaporation of adopting target, because the generating surface fixed point is at the end face of target, so that the rete pros and cons of workpiece to be plated is inhomogeneous, can only adopt a plurality of evaporation sources to remedy this deficiency at present, thereby cost will increase greatly for this reason.Another kind is the magnetron sputtering ion plating machine, though its adopts the side evaporation of Style Columu Talget, needs to adopt high-voltage (400 volts---600 volts) evaporation, and owing to ionization level is very low, diffraction is extreme difference also, so incompatibility plated film on the workpiece of complex geometry.

Task of the present utility model just provides the Style Columu Talget plasma film coating machine that a kind of workpiece to be plated even film layer firmly can be done multiple reactive ion plating.

The utility model is achieved in that plasma film coating machine pumped vacuum systems, Bell jar, wider range measurement are regulated, inlet pipe, Hong inclined to one side source, work rest, the work rest whirler, viewing window, arc power, arc initiation device, striking silk, Style Columu Talget, current-limiting resistance, alnico magnets, motor, the alnico magnets travel rope, post target water-cooled tube, compositions such as support.

Pumped vacuum systems is made up of mechanical pump and oil diffusion pump, it vacuumizes in Bell jar, regulate inspection by the wider range measurement and pick up the vacuum tightness signal, inlet pipe connects argon gas and reactant gases, Hong inclined to one side source provides a negative bias to work rest, work rest is by work rest rotating machine driven rotary, viewing window can be observed the situation in the vacuum chamber, arc power is that its anode of direct supply (9) of a low voltage large power supply is connected with Bell jar or support, negative terminal connects with Style Columu Talget, under the certain vacuum condition, when arc initiation device drive the striking silk to Style Columu Talget move and by the Style Columu Talget contact when separating, cause the contact short circuit of short period of time between striking silk and the Style Columu Talget, because the striking silk connects by current-limiting resistance and arc power anode, for this reason, the striking silk is by post target contact generation electrical spark when separating, make ionization of gas, the Style Columu Talget arc is lighted, in Style Columu Talget under the effect in alnico magnets magnetic field, make it to form a cyclic arc, make target plating material evaporate ionization, under the effect of work rest negative bias, plating material film forming on workpiece of evaporation, alnico magnets are done to move around along post target axle at post target in-core in the post target, the while cyclic arc is followed the magnetic field of alnico magnets in the target and is done to move around along target, when post target water-cooled tube is connected the water source, Style Columu Talget is cooled off.

The utility model has the advantages that: the workpiece to be plated even film layer is firm, adds different reaction gas physical efficiencys and does multiple reactive ion plating, and performance of the present utility model is equivalent to many targets formula plasma film coating machine, and cost equals single target plasma film coating machine.

Accompanying drawing is a structure principle chart of the present utility model

1. pumped vacuum systems 2. Bell jars 3. wider range measuring tubes 4. inlet pipe

5. bang inclined to one side source 6. falseworks, 7. work rest rotating machines, 8. viewing windows

9. low voltage large power supply follower 10. Style Columu Talget 11. arc initiation devices

12. striking silk 13. current-limiting resistances 14. alnico magnets 15. motors

16. draw connection 17. Style Columu Talget water-cooled tubes 18. supports

With reference to the accompanying drawings, the utility model is further described

Pumped vacuum systems (1) vacuumizes in Bell jar (2), wider range measuring tube (3) can be joined the vacuum tightness in the vacuum instrumentation Bell jar (2), inlet pipe (4) connects desired gas and gas control valve, positive termination Bell jar (2) shell in Hong inclined to one side source (5), negative terminal connects work rest (6), falsework rotating machine (7) drives the rotation of falsework (6), viewing window (8) can be observed the situation in the Bell jar (2), low-voltage and high-current follower (9) can be selected ZQX-160 type DC welder for use, its positive termination Bell jar (2), negative terminal connects Style Columu Talget (10), arc initiation device (11) acts on the same Style Columu Talget of striking silk (12) (10) and does the short-time contact short circuit, shape is played electrical spark, makes the combustion of Style Columu Talget (10) acnode, and short-circuit current forms a loop through current-limiting resistance (13).Alnico magnets this moment (14) are limited in the scratch start region of discharge, Style Columu Talget (10) electric arc quickens rotation around the post target and forms cyclic arc under the action of a magnetic field, make target metal gasification and ionization, under the effect of work negative bias, film forming on the Worker's Stadium, this ring-type arc is followed alnico magnets (14) and is moved around along Style Columu Talget simultaneously.Traction belt (16) connects alnico magnets (14) and motor (15), and post target water-cooled tube (17) is installed on Style Columu Talget (10) top, support (18).

Claims

1, a kind of Style Columu Talget plasma film Mo machine, form by parts such as low-voltage and high-current follower, Style Columu Talget, Bell jar, supports, it is characterized in that the low-voltage and high-current follower negative terminal that described coating equipment adopts connects with Style Columu Talget, anode connects with Bell jar or with support.

2, according to the described coating equipment of claim (1), it is characterized in that adopting in the post target monolithic alnico magnets and can be done move around by motor (15) traction along the target axle.