CN203260550U - Dual-frequency ion source - Google Patents
Dual-frequency ion source Download PDFInfo
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- CN203260550U CN203260550U CN 201320288971 CN201320288971U CN203260550U CN 203260550 U CN203260550 U CN 203260550U CN 201320288971 CN201320288971 CN 201320288971 CN 201320288971 U CN201320288971 U CN 201320288971U CN 203260550 U CN203260550 U CN 203260550U
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- ion source
- grid
- arc chamber
- backboard
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Abstract
The utility model discloses a dual-frequency ion source, which comprises a backboard, a discharge chamber, a grid and a neutralizer, wherein the rear end of the discharge chamber is shielded and closed by the backboard, the backboard is provided with a gas input hole, the grid is arranged at the front end of the discharge chamber, and the neutralizer is arranged at a grid plasma emission opening; and the discharge chamber is in a cylinder shape and is divided into two sections, the front section is a small-diameter section, the rear section is a large-diameter section, and two-stage RF induction coils are arranged on the outer edges of the two sections of the discharge chamber. The dual-frequency ion source can work normally under the low pressure of 0.001Pa, the process range of film coating is wider, the stability of the ion source is higher, the beam error during the process of film coating ranges from minus 3% to plus 3%, the dual-frequency ion source can be continuously used for 500 hours without having failure, and the ion beam is low in pollution.
Description
Technical field
The utility model relates to a kind of ion source, specifically a kind of radio-frequency ion source.
Background technology
In recent years, ion beam assisted depositing (IAD) technology generally has been applied in modern high-quality, the production of highly difficult, high efficiency optical coating.Ion beam assisted depositing is in gas-phase deposition coating, utilizes high-energy particle bombardment thin film deposition surface, improves the density of film and the structure of film, thereby improves the optical characteristics such as refractive index of film.Ion source plays decisive role as the device of ion beam assisted depositing in the process that changes the deposit film constituent structure.The assisted deposition ion source generally is divided into according to the ion accelerated mode has the grid ion source and without the grid ion source.
In without the grid ion source, commonly used have hall ion source, APS ion source, Penning ion source, an anode layer ion source etc.Without the grid ion source because do not need aperture plate to have power supply and advantage simple in structure, and by carrying out the design in special-shaped magnetic field, make the ion of plasma source extract efficient and greatly improve, under less discharge power (～4KW) just can obtain maximum ion current density 500 μ A/ cm
2Without the most representative in the grid ion source be the APS ion source of German Lai Bao company development, APS ion source and other are similarly without the grid ion source, exist the lower (ion energy: 20-200eV), the shortcoming such as use cost high (expensive LaB6 material) of energy.
In the grid ion source was arranged, commonly used had Kaufman (Kaufman) ion source, radio frequency (RF) ion source, a microwave ion source etc.Wherein, radio-frequency ion source is that present optical coating uses ionogenic main flow, as shown in Figure 1, in its arc chamber without filament as negative electrode, but adopt magnetic induction to produce plasma, thereby prolong stable work time, and reduce the impurity in the ion beam; Utilize the grid plasma to accelerate, wherein grid comprises screen, accelerating grid and grounded grid three-decker, and adopts averager to force neutralization.External the most representative with the radio-frequency ion source of U.S. Veeco company at present, its advantage is: the grid acceleration energy is large, but the ion pack, and the energy adjustment wide ranges is applicable to reacting gas.Shortcoming is: complex structure, expensive, poor stability, grid need often to clean, and ion beam current is low, and the wider distribution of ion energy is inhomogeneous etc.Domestic also have many units at the research radio-frequency ion source, and such as plasma physics research institute of the Chinese Academy of Sciences, Northeastern University, China Engineering Physics Research Institute, but they are in the development stage basically, and poor stability does not still have commercialization.
The utility model content
The utility model provides a kind of double frequency ion source for the defective that existing radio-frequency ion source technology exists, can the Effective Raise ion beam current, improve the particle energy uniformity, and reduce grid and clean frequency.
A kind of double frequency ion source described in the utility model, comprise backboard, arc chamber, grid and averager, the rear end of described arc chamber hides sealing by backboard, and backboard is provided with the gas input hole, grid is installed in the arc chamber front end, and averager is arranged on grid plasma emission mouth place; Described arc chamber is drum type brake and is divided into two sections, and leading portion is reduced diameter section, and back segment is enlarged diameter section, two sections arc chamber outer rims the two-stage radio-frequency induction coil is set.
Described two-stage radio-frequency induction coil connects two independently power supplys, and one of them frequency is 60 megahertzes, and corresponding radio frequency induction coil is around the arc chamber reduced diameter section, and another frequency is 13.6 megahertzes, and corresponding radio frequency induction coil is around the arc chamber enlarged diameter section.
As improvement, the coil turn of 60 megahertzes is 6 circles, and the turn-to-turn distance is 10mm, and the 13.6 megahertz numbers of turn are 4 circles, and the turn-to-turn distance is 8mm, and two coils all are wrapped with the thick insulating barrier of 1mm outward, and induction coil is selected copper pipe, and inside is connected with the deionized water cooling.
As improvement, described minor diameter and large diameter diameter ratio are D
1: D
2=1:1.2.
As improvement, at arc chamber enlarged diameter section rear portion near the backboard place barricade that equal gas uses that be arranged in parallel.
As improvement, described arc chamber wall material is selected the quartz of little recombination coefficient.
As improvement, have an annular water tank in the backboard outside and pass into cooling water.And the grid employing comprises the three grid ion-optic systems of drawing grid, accelerating grid and suppressor.
What double frequency ion source of the present utility model adopted is two independently power supplys, and a frequency is 60 megahertzes, and another frequency is 13.6 megahertzes.Such frequency and mechanism can work ion source under the low pressure of 0.001 Pa, the processing range when making plated film is wider.
The ionogenic working gas of double frequency of the present utility model is oxygen, and argon gas, nitrogen etc. also can be used as working gas.By plenum system, make working gas pass barricade evenly, spread apart to arc chamber fast.Two independent radio-frequency powers of 60 megahertzes and 13.6 megahertzes are transferred to respectively through impedance matching network on the induction coil of arc chamber of taper end and butt end, finally are coupled to respectively in two arc chambers.When radio-frequency current process induction coil, produce axial radio-frequency (RF) magnetic field, this magnetic field produces the vortex circumferential electric field over time.This induction field accelerates the electronics in arc chamber, and its and gas particle are bumped and ionize, thus generation and keep plasma.Accelerating grid electrode adopts and comprises the three grid ion-optic systems of drawing grid, accelerating grid and suppressor, and a plurality of apertures are arranged on the anode, will form the two sheath layers of plasma on the discharge plasma border.Ion accelerates to form ion beam by this meniscus sheath layer electron emission through the focusing of ion-optic system.This ion beam also must force neutralization by averager, and averager also can reliably provide the igniting starting the arc in low-voltage ion source except neutralization.
Double frequency of the present utility model is ionogenic draw functional.The ionogenic ion beam current of general radio frequency source can only reach 700 milliamperes, and double frequency ion source of the present utility model can reach 1000 milliamperes, and the ionization level of plasma obviously improves, and ion energy is more even simultaneously.Thereby improve quality and the qualification rate of optical coating product.For example when doing the test of projector light source lampshade plated film, use the full stove qualification rate of general radio frequency source ion source plated film 96%, and expire the stove qualification rate 99% with ion source of the present utility model, rate of finished products can improve 3%.
Ionogenic stability of the present utility model is high, and the error of line is used 500 hours failsafes continuously in positive and negative 3% in coating process, reaches world-class levels.
The ion beam that double frequency ion source of the present utility model is drawn pollutes little.The minimum 30ev that transfers to of the ionogenic ion energy of general radio frequency source, but also there is a large amount of high energy ions simultaneously in it, thus the bombardment grid is polluted grid, usually will clear up grid between 100 to 200 hours.The utility model adopts the double frequency ion source, and the potential change cycle of plasma sheath is different from the ionogenic unimodal structure of traditional single-frequency, but presents multi-peaks structure.Frequency 13.6MHz is higher, the energy of incident ion is less, ion passes the sheath layer within several rf periods, therefore the average sheath layer current potential of Ion response descends, can effectively reduce ion energy, the ionogenic high energy ion quantity of double frequency is reduced, thereby reduced bombardment and pollution to grid, generally can use between 500 to 800 hours and clear up grid.
The ionogenic suitable gas scope of double frequency of the present utility model is wide, and except oxygen, argon gas, nitrogen etc. also can be used as working gas.
Description of drawings
Fig. 1 is the structural representation of prior art,
Fig. 2 is structural representation of the present utility model.
The main element symbol description:
Arc chamber 1
Barricade 2
Accelerating grid electrode 3
Averager 4
60 megahertz radio frequency induction coils 5
13.6 megahertz radio frequency induction coil 6
Backboard 7
Embodiment
The ionogenic basic structure of double frequency of the present utility model comprises plasma discharge chamber 1, barricade 2, accelerating grid electrode 3, averager 4, two-stage radio- frequency induction coil 5,6, backboard 7 etc. as shown in Figure 2.Other omits not mark such as constraint magnetic field, plenum system, vacuum-pumping system, cooling system and plasma density diagnostic system etc. at this.
The ionogenic induction coil of double frequency adopts the radio frequency induction coil 5,6 of two independent current sources.A frequency is 60 megahertzes, and another frequency is 13.6 megahertzes.Two radio-frequency power generators are through 50 Ω radio frequency coaxial-cables, and by radio freqnency transformer and impedance matching network, are connected respectively on two inductive coupling coils 5,6.Two radio frequency induction coils 5,6 all adopt cylinder spiral shape coil, and adopt the externally positioned type structure.60 megahertz radio frequency induction coils 5 are around arc chamber 1 taper end, and coil turn is 6 circles, and the turn-to-turn distance is 10mm; 13.6 megahertz radio frequency induction coil 6 is around arc chamber 1 butt end, coil turn is 4 circles, and the turn-to-turn distance is 8mm.Two radio frequency induction coil 5,6 outer thick insulating barriers of 1mm that all are wrapped with are with control turn-to-turn electric discharge phenomena.Two radio frequency induction coils 5,6 are all selected the less copper pipe of resistivity, and inside is connected with the deionized water cooling.
Working gas among the embodiment is oxygen, the size that can regulate gas pushing quantity by plenum system.1 inner close air taking port place is provided with all gas barricades 2 of a disc at arc chamber, and working gas can be spread apart to arc chamber 1 evenly and rapidly by it.When air pressure is higher than 1Pa, can directly start by input radio frequency power; When air pressure is lower than 1Pa, can or starts filament by pulse gas and start.Vacuum-pumping system can add a prime mechanical pump by molecular pump to be finished.When vacuum system base vacuum degree is 5x10
-4During Pa, it is 1.2x10 that ion source passes into oxygen to working vacuum degree
-3Pa.When induction coil 5,6 is connected with radio-frequency current, will produce axial radio-frequency (RF) magnetic field, this magnetic field produces the vortex circumferential electric field over time.This induction field accelerates the electronics in arc chamber 1, and its and gas particle are bumped and ionize, thus generation and keep plasma.
The accurate control of oxygen content is of crucial importance to the uniformity of quality of forming film and film in the plasma, and it is related to the uniformity of constituent of the film, especially Multilayer ultrathin coating.The automatic control technology of the oxygen plasma constant concentration of using in the present embodiment is that 0.2 millimeter platinum plating tungsten filament is placed near the backboard 7 as the plasma probe, thereby obtain corresponding electric current by the bias voltage that changes probe and obtain volt-ampere (I-V) characteristic curve, calculated the parameters such as plasma temperature, density by the I-V curve.The electroneutral plasma space of detected space, electron density and ion concentration equate that the speed of electronics and ion satisfies Distribution and Maxwell's Velocity.Chemical reaction does not occur in probe material and gas, guarantees to work steadily in the long term under the atmosphere of aerobic.The space charge sheath layer thickness that forms around the probe is less than the dimension of probe area, can ignore edge effect like this, is similar to think that the area of sheath layer and probe equates.Can calculate plasma concentration by the I-V curve, and provide a voltage signal.To flowmeter, flowmeter is just regulated by the value of setting by this voltage signal.If it is large that concentration becomes, oxygen flow just reduces, if concentration diminishes, it is large that oxygen flow just becomes.By voltage signal, adjust the power of high frequency voltage simultaneously, make like this ion concentration of oxygen basically constant.
Adopt the 6221 type data acquisitions of NI in the present embodiment, by the Labview software control, provide pumping signal, be loaded on the probe by the drive circuit amplification, data collecting card feedback signal (I-V) is arranged again, again by the basic principle data of Labview software according to probe, thereby draw the numerical value of plasma concentration, and provide a voltage signal.
The concrete application approach of the utility model is a lot; the above only is preferred implementation of the present utility model; should be understood that; for those skilled in the art; under the prerequisite that does not break away from the utility model principle; can also make some improvement, these improvement also should be considered as protection range of the present utility model.
Claims (8)
1. a double frequency ion source comprises backboard, arc chamber, grid and averager, and the rear end of described arc chamber hides sealing by backboard, and backboard is provided with the gas input hole, and grid is installed in the arc chamber front end, and averager is arranged on grid plasma emission mouth place; It is characterized in that described arc chamber is drum type brake and is divided into two sections, leading portion is reduced diameter section, and back segment is enlarged diameter section, two sections arc chamber outer rims the two-stage radio-frequency induction coil is set.
2. double frequency ion source according to claim 1, it is characterized in that, described two-stage radio-frequency induction coil connects two independently power supplys, one of them frequency is 60 megahertzes, corresponding radio frequency induction coil is around reduced diameter section, another frequency is 13.6 megahertzes, and corresponding radio frequency induction coil is around enlarged diameter section.
3. double frequency ion source according to claim 1 and 2, it is characterized in that, the coil turn of 60 megahertzes is 6 circles, the turn-to-turn distance is 10mm, 13.6 the megahertz number of turn is 4 circles, the turn-to-turn distance is 8mm, and two coils all are wrapped with the thick insulating barrier of 1mm outward, induction coil is selected copper pipe, and inside is connected with the deionized water cooling.
4. double frequency ion source according to claim 1 and 2 is characterized in that, described minor diameter and large diameter diameter ratio are D
1: D
2=1:1.2.
5. double frequency ion source according to claim 1 and 2 is characterized in that, at arc chamber enlarged diameter section rear portion near the backboard place barricade that equal gas uses that be arranged in parallel.
6. double frequency ion source according to claim 1 and 2 is characterized in that, the arc chamber wall material is selected the quartz of little recombination coefficient.
7. double frequency ion source according to claim 1 and 2 is characterized in that, has an annular water tank in the backboard outside and passes into cooling water.
8. double frequency ion source according to claim 1 and 2 is characterized in that, grid adopts and comprises the three grid ion-optic systems of drawing grid, accelerating grid and suppressor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320288971 CN203260550U (en) | 2013-05-24 | 2013-05-24 | Dual-frequency ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320288971 CN203260550U (en) | 2013-05-24 | 2013-05-24 | Dual-frequency ion source |
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|---|---|
| CN203260550U true CN203260550U (en) | 2013-10-30 |
Family
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|---|---|---|---|
| CN 201320288971 Withdrawn - After Issue CN203260550U (en) | 2013-05-24 | 2013-05-24 | Dual-frequency ion source |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103247504A (en) * | 2013-05-24 | 2013-08-14 | 无锡启晖光电科技有限公司 | Dual-frequency ion source |
| CN104363693A (en) * | 2014-09-17 | 2015-02-18 | 东北师范大学 | Planar radio-frequency ion source drive-in target neutron tube |
| CN109538432A (en) * | 2019-01-24 | 2019-03-29 | 河南理工大学 | A kind of Helicon wave plasma propulsion device of no averager |
| CN110379698A (en) * | 2019-07-29 | 2019-10-25 | 上海集成电路研发中心有限公司 | A kind of ion source with double ionization rooms |
| CN114302548A (en) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | Radio frequency ionization device, radio frequency neutralizer and control method thereof |
-
2013
- 2013-05-24 CN CN 201320288971 patent/CN203260550U/en not_active Withdrawn - After Issue
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103247504A (en) * | 2013-05-24 | 2013-08-14 | 无锡启晖光电科技有限公司 | Dual-frequency ion source |
| CN103247504B (en) * | 2013-05-24 | 2015-11-18 | 无锡启晖光电科技有限公司 | A kind of Dual-frequency ion source |
| CN104363693A (en) * | 2014-09-17 | 2015-02-18 | 东北师范大学 | Planar radio-frequency ion source drive-in target neutron tube |
| CN109538432A (en) * | 2019-01-24 | 2019-03-29 | 河南理工大学 | A kind of Helicon wave plasma propulsion device of no averager |
| CN110379698A (en) * | 2019-07-29 | 2019-10-25 | 上海集成电路研发中心有限公司 | A kind of ion source with double ionization rooms |
| CN114302548A (en) * | 2021-12-31 | 2022-04-08 | 中山市博顿光电科技有限公司 | Radio frequency ionization device, radio frequency neutralizer and control method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20131030 Effective date of abandoning: 20151104 |
|
| C25 | Abandonment of patent right or utility model to avoid double patenting |