CN109192641B - Penning cold cathode ion source - Google Patents
Penning cold cathode ion source Download PDFInfo
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- CN109192641B CN109192641B CN201811013086.6A CN201811013086A CN109192641B CN 109192641 B CN109192641 B CN 109192641B CN 201811013086 A CN201811013086 A CN 201811013086A CN 109192641 B CN109192641 B CN 109192641B
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- cathode
- gas distribution
- ion source
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
Abstract
The invention discloses a penning cold cathode ion source, which is characterized in that discharge voltage is applied between an anode cylinder and a cathode, so that gas is discharged in a discharge chamber to form plasma; and applying extraction voltage between the cathode grid and the extraction grid to lead ions out of the plasma in the discharge chamber through an extraction port of the extraction grid. The first-stage distribution is carried out through the first gas distribution chamber, the first-stage distribution passes through the larger first gas distribution chamber, so that the distribution of the whole discharge area can be quickly achieved, but the distribution cannot be uniform, the second-stage distribution is carried out through the second gas distribution chamber, and the second-stage distribution is uniformly distributed through the small second gas distribution chamber, so that the distribution can be uniformly distributed in the whole discharge area. Solves the problem that the penning cold cathode ion source has higher requirement on air flow distribution and is difficult to be led out in large size in the prior art. The invention can be used for large-size extraction and can treat the surface of a large-size sample.
Description
Technical Field
The invention belongs to the technical field of ion beam material surface modification, and particularly relates to a penning cold cathode ion source.
Background
Ion source technology is widely used in the research of material surface modification and the fabrication of microelectronic devices, and therefore, ion source technology is an important application technology. The ion source is a core component of ion beam surface treatment and is a source for generating ions. When various ions generated by the ion source pass through an electric field, high energy is obtained, and then the surface of the sample is treated by adopting the high energy ions, so that a new structure is formed on the surface of the sample, and the purposes of material surface modification, formation of a new device and the like are achieved.
At present, the ion sources used for ion coating pretreatment mainly comprise a Hall ion source, a Koufman ion source and a penning cold cathode ion source, and a small part of the ion sources adopt microwave discharge and high-frequency discharge ion sources and the like.
The Hall ion source has large current and low voltage, is mainly used for optical coating and is not ideal for treating a metal substrate; the filament of the koffman ion source has short service life, needs to be replaced frequently, is very inconvenient and cannot process an oxidation film; microwave and high-frequency discharge ions generally have low power and high price.
The cold cathode ion source does not need a filament, has long service life and simple structure, and obtains plasma by means of penning discharge, and the cold cathode ion source is composed of two oppositely arranged discharge cathodes and an anode, wherein the anode is in a cylindrical shape, the discharge cathodes are in two sheet electrode structures and are oppositely arranged up and down at two ends of the anode cylinder, the middle of one of the discharge cathodes is provided with a hole for leading out ion beam current, a permanent magnet is added outside the anode and is axially arranged, electrons are accelerated in an electric field formed between the discharge cathodes and the anode and oscillate back and forth between the two discharge cathodes to form spiral motion under the action of a magnetic field, so that the collision probability of the electrons and molecules is increased, and the ionization degree is improved. When gas is fed into the discharge chamber formed by the anode and the discharge cathode, a discharge is generated to form a plasma.
The ion source electron with the structure is generated by oscillation and collision between two discharge cathodes, but the discharge gas pressure is high, the voltage is high, the requirements on gas flow distribution and magnetic field distribution are higher, otherwise, discharge unevenness and ablation phenomena are formed, the current is smaller, large-size extraction is difficult, most of the existing cold cathode ion sources are circular ion sources with the extraction caliber below 12 cm, the requirements on vacuum chambers are larger and larger along with the requirements of industrial production, the size requirements on the ion sources are larger and larger, a splicing mode of a plurality of small sources is proposed, but the splicing mode is found to be difficult to achieve uniform distribution of extraction beams, so that a large-size rectangular ion source needs to be developed.
Disclosure of Invention
The invention aims to provide a penning cold cathode ion source, which solves the problem that in the prior art, the penning cold cathode ion source has higher requirements on air flow distribution and magnetic field distribution, and is difficult to extract in a large size. The invention can be used for large-size extraction and can treat the surface of a large-size sample.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a penning cold cathode ion source which comprises a base, an air inlet nozzle, a gas distribution device, a cathode, an anode cylinder, an installation cylinder, permanent magnetic steel, a cathode grid mesh and an extraction grid mesh, wherein the air inlet nozzle is arranged on the base;
the air inlet nozzle penetrates from the bottom to the top of the base; the gas distribution device comprises a first gas distribution chamber and a second gas distribution chamber which are connected into a whole, the cavity volume of the first gas distribution chamber is larger than that of the second gas distribution chamber, the first gas distribution chamber is arranged on the base, a first cavity is formed between the first gas distribution chamber and the base, and gas introduced from the gas inlet nozzle can enter the first cavity; a plurality of first vent holes are formed at the joint of the first gas distribution chamber and the second gas distribution chamber; a plurality of second vent holes are formed in the side wall of the second gas distribution chamber; the second gas distribution chamber is provided with a cathode, the cathode is provided with a third vent hole, an anode cylinder is arranged outside the cathode, an installation cylinder is arranged outside the anode cylinder, and the installation cylinder is provided with a plurality of installation holes for installing permanent magnetic steel; the cathode is positioned below the anode cylinder, the cathode grid is positioned above the anode cylinder, an insulating layer is arranged between the cathode grid and the anode cylinder, and the cathode grid are oppositely arranged; the cathode grid is provided with a lead-out grid in parallel, and the middle of the lead-out grid is provided with a lead-out opening.
Furthermore, the invention is characterized in that:
the air inlet nozzle is positioned in the middle of the base; the distance between the adjacent first vent holes is gradually increased from the end part to the middle part.
The distance between the adjacent second vent holes is gradually increased from the end part to the middle part.
Permanent magnet steel distributes along the circumference of installation section of thick bamboo, and a plurality of permanent magnet steel is parallel to each other, evenly distributed between a plurality of permanent magnet steel of centre, the interval between the adjacent permanent magnet steel at both ends crescent.
The permanent magnet steel is cylindrical.
The cathode comprises a body and an auxiliary cathode which are connected into a whole, and the auxiliary cathode protrudes in the anode cylinder.
The base is provided with a groove for placing the gas distribution device.
The outlet is rectangular.
The length of the leading-out opening is 450mm, and the width is 40 mm.
A discharge voltage of 600V-700V is applied between the cathode and the anode cylinder;
an extraction voltage is applied between the extraction grid and the cathode grid; when the ion source is used for cleaning, the extraction voltage is 800V-1500V; when the ion source is used for etching, the extraction voltage is 2000V-3000V.
The gas introduced from the gas inlet nozzle is argon.
Compared with the prior art, the invention has the following beneficial technical effects:
according to the penning cold cathode ion source provided by the invention, discharge voltage is applied between the anode cylinder and the cathode, so that gas is discharged in a discharge chamber to form plasma; and applying extraction voltage between the cathode grid and the extraction grid to lead ions out of the plasma in the discharge chamber through an extraction port of the extraction grid. The invention provides a classified distribution principle of inlet air, because the inlet air can not be distributed quickly after the inlet nozzle is fed with air, the invention arranges the air distribution device into a first air distribution chamber and a second air distribution chamber which are connected into a whole, the cavity volume of the first air distribution chamber is larger than that of the second air distribution chamber, the invention carries out first-stage distribution by the first air distribution chamber, the first-stage distribution passes through the larger first air distribution chamber, so that the distribution of the first-stage distribution can reach the whole discharge area quickly, but can not be uniform, and then carries out second-stage distribution by the second air distribution chamber, and the second-stage distribution is uniformly distributed by the small second air distribution chamber, so that the second-stage distribution can be uniformly distributed in the whole discharge area. The invention is suitable for industrial production, is used for the film coating pretreatment process, and has the advantages of convenient and simple use, no fault for a long time and reliable use.
Furthermore, the invention adopts a mode of uniform distribution of the spacing between the permanent magnetic steels in the middle of the discharge space, and when the permanent magnetic steels approach to the two ends of the arc, the spacing between the adjacent permanent magnetic steels is gradually increased, so that the uniform distribution of the magnetic field is ensured.
Furthermore, the invention realizes the uniform distribution of gas and magnetic field, therefore, the leading-out opening of the invention can be set as a rectangular large-area leading-out caliber, and the market demand is satisfied.
Drawings
FIG. 1 is a schematic structural diagram of a penning cold cathode ion source according to the present invention;
in the figure, 1, a base; 2. an insulating layer; 3. a cathode; 4. permanent magnetic steel; 5. an anode cylinder; 6. leading out a grid mesh; 7. a cathode grid; 8. an air inlet nozzle; 9. and (6) mounting the cylinder.
Detailed Description
The invention is described in further detail below with reference to the accompanying drawings:
referring to fig. 1, the invention provides a penning cold cathode ion source, which comprises a base 1, an air inlet nozzle 8, an air distribution device, a cathode 3, an anode cylinder 5, an installation cylinder 9, permanent magnetic steel 4, a cathode grid 7 and an extraction grid 6;
the air inlet nozzle 8 penetrates from the bottom to the top of the base 1; the gas distribution device comprises a first gas distribution chamber and a second gas distribution chamber which are connected into a whole, the cavity volume of the first gas distribution chamber is larger than that of the second gas distribution chamber, the first gas distribution chamber is arranged on the base 1, a first cavity is formed between the first gas distribution chamber and the base 1, and gas introduced from the gas inlet nozzle 8 can enter the first cavity; a plurality of holes are arranged at the joint of the first gas distribution chamber and the second gas distribution chamber and are called as first vent holes; a plurality of holes are formed in the side wall of the second gas distribution chamber and are called second vent holes; a cathode 3 is arranged on the second gas distribution chamber, the cathode 3 is fixed on the base 1, a hole is formed in the cathode 3 and is called a third vent hole, an anode cylinder 5 is arranged outside the cathode 3, an installation cylinder 9 is arranged outside the anode cylinder 5, and a plurality of installation holes for installing permanent magnetic steel 4 are formed in the installation cylinder 9; the cathode 3 is positioned below the anode cylinder 5, the cathode grid 7 is positioned above the anode cylinder 5, the insulating layer 2 is arranged between the cathode grid 7 and the anode cylinder 5, and the cathode 3 and the cathode grid 7 are oppositely arranged; the cathode grid 7 is provided with a lead-out grid 6 in parallel, and the middle of the lead-out grid 6 is provided with a lead-out port.
The invention provides a classified distribution principle of inlet air, because the inlet air of the inlet nozzle 8 can not be distributed quickly, the invention carries out first-stage distribution through the first gas distribution chamber, the first-stage distribution passes through the first gas distribution chamber with larger size, so that the distribution can reach the whole discharge area quickly, but can not be uniform, and then carries out second-stage distribution through the second gas distribution chamber, the second-stage distribution is uniformly distributed through the second gas distribution chamber with small size, so that the distribution can be uniformly distributed in the whole discharge area.
Preferably, the air intake nozzle 8 is located in the middle of the base 1; the distance between the adjacent first vent holes is gradually increased from the end part to the middle part. The distance between the adjacent second vent holes is gradually increased from the end part to the middle part. Here, because the air inlet nozzle 8 is located in the middle of the base 1, the air quantity in the middle is sufficient relative to the air quantities at the two ends, so that the arrangement of the first vent hole and the second vent hole in the middle is relatively sparse, and the arrangement of the first vent hole and the second vent hole at the two ends is relatively compact, thereby achieving the purpose of uniform air distribution.
Preferably, the permanent magnetic steel 4 is cylindrical, the permanent magnetic steel 4 is distributed along the circumferential direction of the mounting cylinder 9, the permanent magnetic steels 4 are parallel to each other, and the lower end of the permanent magnetic steel 4 and the mounting cylinder 9 are fixed on the base 1. A plurality of permanent magnet steels 4 in the middle are uniformly distributed, and the space between the adjacent permanent magnet steels 4 at the two ends is gradually increased.
Here, according to the characteristics of the rectangular ion source, the permanent magnet steels 4 in the middle of the discharge space are uniformly distributed, and when the permanent magnet steels approach to the two ends of the arc, the distance between the adjacent permanent magnet steels 4 is gradually increased, so that the uniform magnetic field distribution is ensured.
Preferably, the base 1 of the present invention is provided with grooves for placing the gas distribution means.
The invention can make the magnetic field and the gas uniformly distributed, so the lead-out opening of the invention can be made into a rectangle, the length of the lead-out opening can be 450mm, and the width can be 40 mm.
The discharge voltage of 600V-700V is applied between the cathode 3 and the anode cylinder 5, wherein, the potential of the anode cylinder 5 and the cathode potential are respectively connected through the binding post; an extraction voltage is applied between the extraction grid 6 and the cathode grid 7; when the ion source is used for cleaning, the extraction voltage is 800V-1500V; when the ion source is used for etching, the extraction voltage is 2000V-3000V.
Preferably, the gas introduced from the gas inlet nozzle 8 is argon, and the argon is inert gas and is most easily ionized.
When in use, firstly, the system is vacuumized to 10 DEG-3Pa, then, filling the desired gas into the discharge chamber to 10-1Pa, at this time, 700V voltage is applied between the anode cylinder 5 and the cathode 3, so that the gas generates discharge in the discharge chamber to form plasma, at this time, 1000-1500V extraction voltage is applied to the extraction electrode, so that ions are extracted from the plasma in the discharge chamber through the extraction opening of the extraction grid 6, and a focusing lens is formed between the extraction grid 6 and the cathode grid 7, so that the ion beam is focused into a beam.
Claims (6)
1. A penning cold cathode ion source is characterized by comprising a base (1), an air inlet nozzle (8), an air distribution device, a cathode (3), an anode cylinder (5), an installation cylinder (9), permanent magnetic steel (4), a cathode grid mesh (7) and an extraction grid mesh (6);
the air inlet nozzle (8) penetrates from the bottom to the top of the base (1); the gas distribution device comprises a first gas distribution chamber and a second gas distribution chamber which are connected into a whole, the cavity volume of the first gas distribution chamber is larger than that of the second gas distribution chamber, the first gas distribution chamber is arranged on the base (1), a first cavity is formed between the first gas distribution chamber and the base (1), and gas introduced through the gas inlet nozzle (8) can enter the first cavity; a plurality of first vent holes are formed at the joint of the first gas distribution chamber and the second gas distribution chamber; a plurality of second vent holes are formed in the side wall of the second gas distribution chamber; a cathode (3) is arranged on the second gas distribution chamber, a third vent hole is arranged on the cathode (3), and the distance between the adjacent first vent holes is gradually increased from the end part to the middle part; the distance between every two adjacent second ventilation holes is gradually increased from the end part to the middle part, an anode cylinder (5) is arranged outside the cathode (3), an installation cylinder (9) is arranged outside the anode cylinder (5), a plurality of installation holes used for installing the permanent magnetic steels (4) are formed in the installation cylinder (9), the permanent magnetic steels (4) are distributed along the circumferential direction of the installation cylinder (9), the permanent magnetic steels (4) are mutually parallel, the permanent magnetic steels (4) in the middle part are uniformly distributed, and the distance between every two adjacent permanent magnetic steels (4) at the two ends is gradually increased; the cathode (3) is positioned below the anode cylinder (5), the cathode grid (7) is positioned above the anode cylinder (5), the insulating layer (2) is arranged between the cathode grid (7) and the anode cylinder (5), and the cathode (3) and the cathode grid (7) are oppositely arranged; the cathode grid (7) is provided with a lead-out grid (6) in parallel, the middle of the lead-out grid (6) is provided with a lead-out opening, the lead-out opening is rectangular, the length of the lead-out opening is 450mm, and the width of the lead-out opening is 40 mm.
2. A penning cold cathode ion source according to claim 1, characterized in that the permanent magnetic steel (4) is cylindrical.
3. A penning cold cathode ion source according to claim 1, characterized in that the cathode (3) comprises a body and an auxiliary cathode integrated into one piece, the auxiliary cathode protruding inside the anode cylinder (5).
4. A penning cold cathode ion source according to claim 1, characterized in that the base (1) is provided with grooves for placing gas distribution means.
5. A penning cold cathode ion source according to claim 1, characterized in that a discharge voltage of 600V-700V is applied between the cathode (3) and the anode cylinder (5);
an extraction voltage is applied between the extraction grid (6) and the cathode grid (7); when the ion source is used for cleaning, the extraction voltage is 800V-1500V; when the ion source is used for etching, the extraction voltage is 2000V-3000V.
6. A penning cold cathode ion source according to claim 1, characterized in that the gas fed through the inlet nozzle (8) is argon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811013086.6A CN109192641B (en) | 2018-08-31 | 2018-08-31 | Penning cold cathode ion source |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811013086.6A CN109192641B (en) | 2018-08-31 | 2018-08-31 | Penning cold cathode ion source |
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| Publication Number | Publication Date |
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| CN109192641A CN109192641A (en) | 2019-01-11 |
| CN109192641B true CN109192641B (en) | 2020-03-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201811013086.6A Active CN109192641B (en) | 2018-08-31 | 2018-08-31 | Penning cold cathode ion source |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7462033B2 (en) * | 2019-09-20 | 2024-04-04 | インフィコン・アーゲー | Vacuum-tight electrical feedthroughs |
| CN112139151A (en) * | 2020-09-11 | 2020-12-29 | 韩山师范学院 | Surface cleaning device for large equipment |
| CN116206518A (en) * | 2023-03-14 | 2023-06-02 | 哈尔滨工业大学 | Ground simulation device and method for interaction of interplanetary magnetic field and earth magnetic field |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2053796U (en) * | 1989-10-06 | 1990-02-28 | 西安工业学院 | Wide-beam cold-cathode ionization source |
| CN1594649A (en) * | 2004-07-06 | 2005-03-16 | 西安交通大学 | Metal ion source |
| CN106057614A (en) * | 2016-08-12 | 2016-10-26 | 兰州大学 | Cold-cathode penning ion source |
| CN207367914U (en) * | 2017-09-26 | 2018-05-15 | 深圳市鼎力真空科技有限公司 | A kind of narrow beam Linear ion gun |
-
2018
- 2018-08-31 CN CN201811013086.6A patent/CN109192641B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2053796U (en) * | 1989-10-06 | 1990-02-28 | 西安工业学院 | Wide-beam cold-cathode ionization source |
| CN1594649A (en) * | 2004-07-06 | 2005-03-16 | 西安交通大学 | Metal ion source |
| CN106057614A (en) * | 2016-08-12 | 2016-10-26 | 兰州大学 | Cold-cathode penning ion source |
| CN207367914U (en) * | 2017-09-26 | 2018-05-15 | 深圳市鼎力真空科技有限公司 | A kind of narrow beam Linear ion gun |
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| CN109192641A (en) | 2019-01-11 |
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Effective date of registration: 20220719 Address after: 710000 first floor, building 4, Kechuang smart Park, FengHao Avenue, Fengdong new town, Xixian New District, Xi'an, Shaanxi Province Patentee after: Shaanxi Ian Buneng carbon based Technology Co.,Ltd. Address before: Beilin District Xianning West Road 710049, Shaanxi city of Xi'an province No. 28 Patentee before: XI'AN JIAOTONG University |