CN106531600A - Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system - Google Patents
Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system Download PDFInfo
- Publication number
- CN106531600A CN106531600A CN201610888553.4A CN201610888553A CN106531600A CN 106531600 A CN106531600 A CN 106531600A CN 201610888553 A CN201610888553 A CN 201610888553A CN 106531600 A CN106531600 A CN 106531600A
- Authority
- CN
- China
- Prior art keywords
- electrode
- cooling water
- support seat
- layers
- arc chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000605 extraction Methods 0.000 title claims abstract description 21
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 title abstract description 4
- 239000000498 cooling water Substances 0.000 claims abstract description 26
- 239000000523 sample Substances 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 11
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000004593 Epoxy Substances 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000001802 infusion Methods 0.000 claims description 7
- 230000006698 induction Effects 0.000 claims description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
- 241000233855 Orchidaceae Species 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 6
- 239000001257 hydrogen Substances 0.000 abstract description 6
- -1 hydrogen ions Chemical class 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002449 FKM Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010885 neutral beam injection Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a device of a negative hydrogen ion source of a hole-shaped water-cooled electrode extraction system. A discharge chamber cover plate is fixed at the top end of a discharge chamber; an RF driver and a cesium injector are sequentially arranged at the upper part of the discharge chamber cover plate; the discharge chamber is fixedly arranged on a probe plate; the probe plate is provided with a plurality of langmuir probes; a magnetic filter is arranged on the lower surface of the probe plate; a tapered support seat is located below the probe plate; an electrode system is arranged on the tapered support seat; the tapered support seat is provided with two layers of metal flanges; support epoxy is located between the two layers of metal flanges; the tapered support seat is also provided with a cooling water pipe I; and two ends of the cooling water pipe I are located on the metal flanges respectively. Stable long-pulse plasma is generated through the RF driver, output of negative hydrogen ions is improved under the help of the cesium injector, beam current is led out through the extraction system and the beam current density is 350A/m<2>.
Description
Technical field
The present invention relates to a kind of device of hole shape water cooled electrode extraction system H- ion source.
Background technology
Ion source is to make neutral atom or molecular ionization, and therefrom draws the device of ion beam current.It is various types of
Ion accelerator, mass spectrograph, calutron, ion implantation apparatuses, ion beam etching device, ion propeller and receive
The indispensable part of the equipment such as the neutral-beam injector in control fusion facility.H- ion source is that one kind can produce negative hydrogen
The device of ion beam current, is mainly used in providing for which in neutral-beam injector at present>The high energy beam current of 180keV, high energy beam current
Injection controlled fusion device is plasma heating so as to reach fusion temperature.
The content of the invention
The object of the invention is exactly for the defect for making up prior art, there is provided a kind of hole shape water cooled electrode extraction system bears hydrogen
Ionogenic device.
The present invention is achieved by the following technical solutions：
A kind of device of hole shape water cooled electrode extraction system H- ion source, include caesium infusion appliance, RF drivers, arc chamber,
Probe card, electrode system, taper support seat, metal flange, support epoxy, magnetic filter and four layers of permanent magnet, in arc chamber
Top is fixed with electric discharge room cover plate, is sequentially arranged above with described RF drivers and caesium infusion appliance, institute in electric discharge room cover plate
The arc chamber stated is fixedly mounted on probe card, is provided with multiple Langmuir probes, described magnetic filter on described probe card
Device is arranged on below probe card, and described taper support seat is located at the lower section of probe card, and electrode system is arranged on taper support
On seat, double layer of metal flange is provided with taper support seat, described support epoxy is located between double layer of metal flange, in taper
Cooling water pipe one is additionally provided with support base, and the two ends of described cooling water pipe one are located on metal flange respectively, cooling water pipe one
Mid portion pass through described electrode system, described four layers of permanent magnet are around installed in the periphery of arc chamber.
Described electrode system is made up of PG electrodes, EG electrodes, four layers of electrode of ESG electrodes and GG electrodes, every layer of electrode
Be made up of four electrode plates, have 30 circular holes per electrode plate, between PG electrodes and EG electrodes, have 12kV voltages, EG electrodes and
There are 50kV voltages between ESG electrodes isoelectric level and GG electrodes.
Cooling water channel of the four layers of described electrode interior containing 12 long 3mm width 2.5mm, is provided with below cooling water channel
Permanent magnet mounting groove, in permanent magnet mounting groove is provided with permanent magnet, is fixedly arranged above magnet cover plate in electrode.
It is that 4mm thickness is cooled down to whole arc chamber for 1mm cooling water pipes two to be welded with internal diameter on described arc chamber, described
Four layers of permanent magnet be long 50mm, wide 10mm, height 15mm, magnetic induction be 3600 Gauss permanent magnets
RF drivers produce plasma as plasma generator, and wherein arc chamber is used as plasma propagation chamber, caesium note
Entering device can promote anion to produce, and magnetic filter can effectively reduce the electron temperature and anion loss rate of draw-out area.Electrode
System is made up of four layers of circle hole shape water cooled electrode.Four layers of electrode are respectively：Plasma electrode（PG electrodes）, extraction electrode（EG
Electrode）, electronics suppression electrode（ESG electrodes）, ground electrode（GG）.Every layer of electrode is made up of four electrode plates, is had per electrode plate
30 circular holes, wherein have 12kV voltages, have 50kV voltages between EG and ESG isoelectric levels and GG between PG and EG electrodes.Negative hydrogen from
Son is brought out under multistage electric field acceleration, and beam current density reaches 350A/m2.
It is an advantage of the invention that：The present invention produces stable long pulse plasma by RF drivers, in caesium infusion appliance
With the help of improve negative hydrogen ion output, by extraction system educt beaming flow, beam current density reaches 350A/m2.The negative hydrogen from
Component provides a kind of long pulse high-power H- ion source, meets neutral beam injection device high parameter requirement.
Description of the drawings
Fig. 1 is 1/4 sectional view of the present invention.
Fig. 2 is four layers of electrode schematic diagram of the present invention.
Fig. 3 is the EG electrode structure schematic diagrams of the present invention.
Fig. 4 is the EG electrode sectional views of the present invention.
Fig. 5 is the EG electrode cap upper cover plate structural representations of the present invention.
Specific embodiment
As shown in Fig. 1,2,3,4,5, a kind of device of hole shape water cooled electrode extraction system H- ion source includes caesium note
Enter device 1, RF drivers 2, arc chamber 4, probe card 5, electrode system 6, taper support seat 7, metal flange 8, support epoxy 9, magnetic
Filter 11 and four layers of permanent magnet 13, the top of arc chamber 4 be fixed with electric discharge room cover plate 3, electric discharge room cover plate 3 top according to
Secondary to be provided with described RF drivers 2 and caesium infusion appliance 1, described arc chamber 4 is fixedly mounted on probe card 5, described
Multiple Langmuir probes are installed on probe card 5, described magnetic filter 11 is arranged on below probe card 5, described taper
Support seat 7 is located at the lower section of probe card 5, and electrode system 6 is arranged on taper support seat 7, is provided with two-layer gold on taper support seat 7
Category flange 8, described support epoxy 9 are located between double layer of metal flange 8, are additionally provided with cooling water pipe one on taper support seat 7
10, the two ends of described cooling water pipe 1 are located on metal flange 8 respectively, and the mid portion of cooling water pipe 1 is through described
Electrode system 6, four layers of described permanent magnet 13 are fitted around in the periphery of arc chamber 4.
Described electrode system 6 is to suppress electrode 16 and ground electrode 17 by plasma electrode 14, extraction electrode 15, electronics
Four layers of electrode composition, every layer of electrode are made up of four electrode plates, have 30 circular holes per electrode plate, plasma electrode 14 and are drawn
Go out, extraction electrode 15 and electronics suppress have 50kV electric between 16 isoelectric level of electrode and ground electrode 17
Pressure.
Cooling water channel 18 of the four layers of described electrode interior containing the wide 2.5mm of 12 long 3mm, below cooling water channel 18
Permanent magnet mounting groove 19 is provided with, and permanent magnet 20 is installed in permanent magnet mounting groove 19, magnetic is fixedly arranged above in electrode
Body cover plate 21.
It is that 4mm thickness is cooled down to whole arc chamber for 1mm cooling water pipes 2 12 to be welded with internal diameter on described arc chamber 4,
Four layers of described permanent magnet 13 are long 50mm, wide 10mm, height 15mm, magnetic induction are 3600 Gauss permanent magnets.
In FIG, RF drivers 2 and caesium infusion appliance 1 are arranged on electric discharge room cover plate 3, integral installation is in arc chamber 4
On, seal and sealed using fluorine rubber ring.Arc chamber 4 is bolted on 5 on probe card, and on probe card, 5 install multiple bright Miaos
Your probe is used for measuring plasma parameter.Electrode system 6 is arranged on taper support seat 7, and support base 7 can using pyramidal structure
To considerably increase the insulation clearance between electrode under limited space, reduce extraction system size so as to reach, save material
The purpose of material and increase intensity.Taper support seat 7 is arranged on metal flange 8, and metal flange 8 is not only provided a supporting role may be used also
To play a part of cooling water supply and applied voltage.Epoxy 9 is supported to adopt bolt and viton seal ring as insulant
It is fixed between metal flange 8.Cooling water is introduced cooling water by the interface on metal flange 8 and is flowed into by cooling water pipe 10 again
Electrode system 6 realizes cooling.Wherein magnetic filter 11 mainly reduces the electron temperature of draw-out area installed on probe card 5, so as to
Reduce the collision loss that high energy electron is caused to anion.Being welded with cooling water pipe 12 on arc chamber 4 can be to whole arc chamber
Cooling.Four layers of permanent magnet 13 are fitted around around arc chamber, and its effect is constraint plasma, improves the close of plasma
Degree uniformity, makes plasma density less over time.
In fig. 2, there are 12kV voltages, the electricity such as EG electrodes 15 and ESG electrodes 16 between 15 electrode of PG electrodes 14 and EG electrodes
There are 50kV voltages between position and GG electrodes 17.Negative hydrogen ion is brought out under multistage electric field acceleration, and beam current density reaches 350A/
m2。
In Fig. 3,4,5, each electrode interior contains water-cooling groove, the internal cooling water channel 18 containing the wide 2.5mm of 12 long 3mm
For cooling down whole electrode, water route is presented herein below installation permanent magnet 20 in permanent magnet mounting groove 19 and prevents for constraining coelectron
Stop which to damage lower electrode bombardment.Magnet cover plate 21 is bolted on EG electrodes 15 prevents permanent magnet 20 from taking off
Fall.
Hole shape water cooled electrode system H- ion source operation principle：Hydrogen is ionized generation plasma into RF drivers 2
Body, the plasma electron and ion contacted with 4 inwall of arc chamber can lose.When discharge stability, into plasma
Electronics and produce ion tend to equal with the number of the electronics and ion that are lost in anode.Load in electrode system 6
High pressure, electrode system form ion optical lens.The ion of extraction forms ion beam through electrode system, and accelerates to required
Energy.
Claims (4)
1. a kind of device of hole shape water cooled electrode extraction system H- ion source, it is characterised in that：Include caesium infusion appliance, RF to drive
Dynamic device, arc chamber, probe card, electrode system, taper support seat, metal flange, support epoxy, magnetic filter and four layers of permanent magnetic
Ferrum, is fixed with electric discharge room cover plate on the top of arc chamber, is sequentially arranged above with described RF drivers in electric discharge room cover plate
With caesium infusion appliance, described arc chamber is fixedly mounted on probe card, is provided with multiple Langmuirs and visits on described probe card
Pin, described magnetic filter are arranged on below probe card, and described taper support seat is located at the lower section of probe card, electrode system peace
It is mounted on taper support seat, is provided with double layer of metal flange on taper support seat, described support epoxy is located at double layer of metal method
Between orchid, cooling water pipe one is additionally provided with taper support seat, the two ends of described cooling water pipe one are located at metal flange respectively
On, the mid portion of cooling water pipe one passes through described electrode system, and four layers of described permanent magnet are around installed in arc chamber
Periphery.
2. the device of a kind of hole shape water cooled electrode extraction system H- ion source according to claim 1, it is characterised in that：
Described electrode system suppresses four layers of electrode of electrode and ground electrode to constitute by plasma electrode, extraction electrode, electronics, per layer
Electrode is made up of four electrode plates, is had 30 circular holes per electrode plate, is had 12kV electric between plasma electrode and extraction electrode
Pressure, extraction electrode and electronics suppress have 50kV voltages between electrode isoelectric level and ground electrode.
3. the device of a kind of hole shape water cooled electrode extraction system H- ion source according to claim 2, it is characterised in that：
Cooling water channel of the four layers of described electrode interior containing 12 long 3mm width 2.5mm, is provided with permanent magnet below cooling water channel
Mounting groove, in permanent magnet mounting groove is provided with permanent magnet, is fixedly arranged above magnet cover plate in electrode.
4. the device of a kind of hole shape water cooled electrode extraction system H- ion source according to claim 1, it is characterised in that：
It is that 4mm thickness is cooled down to whole arc chamber for 1mm cooling water pipes two to be welded with internal diameter on described arc chamber, and described four layers are forever
Long Magnet is long 50mm, wide 10mm, height 15mm, magnetic induction are 3600 Gauss permanent magnets.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610888553.4A CN106531600A (en) | 2016-10-11 | 2016-10-11 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610888553.4A CN106531600A (en) | 2016-10-11 | 2016-10-11 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106531600A true CN106531600A (en) | 2017-03-22 |
Family
ID=58331488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610888553.4A Pending CN106531600A (en) | 2016-10-11 | 2016-10-11 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106531600A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107833817A (en) * | 2017-10-18 | 2018-03-23 | 东莞中子科学中心 | Remove caesium method and except caesium draws power supply in a kind of caesium catalysis negative hydrogen ion penning source |
| CN110418488A (en) * | 2019-08-26 | 2019-11-05 | 大连理工大学 | A kind of radio frequency discharge H- ion source chamber |
| CN111681936A (en) * | 2020-06-09 | 2020-09-18 | 中国科学院合肥物质科学研究院 | Tip field negative hydrogen ion source device for high-energy ion implanter |
| CN113438794A (en) * | 2021-06-29 | 2021-09-24 | 大连理工大学 | Negative hydrogen ion source system |
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| CN205452229U (en) * | 2015-12-30 | 2016-08-10 | 核工业西南物理研究院 | Long pulse high power ion source electrode grid cooling water route and vacuum seal structure |
| CN205542698U (en) * | 2015-12-30 | 2016-08-31 | 核工业西南物理研究院 | Clamping nut filament support's shielding structure in ion source arc chamber |
| CN205541967U (en) * | 2015-12-30 | 2016-08-31 | 核工业西南物理研究院 | Real empty room of high power long pulse neutral beam injection ware |
| CN206210745U (en) * | 2016-10-11 | 2017-05-31 | 中国科学院合肥物质科学研究院 | A kind of device of hole shape water cooled electrode extraction system H- ion source |
-
2016
- 2016-10-11 CN CN201610888553.4A patent/CN106531600A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN205452229U (en) * | 2015-12-30 | 2016-08-10 | 核工业西南物理研究院 | Long pulse high power ion source electrode grid cooling water route and vacuum seal structure |
| CN205542698U (en) * | 2015-12-30 | 2016-08-31 | 核工业西南物理研究院 | Clamping nut filament support's shielding structure in ion source arc chamber |
| CN205541967U (en) * | 2015-12-30 | 2016-08-31 | 核工业西南物理研究院 | Real empty room of high power long pulse neutral beam injection ware |
| CN206210745U (en) * | 2016-10-11 | 2017-05-31 | 中国科学院合肥物质科学研究院 | A kind of device of hole shape water cooled electrode extraction system H- ion source |
Non-Patent Citations (1)
| Title |
|---|
| WEI JIANGLONG等: "Design of the Prototype Negative Ion Source for Neutral Beam Injector at ASIPP", 《PLASMA SCIENCE AND TECHNOLOGY》 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107833817A (en) * | 2017-10-18 | 2018-03-23 | 东莞中子科学中心 | Remove caesium method and except caesium draws power supply in a kind of caesium catalysis negative hydrogen ion penning source |
| CN107833817B (en) * | 2017-10-18 | 2019-05-21 | 东莞中子科学中心 | Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source |
| CN110418488A (en) * | 2019-08-26 | 2019-11-05 | 大连理工大学 | A kind of radio frequency discharge H- ion source chamber |
| CN111681936A (en) * | 2020-06-09 | 2020-09-18 | 中国科学院合肥物质科学研究院 | Tip field negative hydrogen ion source device for high-energy ion implanter |
| CN113438794A (en) * | 2021-06-29 | 2021-09-24 | 大连理工大学 | Negative hydrogen ion source system |
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| C06 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170322 |
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