CN107833817A - Remove caesium method and except caesium draws power supply in a kind of caesium catalysis negative hydrogen ion penning source - Google Patents
Remove caesium method and except caesium draws power supply in a kind of caesium catalysis negative hydrogen ion penning source Download PDFInfo
- Publication number
- CN107833817A CN107833817A CN201710972829.1A CN201710972829A CN107833817A CN 107833817 A CN107833817 A CN 107833817A CN 201710972829 A CN201710972829 A CN 201710972829A CN 107833817 A CN107833817 A CN 107833817A
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- caesium
- pulse
- except
- high voltage
- power supply
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- 229910052792 caesium Inorganic materials 0.000 title claims abstract description 178
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 title claims abstract description 177
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000006555 catalytic reaction Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000000605 extraction Methods 0.000 claims abstract description 54
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 20
- 230000035485 pulse pressure Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 description 10
- 230000008021 deposition Effects 0.000 description 9
- 210000001367 artery Anatomy 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 210000003462 vein Anatomy 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- BCQMBFHBDZVHKU-UHFFFAOYSA-N terbumeton Chemical compound CCNC1=NC(NC(C)(C)C)=NC(OC)=N1 BCQMBFHBDZVHKU-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007773 negative electrode material Substances 0.000 description 1
- 238000001956 neutron scattering Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Particle Accelerators (AREA)
Abstract
This application discloses a kind of caesium catalysis negative hydrogen ion penning source except caesium method and except caesium draws power supply.Caesium method remove in the caesium catalysis negative hydrogen ion penning source of the application, is included in loading on extraction electrode and is removed caesium pulse, using except caesium pulse is by H Ion Extractions, forming the diverging line of low energy, the caesium deposited on removal extraction electrode；Wherein, except the impulse amplitude of caesium pulse is less than high voltage pulse.The application's removes caesium method, diverging line is drawn by using except caesium pulse, the caesium on extraction electrode surface is removed using line is dissipated, effectively avoid caesium extraction electrode surface deposit, avoid due to caesium deposit caused by H ion beam current qualities it is impacted and sparking the problems such as；Laid a good foundation to provide the H ion beam currents of high-quality.
Description
Technical field
The application is related to penning source domain, except caesium method and is removed more particularly to a kind of caesium catalysis negative hydrogen ion penning source
Caesium draws power supply.
Background technology
CSNS (abbreviation CSNS), high current neutron is produced by 1.6GeV high energy proton bombardments heavy metal target, and
Material microstructure and motion are studied using neutron.CSNS is mainly by linear accelerator, neutron-producing target station and neutron scattering spectrometer three
Most of composition.Wherein, linear accelerator is by H- ion guns (IS), low energy beam-flow transmission line (LEBT), radio frequency quadrupole accelerator
(RFQ), MEBT (MEBT), draft tube linac (DTL) and high energy beam transport line (HEBT) composition.
Inner in CSNS H- ion guns (IS), the source body for producing H- ion beams is penning source body 1, as depicted in figs. 1 and 2,
The lower section of penning source body 1 is extraction electrode bearing 2, and extraction electrode 21 is fixed on extraction electrode bearing 2, caused H- ion beams
Drawn by extraction electrode 21；Wherein, load pulses high pressure realizes the extraction of H- ion beams on extraction electrode 21, and high voltage pulse by
Draw power supply and high voltage pulse, capacitive load are produced using solid-state switch charge and discharge system.0 to 25kv company can be exported by drawing power supply
Continuous adjustable, 1 arrives the high voltage pulse of 25Hz frequency-adjustables, and high voltage pulse make it that H- ions accelerate (beamacceleration) is logical by H- ion guns (IS)
Cross low energy transmission line (LEBT).
H- ion guns (IS), as the source of linear accelerator and CSNS, effect be exactly produce H- from
Beamlet stream.Used in CSNS is present is the negative hydrogen ion penning source based on caesium catalytic action.Behind hydrogen injection penning source, to want
Produce H- ions, it is necessary to first produce electronics.Want to obtain electronics from the surface of any material it may first have to overcome material surface list
The spilling work((abbreviation Φ) of individual electronics, so needing to find the surface spilling less material of work(.
Work(Φ=2.14eV is overflowed on the minimum surface of caesium metal, and caesium can obtain as other metallic surface coating
Overflow work(in smaller surface.Existing CSNS uses negative electrode and anode material of the molybdenum as penning source, in Mo metallic surface
Caesium is plated, when it is 0.6 atomic layer to plate caesium thickness degree, surface overflows work(Φ and drops to 1.5eV suddenly, even if plating caesium thickness degree increases
Add, its surface overflows work(Φ and is also approximately equal to 2eV, and it is much smaller that work(is overflowed on the surface than the 4.6eV of molybdenum in itself.Therefore, it is existing
CSNS be catalyzed negative hydrogen ion penning source using caesium, to produce H- ion beam currents.
Caesium metal can greatly facilitate the yield of H- ions, be that CSNS penning source produces one of wholesale H- ion beam currents
Necessary condition.The injection rate of caesium can regulate and control vapour pressure, accurately controlled by setting caesium pot temperature；In general, caesium pot
Temperature is in 70 DEG C to 190 DEG C regulation and control, it is possible to meets the demand for control of different injection rates；Existing CSNS is also to use this side
Formula carries out what caesium injection rate accurately controlled.
But CSNS is a customer-oriented large scale equipment, when needed, often continuous operation, and it is continuous at its
It is not necessarily lasting to need H- ion beam currents during operation, that is to say, that can exist operation dutycycle it is relatively low when
Wait.Now, although not needing H- ion beam currents temporarily, CSNS is continued to run with, and caesium can also continue to inject, and not need caesium
In the case that catalysis produces H- ions, the caesium persistently injected can not be consumed fully, and excessive caesium can be caused constantly to be deposited on
Extraction electrode surface.The excessive caesium of extraction electrode deposition can cause many troubles, on the one hand, can cause extraction electrode and penning source
Sparking；On the other hand, H- ion beam currents are beaten can cause a large amount of caesium particles to sputter on extraction electrode, produce more polyelectron and splash
Ion is penetrated, the quality of H- ion beam currents is impacted.It is of course also possible to reduce or stop caesium by lowering the temperature of caesium pot
Supply；But reduce caesium pot temperature and take around half an hour, poor in timeliness, and caesium injection is also had in this process,
And bad quantitative assurance.
Therefore, caesium how is avoided in extraction electrode surface excess deposition, or how to be gone in time after finding to have caesium deposition
Remove, be the sparking for avoiding penning source and the key for ensureing H- ion beam current quality.
The content of the invention
The purpose of the application be to provide a kind of caesium catalysis negative hydrogen ion penning source except caesium method and except caesium draws power supply.
The application employs following technical scheme：
What the one side of the application disclosed a kind of caesium catalysis negative hydrogen ion penning source removes caesium method, is included in extraction electrode
Upper loading removes caesium pulse, using except caesium pulse is by H- Ion Extractions, forms the diverging line of low energy, removes and is sunk on extraction electrode
Long-pending caesium；Wherein, except the impulse amplitude of caesium pulse is less than high voltage pulse.
It should be noted that the key of the application is using impulse amplitude less than high voltage pulse except caesium pulse extraction is low
The diverging line of energy, flowed away using angular-spread beam except the caesium deposited on extraction electrode；Its principle is, on the one hand, diverging line is straight
Connect and destroy the Cs atom on extraction electrode from surface；On the other hand, diverging line is beaten on extraction electrode, and electricity is drawn in heating
Pole, the caesium of deposition is set to melt evaporation.It is appreciated that the diverging line of low energy can not be by between penning source and transfers line
Gap, therefore, transfers line will not be impacted；Also, diverging line increases the surface contacted with extraction electrode
Product, make its removal to depositing caesium more abundant；In addition, except the voltage of caesium pulse is relatively low, energy is also lower, will not produce and beat
Fire, avoid the sparking problem between extraction electrode and penning source caused by caesium deposits.
Preferably, except the impulse amplitude of caesium pulse is less than high voltage pulse.
It should be noted that except the impulse amplitude of caesium pulse is less than high voltage pulse, it is the purpose is to so that the line of extraction
Low energy line, ensure that it will not be supplied by LEBT without interference with normal line.It is appreciated that the pulse width except caesium pulse
Degree is bigger, and the beam energy of extraction is higher, and line is stronger to the removal effect of the unnecessary caesium of deposition, still, except caesium pulse is drawn
The line gone out must can not disturb the supply of normal line, therefore, except the impulse amplitude of caesium pulse is necessarily less than high voltage pulse, and
And, it is necessary to LEBT will not be passed through by ensureing the line for the low energy drawn except caesium pulse.
It is furthermore preferred that except the pulsewidth of caesium pulse is arranged between two pulses of high voltage pulse.And both pulse widths
All in arc stream pulse width.
It should be noted that except the diverging line of caesium pulse extraction is because can not be by between penning source and transfers line
Gap, the subsequent transmission components of CSNS linear accelerators can't be influenceed；Except caesium pulse is arranged at two pulses of high voltage pulse
Between when, as long as not influenceing the normal sequential of high voltage pulse；And the sequential of upstream device is unified with high voltage pulse, because
This, except caesium pulse does not interfere with CSNS normal sequential.
Preferably, except the pulse width of caesium pulse is 20-150 μ s continuously adjustabes, pulse rise time is less than 10 μ s, arteries and veins
Rushing fall time is less than 10 μ s, and impulse amplitude is 0-10kV continuously adjustabes, and pulse recurrence frequency is 1-25Hz continuously adjustabes.
It should be noted that the application's removes caesium pulse to reach the purpose except caesium, on the one hand, except the pulse of caesium pulse
Amplitude is less than high voltage pulse, and voltage is lower, and energy is also lower, therefore can only draw diverging line, and can not be as high voltage pulse
Draw the high H- ion beams of energy like that；On the other hand, except caesium pulse independence be arranged at high voltage pulse before or after, be located at
Between two high voltage pulses, the normal sequential of high voltage pulse is not influenceed.In order to obtain a kind of realization side of diverging line the application
Preferably using pulse width in formula, pulse rise time is less than 10 μ s for 20-150 μ s continuously adjustabes, and pulse fall time is small
In 10 μ s, impulse amplitude is 0-10kV continuously adjustabes, and pulse recurrence frequency removes caesium pulse for 1-25Hz continuously adjustabes.
The another side of the application discloses a kind of caesium that removes and draws power supply, and power supply and caesium catalysis negative hydrogen ion Pan should be drawn except caesium
Ning Yuan extraction electrode connection, drawing power supply except caesium includes two-way pulse output system, respectively high voltage pulse output system with
Except caesium pulse output system；High voltage pulse output system is extraction electrode load pulses high pressure, for drawing H- ion beams；Except caesium
Pulse output system is that extraction electrode loading removes caesium pulse, and the H- ions for drawing low energy dissipate line；Two-way pulse is defeated
Go out in system, remove caesium pulse except the loading of caesium pulse output system, its impulse amplitude is less than the loading of high voltage pulse output system
High voltage pulse.
It should be noted that the caesium that removes of the application draws power supply, can actually provide simultaneously except caesium pulse and arteries and veins
The power supply for pressure of leaping high, i.e., on the basis of the extraction power supply for extraction electrode load pulses high pressure of script, redesign increases again
Loading all the way is added to remove the pulse output of caesium pulse and the system of pulse signal acquisition, i.e., except caesium pulse output system.It is appreciated that
The application's removes caesium pulse output system all the way except caesium draws power supply its key and is to add, and others may be referred to existing
Draw power supply.
Preferably, the caesium that removes of the application is drawn in power supply, removes caesium pulse except the loading of caesium pulse output system, it removes caesium arteries and veins
The high voltage pulse of the pulse width of punching and the loading of high voltage pulse output system all in arc stream pulsewidth within, also, remove caesium pulse
Pulsewidth be arranged between two pulses of high voltage pulse.
It should be noted that the application's draws power supply except caesium, except the loading of caesium pulse output system can be with except caesium pulse
Independent is arranged at before or after whole high voltage pulse, between two high voltage pulses, is not specifically limited herein.
Preferably, the caesium that removes of the application is drawn in power supply, the high voltage pulse of high voltage pulse output system loading, and its pulse is wide
Spend and be less than 10 μ s for 50-500 μ s continuously adjustabes, pulse rise time, pulse fall time is less than 10 μ s, impulse amplitude 0-
25kV continuously adjustabes, pulse recurrence frequency are 1-25Hz continuously adjustabes.
Preferably, the caesium that removes of the application is drawn in power supply, removes caesium pulse except the loading of caesium pulse output system, its pulse is wide
Spend and be less than 10 μ s for 20-150 μ s continuously adjustabes, pulse rise time, pulse fall time is less than 10 μ s, impulse amplitude 0-
10kV continuously adjustabes, pulse recurrence frequency are 1-25Hz continuously adjustabes.
The application's simultaneously also discloses a kind of caesium catalysis negative hydrogen ion Pan for removing caesium and drawing power supply using the application again
Ning Yuan.
It should be noted that electricity is drawn in the caesium catalysis negative hydrogen ion penning source of the application as a result of the caesium that removes of the application
Source, it can be very good to avoid caesium excess deposition to avoid the H- ion beam currents as caused by caesium excess deposition on extraction electrode surface
Quality is impacted, and the problems such as sparking.
The caesium that power supply or the application are drawn except caesium for simultaneously also disclosing the application again of the application is catalyzed negative hydrogen ion Pan
Applications of the Ning Yuan in spallation neutron target.
The beneficial effect of the application is：
The application's removes caesium method, diverging line is drawn by using except caesium pulse, using dissipating line to extraction electrode
The caesium on surface is removed, effectively avoid caesium extraction electrode surface deposit, avoid due to caesium deposit caused by H- from
The problems such as sub- quality of beam is impacted and strikes sparks；Laid a good foundation to provide the H- ion beam currents of high-quality.
Brief description of the drawings
Fig. 1 is the structural representation of H- ion guns in the application background technology；
Fig. 2 is the structural representation of extraction electrode in the application background technology.
Embodiment
Technical term in the application is explained as follows：
Except caesium pulse：Refer to be loaded on extraction electrode, the voltage of the diverging line of the H- ions of low energy can be drawn
Pulse.
High voltage pulse：Refer to be loaded on extraction electrode, the voltage pulse of H- ion beam currents can be drawn.High voltage pulse
Voltage is higher than caesium pulse is removed, therefore, it is possible to draw the higher H- ion beams of energy, rather than diverging line.
The application is described in further detail below by specific embodiment.Following examples only are entered to advance to the application
One step illustrates, should not be construed as the limitation to the application.
Embodiment
The caesium that removes of this example draws power supply, is improved on the basis of existing extraction power supply, that is, is ensureing high voltage pulse output
On the basis of system, the output except caesium pulse and Pulse signal acquisition system all the way are further added by, i.e., except caesium pulse output system.Arteries and veins
Pressure output system of leaping high is extraction electrode load pulses high pressure, for drawing H- ion beams；Except caesium pulse output system is extraction
Electrode loading removes caesium pulse, and the H- ions for drawing low energy dissipate line；In two-way pulse output system, except caesium pulse is defeated
Go out system loads removes caesium pulse, and its impulse amplitude is less than the high voltage pulse of high voltage pulse output system loading, also, removes caesium arteries and veins
The pulsewidth of punching is arranged between two pulses of high voltage pulse, and it adds except the pulse width of caesium pulse with high voltage pulse output system
The high voltage pulse of load all in arc stream pulsewidth within.
The caesium that removes of this example draws power supply, and the high voltage pulse of high voltage pulse output system loading, its pulse width is 50-500
μ s continuously adjustabes, pulse rise time are less than 10 μ s, and pulse fall time is less than 10 μ s, and impulse amplitude is that 0-25kV continuously may be used
Adjust, pulse recurrence frequency is 1-25Hz continuously adjustabes.Caesium pulse is removed except the loading of caesium pulse output system, its pulse width is
20-150 μ s continuously adjustabes, pulse rise time are less than 10 μ s, and pulse fall time is less than 10 μ s, and impulse amplitude connects for 0-10kV
Continuous adjustable, pulse recurrence frequency is 1-25Hz continuously adjustabes.
Electrically connected in use, this example is drawn into power supply except caesium with the extraction electrode in caesium catalysis negative hydrogen ion penning source,
Loading remove caesium pulse on extraction electrode, using except caesium pulse is by H- Ion Extractions, forms the diverging line of low energy, removes extraction
The caesium deposited on electrode.
Using this example except caesium draws the penning source of power supply, the advantage is that：
(1) except caesium pulse, its impulse amplitude is up to 10kv, and voltage is low, can only draw the diverging line of low energy, and low
The diverging line of energy can not will not cause shadow by the gap between ion gun and transfers line to transfers line vacuum
Ring；
(2) line is diverging under this voltage, increases the surface area that diverging line contacts with extraction electrode, makes it
Removal to deposition caesium is more abundant；
(3) energy of low-voltage is relatively low, even if there is caesium deposition also not produce sparking.
Also, this example be arranged at two high voltage pulses except caesium pulse between, do not interfere with the normal sequential of high voltage pulse.
Above content is to combine the further description that specific embodiment is made to the application, it is impossible to assert this Shen
Specific implementation please is confined to these explanations.For the application person of an ordinary skill in the technical field, do not taking off
On the premise of conceiving from the application, some simple deduction or replace can also be made.
Claims (10)
1. caesium method is removed in a kind of caesium catalysis negative hydrogen ion penning source, it is characterised in that：It is included in loading on extraction electrode and removes caesium
Pulse, using except caesium pulse is by H- Ion Extractions, the diverging line of low energy is formed, removes what is deposited on the extraction electrode
Caesium；
The impulse amplitude except caesium pulse is less than high voltage pulse.
2. according to claim 1 remove caesium method, it is characterised in that：It is high that the impulse amplitude except caesium pulse is less than pulse
Pressure.
3. according to claim 1 remove caesium method, it is characterised in that：The pulsewidth except caesium pulse is arranged at high voltage pulse
Two pulses between.
4. remove caesium method according to claim any one of 1-3, it is characterised in that：The pulse width except caesium pulse is
20-150 μ s continuously adjustabes, pulse rise time are less than 10 μ s, and pulse fall time is less than 10 μ s, and impulse amplitude connects for 0-10kV
Continuous adjustable, pulse recurrence frequency is 1-25Hz continuously adjustabes.
5. one kind draws power supply except caesium, described to be connected except caesium extraction power supply with the extraction electrode in caesium catalysis negative hydrogen ion penning source,
It is characterized in that：It is described to draw power supply except caesium and include two-way pulse output system, respectively high voltage pulse output system and except caesium
Pulse output system；
The high voltage pulse output system is the extraction electrode load pulses high pressure, for drawing normal H- ion beams；
Described to remove caesium pulse except caesium pulse output system for extraction electrode loading, the H- ions for drawing low energy dissipate
Line；
In two-way pulse output system, described to remove caesium pulse except the loading of caesium pulse output system, its impulse amplitude is less than described
The high voltage pulse of high voltage pulse output system loading.
It is 6. according to claim 5 except caesium draws power supply, it is characterised in that：The removing except the loading of caesium pulse output system
Caesium pulse, it is within arc stream pulsewidth except the pulse width of caesium pulse, and the pulsewidth of high voltage pulse is also within arc stream pulsewidth；
Also, except the pulsewidth of caesium pulse is arranged between two pulses of high voltage pulse.
7. the caesium that removes according to claim 5 or 6 draws power supply, it is characterised in that：The high voltage pulse output system loading
High voltage pulse, its pulse width is 50-500 μ s continuously adjustabes, and pulse rise time is less than 10 μ s, and pulse fall time is less than
10 μ s, impulse amplitude are 0-25kV continuously adjustabes, and pulse recurrence frequency is 1-25Hz continuously adjustabes.
It is 8. according to claim 7 except caesium draws power supply, it is characterised in that：The removing except the loading of caesium pulse output system
Caesium pulse, its pulse width are 20-150 μ s continuously adjustabes, and pulse rise time is less than 10 μ s, and pulse fall time is less than 10 μ
S, impulse amplitude are 0-10kV continuously adjustabes, and pulse recurrence frequency is 1-25Hz continuously adjustabes.
9. a kind of caesium that power supply is drawn except caesium using described in claim any one of 5-8 is catalyzed negative hydrogen ion penning source.
10. the caesium catalysis negative hydrogen ion drawn except caesium described in power supply or claim 9 according to claim any one of 5-8
Application of the penning source in spallation neutron target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710972829.1A CN107833817B (en) | 2017-10-18 | 2017-10-18 | Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710972829.1A CN107833817B (en) | 2017-10-18 | 2017-10-18 | Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107833817A true CN107833817A (en) | 2018-03-23 |
| CN107833817B CN107833817B (en) | 2019-05-21 |
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ID=61648420
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000021597A (en) * | 1998-06-30 | 2000-01-21 | Nissin Electric Co Ltd | Hydrogen anion beam implantation method and implantation device |
| WO2014039579A2 (en) * | 2012-09-04 | 2014-03-13 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
| CN106531600A (en) * | 2016-10-11 | 2017-03-22 | 中国科学院合肥物质科学研究院 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
-
2017
- 2017-10-18 CN CN201710972829.1A patent/CN107833817B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000021597A (en) * | 1998-06-30 | 2000-01-21 | Nissin Electric Co Ltd | Hydrogen anion beam implantation method and implantation device |
| WO2014039579A2 (en) * | 2012-09-04 | 2014-03-13 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
| CN104903967A (en) * | 2012-09-04 | 2015-09-09 | Tri阿尔法能源公司 | Negative ion-based neutral beam injector |
| CN106531600A (en) * | 2016-10-11 | 2017-03-22 | 中国科学院合肥物质科学研究院 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
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| CN107833817B (en) | 2019-05-21 |
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