CN107833817B - Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source - Google Patents
Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source Download PDFInfo
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- CN107833817B CN107833817B CN201710972829.1A CN201710972829A CN107833817B CN 107833817 B CN107833817 B CN 107833817B CN 201710972829 A CN201710972829 A CN 201710972829A CN 107833817 B CN107833817 B CN 107833817B
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- caesium
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- 229910052792 caesium Inorganic materials 0.000 title claims abstract description 176
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 title claims abstract description 175
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000006555 catalytic reaction Methods 0.000 title claims abstract description 13
- 238000000605 extraction Methods 0.000 claims abstract description 55
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 21
- 210000001367 artery Anatomy 0.000 claims description 6
- 210000003462 vein Anatomy 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000004080 punching Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 11
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 238000001956 neutron scattering Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Particle Accelerators (AREA)
Abstract
This application discloses a kind of caesium catalysis negative hydrogen ion penning sources to draw power supply except caesium method and except caesium.Caesium method is removed in the caesium catalysis negative hydrogen ion penning source of the application, including load removes caesium pulse on extraction electrode, using except caesium pulse is by H- Ion Extraction, is formed the diverging line of low energy, is removed the caesium deposited on extraction electrode；Wherein, except the impulse amplitude of caesium pulse is less than high voltage pulse.The application's removes caesium method, diverging line is drawn by using except caesium pulse, the caesium on extraction electrode surface is removed using diverging line, effectively avoids the problems such as caesium is deposited on extraction electrode surface, avoids impacted H- ion beam current quality caused by being deposited due to caesium and sparking；It lays a good foundation to provide the H- ion beam current of high-quality.
Description
Technical field
This application involves penning source domains, except caesium method and remove more particularly to a kind of caesium catalysis negative hydrogen ion penning source
Caesium draws power supply.
Background technique
Chinese spallation neutron source (abbreviation CSNS), generates high current neutron by 1.6GeV high energy proton bombardment heavy metal target, and
Material microstructure and movement are studied using neutron.CSNS is mainly by linear accelerator, neutron-producing target station and neutron scattering spectrometer three
Most of composition.Wherein, linear accelerator is by H- ion source (IS), low energy beam-flow transmission line (LEBT), radio frequency quadrupole accelerator
(RFQ), medium energy beam transmission line (MEBT), draft tube linac (DTL) and high energy beam transport line (HEBT) composition.
Inner in the H- ion source (IS) of CSNS, the source body for generating H- ion beam is penning source body 1, as depicted in figs. 1 and 2,
The lower section of penning source body 1 is extraction electrode support 2, and extraction electrode 21 is fixed on extraction electrode support 2, the H- ion beam of generation
It is drawn by extraction electrode 21；Wherein, on extraction electrode 21 load pulses high pressure realize H- ion beam extraction, and high voltage pulse by
It draws power supply and high voltage pulse, capacitive load is generated using solid-state switch charge and discharge system.0 to 25kv company can be exported by drawing power supply
Continue adjustable, 1 arrives the adjustable high voltage pulse of 25Hz frequency, and high voltage pulse passes through H- ion beam acceleration by H- ion source (IS)
Transfers line (LEBT).
H- ion source (IS), as linear accelerator and the source of Chinese spallation neutron source, effect be exactly generate H- from
Beamlet stream.Used in CSNS is present is the negative hydrogen ion penning source based on caesium catalytic action.Behind hydrogen injection penning source, to want
Generate H- ion, it is necessary to first generate electronics.Want to obtain electronics from the surface of any substance it may first have to overcome material surface list
The spilling function (abbreviation Φ) of a electronics, so needing to find surface overflows the lesser substance of function.
Function Φ=2.14eV is overflowed on the smallest surface of caesium metal, and caesium is as other metallic surface coating, available
Overflow function in smaller surface.Existing CSNS uses cathode and anode material of the molybdenum as penning source, in Mo metallic surface
Caesium is plated, when plating caesium layer with a thickness of 0.6 atomic layer, surface overflows function Φ and drops to 1.5eV suddenly, even if plating caesium thickness degree increases
Add, surface overflows function Φ and is also approximately equal to 2eV, and it is much smaller that function is overflowed on the surface than the 4.6eV of molybdenum itself.Therefore, existing
CSNS using caesium be catalyzed negative hydrogen ion penning source, to generate H- ion beam current.
Caesium metal can greatly facilitate the yield of H- ion, be that the penning source of CSNS generates one of wholesale H- ion beam current
Necessary condition.The injection rate of caesium can regulate and control vapour pressure, accurately be controlled by setting caesium pot temperature；In general, caesium pot
Temperature regulates and controls at 70 DEG C to 190 DEG C, so that it may meet the demand for control of different injection rates；Existing CSNS is also using this side
Formula carries out what caesium injection rate accurately controlled.
But CSNS is a customer-oriented large scale equipment, and when needed, often continuous operation, and it is continuous at it
It is not necessarily lasting to need H- ion beam current during operation, that is to say, that can exist operation duty ratio it is lower when
It waits.Although at this point, temporarily do not need H- ion beam current, CSNS is continued to run, and caesium can also continue to inject, and is not needing caesium
In the case that catalysis generates H- ion, the caesium persistently injected is unable to get abundant consumption, will lead to excessive caesium and is constantly deposited on
Extraction electrode surface.Extraction electrode, which deposits excessive caesium, will cause many troubles, on the one hand, can cause extraction electrode and penning source
Sparking；On the other hand, H- ion beam current is beaten will cause a large amount of caesium particle sputterings on extraction electrode, generates more polyelectron and splashes
Ion is penetrated, the quality of H- ion beam current is impacted.It is of course also possible to reduce or stop caesium by the temperature for lowering caesium pot
Supply；But reduce caesium pot temperature and take around half an hour, poor in timeliness, and also have caesium injection in this process,
And bad quantitative assurance.
Therefore, how to avoid caesium in extraction electrode surface excess deposition, or how to be gone in time after discovery has caesium deposition
It removes, is the key that the sparking and guarantee H- ion beam current quality for avoiding penning source.
Summary of the invention
What the purpose of the application was to provide a kind of caesium catalysis negative hydrogen ion penning source draws power supply except caesium method and except caesium.
The application uses following technical scheme:
The one side of the application disclose a kind of caesium catalysis negative hydrogen ion penning source except caesium method, be included in extraction electrode
Upper load removes caesium pulse, using except caesium pulse is by H- Ion Extraction, forms the diverging line of low energy, removes and sink on extraction electrode
Long-pending caesium；Wherein, except the impulse amplitude of caesium pulse is less than high voltage pulse.
It should be noted that the key of the application is using impulse amplitude less than high voltage pulse except caesium pulse extraction is low
The diverging line of energy is flowed away using angular-spread beam except the caesium deposited on extraction electrode；Its principle is, on the one hand, diverging line is straight
It connects and destroys the Cs atom on extraction electrode from surface；On the other hand, diverging line is beaten on extraction electrode, and electricity is drawn in heating
Pole makes the caesium fusing evaporation of deposition.It is appreciated that the diverging line of low energy can not be by between penning source and transfers line
Gap therefore transfers line will not be impacted；Also, diverging line increases the surface contacted with extraction electrode
Product keeps it more abundant to the removal of deposition caesium；In addition, the voltage except caesium pulse is lower, energy is also lower, will not generate and beat
Fire avoids the sparking problem caused by caesium deposition between extraction electrode and penning source.
Preferably, except the impulse amplitude of caesium pulse is less than high voltage pulse.
It should be noted that except caesium pulse impulse amplitude be less than high voltage pulse, it is intended that make draw line be
Low energy line guarantees that it will not will not interfere normal line to supply by LEBT.It is appreciated that except the pulse width of caesium pulse
Degree is bigger, and the beam energy of extraction is higher, and line is stronger to the removal effect of the extra caesium of deposition, still, except caesium pulse is drawn
Line out must cannot interfere the supply of normal line, therefore, except the impulse amplitude of caesium pulse is necessarily less than high voltage pulse, and
And, it is necessary to ensure that the line for the low energy drawn except caesium pulse will not pass through LEBT.
It is furthermore preferred that the pulsewidth except caesium pulse is set between two pulses of high voltage pulse.And both pulse widths
All in arc stream pulse width.
It should be noted that except the diverging line of caesium pulse extraction is because can not be by between penning source and transfers line
Gap, will not influence the subsequent transmission component of CSNS linear accelerator；Except caesium pulse is set to two pulses of high voltage pulse
Between when, as long as not influencing the normal timing of high voltage pulse；And the timing of upstream device is unified with high voltage pulse, because
This, except caesium pulse will not influence the normal timing of CSNS.
Preferably, continuously adjustable for 20-150 μ s except the pulse width of caesium pulse, pulse rise time is less than 10 μ s, pulse
Fall time, impulse amplitude was continuously adjustable for 0-10kV less than 10 μ s, and pulse recurrence frequency is continuously adjustable for 1-25Hz.
It should be noted that the application's removes caesium pulse to achieve the purpose that except caesium, on the one hand, except the pulse of caesium pulse
Amplitude is less than high voltage pulse, and voltage is lower, and energy is also lower, therefore can only draw diverging line, and cannot be as high voltage pulse
The high H- ion beam of energy is drawn like that；On the other hand, except caesium pulse is independent be set to high voltage pulse before or after, be located at
Between two high voltage pulses, the normal timing of high voltage pulse is not influenced.In order to obtain a kind of realization side of diverging line the application
Preferably use pulse width continuously adjustable for 20-150 μ s in formula, pulse rise time, pulse fall time was small less than 10 μ s
In 10 μ s, impulse amplitude is continuously adjustable for 0-10kV, and pulse recurrence frequency removes caesium pulse for what 1-25Hz was continuously adjusted.
The another side of the application discloses one kind except caesium draws power supply, should be catalyzed negative hydrogen ion Pan except caesium extraction power supply and caesium
The extraction electrode of Ning Yuan connects, and drawing power supply except caesium includes two-way pulse output system, respectively high voltage pulse output system and
Except caesium pulse output system；High voltage pulse output system is extraction electrode load pulses high pressure, for drawing H- ion beam；Except caesium
Pulse output system is that extraction electrode load removes caesium pulse, and the H- ion for drawing low energy dissipates line；Two-way pulse is defeated
Out in system, caesium pulse is removed except the load of caesium pulse output system, impulse amplitude is less than the load of high voltage pulse output system
High voltage pulse.
It should be noted that the caesium that removes of the application draws power supply, can actually provide simultaneously except caesium pulse and arteries and veins
The power supply for pressure of leaping high, i.e., on the basis of script is the extraction power supply of extraction electrode load pulses high pressure, redesign increases again
Add load all the way except the pulse output of caesium pulse and the system of pulse signal acquisition, that is, removes caesium pulse output system.It is appreciated that
The application's removes caesium pulse output system except caesium extraction its key of power supply is to increase all the way, and others can refer to existing
Draw power supply.
Preferably, the caesium that removes of the application is drawn in power supply, is removed caesium pulse except the load of caesium pulse output system, is removed caesium arteries and veins
The pulse width of punching and the high voltage pulse of high voltage pulse output system load all in arc stream pulsewidth within, also, remove caesium pulse
Pulsewidth be set between two pulses of high voltage pulse.
It should be noted that the application's draws power supply except caesium, except the load of caesium pulse output system can be with except caesium pulse
It is independent to be set to before or after entire high voltage pulse, it is located between two high voltage pulses, is not specifically limited herein.
Preferably, the caesium that removes of the application is drawn in power supply, the high voltage pulse of high voltage pulse output system load, and pulse is wide
Degree is 50-500 μ s continuously adjustable, and pulse rise time, pulse fall time was less than 10 μ s, impulse amplitude 0- less than 10 μ s
25kV is continuously adjustable, and pulse recurrence frequency is continuously adjustable for 1-25Hz.
Preferably, the caesium that removes of the application is drawn in power supply, removes caesium pulse except the load of caesium pulse output system, pulse is wide
Degree is 20-150 μ s continuously adjustable, and pulse rise time, pulse fall time was less than 10 μ s, impulse amplitude 0- less than 10 μ s
10kV is continuously adjustable, and pulse recurrence frequency is continuously adjustable for 1-25Hz.
The application's also discloses a kind of caesium catalysis negative hydrogen ion Pan for removing caesium and drawing power supply using the application on one side again
Ning Yuan.
It should be noted that electricity is drawn due to using the caesium that removes of the application in the caesium catalysis negative hydrogen ion penning source of the application
Source can be very good to avoid caesium excess deposition on extraction electrode surface, avoid the H- ion beam current as caused by caesium excess deposition
Quality is impacted, and the problems such as sparking.
The caesium for drawing power supply or the application except caesium for also disclosing the application on one side again of the application is catalyzed negative hydrogen ion Pan
Application of the Ning Yuan in spallation neutron target.
The beneficial effects of the present application are as follows:
The application's removes caesium method, diverging line is drawn by using except caesium pulse, using diverging line to extraction electrode
The caesium on surface is removed, effectively avoid caesium extraction electrode surface deposit, avoid due to caesium deposition caused by H- from
The problems such as sub- quality of beam is impacted and strikes sparks；It lays a good foundation to provide the H- ion beam current of high-quality.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of H- ion source in the application background technique；
Fig. 2 is the structural schematic diagram of extraction electrode in the application background technique.
Specific embodiment
Technical term in the application is explained as follows:
Except caesium pulse: referring to and be loaded on extraction electrode, the voltage of the diverging line of the H- ion of low energy can be drawn
Pulse.
High voltage pulse: referring to and be loaded on extraction electrode, can draw the voltage pulse of H- ion beam current.High voltage pulse
Voltage, which is higher than, removes caesium pulse, therefore, can draw the higher H- ion beam of energy, rather than dissipate line.
The application is described in further detail below by specific embodiment.Following embodiment only to the application carry out into
One step explanation, should not be construed as the limitation to the application.
Embodiment
The caesium that removes of this example draws power supply, improves on the basis of existing extraction power supply, that is, is ensureing high voltage pulse output
On the basis of system, it is further added by the output and Pulse signal acquisition system for removing caesium pulse all the way, that is, removes caesium pulse output system.Arteries and veins
Pressure output system of leaping high is extraction electrode load pulses high pressure, for drawing H- ion beam；Except caesium pulse output system is to draw
Electrode load removes caesium pulse, and the H- ion for drawing low energy dissipates line；In two-way pulse output system, except caesium pulse is defeated
Out system loads remove caesium pulse, impulse amplitude be less than high voltage pulse output system load high voltage pulse, also, remove caesium arteries and veins
The pulsewidth of punching is set between two pulses of high voltage pulse, except the pulse width of caesium pulse adds with high voltage pulse output system
The high voltage pulse of load all in arc stream pulsewidth within.
The caesium that removes of this example draws power supply, the high voltage pulse of high voltage pulse output system load, and pulse width is 50-500 μ
S is continuously adjustable, and pulse rise time, pulse fall time, impulse amplitude was continuously adjustable for 0-25kV less than 10 μ s less than 10 μ s,
Pulse recurrence frequency is continuously adjustable for 1-25Hz.Caesium pulse, pulse width 20- are removed except the load of caesium pulse output system
150 μ s are continuously adjustable, and pulse rise time, pulse fall time, impulse amplitude was that 0-10kV is continuous less than 10 μ s less than 10 μ s
Adjustable, pulse recurrence frequency is continuously adjustable for 1-25Hz.
In use, the caesium extraction power supply that removes of this example is electrically connected with the extraction electrode in caesium catalysis negative hydrogen ion penning source,
Load removes caesium pulse on extraction electrode, using except caesium pulse is by H- Ion Extraction, forms the diverging line of low energy, removal is drawn
The caesium deposited on electrode.
Using the penning source removed caesium and draw power supply of this example, the advantage is that:
(1) except its impulse amplitude of caesium pulse is up to 10kv, voltage is low, can only draw the diverging line of low energy, and low
The diverging line of energy cannot will not cause shadow to transfers line vacuum by the gap between ion source and transfers line
It rings；
(2) line is diverging under this voltage, increases the surface area that diverging line is contacted with extraction electrode, makes it
It is more abundant to the removal of deposition caesium；
(3) energy of low-voltage is lower, even if there is caesium deposition that will not generate sparking.
Also, the caesium pulse that removes of this example is set between two high voltage pulses, will not influence the normal timing of high voltage pulse.
The foregoing is a further detailed description of the present application in conjunction with specific implementation manners, and it cannot be said that this Shen
Specific implementation please is only limited to these instructions.For those of ordinary skill in the art to which this application belongs, it is not taking off
Under the premise of from the application design, a number of simple deductions or replacements can also be made.
Claims (5)
1. caesium method is removed in a kind of caesium catalysis negative hydrogen ion penning source, it is characterised in that: remove caesium including loading on extraction electrode
Pulse forms the diverging line of low energy using except caesium pulse is by H- Ion Extraction, removes and deposits on the extraction electrode
Caesium；
The impulse amplitude except caesium pulse is less than high voltage pulse；
The diverging line of the low energy drawn except caesium pulse will not pass through low energy beam-flow transmission line；
The pulsewidth except caesium pulse is set between two pulses of high voltage pulse；
The pulse width except caesium pulse is continuously adjustable for 20-150 μ s, pulse rise time less than 10 μ s, when pulse declines
Between less than 10 μ s, impulse amplitude is continuously adjustable for 0-10kV, and pulse recurrence frequency is continuously adjustable for 1-25Hz.
2. one kind draws power supply except caesium, described to connect except caesium extraction power supply with the extraction electrode in caesium catalysis negative hydrogen ion penning source,
It is characterized by: it is described except caesium draw power supply include two-way pulse output system, respectively high voltage pulse output system and remove caesium
Pulse output system；
The high voltage pulse output system is the extraction electrode load pulses high pressure, for drawing normal H- ion beam；
Described to remove caesium pulse except caesium pulse output system for extraction electrode load, the H- ion for drawing low energy dissipates
Line；
In two-way pulse output system, described to remove caesium pulse except the load of caesium pulse output system, impulse amplitude is less than described
The high voltage pulse of high voltage pulse output system load；
It is described to remove caesium pulse except the load of caesium pulse output system, except the diverging line of the low energy of caesium pulse extraction will not lead to
It crosses low energy beam and spreads defeated line；
It is described to remove caesium pulse except the load of caesium pulse output system, except the pulsewidth of caesium pulse is set to two arteries and veins of high voltage pulse
Between punching；
It is described to remove caesium pulse except the load of caesium pulse output system, except the pulse width of caesium pulse is that 20-150 μ s continuously may be used
It adjusts, pulse rise time, pulse fall time, impulse amplitude was continuously adjustable for 0-10kV, pulse weight less than 10 μ s less than 10 μ s
Complex frequency is continuously adjustable for 1-25Hz.
3. according to claim 2 except caesium draws power supply, it is characterised in that: the arteries and veins of the high voltage pulse output system load
It leaps high pressure, pulse width is continuously adjustable for 50-500 μ s, and pulse rise time, pulse fall time was less than 10 μ less than 10 μ s
S, impulse amplitude is continuously adjustable for 0-25kV, and pulse recurrence frequency is continuously adjustable for 1-25Hz.
4. a kind of be catalyzed negative hydrogen ion penning source using the caesium described in claim 2 or 3 for drawing power supply except caesium.
5. according to claim 2 or 3 except caesium draws power supply or caesium as claimed in claim 4 is catalyzed negative hydrogen ion penning source
Application in spallation neutron target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710972829.1A CN107833817B (en) | 2017-10-18 | 2017-10-18 | Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710972829.1A CN107833817B (en) | 2017-10-18 | 2017-10-18 | Power supply is drawn except caesium method and except caesium in a kind of caesium catalysis negative hydrogen ion penning source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107833817A CN107833817A (en) | 2018-03-23 |
| CN107833817B true CN107833817B (en) | 2019-05-21 |
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ID=61648420
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000021597A (en) * | 1998-06-30 | 2000-01-21 | Nissin Electric Co Ltd | Hydrogen anion beam implantation method and implantation device |
| WO2014039579A2 (en) * | 2012-09-04 | 2014-03-13 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
| CN106531600A (en) * | 2016-10-11 | 2017-03-22 | 中国科学院合肥物质科学研究院 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
-
2017
- 2017-10-18 CN CN201710972829.1A patent/CN107833817B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000021597A (en) * | 1998-06-30 | 2000-01-21 | Nissin Electric Co Ltd | Hydrogen anion beam implantation method and implantation device |
| WO2014039579A2 (en) * | 2012-09-04 | 2014-03-13 | Tri Alpha Energy, Inc. | Negative ion-based neutral beam injector |
| CN104903967A (en) * | 2012-09-04 | 2015-09-09 | Tri阿尔法能源公司 | Negative ion-based neutral beam injector |
| CN106531600A (en) * | 2016-10-11 | 2017-03-22 | 中国科学院合肥物质科学研究院 | Device of negative hydrogen ion source of hole-shaped water-cooled electrode extraction system |
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