CN110418488A - A kind of radio frequency discharge H- ion source chamber - Google Patents
A kind of radio frequency discharge H- ion source chamber Download PDFInfo
- Publication number
- CN110418488A CN110418488A CN201910788089.5A CN201910788089A CN110418488A CN 110418488 A CN110418488 A CN 110418488A CN 201910788089 A CN201910788089 A CN 201910788089A CN 110418488 A CN110418488 A CN 110418488A
- Authority
- CN
- China
- Prior art keywords
- diffusion
- quartz ampoule
- discharge
- permanent magnet
- bottom cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims abstract description 57
- 239000010453 quartz Substances 0.000 claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000003708 ampul Substances 0.000 claims abstract description 39
- 238000007789 sealing Methods 0.000 claims abstract description 16
- 238000000605 extraction Methods 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 19
- 238000001816 cooling Methods 0.000 claims description 6
- 230000035699 permeability Effects 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 230000001133 acceleration Effects 0.000 claims 1
- 230000005389 magnetism Effects 0.000 claims 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 abstract description 8
- 230000008878 coupling Effects 0.000 abstract description 7
- 238000010168 coupling process Methods 0.000 abstract description 7
- 238000005859 coupling reaction Methods 0.000 abstract description 7
- 239000007789 gas Substances 0.000 abstract description 3
- 238000003892 spreading Methods 0.000 abstract description 3
- 238000004804 winding Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a kind of radio frequency discharge H- ion source chambers, including quartz ampoule, diffusion chamber body and diffusion cavity bottom cover, the top for spreading the bottom end of the side wall of chamber body and the side wall of diffusion cavity bottom cover is connected, quartz ampoule is installed in the top of diffusion chamber body, the top of quartz ampoule is provided with sealing top plate, it is provided with the admission line communicated with the inside of quartz ampoule on sealing top plate, admission line is connected by intake valve control with gas source；Several discharge lines ring layers for being arranged above and below and being sequentially connected in series are wound on the outer wall of quartz ampoule, in each discharge lines ring layer include several circles from the inside to the outside successively winding and concatenated discharge coil, the center of diffusion cavity bottom cover corresponds to quartz ampoule and is provided with extraction aperture plate, and diffusion cavity two sides are respectively arranged with the first permanent magnet and the second permanent magnet.Radio frequency discharge H- ion source chamber of the present invention improves the negative hydrogen ion density of radio-frequency power coupling efficiency, the density of plasma and generation.
Description
Technical field
The present invention relates to technical field of plasma, more particularly to a kind of radio frequency discharge H- ion source chamber.
Background technique
Radio frequency discharge H- ion source is mainly used for the neutral beam heating system in magnetic trapped fusion apparatus, is neutral beam
The source of heating system, the quality of negative hydrogen ion directly affect the efficiency of neutral beam heating system, the density of negative hydrogen ion with
And uniformity is most important.The electric discharge source region and expansion power supply area of traditional radio frequency discharge H- ion source chamber are by bottom magnetic field
Influence leads to the radio frequency discharge H- ion source chamber midline circle that electron density is low, plasma generation efficiency is low and traditional
It is simply wrapped in the outside that plasma generates the quartz ampoule in area, radio-frequency power coupling efficiency is low, if increasing coil turn
Just need to increase the height of quartz ampoule, and this volume that will lead to electric discharge source region increases, source region of discharging deposits to plasma
Power density reduce, cause generate negative hydrogen ion density it is low.
Summary of the invention
The object of the present invention is to provide a kind of radio frequency discharge H- ion source chambers, above-mentioned of the existing technology to solve
Problem improves radio-frequency power coupling efficiency, the density of plasma and the negative hydrogen ion density of generation.
To achieve the above object, the present invention provides following schemes:
The present invention provides a kind of radio frequency discharge H- ion source chambers, including quartz ampoule, diffusion chamber body and diffusion
The top of the side wall of cavity bottom cover, the bottom end of the side wall of the diffusion chamber body and the diffusion cavity bottom cover is connected, described
Quartz ampoule is installed in the top of the diffusion chamber body, and the quartz ampoule is connected to the inside of the diffusion chamber body,
The top of the quartz ampoule is provided with sealing top plate, be provided on the sealing top plate communicated with the inside of the quartz ampoule into
Feed channel, the admission line are connected by intake valve control with gas source；It is wound on several on the outer wall of the quartz ampoule
Lower arrangement and the discharge lines ring layer that is sequentially connected in series, include in each discharge lines ring layer several circles from the inside to the outside successively winding and
Concatenated discharge coil, the center of the diffusion cavity bottom cover correspond to the quartz ampoule and are provided with extraction aperture plate, the diffusion chamber
Side in the horizontal direction of body bottom cover is provided with several the first permanent magnets, in the horizontal direction of the diffusion cavity bottom cover
The other side is provided with several the second permanent magnets, and lateral cooling is generated between first permanent magnet and second permanent magnet
Magnetic field, first permanent magnet is identical as the level height of second permanent magnet, the top of the side wall of the diffusion cavity bottom cover
The height at end is higher than the top of first permanent magnet and the top of second permanent magnet；The diffusion chamber body and described
The material of seal cover board is high-permeability material, and the material of the diffusion cavity bottom cover is low magnetic permeability material.
Preferably, the top of the diffusion chamber body is also covered with shielding case, the quartz ampoule, the sealing top plate and
The discharge lines ring layer is respectively positioned in the shielding case, and the material of the shielding case is high-permeability material.
Preferably, first permanent magnet is the pole S close to one end of the diffusion cavity bottom cover, and second permanent magnet leans on
One end of the nearly diffusion cavity bottom cover is the pole N.
Preferably, the discharge lines ring layer is 1-10, includes discharging in a discharge lines ring layer described in 1-10 circle
Coil.
Preferably, the extraction aperture plate is electrically connected with accelerator, and the discharge coil is electrically connected with radio-frequency power supply, described to draw
It deletes out and is provided with vacuum system below net.
Preferably, several described first permanent magnets are alternatively arranged, several described second permanent magnets are alternatively arranged, described
First permanent magnet and second permanent magnet are 5.
Preferably, the diffusion chamber body and the diffusion cavity bottom cover are tightly connected, the quartz ampoule and the expansion
It dissipates chamber body to be tightly connected, the sealing top plate and the quartz ampoule are tightly connected.
Preferably, there is interval between the adjacent two discharge lines ring layers.
Radio frequency discharge H- ion source chamber of the present invention achieves following technical effect compared with the existing technology:
Radio frequency discharge H- ion source chamber of the present invention improves the density and production of radio-frequency power coupling efficiency, plasma
Raw negative hydrogen ion density.Radio frequency discharge H- ion source chamber of the present invention can not only be increased by setting 3 D stereo coil
Place the number of turns of electric coil, additionally it is possible to which the height for reducing quartz ampoule reduces the volume of electric discharge source region, penetrates to greatly improved
Frequency power coupling efficiency, the material by that will spread cavity bottom cover reduce the cooling magnetic field of bottom using low magnetic permeability material
Electric discharge source region is had an impact, the density and negative hydrogen ion density of plasma are improved.
Detailed description of the invention
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the invention
Example, for those of ordinary skill in the art, without creative efforts, can also obtain according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the structural schematic diagram of radio frequency discharge H- ion source chamber of the present invention；
Fig. 2 is the structural schematic diagram of discharge lines ring layer in radio frequency discharge H- ion source chamber of the present invention；
Wherein: the first permanent magnet of 1-, 2- spread chamber body, 3- shielding case, 4- discharge coil, 5- quartz ampoule, 6- sealing
Top plate, 7- admission line, 8- draw aperture plate, and 9- spreads cavity bottom cover, the second permanent magnet of 10-.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art under the premise of not making the creative labor it is obtained it is all its
His embodiment, shall fall within the protection scope of the present invention.
The object of the present invention is to provide a kind of radio frequency discharge H- ion source chambers, above-mentioned of the existing technology to solve
Problem improves radio-frequency power coupling efficiency, the density of plasma and the negative hydrogen ion density of generation.
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing and specific real
Applying mode, the present invention is described in further detail.
It is as shown in Figs. 1-2: the present embodiment radio frequency discharge H- ion source chamber include quartz ampoule 5, diffusion chamber body 2 and
Cavity bottom cover 9 is spread, the bottom end for spreading the side wall of chamber body 2 is connect with the end sealing of the side wall of diffusion cavity bottom cover 9, stone
English pipe 5 is installed in the top of diffusion chamber body 2, and quartz ampoule 5 and diffusion chamber body 2 are tightly connected, and quartz ampoule 5 and diffusion
The inside of chamber body 2 is connected to, and the top of quartz ampoule 5 is provided with sealing top plate 6, and sealing top plate 6 and quartz ampoule 5 are tightly connected,
The admission line 7 communicated with the inside of quartz ampoule 5 is provided on sealing top plate 6, admission line 7 passes through intake valve control and gas source phase
Connection.The center of diffusion cavity bottom cover 9 corresponds to quartz ampoule 5 and is provided with extraction aperture plate 8, draws aperture plate 8 and is electrically connected with accelerator, draws
It deletes out and is provided with vacuum system below net.
3 discharge lines ring layers for being arranged above and below and being sequentially connected in series, two adjacent electric discharges are wound on the outer wall of quartz ampoule 5
There is interval between coil layer.In each discharge lines ring layer include 4 circles from the inside to the outside successively winding and concatenated discharge coil 4,
Discharge coil 4 is electrically connected with radio-frequency power supply, by the way that 3 D stereo coil is arranged, can not only increase the number of turns of discharge coil 4, also
The height that can reduce quartz ampoule 5 reduces the volume of electric discharge source region, so that radio-frequency power coupling efficiency greatly improved.
The right side of diffusion cavity bottom cover 9 is provided with 5 spaced first permanent magnets 1, spreads the left side of cavity bottom cover 9
It is provided with 5 spaced second permanent magnets 10, the first permanent magnet 1 is the pole S close to one end of diffusion cavity bottom cover 9, second
Permanent magnet 10 is the pole N close to one end of diffusion cavity bottom cover 9.Transverse direction is generated between first permanent magnet 1 and the second permanent magnet 10
Cooling magnetic field；First permanent magnet 1 is identical as the level height of the second permanent magnet 10, and spreads the top of the side wall of cavity bottom cover 9
The first permanent magnet of ratio 1 top and the second permanent magnet 10 the high 2mm in top, diffusion chamber body 2 top be also covered with screen
Cover 3 is covered, quartz ampoule 5, sealing top plate 6 and discharge lines ring layer are respectively positioned in shielding case 3.
In the present embodiment, the material for spreading chamber body 2, shielding case 3 and seal cover board is high-permeability material (such as life
Iron etc.), diffusion cavity bottom cover 9 is made using low magnetic permeability material (such as 316 type stainless steels), using high-permeability material
Diffusion chamber body 2, shielding case 3 and the seal cover board of production can effectively prevent 10 institute of the first permanent magnet 1 and the second permanent magnet
The cooling magnetic field of generation is to electric discharge source region and expands power supply area diffusion, to improve electric discharge source region and expand the electron density of power supply area
With the generation efficiency of plasma；First permanent magnet 1 and second is enabled to forever using low magnetic permeability material production diffusion chamber body
The magnetic field of magnet 10 passes through diffusion cavity bottom cover 9 and forms lateral cooling magnetic field in the bottom of diffusion cavity.
In the description of the present invention, it should be noted that the instruction such as term "top", "bottom", "left", "right", "inner", "outside"
Orientation or positional relationship be based on the orientation or positional relationship shown in the drawings, be merely for convenience of description the present invention and simplification retouch
It states, rather than the device or element of indication or suggestion meaning must have a particular orientation, be constructed and operated in a specific orientation,
Therefore it is not considered as limiting the invention.In addition, term " first ", " mat woven of fine bamboo strips two " are used for description purposes only, and cannot understand
For indication or suggestion relative importance.
Apply that a specific example illustrates the principle and implementation of the invention in this specification, above embodiments
Explanation be merely used to help understand method and its core concept of the invention；At the same time, for those skilled in the art,
According to the thought of the present invention, there will be changes in the specific implementation manner and application range.In conclusion in this specification
Appearance should not be construed as limiting the invention.
Claims (8)
1. a kind of radio frequency discharge H- ion source chamber, it is characterised in that: including quartz ampoule, diffusion chamber body and diffusion cavity
The top of the side wall of bottom cover, the bottom end of the side wall of the diffusion chamber body and the diffusion cavity bottom cover is connected, the quartz
Pipe is installed in the top of the diffusion chamber body, and the quartz ampoule is connected to the inside of the diffusion chamber body, described
The top of quartz ampoule is provided with sealing top plate, is provided with the air inlet pipe communicated with the inside of the quartz ampoule on the sealing top plate
Road, the admission line are connected by intake valve control with gas source；Several are wound on the outer wall of the quartz ampoule to arrange up and down
The discharge lines ring layer for arranging and being sequentially connected in series includes that several circles successively wind and connect from the inside to the outside in each discharge lines ring layer
Discharge coil, the center of the diffusion cavity bottom cover corresponds to the quartz ampoule and is provided with extraction aperture plate, the diffusion cavity bottom
Side in the horizontal direction of lid is provided with several the first permanent magnets, another in the horizontal direction of the diffusion cavity bottom cover
Side is provided with several the second permanent magnets, and lateral cooling magnetic is generated between first permanent magnet and second permanent magnet
, first permanent magnet is identical as the level height of second permanent magnet, the top of the side wall of the diffusion cavity bottom cover
Height be higher than first permanent magnet top and second permanent magnet top；The diffusion chamber body and described close
The material for covering plate is high-permeability material, and the material of the diffusion cavity bottom cover is low magnetic permeability material.
2. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: the diffusion chamber body
Top is also covered with shielding case, and the quartz ampoule, the sealing top plate and the discharge lines ring layer are respectively positioned in the shielding case,
The material of the shielding case is high-permeability material.
3. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: first permanent magnet is close
One end of the diffusion cavity bottom cover is the pole S, and second permanent magnet is the pole N close to one end of the diffusion cavity bottom cover.
4. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: the discharge lines ring layer is 1-
10, include discharge coil described in 1-10 circle in a discharge lines ring layer.
5. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: the extraction aperture plate and acceleration
Device electrical connection, the discharge coil are electrically connected with radio-frequency power supply, and the extraction, which is deleted, is provided with vacuum system below net.
6. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: several described first permanent magnetism
Iron is alternatively arranged, several described second permanent magnets are alternatively arranged, and first permanent magnet and second permanent magnet are 5
It is a.
7. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: the diffusion chamber body with
The diffusion cavity bottom cover is tightly connected, and the quartz ampoule and the diffusion chamber body are tightly connected, the sealing top plate and
The quartz ampoule is tightly connected.
8. radio frequency discharge H- ion source chamber according to claim 1, it is characterised in that: two adjacent electric discharges
There is interval between coil layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910788089.5A CN110418488A (en) | 2019-08-26 | 2019-08-26 | A kind of radio frequency discharge H- ion source chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910788089.5A CN110418488A (en) | 2019-08-26 | 2019-08-26 | A kind of radio frequency discharge H- ion source chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110418488A true CN110418488A (en) | 2019-11-05 |
Family
ID=68368875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910788089.5A Pending CN110418488A (en) | 2019-08-26 | 2019-08-26 | A kind of radio frequency discharge H- ion source chamber |
Country Status (1)
| Country | Link |
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| CN (1) | CN110418488A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113438794A (en) * | 2021-06-29 | 2021-09-24 | 大连理工大学 | Negative hydrogen ion source system |
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| KR20100061126A (en) * | 2008-11-28 | 2010-06-07 | 위순임 | Compound plasma reactor |
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| CN104378904A (en) * | 2014-11-20 | 2015-02-25 | 大连理工大学 | Radio frequency plasma chamber meeting mechanism that negative hydrogen ions are generated through plasmas |
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-
2019
- 2019-08-26 CN CN201910788089.5A patent/CN110418488A/en active Pending
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| CN101043786A (en) * | 2006-12-06 | 2007-09-26 | 中国科学技术大学 | Inductively coupled plasma generating equipment for concave cavity coil antenna |
| KR20100061126A (en) * | 2008-11-28 | 2010-06-07 | 위순임 | Compound plasma reactor |
| CN103854945A (en) * | 2012-12-05 | 2014-06-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma equipment and reaction chamber thereof |
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| CN113438794A (en) * | 2021-06-29 | 2021-09-24 | 大连理工大学 | Negative hydrogen ion source system |
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