CN112139151A - Surface cleaning device for large equipment - Google Patents
Surface cleaning device for large equipment Download PDFInfo
- Publication number
- CN112139151A CN112139151A CN202010952202.1A CN202010952202A CN112139151A CN 112139151 A CN112139151 A CN 112139151A CN 202010952202 A CN202010952202 A CN 202010952202A CN 112139151 A CN112139151 A CN 112139151A
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- China
- Prior art keywords
- cavity cover
- anode assembly
- cavity
- surface cleaning
- scale equipment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
Abstract
The invention discloses a large-scale equipment surface cleaning device. It includes cavity cover, anode assembly, negative pole subassembly, high voltage power supply that the inside cavity that has, the lower extreme opening of cavity cover, the upper end of cavity cover is the enclosed construction, the anode assembly runs through the upper end cavity wall of cavity cover and with the upper end cavity wall sealing connection of cavity cover, be provided with in the anode assembly with the communicating gas passage of the inside cavity of cavity cover, gas passage is connected with outside air exhaust unit, the negative pole subassembly sets up inside the cavity cover and with the anode assembly corresponds, anode assembly, high voltage power supply the negative pole subassembly connects gradually through the wire. The plasma cleaning device is simple in structure, can be suitable for cleaning the surfaces of equipment of any size, can be used for plasma cleaning the surfaces of large-scale non-detachable equipment, and is pollution-free and good in cleaning effect.
Description
Technical Field
The invention relates to a device for cleaning the surface of equipment, in particular to a cleaning device for cleaning the surface of large-scale equipment.
Background
The equipment surface cleaning technology is widely applied to the field of energy, optical and chemical equipment treatment, and the cleaning of large-scale high-precision equipment is very difficult, for example: optical lens, vacuum chamber, etc. Existing surface cleaning techniques include solvent based, laser cleaning, and plasma cleaning.
The method for removing dirt on the surface of an object by using the solvent is to perform chemical conversion, dissolution and stripping by using pollutants or a covering layer on the surface of the cleaning agent so as to achieve the effects of degreasing, derusting and decontamination. The solvent cleaning technology is mainly completed manually, is influenced by factors such as the shape of the cleaned surface and the like, is easy to cause secondary pollution, and is not beneficial to cleaning large-scale high-precision equipment. The laser cleaning technology is a process for cleaning the surface of a workpiece by irradiating the surface of the workpiece with high-energy laser beams to instantaneously evaporate or peel off dirt, rust spots or coatings on the surface and effectively remove attachments or surface coatings on the surface of the cleaned object at a high speed. It does not need organic solvent, has no pollution and noise, is harmless to human body and environment, and is a green cleaning technology. However, under the influence of laser power, the laser cleaning area and the energy acting on the surface to be cleaned are small, and the laser cleaning device is not suitable for cleaning large-scale equipment. Plasma cleaning is also a green cleaning technology, and the purpose of cleaning the surface is realized by acting high-energy electrons on the surface to be cleaned.
In plasma cleaning, two plasma generating methods mainly include low-pressure discharge and atmospheric discharge. Wherein the low-pressure discharge is relatively uniform and stable, and is widely applied to the cleaning of the surface of an object. The existing low-pressure discharge cleaning needs to be provided with a vacuum system, a cleaned part is placed in the system, and cleaning is completed under low-pressure discharge, but the existing low-pressure discharge cleaning device can only clean small detachable objects and cannot be used for cleaning the surface of large equipment.
Disclosure of Invention
In order to solve the problem that a cleaned piece needs to be placed in a system during plasma cleaning and only a small detachable object can be cleaned, the invention provides a cleaning device suitable for cleaning the surface of large equipment.
The invention is realized by the following technical scheme: a large-scale equipment surface cleaning device is characterized in that: including cavity cover, anode assembly, negative pole subassembly, the high voltage power supply that has the cavity inside, the lower extreme opening of cavity cover, the upper end of cavity cover is the enclosed construction, the anode assembly runs through the upper end cavity wall of cavity cover and with the upper end cavity wall sealing connection of cavity cover, be provided with in the anode assembly with the communicating gas passage of cavity cover inside cavity, gas passage is connected with outside air exhaust unit, the negative pole subassembly sets up inside and with the anode assembly corresponds of cavity cover, anode assembly, high voltage power supply the negative pole subassembly passes through the wire and connects gradually.
When the cleaning device is used, the lower end of the cavity cover is in contact with the surface of equipment to be cleaned, and the air exhaust unit can form low pressure in the cavity cover through the air channel connected with the air exhaust unit. Through set up the anode assembly on the cavity cover, set up the negative pole subassembly in the cavity cover, the circuit that comprises anode assembly, high voltage power supply, negative pole subassembly is after the switch-on, can be so that the cavity cover in the back that produces the low pressure, produces plasma and washs equipment surface between the negative and positive poles.
Furthermore, the cathode assembly is a grid mesh, and the grid mesh is a metal grid. The cathode assembly is made into a grid net shape, so that the area of the cathode is increased, more electrons can be generated between the cathode and the anode, and the cleaning effect is improved.
Further, in order to facilitate installation and disassembly, the outer part of the anode assembly is provided with threads, and the anode assembly is connected with the upper end cavity wall of the cavity cover through the threads.
Furthermore, in order to improve the cleaning effect, a bias voltage source is connected between the high-voltage power supply and the cathode assembly. By arranging the bias voltage source, the energy of electrons hitting the surface of the equipment to be cleaned can be adjusted, the bias voltage is selected according to the depth of the equipment to be cleaned, the bias voltage is increased, the depth of the electrons hitting the wall surface is also increased, and the cleaning force is increased.
Further, the anode assembly further comprises a disc connected with the anode assembly, the disc is located in the cavity cover, and a gas channel of the anode assembly penetrates through the disc. Through the disc, the corresponding area between the anode assembly and the cathode assembly is increased, so that more electrons are formed, and the cleaning effect is improved.
Further, in order to simplify the structural design, the anode assembly is of a tubular structure.
Furthermore, the lower port of the cavity cover is connected with a rubber ring. The rubber ring can protect the surface of the equipment from being scratched, and meanwhile, the sealing performance of the cavity cover and the surface of the equipment can be improved.
Further, in order to facilitate the installation of the rubber ring, the rubber ring is fixed at the lower end of the cavity cover through a clamping mechanism, the clamping mechanism comprises a clamping ring and a fastening piece, and the clamping ring is arranged on the outer side of the rubber ring and is fastened through the fastening piece.
Furthermore, the cross section of the cavity cover is in an inverted U shape, so that the processing and the operation are convenient.
Further, in order to facilitate connection and operation, the upper end of the anode assembly is provided with a connecting part, the air exhaust unit is a vacuum pump, and the connecting part is connected with the vacuum pump.
The invention has the beneficial effects that: the invention has simple structure, and the gas channel arranged in the anode assembly is connected with the air extraction unit, so that the low pressure required by the work can be formed in the cavity cover, and the structural design can be simplified; through set up the anode assembly on the cavity cover, set up the negative pole subassembly in the cavity cover, the circuit that comprises anode assembly, high voltage power supply, negative pole subassembly is after the switch-on, can be so that the cavity cover in the back that produces the low pressure, produces plasma and washs equipment surface between the negative and positive poles. When the plasma cleaning device works, only the lower end of the cavity cover is in contact with the surface of the equipment to be cleaned, and the equipment to be cleaned does not need to be arranged in the cavity cover for cleaning, so that the plasma cleaning device can be suitable for equipment of any size, and particularly can be used for plasma cleaning of the surface of large-scale non-detachable equipment. The invention adopts plasma cleaning, has no pollution and good cleaning effect.
Drawings
FIG. 1 is a schematic diagram of the structure of the present invention in a specific embodiment;
FIG. 2 is a front view of an anode assembly of the present invention in an embodiment;
FIG. 3 is a top view of FIG. 2;
FIG. 4 is a front view of a clamping mechanism in accordance with the present invention in an exemplary embodiment;
FIG. 5 is a top view of FIG. 4;
FIG. 6 is a front view of a cathode assembly in accordance with the present invention in an embodiment;
FIG. 7 is a top view of FIG. 6;
FIG. 8 is a schematic view of the present invention in use in a particular embodiment;
in the figure, 1, a chamber cover; 2. the upper end cavity wall of the cavity cover; 3. an anode assembly; 4. a gas channel; 5. a cathode assembly; 6. a high voltage power supply; 7. a bias voltage source; 8. an anode lead-out screw; 9. a disc; 10. a cathode lead-out screw; 11. a rubber ring; 12. a clamping ring; 13. a fastener; 14. connecting part 15, air suction unit 16, surface of the cleaned equipment.
Detailed Description
The invention will now be further illustrated by way of non-limiting examples in conjunction with the accompanying drawings:
the invention is used for cleaning organic matters and shallow permeates on the surface of large equipment, and is high-precision and pollution-free cleaning equipment.
As shown in the attached drawings, the surface cleaning device for the large-scale equipment comprises a cavity cover 1, an anode assembly 3, a cathode assembly 5 and a high-voltage power supply 6. The cavity cover 1 is internally provided with a cavity, the lower end of the cavity cover 1 is opened, and the upper end of the cavity cover 1 is of a closed structure. The shape of the chamber cover 1 may be various shapes, and preferably, the cross section of the chamber cover 1 is in an inverted "U" shape. The anode assembly 3 is made of metal, and the anode assembly 3 penetrates through the upper end cavity wall 2 of the cavity cover 1 and is connected with the upper end cavity wall 2 of the cavity cover 1 in a sealing mode. And a gas channel 4 communicated with the inner cavity of the cavity cover 1 is arranged in the anode assembly 3. In this embodiment, the anode assembly 3 is a tubular structure, and the lumen thereof is a gas channel. In order to facilitate installation and disassembly, the outer part of the anode assembly 3 is provided with threads, and the anode assembly 3 is connected with the upper end cavity wall 2 of the cavity cover 1 through the threads. The gas duct 4 is connected to an external pumping unit 15. The pumping unit 15 is used for pumping the gas in the chamber cover 1, and may be various pumping devices in the prior art, and in this embodiment, the pumping unit is preferably a vacuum pump. The cathode assembly 5 is disposed inside the chamber cover 1 and corresponds to a portion of the anode assembly 3 inside the chamber cover 1. The anode assembly 3, the high-voltage power supply 6 and the cathode assembly 5 are sequentially connected through leads, the anode assembly 3 is connected with the high-voltage end of the high-voltage power supply 6, and the cathode assembly 5 is connected with the grounding end of the high-voltage power supply 6. In order to facilitate wiring, an anode leading-out screw 8 is arranged on the anode assembly 3, a cathode leading-out screw 10 is arranged on the cathode assembly 5, and the anode assembly 3 and the cathode assembly 5 are respectively connected with a connecting wire through the anode leading-out screw 8 and the cathode leading-out screw 10. In this embodiment, the cathode assembly 5 is preferably in a grid structure, the grid is a metal grid, the grid is fixed in the cavity cover 1 through a fixing ring, the grid is provided with a cathode lead-out screw 10, and the cathode lead-out screw 10 is connected with the ground terminal of the high-voltage power supply 6. The cathode assembly 5 is made into a grid net shape, so that the area of the cathode is increased, and more electrons can be generated between the cathode and the anode. The area of the grid mesh can be set according to specific working conditions.
In this embodiment, the anode assembly 3 further includes a disk 9 connected thereto, the disk 9 is located in the chamber cover 1, and the gas channel 4 of the anode assembly 3 penetrates through the disk 9. The disc 9 is also made of metal, and the disc 9 increases the corresponding area between the disc and the cathode assembly 5, so that more electrons are formed. The size of the disc 9 can be set according to specific working conditions.
In order to improve the cleaning effect, a bias voltage source 7 is connected between the high voltage power supply 6 and the cathode assembly 5. The bias voltage source 7 is used for adjusting the energy of electrons hitting the surface of equipment to be cleaned, the voltage of the bias voltage source 7 is adjusted to be 1-20V, the bias voltage is selected according to the depth of the equipment to be cleaned, the bias voltage is increased, the depth of the electrons hitting the wall surface is also increased, and the cleaning force is increased. When the bias voltage source 7 is set, the cathode assembly 5 is connected with the bias voltage source 7 through the cathode lead-out screw 10, and the bias voltage source 7 is connected with the high-voltage power supply 6.
In order to protect the surface of the device from being scratched and to ensure the sealing property between the chamber cover 1 and the surface of the device, in this embodiment, a rubber ring 11 is preferably connected to the lower port of the chamber cover 1. To facilitate the installation of the rubber ring 11, preferably, the rubber ring 11 is fixed at the lower end of the chamber cover 1 by a clamping mechanism, the clamping mechanism comprises a clamping ring 12 and a fastening piece 13, the fastening piece 13 is a bolt pair, the clamping ring 12 is arranged on the outer side of the rubber ring 11, the bolt of the bolt pair is connected to the clamping ring 12, and the clamping ring 12 can be screwed by screwing a nut, so that the clamping ring 12 fixes the rubber ring 11 at the lower end of the chamber cover 1. The clamping mechanism is made of rubber materials.
For the convenience of connection, a connection part 14, i.e. a suction line, connected with a vacuum pump through the suction line is provided at the upper end of the anode assembly 3 in this embodiment.
When the invention is used for cleaning the surface of large-scale equipment, the cavity cover 1 is placed on the surface of the large-scale equipment to be cleaned, the lower end of the cavity cover 1 is contacted with the surface of the equipment to be cleaned, the gas channel 4 is connected with the air extraction unit 15, after the air extraction unit 15 is started, the gas in the cavity cover 1 is extracted along the gas channel 4, so that the gas pressure in the cavity cover 1 is reduced, and under the action of the external atmospheric pressure, the cavity cover 1 is tightly combined with the surface of the equipment, so that a low-pressure environment is formed in the cavity cover 1. After the air extraction is finished, the high-voltage power supply 6 is started, plasma is generated between the anode assembly 2 and the cathode assembly 5, and the surface of the equipment is cleaned. When the bias voltage source 7 is arranged, after the high-voltage power supply 6 is started, the bias voltage source 7 is started, and the bias voltage is selected according to the depth required to be cleaned so as to clean the surface of the equipment.
Other parts in this embodiment are the prior art, and are not described herein again.
Since many changes may be made in the above-described embodiments without departing from the scope of the invention, it is intended that all matter contained in the above description and shown in the accompanying drawings shall be interpreted as illustrative and not in a limiting sense.
Claims (10)
1. A large-scale equipment surface cleaning device is characterized in that: including inside cavity cover (1), anode assembly (3), negative pole subassembly (5), high voltage power supply (6) that have the cavity, the lower extreme opening of cavity cover (1), the upper end of cavity cover (1) is the enclosed construction, anode assembly (3) run through the upper end cavity wall of cavity cover (1) and with the upper end cavity wall sealing connection of cavity cover (1), be provided with in anode assembly (3) with the communicating gas passage (4) of cavity cover (1) internal cavity, gas passage (4) are connected with outside air exhaust unit, negative pole subassembly (5) set up cavity cover (1) inside and with anode assembly (3) correspond, anode assembly (3), high voltage power supply (6) negative pole subassembly (5) connect gradually through the wire.
2. The large-scale equipment surface cleaning apparatus according to claim 1, wherein: the cathode assembly (5) is a grid mesh, and the grid mesh is a metal grid.
3. The large-scale equipment surface cleaning apparatus according to claim 1, wherein: the outside of positive pole subassembly (3) is provided with the screw thread, positive pole subassembly (3) through the screw thread with the upper end cavity wall connection of cavity cover (1).
4. The large-scale equipment surface cleaning apparatus according to claim 1, wherein: and a bias voltage source (7) is connected between the high-voltage power supply (6) and the cathode assembly (5).
5. The large-scale equipment surface cleaning apparatus according to claim 1, 2, 3 or 4, wherein: the anode assembly (3) further comprises a disc (9) connected with the anode assembly, the disc (9) is located in the cavity cover (1), and a gas channel (4) of the anode assembly (3) penetrates through the disc (9).
6. The large-scale equipment surface cleaning apparatus according to claim 5, wherein: the anode assembly (3) is of a tubular structure.
7. The large-scale equipment surface cleaning apparatus according to claim 5, wherein: the lower port of the cavity cover (1) is connected with a rubber ring (11).
8. The large-scale equipment surface cleaning apparatus according to claim 7, wherein: the rubber ring (11) is fixed at the lower end of the cavity cover (1) through a clamping mechanism, the clamping mechanism comprises a clamping ring (12) and a fastening piece (13), and the clamping ring (12) is arranged on the outer side of the rubber ring (11) and is fastened through the fastening piece (13).
9. The large-scale equipment surface cleaning apparatus according to claim 1, wherein: the cross section of the cavity cover (1) is in an inverted U shape.
10. The large-scale equipment surface cleaning apparatus according to claim 1, wherein: the upper end of the anode assembly (3) is provided with a connecting part (14), the air exhaust unit is a vacuum pump, and the connecting part (14) is connected with the vacuum pump.
Priority Applications (1)
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CN202010952202.1A CN112139151A (en) | 2020-09-11 | 2020-09-11 | Surface cleaning device for large equipment |
Applications Claiming Priority (1)
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CN202010952202.1A CN112139151A (en) | 2020-09-11 | 2020-09-11 | Surface cleaning device for large equipment |
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CN202010952202.1A Pending CN112139151A (en) | 2020-09-11 | 2020-09-11 | Surface cleaning device for large equipment |
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Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230898A (en) * | 1990-04-27 | 1992-08-19 | Commiss Energ Atom | Method and apparatus for decontamination by ionizing peeling |
JPH08153713A (en) * | 1995-03-10 | 1996-06-11 | Hitachi Ltd | Sample holding method for plasma treatment apparatus |
CN1720349A (en) * | 2002-12-02 | 2006-01-11 | 希姆科技有限公司 | Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
CN201336769Y (en) * | 2008-12-19 | 2009-10-28 | 中国科学院空间科学与应用研究中心 | High-density large-area plasma sheet generating device |
CN101765811A (en) * | 2007-07-30 | 2010-06-30 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
US20130061871A1 (en) * | 2011-09-09 | 2013-03-14 | Texas Instruments Incorporated | Plasma purging an idle chamber to reduce particles |
US20130276821A1 (en) * | 2005-09-27 | 2013-10-24 | Lam Research Corporation | Method and System for Distributing Gas for A Bevel Edge Etcher |
CN203613262U (en) * | 2013-12-11 | 2014-05-28 | 陈大民 | Floating potential anode glow emission device |
CN109192641A (en) * | 2018-08-31 | 2019-01-11 | 西安交通大学 | A kind of penning cold-cathode source |
CN111430207A (en) * | 2019-01-10 | 2020-07-17 | 三星电子株式会社 | Plasma processing method and plasma processing apparatus |
-
2020
- 2020-09-11 CN CN202010952202.1A patent/CN112139151A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230898A (en) * | 1990-04-27 | 1992-08-19 | Commiss Energ Atom | Method and apparatus for decontamination by ionizing peeling |
JPH08153713A (en) * | 1995-03-10 | 1996-06-11 | Hitachi Ltd | Sample holding method for plasma treatment apparatus |
CN1720349A (en) * | 2002-12-02 | 2006-01-11 | 希姆科技有限公司 | Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
US20130276821A1 (en) * | 2005-09-27 | 2013-10-24 | Lam Research Corporation | Method and System for Distributing Gas for A Bevel Edge Etcher |
CN101765811A (en) * | 2007-07-30 | 2010-06-30 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
CN201336769Y (en) * | 2008-12-19 | 2009-10-28 | 中国科学院空间科学与应用研究中心 | High-density large-area plasma sheet generating device |
US20130061871A1 (en) * | 2011-09-09 | 2013-03-14 | Texas Instruments Incorporated | Plasma purging an idle chamber to reduce particles |
CN203613262U (en) * | 2013-12-11 | 2014-05-28 | 陈大民 | Floating potential anode glow emission device |
CN109192641A (en) * | 2018-08-31 | 2019-01-11 | 西安交通大学 | A kind of penning cold-cathode source |
CN111430207A (en) * | 2019-01-10 | 2020-07-17 | 三星电子株式会社 | Plasma processing method and plasma processing apparatus |
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Application publication date: 20201229 |
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