CN208649451U - Film forming substrate and rotation film formation device - Google Patents
Film forming substrate and rotation film formation device Download PDFInfo
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- CN208649451U CN208649451U CN201821213152.XU CN201821213152U CN208649451U CN 208649451 U CN208649451 U CN 208649451U CN 201821213152 U CN201821213152 U CN 201821213152U CN 208649451 U CN208649451 U CN 208649451U
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- film forming
- forming substrate
- mask
- substrate
- film
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Abstract
The utility model provides a kind of film forming substrate and rotation film formation device.In the state that the surface of the film forming surface side of the film forming substrate is bonded with mask, rotate the film forming substrate together with mask around the rotary shaft vertical with the surface of the film forming surface side of the film forming substrate, to in the film forming with forming film on substrate, the film forming substrate is characterized in that a part of surface of the film forming surface side of the film forming substrate is coarse face.According to the utility model, the frictional resistance between film forming substrate and mask can be improved using coarse face, so as to inhibit the opposite sliding when rotating film forming between film forming substrate and mask.
Description
Technical field
The utility model relates to a kind of film forming substrate and rotation film formation devices, and in particular to a kind of to utilize film forming base
The coarse face of plate come inhibit the opposite sliding when rotating film forming between film forming substrate and mask film forming substrate and
Rotate film formation device.
Background technique
For common not rotary film forming evaporation film-forming etc., when carrying out evaporation film-forming, carry out as at
After contraposition of substrate and mask of film object etc., evaporation film-forming is carried out in the state of moving the substrate and mask not,
After the completion of film forming, the substrate is removed.
In contrast, when carrying out rotation film forming in rotating film formation device, in the film forming room of usually vacuum chamber,
In the state of being bonded film forming substrate with mask, make the film forming with substrate together with mask around with the film forming substrate
The rotary shaft rotation vertical with the surface of mask, passes through the particle such as from evaporation source or sputtering source on the mask
The opening portion of formation, to form the film of predetermined pattern on the film forming substrate.It, can be in the rotation film formation device
Surface configuration in the side opposite with the mask of film forming substrate has coldplate, and by the coldplate, particle is described
The surface of the film forming surface side of film forming substrate is cooling and forms the film of predetermined pattern.In addition, in the rotation film formation device, example
Film forming is placed on mask with substrate such as, is made at the film forming substrate and the mask by the gravity of the film forming substrate
In the state of fitting, when carrying out rotation film forming in the state of above-mentioned fitting, when for example just having started rotation, in rotary course or
When rotation stops etc., film forming substrate and mask phase may be made with producing relative sliding between substrate and mask in film forming
To offset.If film forming substrate offset opposite with mask, it is bad with the precision of the pattern of the film formed on substrate to generate film forming
The problems such as changing, be for example inconsistent with the pattern of the opening portion on mask.
Utility model content
The utility model is made to solve the above-mentioned problems, and main purpose is to provide a kind of utilization film forming substrate
Coarse face inhibit film forming substrate and the rotation of the opposite sliding when rotating film forming between film forming substrate and mask
Change into film device.
To achieve the goals above, the film forming of the utility model uses following scheme with substrate:
In the state that the surface of the film forming surface side of the film forming substrate is bonded with mask, make the film forming substrate with
Mask is rotated around the rotary shaft vertical with the surface of the film forming surface side of the film forming substrate together, thus in the film forming
With film is formed on substrate, the film forming substrate is characterized in that,
A part of surface of the film forming surface side of the film forming substrate is coarse face.
Preferably, the film forming surface side of the film forming substrate peripheral part a part, continuously or interruption
Coarse face is stated in ground formation.
Preferably, in the entire peripheral part of the film forming surface side of the film forming substrate, continuously or intermittently shape
At there is the rough surface portion.
Preferably, the position that the formation of film forming substrate has the coarse face is the institute of the film forming substrate
State the position without film forming of film forming surface side.
Preferably, multiple opening portions are provided on the mask, from the film forming substrate and the mask
When observing on thickness direction, a part of the coarse face is configured to and the stack portion of the mask and the film forming substrate
The crossover location overlapping that peripheral portion intersects, the stack portion of the mask forms the non-opening portion other than the opening portion.
In addition, to achieve the goals above, the rotation film formation device of the utility model includes film forming substrate, and feature exists
In a part of surface of the film forming surface side of the film forming substrate is coarse face.
Preferably, the rotation film formation device is at the side, that is, back side opposite with film forming surface side of the film forming substrate
Side, configured with the press section pressed to mask side with substrate the film forming.
Preferably, the film forming substrate is close to the mask using the pressing of the press section.
Preferably, when the pressing side pressed from the press section looks up, the press section and it is described at
The coarse face of film substrate is least partially overlapped.
Preferably, multiple positions of the back side of the press section configuration in the film forming substrate.
It is according to the present utility model film forming with substrate and rotation film formation device, due to the film forming substrate it is described at
A part of surface of film surface side is coarse face, therefore, can improve film forming substrate using the coarse face of film forming substrate
Frictional resistance between mask, so as to inhibit the opposite sliding when rotating film forming between film forming substrate and mask.
Thus, it is possible to improve film forming with the precision of the pattern of the film formed on substrate.
Detailed description of the invention
Fig. 1 is the top view for showing the fit-state of film forming substrate and mask of the embodiments of the present invention.
Fig. 2 is the side view for showing the fit-state of film forming substrate and mask of the embodiments of the present invention.
Fig. 3 is the side view for showing the state of present embodiment pressed with substrate by press section film forming.
Description of symbols
1 film forming uses substrate
The coarse face of 1a
2 masks
The opening portion 2a
The non-opening portion 2b (stack portion)
3 press sections
C crossover location
Specific embodiment
When carrying out rotation film forming in rotating film formation device, in the film forming room of usually vacuum chamber, use film forming
In the state that substrate is bonded with mask, make the film forming substrate together with mask around the table with the film forming substrate and mask
The vertical rotary shaft rotation in face, makes particle pass through the opening portion formed on the mask, thus on the film forming substrate
Form film.As the source of above-mentioned particle, such as can come from evaporation source or sputtering source etc..By being deposited or being sputtered,
To make particle be formed a film in film forming on substrate.For vapor deposition, it is bonded the surface of film forming substrate with mask, makes to be deposited
Material is formed through from evaporation source and is deposited in the opening portion of the mask to the surface of the film forming substrate, to form figure
Case.In addition, for sputtering, make the sputter material from sputtering source be formed through be splashed in the opening portion of mask it is described
Film forming uses the surface of substrate, to form pattern.
Next, referring to Fig.1~Fig. 3 is illustrated the film forming of the embodiments of the present invention with substrate.Fig. 1 is to show
The top view of the fit-state of the film forming substrate and mask of the embodiments of the present invention out.Fig. 2 is that show this practical new
The side view of the fit-state of the film forming substrate and mask of the embodiment of type.Fig. 3 be show present embodiment by pressing
The side view for the state that portion presses film forming with substrate.In addition, the thick-line arrow in Fig. 1 shows the implementation of the utility model
The film forming of mode uses the direction of rotation of substrate and mask, and thin-line arrow shows the film forming substrate of the embodiments of the present invention
Be movable into and out direction.In addition, the thin-line arrow in Fig. 3 shows being carried out to film forming with substrate by press section for present embodiment
The pressing direction of pressing.The film forming of the pressing direction and the embodiments of the present invention thickness direction one of substrate and mask
It causes.
A part of surface of the film forming surface side of the film forming substrate 1 of present embodiment is coarse face 1a.Such as Fig. 1 and Fig. 2
Shown, in the i.e. described film forming surface side in the side of film forming substrate 1 being bonded with mask 2, the coarse face 1a is formed in institute
State the entire peripheral part of film forming substrate 1.In Fig. 1, the coarse face 1a is respectively formed in the rectangular film forming and uses
Four edge parts of the peripheral part of substrate 1.But coarse face 1a is not necessarily required to be formed in entire peripheral part, it can also be only
It is formed in a part of peripheral part, an edge part of such as peripheral part, two edge parts or three edge parts.
In addition, though the peripheral part that multiple coarse face 1a are intermittently formed in film forming substrate 1 is shown in FIG. 1, but
It is, however it is not limited to which the form, multiple coarse face 1a can also be continuously formed at the peripheral part of film forming substrate 1 and become one
Body.It should be noted that when multiple coarse face 1a are continuously formed at the entire peripheral part of film forming substrate 1, and this is removed
Except the case where (for example, the situation for being only formed in a part of peripheral part) compare, rubbing between film forming substrate 1 and mask 2
It wipes resistance to further increase, can more reliably inhibit relatively sliding between film forming substrate 1 and mask 2 when rotating film forming
Dynamic, film forming is further increased with the precision of the pattern of the film formed on substrate as a result,.
In addition, though showing rectangular film forming substrate 1 in Fig. 1, but film forming is not limited to the shape of substrate 1
This, can be other shapes except rectangle, such as square, circle.
It should be noted that can only include for opposite sliding of the above-mentioned film forming between substrate 1 and mask 2
A side in sliding on the direction of rotation of rotary shaft and the axially vertical sliding radially with rotary shaft, also can wrap
Include the sliding on the direction of rotation of rotary shaft and the axially vertical sliding both sides radially with rotary shaft.
For the film forming material of substrate 1, and it is not particularly limited, such as can be glass substrate.In addition, for thick
It for the generation type of matte portion 1a, and is not particularly limited, such as general chemical etching, plasma etching, spray can be used
Sand processing etc..In addition, the coarse face 1a of film forming substrate 1 is for example pre-formed before rotation film forming.In addition, for coarse
For the roughness of facial 1a, value is simultaneously not particularly limited, as long as film forming base can sufficiently be improved by the coarse face 1a
Frictional resistance between plate 1 and mask 2 is come sliding opposite both when rotation being avoided to form a film.
In addition, film forming substrate 1 can be placed on mask 2 for film forming is with being bonded of substrate 1 and mask 2
And it is bonded the two by the gravity of film forming substrate 1.In addition to this, film forming substrate 1 can also be made by the magnetic force of magnet
It is bonded with mask 2.It is bonded alternatively, it is also possible to clamp film forming substrate 1 with mask 2 using clamping device.It is using
When clamping device, clamping device can be controlled based on the movement of actuator, so as to free switching to clamp position and unclamp shape
State.
In the present embodiment, it in addition to above-mentioned laminating type or on the basis of above-mentioned laminating type, can also utilize
Match in the side i.e. back side opposite with the i.e. described film forming surface side in the side for being formed with coarse face 1a of the film forming substrate 1
The press section 3 set is close to the film forming substrate 1 with the mask 2.By the way that aforesaid way is applied in combination, can make described
Film forming is more reliably close together with substrate 1 and the mask 2.
In addition, being seen for the configuration of the press section 3 from the pressing direction that the press section 3 is pressed
When examining, the press section 3 can be least partially overlapped with the coarse face 1a.By make the press section 3 with it is described coarse
Facial 1a is least partially overlapped, can be further improved the frictional resistance between film forming substrate 1 and mask 2, so as to more
Reliably this unfavorable condition is deviated relative to sliding to the two to inhibit.In addition, the press section 3 can be only fitted to it is described
Multiple positions of the back side of film forming substrate 1.By making the configuration of press section 3 in the institute of the film forming substrate 1
The multiple positions for stating back side, with above situation likewise it is possible to further increase rubbing between film forming substrate 1 and mask 2
Resistance is wiped, is inhibited so as to more reliably deviate this unfavorable condition relative to sliding to the two.In addition, the pressing
Portion 3 can control its movement by the movement of actuator, so as to close to the film forming direction of substrate 1 and from film forming substrate
It is moved freely on 1 direction left.The press section 3 can carry out free switching to film forming use by the movement of actuator as a result,
The pressing of pressing state and the above-mentioned pressing of releasing that substrate 1 is pressed releases state.
In addition, being driven to film forming substrate 1 and mask 2 so that it can for example be used around the device that rotary shaft rotates
Motor as common driving device.By the driving of the motor, film forming substrate 1 and mask 2 for example can be with perseverances
Fixed revolving speed rotation.
The position that the formation of film forming substrate 1 has the coarse face 1a be the film forming substrate 1 it is described at
The position without film forming of film surface side.Pass through the portion without film forming in the film forming surface side of film forming substrate 1
Position forms the coarse face 1a, and so as to avoid generating, film forming is bad, regulation cannot be for example formed on film forming substrate 1
The film of pattern.
For mask 2, shape can be corresponding with the shape of film forming substrate 1, and size can be than film forming base
Plate 1 big one encloses.As shown in Figure 1, as an example, multiple opening portion 2a are provided on the mask 2.From the film forming base
It is described thick when being observed on the thickness direction of the direction that plate 1 is bonded with the mask 2 i.e. described film forming substrate 1 and the mask 2
A part of matte portion 1a is configured to intersect position with what the peripheral portion in the stack portion of the mask 2 and the film forming substrate 1 intersected
C overlapping is set, the stack portion of the mask 2 forms the non-opening portion 2b other than the opening portion 2a.Although only showing one in Fig. 1
Crossover location C (position that two dotted lines in Fig. 1 intersect), but crossover location C can be formed at multiple positions.Described thick
In the case that matte portion 1a is discontinuously formed, the quantity of crossover location C can be identical as the coarse face quantity of 1a.
The rotation film formation device of the utility model includes film forming substrate 1 and mask 2.In addition, as described above, the rotation
Film formation device can be in one opposite with the i.e. described film forming surface side in the side for being formed with coarse face 1a of the film forming substrate 1
Side, that is, back side, configured with the press section 3 pressed to mask side with substrate 1 film forming.In addition, the thick line in Fig. 1
Direction of rotation shown in arrow is only an example, is not limited to this, is also possible to its opposite direction.In addition, the filament in Fig. 1
Film forming substrate shown in arrow is only an example relative to the direction that is movable into and out of rotation film formation device, is not limited to
This, for example, film forming substrate is also possible to the same direction relative to the direction that is movable into and out of rotation film formation device.
An example of the specific structure of rotation film formation device as the embodiments of the present invention, can be following knot
Structure.
Rotation film formation device has vacuum chamber.The inside of vacuum chamber is maintained the inertia such as the reduced pressure atmospheres such as vacuum or nitrogen
Atmosphere.It is equipped with film forming substrate holding unit and mask platform on the top of the inside of vacuum chamber, is set in the bottom surface of vacuum chamber
There is evaporation source.Film forming with substrate holding unit be to the mechanism that is kept with substrate 1 of received film forming.Mask platform setting exists
Film forming uses the downside of substrate holding unit, and mask 2 is placed in mask platform, and mask 2 has and will be formed in film forming base
The corresponding patterns of openings of the pattern of plate 1.In film forming, film forming substrate holding unit declines relative to mask platform, by forming a film
It is placed on mask 2 with the film forming substrate 1 that substrate holding unit is kept, utilizes the rotation imported from vacuum chamber top (outside)
Shaft, film forming substrate holding unit and mask platform rotate, as a result, mask 2 and the film forming base being placed on mask
Plate 1 is also rotated.To film forming on substrate 1 with uniform thickness form a film evaporation material.In the rotation film formation device
In, evaporation shield can be movably set between evaporation source and film forming substrate 1.When being formed a film to film forming with substrate 1,
Evaporation shield is opened, and the evaporation material after gasification, which is formed through, to disperse in the opening portion of mask 2 onto film forming substrate 1.Not
When being formed a film, evaporation shield is closed.In this way, evaporation shield stops evaporation material dispersing to film forming substrate 1.
As described above, the film forming of embodiment according to the present utility model substrate 1 and rotation film formation device, Neng Gouli
The frictional resistance between film forming substrate 1 and mask 2 is improved with the coarse face 1a of film forming substrate 1, so as to inhibit
Opposite sliding of the film forming between substrate 1 and mask 2 when rotation film forming.Thus, it is possible to improve film forming with the film formed on substrate
Pattern precision.
It should be noted that above embodiment is merely exemplary, and not restrictive, without departing from the utility model
Basic principle in the case where, what those skilled in the art can make for above-mentioned details various apparent or equivalent repairs
Change or replace, is all included in the scope of the claims of the utility model.
Claims (10)
1. a kind of film forming substrate makes institute in the state that the surface of the film forming surface side of the film forming substrate is bonded with mask
Film forming substrate is stated to rotate together with mask around the rotary shaft vertical with the surface of the film forming surface side of the film forming substrate,
To be characterized in that in the film forming with film, the film forming substrate is formed on substrate,
A part of surface of the film forming surface side of the film forming substrate is coarse face.
2. film forming substrate as described in claim 1, which is characterized in that
In a part of the peripheral part of the film forming surface side of the film forming substrate, continuously or intermittently it is formed with described thick
Matte portion.
3. film forming substrate as described in claim 1, which is characterized in that
Entire peripheral part in the film forming surface side of the film forming substrate, is continuously or intermittently formed with the rough surface
Portion.
4. film forming substrate according to any one of claims 1 to 3, which is characterized in that
The position that the formation of film forming substrate has the coarse face is the film forming surface side of the film forming substrate
Position without film forming.
5. film forming substrate according to any one of claims 1 to 3, which is characterized in that
Multiple opening portions are provided on the mask,
When from from the thickness direction of the film forming substrate and the mask, a part of the coarse face is configured to
It is Chong Die with the crossover location that the peripheral portion in the stack portion of the mask and the film forming substrate intersects, the stack portion of the mask
Form the non-opening portion other than the opening portion.
6. a kind of rotation film formation device, which is characterized in that including film forming substrate according to any one of claims 1 to 5.
7. rotation film formation device as claimed in claim 6, which is characterized in that
The rotation film formation device is configured in the side, that is, back side opposite with film forming surface side of the film forming substrate to institute
State the press section that film forming is pressed with substrate to mask side.
8. rotation film formation device as claimed in claim 7, which is characterized in that
The film forming substrate is close to the mask using the pressing of the press section.
9. rotation film formation device as claimed in claim 7 or 8, which is characterized in that
When the pressing side pressed from the press section looks up, the press section is coarse with the film forming substrate
Face is least partially overlapped.
10. rotation film formation device as claimed in claim 7 or 8, which is characterized in that
Multiple positions of the back side of the press section configuration in the film forming substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821213152.XU CN208649451U (en) | 2018-07-27 | 2018-07-27 | Film forming substrate and rotation film formation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821213152.XU CN208649451U (en) | 2018-07-27 | 2018-07-27 | Film forming substrate and rotation film formation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208649451U true CN208649451U (en) | 2019-03-26 |
Family
ID=65786975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821213152.XU Active CN208649451U (en) | 2018-07-27 | 2018-07-27 | Film forming substrate and rotation film formation device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208649451U (en) |
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2018
- 2018-07-27 CN CN201821213152.XU patent/CN208649451U/en active Active
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