CN208121186U - A kind of strong glow discharge deposition diamond-like-carbon film device - Google Patents
A kind of strong glow discharge deposition diamond-like-carbon film device Download PDFInfo
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- CN208121186U CN208121186U CN201820506833.9U CN201820506833U CN208121186U CN 208121186 U CN208121186 U CN 208121186U CN 201820506833 U CN201820506833 U CN 201820506833U CN 208121186 U CN208121186 U CN 208121186U
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Abstract
The utility model belongs to technical field of vacuum plating, and in particular to a kind of strong glow discharge deposition diamond-like-carbon film device.The strong glow discharge deposition diamond-like-carbon film device includes vacuum cavity, vacuum suction device, reaction gas control and distributor, multi sphere power supply；Multi sphere evaporation source is equipped in the vacuum cavity, the front end of the multi sphere evaporation source is provided with multi sphere baffle；One impressed current anode is set in the vacuum cavity.Provided equipment generates by using multi sphere evaporation source and controls the concentration and energy of high energy electron, influence of the big particle that multi sphere baffle is used to that multi sphere evaporation source to be avoided to generate to diamond-like carbon film, the ionization level of plasma when controlling depositing diamond-like carbon film using impressed current anode, to improve film deposition rate, glossiness and performance.
Description
Technical field
The utility model belongs to technical field of vacuum plating, and in particular to a kind of strong glow discharge deposition diamond-like carbon film
Equipment.
Background technique
In general, diamond-like carbon-base film (DLC) is that one kind contains diamond lattic structure (SP3 hybrid bond) and graphite
The metastable amorphous state substance of structure (SP2 hybrid bond), carbon atom is mainly with the combination of SP3 and SP2 hybrid bond.Amorphous carbon base film
It can be generally divided into hydrogen-containing carbon film (a-C:H) and not two class of hydrogen-containing carbon film (a-C).Hydrogen content in hydrogeneous DLC film exists
The ingredient of 20at.%~50at.%, SP3 hybrid bond is less than 70%.Commonly tetrahedral amorphous carbon in hydrogen-free DLC film
(ta-C) film.With SP in ta-C coating3Based on hybrid bond, SP3The content of hybrid bond is generally greater than 70%.
The deposition of diamond-like carbon film (DLC) is using ion beam depositing, after decades of development, now earliest
Successfully develop the new method and new technology of many physical vapour deposition (PVD)s, chemical vapor deposition and liquid phase method preparation DLC film.
Plasma auxiliary chemical vapor deposition (PACVD) prepares diamond-like carbon film using CH4、C2H2Deng containing hydrocarbon
Organic gas is carbon source, has the features such as surface is fine and smooth, glossiness is good, and hardness is high, and wear-resisting property is good, but plates in high-end decoration
Film field, client is to the very tight of cost control, it is desirable that improves deposition velocity on the basis of guaranteeing performance and appearance.This technology master
Solve the problems, such as to be to provide it is a kind of can fast deposition high-performance diamond-like carbon film equipment and processing method.
Utility model content
Based on the shortcomings and deficiencies of the above-mentioned prior art, it is heavy that the purpose of this utility model is to provide a kind of strong glow discharges
Product diamond-like-carbon film device, the equipment are based on plasma auxiliary chemical vapor deposition (PACVD) technology, are created by structure
The high energy electron and variation of other particles in deposition process that new design effectively control multi sphere evaporation source generates, and using auxiliary
Supporing yang pole is to improve deposition rate and film performance.
The purpose of this utility model is achieved through the following technical solutions：
A kind of strong glow discharge deposition diamond-like-carbon film device, including vacuum cavity, vacuum suction device, reaction gas
Control and distributor, multi sphere power supply；Vacuum orifice, workpiece rotating frame, multi sphere evaporation source, magnetic control is equipped in the vacuum cavity to splash
It shoots at the target, several heating tubes, several gas distribution tubes；The vacuum orifice is set to the vacuum cavity one side, the workpiece
Pivoted frame is set to the intermediate region of the vacuum cavity, and the heating tube and gas distribution tube are evenly arranged in workpiece rotating frame two
Side；The multi sphere evaporation source is set to vacuum cavity side, and the magnetic controlled sputtering target is set to opposite with multi sphere evaporation source another
One side；The front end of the multi sphere evaporation source is provided with the multi sphere baffle of flexible connection.
Further, the magnetic controlled sputtering target front end is provided with the target baffle of flexible connection.
Further, the workpiece rotating frame is arranged several for placing the work hanger of workpiece, the workpiece rotating frame, workpiece
Hanger and workpiece are nonisulated connection between each other.
Further, the strong glow discharge deposition diamond-like-carbon film device is additionally provided with workpiece power supply unit, the work
Part power supply unit includes workpiece power supply and electric source modes switching switching group；The workpiece power supply is opened by electric source modes switching
Pass group switches over cleaning model or depositional model；
Further, electric source modes switching switching group include negative switch, the first earthing switch, positive switch,
Second earthing switch；Described negative switch one end and the workpiece are electrically connected, and the cathode of the other end and the workpiece power supply connects
It connects；First earthing switch one end is connect with the cathode of the workpiece power supply, other end ground connection；Described positive switch one end with
The workpiece is electrically connected, and the other end is connect with the anode of the workpiece power supply；Second earthing switch one end and the work
The anode connection of part power supply, other end ground connection.
When workpiece power supply is cleaning model, the anode of workpiece power supply connects the workpiece rotating frame, cathode ground connection；Work as workpiece
When power supply is depositional model, the cathode of workpiece power supply connects the workpiece rotating frame, plus earth.The workpiece switches power supply to clearly
It can be used for workpiece cleaning when mold cleaning formula；The workpiece can be used for workpiece depositing coating when switching power supply to depositional model.
Further, the strong glow discharge deposition diamond-like-carbon film device includes an impressed current anode system；It is described auxiliary
Supporing yang electrode systems include setting impressed current anode power supply and impressed current anode；The impressed current anode power supply is set to outside vacuum cavity
Portion, the impressed current anode are set in the vacuum cavity, and the impressed current anode passes through impressed current anode power supply line and impressed current anode
Positive pole connection, the impressed current anode by protruding into vacuum cavity at the top of vacuum cavity down.
Further, the impressed current anode includes shell, power supply line protection pipe, cooling water inlet pipe, cooling water outlet
Pipe, insulation vacuum sealing device；The shell is the cylindrical shell with inner cavity, and the upper end of the shell is close by insulation vacuum
Seal apparatus is connect with the top of the vacuum cavity；The power supply line protection pipe connects the anode casing；The cooling water into
Mouth pipe is protruded into the bottom of the inner cavity of the shell by the top of the shell, and the cooling water outlet pipe is set to the top of the shell
End.
Based on the processing method of above-mentioned strong glow discharge deposition diamond-like-carbon film device, this method includes following step
Suddenly：
S1, it is put into vacuum cavity after cleaning workpiece；
S2, vacuum cavity is vacuumized and is heated, workpiece is toasted；
S3, it is passed through working gas in vacuum cavity, keeps the workpiece on workpiece rotating frame positively charged, multi sphere baffle is more in blocking
The state of arc evaporation source, opens multi sphere power supply, and the electronics that multi sphere evaporation source generates carries out bombardment heating cleaning to workpiece；
S4, keep the workpiece on workpiece rotating frame negatively charged, working gas be passed through in vacuum cavity, open impressed current anode power supply,
Multi sphere baffle is in the state for blocking multi sphere evaporation source, opens multi sphere power supply, and the electronics that multi sphere evaporation source generates promotes work gas
The ionization of body, working gas cation carry out Bombardment and cleaning again to workpiece；
S5, keep the workpiece on workpiece rotating frame negatively charged, working gas is passed through in vacuum cavity, multi sphere baffle is more in blocking
The state of arc evaporation source closes multi sphere power supply, and target baffle is opened, and starts and deposits bottom in workpiece surface using magnetic controlled sputtering target
Layer；
S6, keep the workpiece on workpiece rotating frame negatively charged, close multi sphere power supply, multi sphere baffle is in and blocks multi sphere evaporation source
State is passed through working gas and reaction gas, using magnetic controlled sputtering target in workpiece surface reactive deposition transition zone；
S7, impressed current anode power supply is opened, closes magnetic controlled sputtering target, target baffle blocks magnetic controlled sputtering target, makes workpiece rotating frame
On workpiece it is negatively charged, be passed through working gas and reaction gas, multi sphere baffle is in the state for blocking multi sphere evaporation source, opens more
Arc power, using reaction gas in workpiece surface depositing diamond-like carbon film.
It is to protect target not contaminated that the effect of target baffle is arranged before magnetic controlled sputtering target.
Further, in step S7 impressed current anode voltage 20-200V.
In the step s 7, atom, atomic group and positively charged grain of the multi sphere baffle to stop the generation of multi sphere evaporation source are enabled
Son avoids the influence to depositional coating；The electronics that multi sphere evaporation source generates can be improved aura in the effect of impressed current anode and put
Electric strength improves speed, the glossiness of the depositional coating of workpiece surface to improve the ionization level of reaction gas and working gas
And performance.
The art of this patent scheme has the advantage that compared with the existing technology and effect：
(1) strong glow discharge deposition diamond-like-carbon film device provided by this patent scheme, by multi sphere evaporation source
The multi sphere baffle for the flexible connection that front setting can be enabled or be closed is enabled when carrying out depositing diamond-like carbon film to workpiece
Multi sphere baffle with stop multi sphere evaporation source generate metallic atom, the particles such as ion, atomic group, do not allow these Particle diffusions to sink
Product region, a large amount of high energy electrons for only generating multi sphere evaporation source are introduced into reaction gas, and high energy electron can be with gas molecule
Inelastic collision is generated, molecular activation is made, promotion freely intensifies and ionizes, and generates the strong high energy particle of chemical activity, longevity
Life metastable atom, excited atom, atom or a large amount of active particles such as molecular ion and electronics, these active particles are easy
Workpiece surface deposits to form the fine and close diamond-like carbon film containing SP2 and SP3 chemical bond；Since the concentration of high energy electron is than general
The electron concentration of logical glow discharge deposition film plating process is high, is greatly improved the ionization level of plasma, to improve deposition speed
Rate, glossiness and film performance.
(2) strong glow discharge deposition diamond-like-carbon film device provided by this patent scheme, by vacuum cavity
Increase impressed current anode, cooperate the use of multi sphere evaporation source and multi sphere baffle, multi sphere evaporation source provides electron source, can pass through auxiliary sun
Pole attract electronics, change electronics running track, improve electronics and reaction gas collision probability, thus improve reaction gas from
Rate improves the deposition rate, glossiness and performance of film layer.
Detailed description of the invention
Fig. 1 is the planar structure schematic diagram of strong glow discharge deposition diamond-like-carbon film device in embodiment.
Fig. 2 is the structural schematic diagram of the impressed current anode of strong glow discharge deposition diamond-like-carbon film device in embodiment.
In figure：1- vacuum cavity, 2- vacuum orifice, 3- electric source modes switch switching group, 4- workpiece power supply, 5- multi sphere electricity
Source, 6- multi sphere evaporation source, 7- multi sphere baffle, 8- impressed current anode, 9- impressed current anode power supply, 10- workpiece rotating frame, 11- observation window,
12- fire door, 13- heating tube, 14- gas distribution tube, 15- magnetic controlled sputtering target, 16- power supply line protection pipe, 17- cooling water inlet
Pipe, 18- cooling water outlet pipe, 19- insulation vacuum sealing device, 20- target baffle, 80- shell, 301- negative switch, 302-
First earthing switch, 303- positive switch, the second earthing switch of 304-.
Specific embodiment
The present invention will be further described in detail with reference to the embodiments and the accompanying drawings, but the implementation of the utility model
Mode is without being limited thereto.
Embodiment
As shown in Figure 1, a kind of strong glow discharge deposition diamond-like-carbon film device, including vacuum cavity 1, vacuum suction dress
Set (conventional arrangement is not shown in the figure), reaction gas control and distributor (conventional arrangement is not shown in the figure), multi sphere power supply
5；Vacuum orifice 2, workpiece rotating frame 10, multi sphere evaporation source 6, magnetic controlled sputtering target 15, several heating tubes are equipped in the vacuum cavity 1
13, several gas distribution tubes 14；The vacuum orifice 2 is set to 1 one side of vacuum cavity, and the workpiece rotating frame 10 is arranged
In the intermediate region of the vacuum cavity 1, the heating tube 13 and gas distribution tube 14 are evenly arranged in 10 liang of workpiece rotating frame
Side；The multi sphere evaporation source 6 is set to 1 side of vacuum cavity, and the magnetic controlled sputtering target 15 is set to opposite with multi sphere evaporation source 6
Another side；The front end of the multi sphere evaporation source 6 is provided with the multi sphere baffle 7 of flexible connection.
The multi sphere power supply 5 is used to power to multi sphere evaporation source 6, and the multi sphere power supply 5 is DC power supply or the pulse power.
The multi sphere evaporation source 6 is equipped with several multiple arc targets, and the multiple arc target is sequentially distributed from top to bottom.
The multi sphere baffle 7 is to be flexibly connected, and translatable or rotation is enabled or closed, and is evaporated for stopping from multi sphere
Source 6 generates the particles such as atom, atomic group, the positively charged particle issued.It is equipped between multi sphere baffle 7 and multi sphere evaporation source 6 for height
The side gap that energy electronics passes through.
15 front end of magnetic controlled sputtering target is provided with the target baffle 20 of flexible connection.
The magnetic controlled sputtering target 15 is cylindrical target.
The workpiece rotating frame 10 is arranged several for placing the work hanger (conventional arrangement is not shown in the figure) of workpiece, institute
Stating workpiece rotating frame 10, work hanger and workpiece between each other is nonisulated connection.The workpiece rotating frame 10 is multiaxis public affairs rotation knot
Structure, work hanger are connect by shaft with 10 activity of workpiece rotating frame；The workpiece rotating frame 10 passes through transmission mechanism, band
The rotation of dynamic work hanger and the revolution of the workpiece rotating frame 10.
The strong glow discharge deposition diamond-like-carbon film device is additionally provided with workpiece power supply unit, the workpiece power supply unit
Switch switching group 3 including workpiece power supply 4 and electric source modes；The workpiece power supply 4 by the electric source modes switch switching group 3 into
Row switching cleaning model or depositional model；
Electric source modes switching switching group 3 connects including negative switch 301, the first earthing switch 302, positive switch 303, second
Ground switch 304；Described 301 one end of negative switch and the workpiece are electrically connected, and the cathode of the other end and the workpiece power supply 4 connects
It connects；Described first earthing switch, 302 one end is connect with the cathode of the workpiece power supply 4, other end ground connection；The positive switch
303 one end and the workpiece are electrically connected, and the other end is connect with the anode of the workpiece power supply 4；Second earthing switch 304
One end is connect with the anode of the workpiece power supply 4, other end ground connection.
When workpiece power supply 4 is cleaning model, positive switch 303 and the first earthing switch 302 are closed, disconnects negative switch
301 and second earthing switch 304, at this point, the anode of workpiece power supply 4 connects the workpiece rotating frame, cathode ground connection；When workpiece power supply
When for depositional model, negative switch 301 and the second earthing switch 304 are closed, disconnects positive switch 303 and the first earthing switch
302, at this point, the cathode of workpiece power supply 4 connects the workpiece rotating frame, plus earth.
The workpiece power supply 4 can be used for workpiece cleaning when switching to cleaning model；The workpiece power supply 4 switches to deposition mould
It can be used for workpiece depositing coating when formula.
The workpiece power supply 4 is DC power supply or the pulse power.Before depositional coating, workpiece band can be made using cleaning model
Positive electricity, the high energy electron that multi sphere evaporation source 6 generates are attracted by workpiece, to carry out bombardment heating cleaning to workpiece.
When the workpiece power supply 4 is using depositional model, cathode connects the workpiece rotating frame 10.Before depositional coating, it can make
Cation in 1 plasma of vacuum cavity carries out Bombardment and cleaning to workpiece；In depositional coating, make in plasma just
Ion bombards workpiece, improves the comprehensive performance of film layer under the action of back bias voltage.
The strong glow discharge deposition diamond-like-carbon film device includes an impressed current anode system；The impressed current anode system
Including setting impressed current anode power supply 9 and impressed current anode 8；The impressed current anode power supply 9 is set to outside vacuum cavity 1, described
Impressed current anode 8 is set in the vacuum cavity, and the impressed current anode 8 is connect by power supply line with 9 anode of impressed current anode power supply,
The impressed current anode 8 protrudes into vacuum cavity 1 by 1 top of vacuum cavity down, in depositing diamond-like carbon film, impressed current anode 8
Attract electronics, increase electron energy, promote the ionization of reaction gas, improves the performance of aura intensity and depositional coating.
As shown in Fig. 2, the impressed current anode 8 includes shell 80, power supply line protection pipe 16, cooling water inlet pipe 17, cooling
Water outlet pipe 18, insulation vacuum sealing device 19；The shell 80 be the cylindrical shell 80 with inner cavity, the shell 80 it is upper
End is connect by the vacuum sealing device 19 that insulate with the top of the vacuum cavity 1；The power supply line protection pipe 16 connects described
Shell 80, the impressed current anode power supply line pass through the power supply line protection pipe 16 and connect with the shell 80；The cooling water into
Mouth pipe 17 is protruded into the bottom of the inner cavity of the shell 80 by the top of the shell 80, and the cooling water outlet pipe 18 is set to institute
State the top of shell 80；Power supply line protection pipe 16, cooling water inlet pipe 17 and cooling water outlet pipe 18 pass through insulation vacuum respectively
Sealing device 19 is connect with shell 80.
The cooling water of impressed current anode 8 enters 80 inner cavity of shell from cooling water inlet pipe 17, then draws from cooling water outlet pipe 18
Out.
In addition, the strong glow discharge deposition diamond-like-carbon film device, which is equipped with PLC, controls operating system, for controlling plating
Membrane process；Temperature sensor is additionally provided in the vacuum cavity 1 of the strong glow discharge deposition diamond-like-carbon film device, pressure passes
Sensor, the fire door 12 passed in and out for workpiece, are equipped with observation window 11 on the fire door 12.
Based on the processing method of above-mentioned strong glow discharge deposition diamond-like-carbon film device, include the following steps：
S1, it is put into vacuum cavity after cleaning workpiece；
S2, vacuum cavity is vacuumized and is heated, workpiece is toasted；Control parameter：Background inside vacuum cavity is true
Sky is 0.02-0.001Pa, and heating temperature is 150-300 DEG C, pumpdown time 30-90min；
S3, it is passed through argon working gas (Ar) in vacuum cavity, workpiece is switched power supply into cleaning model, makes workpiece rotating frame
On workpiece it is positively charged, multi sphere baffle is in the state of multi sphere evaporation source blocked, open multi sphere power supply, what multi sphere evaporation source generated
Electronics carries out bombardment heating cleaning to workpiece；Control parameter：Workpiece supply voltage is 20-200V, frequency 2K-10KHz, duty
Than 10%-50%, the electric current 30-60A of multi sphere evaporation source, bombardment time 5-30min, Ar volume flow:30-100SCCM, very
Reciprocal of duty cycle：0.03-0.3Pa, temperature： 100-250℃；
S4, it is passed through working gas Ar in vacuum cavity, workpiece is switched power supply into depositional model, makes the work on workpiece rotating frame
Part is negatively charged, and multi sphere baffle is in the state for blocking multi sphere evaporation source, opens multi sphere power supply, opens impressed current anode power supply, multi sphere
The electronics that evaporation source generates promotes the ionization of working gas Ar, working gas cation Ar+Bombardment and cleaning again is carried out to workpiece；
Control parameter：Workpiece supply voltage is 20-200V, frequency 2K-10KHz, duty ratio 10%-50%, the voltage of impressed current anode
For 100-400V, the electric current 30-60A of multi sphere evaporation source, bombardment time 5-30min, Ar volume flow:50-200SCCM, vacuum
Degree：0.05-0.5Pa, temperature：100-250℃；
In other performances, other control conditions of step S4 are constant, and multi sphere baffle also may be at open shape
State, carrying out Bombardment and cleaning to workpiece at this time can be improved the adhesive force of coating on workpiece, but will affect product surface glossiness.
S5, workpiece power supply is selected as depositional model, keeps the workpiece on workpiece rotating frame negatively charged, be passed through suitable working gas
Ar closes multi sphere power supply, and multi sphere baffle is in the state for blocking multi sphere evaporation source, and target baffle is opened, and starts and uses magnetic control
Sputtering target deposits bottom in workpiece surface；Control parameter：Magnetic controlled sputtering target is one of titanium target, chromium target or zirconium target, target electricity
Stream：10-30A, the voltage-(0~200V) of workpiece power supply, duty ratio：20-80%, frequency：10-80KHZ, time 10-
30min, Ar volume flow:50-300SCCM, vacuum degree：0.1-0.9Pa, temperature：100-300℃；
S6, workpiece power supply is selected as depositional model, keeps the workpiece on workpiece rotating frame negatively charged, close multi sphere power supply, multi sphere
Baffle is in the state for blocking multi sphere evaporation source, working gas Ar and reaction gas is passed through, using magnetic controlled sputtering target to workpiece table
Face deposits bottom；Control parameter：Target current 10-30A, workpiece bias supply voltage 0-200V, duty ratio：20-80%, frequency
Rate：10-80KHZ, time 10-30min, Ar volume flow:50-300SCCM, reaction gas are acetylene or methane；Reaction gas
Body volume flow：10-200SCCM, vacuum degree：0.1-0.9Pa, temperature：100-300℃；In the step, before magnetic controlled sputtering target
Target baffle be in an open state, target is not stopped；
S7, impressed current anode power supply is opened, closes magnetic controlled sputtering target, target baffle blocks magnetic controlled sputtering target, the choosing of workpiece power supply
Depositional model keeps the workpiece on workpiece rotating frame negatively charged, is passed through working gas and reaction gas, and multi sphere baffle is in and blocks multi sphere
The state of evaporation source opens multi sphere power supply, using reaction gas in workpiece surface depositing diamond-like carbon film.Control parameter：Work
Making gas is argon gas, and reaction gas is acetylene or methane, the voltage-(200~1500V) of workpiece power supply, duty ratio：20-
80%, frequency：10-80KHZ, time 30-120min, Ar volume flow:20-200SCCM, reaction gas volume flow：100-
2000SCCM, vacuum degree：1.0-10.0Pa, temperature：100-300 DEG C, the electric current of multi sphere power supply：30-70A；The electricity of impressed current anode
Pressure is 20-200V.
Embodiment 2：Class is deposited in bloom stainless steel work-piece using the strong glow discharge deposition diamond-like-carbon film device
Diamond-like carbon film.
Specific step is as follows：
(1) workpiece is subjected to conventional prerinse, then puts the workpiece in workpiece rotating frame 10, close vacuum cavity 1 and taken out
Vacuum and heated baking；Control parameter：It is evacuated to base vacuum 0.009Pa, heating temperature：200 DEG C, the pumpdown time：
60min。
(2) electron bombardment heating cleaning：Workpiece power supply 4 is selected as cleaning model, opens multi sphere power supply 5, is passed through reaction gas
Argon gas, enables multi sphere baffle 7, and the gear of multi sphere baffle 7 carries out electronics to workpiece in 6 front of multi sphere evaporation source, by multi sphere evaporation source 6
Bombardment and cleaning；Control parameter：4 voltage of workpiece power supply is 100V, frequency 5KHz, duty ratio 20%, the electric current of multi sphere power supply 5
50A, bombardment time 25min, Ar volume flow:40SCCM, vacuum degree：0.10Pa, temperature：150℃；
(3) icon bombardment cleaning：Workpiece power supply 4 is selected as depositional model, and multi sphere baffle is in the shape for blocking multi sphere evaporation source
State opens multi sphere power supply, opens impressed current anode power supply, and the electronics that multi sphere evaporation source generates promotes the ionization of Ar, and Ar+ is to workpiece
Carry out Bombardment and cleaning again；Control parameter：4 voltage of workpiece power supply is 150V, frequency 5KHz, duty ratio 40%, impressed current anode
Voltage be 200V, the electric current 50A of multi sphere power supply 5, bombardment time 25min, Ar volume flow:80SCCM, vacuum degree：
0.20Pa, temperature：150℃；
(4) bottom is deposited：Workpiece power supply 4 is selected as depositional model, is passed through argon working gas, closes multi sphere evaporation source 6, will
The target baffle 20 of 15 front of magnetic controlled sputtering target is opened, and carries out deposition bottom to workpiece using two chromium targets；Control parameter：Magnetic control
Sputtering target 15 electric current 25A, the voltage 120V of workpiece power supply 4, duty ratio：50%, frequency：40KHZ, time 30min, Ar volume
Flow:120SCCM, vacuum degree：0.38Pa, temperature：150℃；
(5) transition zone is deposited：Workpiece power supply 4 is selected as depositional model, is passed through argon working gas and reaction gas C2H2, close
Multi sphere evaporation source 6 is closed, the target baffle 20 of 15 front of magnetic controlled sputtering target is opened, workpiece deposited using two chromium targets
Cross layer；Control parameter：Target 15 electric current 28A, the voltage 180V of workpiece bias power supply 4, duty ratio：50%, frequency：40KHZ, when
Between 30min, Ar volume flow:100SCCM, vacuum degree：0.37-0.42Pa, temperature：150℃；
(6) depositing diamond-like carbon film：The power supply for closing magnetic controlled sputtering target 15, is arranged target before magnetic controlled sputtering target 15
Baffle 20, workpiece power supply 4 are selected as depositional model, are passed through argon working gas (Ar) and reaction gas acetylene, open multi sphere evaporation
Source 6 simultaneously enables multi sphere baffle 7, starts impressed current anode 8, in workpiece surface depositing diamond-like carbon film；Control parameter：Workpiece power supply
4 voltage -800V, duty ratio：50%, frequency：60KHZ, time 120min, Ar volume flow:100SCCM, acetylene volume flow
Amount：400SCCM, vacuum degree：1.5Pa, temperature：150 DEG C, the electric current 50A of multi sphere evaporation source 6,8 voltage of impressed current anode：100V.
(7) workpiece of depositing diamond-like carbon film is detected, detection data is as follows：(a) appearance and test：Outer sightseeing
Sliding fine and smooth, highlight surface is kept substantially, color L=42.03, a=-0.07, b=-2.65, and each face color is uniform；(b) nanometer is hard
Degree：2300nHV, film thickness 3.6um, wherein diamond-like carbon film film layer (DLC) is with a thickness of 2.5um；(c) workpiece diamond-like-carbon
Film film layer wear-resisting property (CS-17) >=10000 circle, by hot dipping (300 DEG C) standard testing, by neutral salt spray standard testing,
Pass through artificial perspiration's standard testing.
Correlation data：It could be used without multi sphere evaporation source and multi sphere baffle, and be not provided with the filming equipment pair of impressed current anode
Workpiece carries out depositing diamond-like carbon film, and the diamond-like carbon film film layer (DLC) deposited under identical workpiece and control parameter is thick
Degree is 0.5um.
The above, the only preferred embodiment of the utility model not make in any form the utility model
Limitation；The those of ordinary skill of all industry can be shown in by specification attached drawing and described above and swimmingly to implement this practical
It is novel；But all those skilled in the art are not departing within the scope of technical solutions of the utility model, using the above institute
The technology contents of announcement and the equivalent variations of a little variation, modification and evolution made, are the equivalence enforcement of the utility model
Example；Meanwhile the changes of all substantial technological any equivalent variationss to the above embodiments according to the utility model, modification with
Develop etc., within the protection scope for still falling within the technical solution of the utility model.
Claims (7)
1. a kind of strong glow discharge deposition diamond-like-carbon film device, it is characterised in that：The strong glow discharge deposition diamond-like
Stone carbon film equipment includes vacuum cavity, vacuum suction device, reaction gas control and distributor, multi sphere power supply；The vacuum
Vacuum orifice, workpiece rotating frame, multi sphere evaporation source, magnetic controlled sputtering target, several heating tubes, several gas distribution tubes are equipped in cavity；
The vacuum orifice is set to the vacuum cavity one side, and the workpiece rotating frame is set to the middle area of the vacuum cavity
Domain, the heating tube and gas distribution tube are evenly arranged in workpiece rotating frame two sides；The multi sphere evaporation source is set to vacuum cavity
Side, the magnetic controlled sputtering target are set to the another side opposite with multi sphere evaporation source；The front end of the multi sphere evaporation source is arranged
There is the multi sphere baffle of flexible connection.
2. strong glow discharge deposition diamond-like-carbon film device according to claim 1, it is characterised in that：The workpiece turns
Several work hangers for being used to place workpiece are arranged in frame, and the workpiece rotating frame, work hanger and workpiece are nonisulated between each other
Connection.
3. strong glow discharge deposition diamond-like-carbon film device according to claim 1, it is characterised in that：The strong aura
Discharge depositing diamond-like-carbon film device is additionally provided with workpiece power supply unit, and the workpiece power supply unit includes workpiece power supply and power supply
Mode selector switch group；The workpiece power supply switches switching group by the electric source modes and switches over cleaning model or deposition mould
Formula.
4. strong glow discharge deposition diamond-like-carbon film device according to claim 3, it is characterised in that：The power supply mould
It includes negative switch, the first earthing switch, positive switch, the second earthing switch that formula, which switches switching group,；Described negative switch one end
It is electrically connected with the workpiece, the other end is connect with the cathode of the workpiece power supply；First earthing switch one end with it is described
The cathode of workpiece power supply connects, other end ground connection；Described positive switch one end and the workpiece are electrically connected, the other end with it is described
The anode connection of workpiece power supply；Second earthing switch one end is connect with the anode of the workpiece power supply, other end ground connection.
5. strong glow discharge deposition diamond-like-carbon film device according to claim 1, it is characterised in that：The strong aura
Discharge depositing diamond-like-carbon film device includes an impressed current anode system；The impressed current anode system includes setting impressed current anode electricity
Source and impressed current anode；The impressed current anode power supply is set to outside vacuum cavity, and the impressed current anode is set to the vacuum
In cavity, the impressed current anode is connect by impressed current anode power supply line with impressed current anode positive pole, and the impressed current anode is by true
Vacuum cavity is protruded into down at the top of cavity body.
6. strong glow discharge deposition diamond-like-carbon film device according to claim 5, it is characterised in that：The auxiliary sun
Pole includes shell, power supply line protection pipe, cooling water inlet pipe, cooling water outlet pipe, insulation vacuum sealing device；The shell is
Cylindrical shell with inner cavity, the upper end of the shell at the top of insulation vacuum sealing device and the vacuum cavity by connecting
It connects；The power supply line protection pipe connects the anode casing；The cooling water inlet pipe is protruded into described by the top of the shell
The bottom of the inner cavity of shell, the cooling water outlet pipe are set to the top of the shell.
7. strong glow discharge deposition diamond-like-carbon film device according to claim 1, it is characterised in that：The magnetic control splashes
Front end of shooting at the target is provided with the target baffle of flexible connection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820506833.9U CN208121186U (en) | 2018-04-11 | 2018-04-11 | A kind of strong glow discharge deposition diamond-like-carbon film device |
Applications Claiming Priority (1)
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| CN108559956A (en) * | 2018-04-11 | 2018-09-21 | 深圳市正和忠信股份有限公司 | A kind of strong glow discharge deposition diamond-like-carbon film device and processing method |
| CN108559956B (en) * | 2018-04-11 | 2024-02-09 | 深圳市正和忠信股份有限公司 | Strong glow discharge deposition diamond-like carbon film equipment and processing method |
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