CN207047312U - A kind of arc ion plating apparatus of deposited tube inside coating - Google Patents
A kind of arc ion plating apparatus of deposited tube inside coating Download PDFInfo
- Publication number
- CN207047312U CN207047312U CN201720901364.6U CN201720901364U CN207047312U CN 207047312 U CN207047312 U CN 207047312U CN 201720901364 U CN201720901364 U CN 201720901364U CN 207047312 U CN207047312 U CN 207047312U
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- Prior art keywords
- arc
- plasma
- target
- tubulose
- ion plating
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- 239000011248 coating agent Substances 0.000 title claims abstract description 38
- 238000000576 coating method Methods 0.000 title claims abstract description 38
- 238000007733 ion plating Methods 0.000 title claims abstract description 33
- 230000000977 initiatory effect Effects 0.000 claims abstract description 15
- 238000010891 electric arc Methods 0.000 claims abstract description 14
- 239000013077 target material Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 241000233855 Orchidaceae Species 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 13
- 230000008021 deposition Effects 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 4
- 238000000427 thin-film deposition Methods 0.000 abstract description 2
- 150000001450 anions Chemical class 0.000 abstract 1
- 239000010408 film Substances 0.000 description 22
- 150000002500 ions Chemical class 0.000 description 10
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 235000019628 coolness Nutrition 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- -1 decorative coveringn Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000009422 external insulation Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000009498 subcoating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010913 used oil Substances 0.000 description 1
- 238000009504 vacuum film coating Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model belongs to inside pipe wall thin film deposition field, is specifically a kind of arc ion plating apparatus of deposited tube inside coating.The equipment includes the tubulose plasma target being placed in vacuum chamber, tubular vacuum focuses on permanent magnet, plasma arc arc initiation device, wherein, the both ends of tubulose plasma target are connected by insulated enclosure flange with vacuum chamber shell, and tubular workpiece is non-contact to be placed on tubulose plasma target, and tubular vacuum more than two focuses on permanent magnet and discharged in tubulose plasma target tube interior edge pipe to by reverse magnetic pole order, focus control is distributed electric arc, ionization arc target material.The anion of Coating Materials can imported into the deeper region of inside pipe wall by the utility model.The utility model solves the problem that electric arc ion-plating deposition depth inside pipe wall depth is inadequate, coating is uneven, it is proposed it is a kind of the simple, mentality of designing that cost is cheap, easy to implement is made on the basis of existing arc ion plating (aip), expand application of the arc ion plating (aip) in terms of inside pipe wall is deposited.
Description
Technical field
The utility model belongs to inside pipe wall thin film deposition field, be specifically a kind of electric arc of deposited tube inside coating from
Sub- coating apparatus.
Background technology
Arc ion plating (AIP) is (also referred to as true as a kind of technology of relatively new physical vapour deposition (PVD) (PVD) film
Empty arc light evaporation, multi-arc ion coating) due to the advantages that quality of coating is high, adhesion is good, film forming is uniform, sedimentation rate is fast, in machine
Tool industry, metallurgy, high temperature protection, ornament materials etc. are used widely.
The basic composition of arc ion plating includes vacuum film coating chamber, cathode arc source, workpiece, vacuum system etc..Arc ions
The technical principle of plating is based primarily upon cold cathode vacuum electric discharge theory, and metallic plasma caused by cathode arc source maintains negative electrode automatically
Arc discharge between coating chamber, the current density of arc spot is up to 105~107A/cm2.In metal that negative electrode is formed about etc.
Gas ions are mainly made up of electronics, cation, molten drop and neutral metal atom, and wherein atom only accounts for very little ratio, generally below
2%.For single element metal targets, ion ratio about up to 30%~100%, the kinetic energy of ion typically 10eV~
In the range of 100eV.
For a long time, the research of arc ion plating concentrates on the outer surface of workpiece such as cutter, various axle classes, blade deposition hard
In terms of coating, decorative coveringn, protective coating, the coating technique research for inner surface is very few.And, it is necessary to right in commercial Application
The workpiece that inner surface does modification is also a lot, and especially the surface of inside pipe wall is modified, such as:Oil pipeline, chemical pipeline,
The cylinder sleeve of automobile, tubular die, various gun barrels, gun barrel etc..These workpiece are because without effective modifying inner surface, usually making
Failed into abrasion and the corrosion of inwall.Therefore a kind of skill of effective electric arc ion-plating deposition inside pipe wall coating is worked out
Art, it is one of arc ion plating field problem urgently to be resolved hurrily.
For electric arc ion-plating deposition inside pipe wall coating, its difficulty essentially consists in, due to the less mouth of pipe of bore for etc.
Gas ions have a shielding action, the concentration of the plasma that cathode arc source ejects pipe internal cavity with Guan Shen increase and by
Gradually reduce, it is impossible to obtain the film of continuous uniform.
Utility model content
The purpose of this utility model is to provide a kind of arc ion plating apparatus of deposited tube inside coating, in existing electric arc
On the basis of ion beam coating equipment, designed by improved structure, realize and uniform, continuous coated want is prepared on deep inside pipe wall
The deposited tube inside coating asked.
To achieve these goals, technical solution of the present utility model is as follows:
A kind of arc ion plating apparatus of deposited tube inside coating, the equipment include the tubulose plasma being placed in vacuum chamber
Target, tubular vacuum focus on permanent magnet, plasma arc arc initiation device;Wherein, the both ends of tubulose plasma target are close by insulating
Envelope flange is connected with vacuum chamber shell, and tubular workpiece is non-contact to be placed on tubulose plasma target, tubular vacuum more than two
Focus on permanent magnet to discharge to by reverse magnetic pole order in tubulose plasma target tube interior edge pipe, focus control distribution electric arc, ionization
Arc target material.
The arc ion plating apparatus of described deposited tube inside coating, plasma arc arc initiation device pass through insulated enclosure flange
On vacuum chamber, plasma arc arc initiation device include being exposed to rotating handle outside vacuum chamber and in vacuum chamber with rotation
The striking pin of turning handle connection, plasma arc arc initiation device are communicated by striking pin with the negative pole of dc source, plasma arc striking
Device triggers striking by rotating.
The arc ion plating apparatus of described deposited tube inside coating, connect between vacuum room housing and tubulose plasma target
Dc source is connected to, vacuum room housing is connected with the positive pole of dc source, the negative pole phase of tubulose plasma target and dc source
Even, tubulose plasma target both ends connection Xun ring water-cooling apparatus.
The arc ion plating apparatus of described deposited tube inside coating, insulated enclosure flange include the flange I of one side spill
With the flange II of one side convex, flange I concave panel is corresponding with flange II convex, is formed non-contact among male-female engagement
Structure.
Design philosophy of the present utility model is:
By the design philosophy described in the target of tubulose plasma arc source, electric arc ion-plating deposition inside pipe wall coating technology needs one
The non-magnetic metal tube of diameter is determined as arc ion plating tubular target source.On tubular vacuum arc ion plating film device, two are made
The individual insulated enclosure flange being connected with vacuum chamber and non-magnetic metal tube target (tubulose plasma target), permanent magnet is distributed in non-
In magnetic conductive metal pipe target, i.e. plasma focus magnetic field.Non-magnetic metal tube target both ends connect Xun ring water, connect direct current
Source, plasma arc striking take insulated rotary to trigger.
The non-magnetic metallic target of tubular arc introduces plasma to survey region in workpiece to be deposited, being sprayed by cathode arc source
The plasma stream gone out is fully introduced into workpiece lumen to be deposited, by cooling down permanent magnet and tubulose plasma arc source Target Design
And the magnetic field intensity constraint arc spot of permanent magnet, the plasma density and the uniformity for making pipe internal cavity effectively improve, and then
The film of continuous uniform is deposited on inside pipe wall.
The utility model has the following advantages and beneficial effect:
1st, the equipment of electric arc ion-plating deposition inside pipe wall coating of the present utility model is solved due to the less mouth of pipe pair of bore
Have shielded effect in plasma, cause the concentration of the plasma that cathode arc source ejects in pipe internal cavity with Guan Shen
Increase and gradually reduce, it is impossible to the problem of obtaining continuous uniform film.
2nd, the arc ion plating apparatus of the utility model deposited tube inside coating, the design of its device is simple, normal using material
See and cost is cheap, handling ease is realized.
3rd, because arc ion plating has the advantages of ion kinetic energy is big, quality of forming film is good in itself, thus it is new using this practicality
Inside pipe wall coating that the arc ion plating apparatus of type deposited tube inside coating is prepared is fine and close, uniformity is good.
4th, the ion stream that the utility model plasma focus magnetic field can not only fly here to inside pipe wall direction is focused,
The utilization rate of ion to a range of ion focusing around cathode arc source, can also be greatly improved simultaneously, and then improves pipe
The sedimentation rate of inwall plated film.
5th, the utility model vaccum case both ends are designed using vacuum insulation sealing flange, this structural insulation arc resistant scaling loss
Its vacuum sealing position current potential is with respect to arc electrode vacuum housing floating potential.This is produced in pipe without electric arc has cooling water temperature low.
Brief description of the drawings
Fig. 1 is the arc ion plating apparatus schematic diagram of the utility model deposited tube inside coating;
Fig. 2 is the utility model pipe external insulation sealing flange structural representation;
Fig. 3 is that the utility model rotates arc-striking structure schematic diagram.
In figure, 1 vacuum chamber, 2 tubular workpieces, 3 tubulose plasma targets, 4 insulated enclosure flanges, the focusing of 5 tubular vacuums is forever
Magnet, 6 dc sources, 7 plasma arc arc initiation devices, 8 rotating handles, 41 flange I, 42 flange II.
Embodiment
Below, the utility model is described in further detail in conjunction with the accompanying drawings and embodiments:
As shown in FIG. 1 to 3, the arc ion plating apparatus of the utility model deposited tube inside coating, including it is placed in vacuum
Tubulose plasma target 3, tubular vacuum in room 1 focus on permanent magnet 5, plasma arc arc initiation device 7;Wherein, tubulose plasma
The both ends of target 3 are by the way that on insulated enclosure flange 4 and the cage connection of vacuum chamber 1, tubular workpiece 2 is non-contact to be placed on tubulose plasma
On target 3, tubular vacuum more than two focuses on permanent magnet 5 in tubulose plasma target tube interior edge pipe to by reverse magnetic pole order
Discharge, focus control distribution electric arc, ionization arc target material.
As shown in figure 3, plasma arc arc initiation device 7 is arranged on vacuum chamber 1 by insulated enclosure flange, plasma arc draws
Arc device 7 includes being exposed to the rotating handle 8 outside vacuum chamber and the striking pin being connected with rotating handle in vacuum chamber, plasma
Arc arc initiation device 7 is communicated by striking pin with the negative pole of dc source 6, and plasma arc arc initiation device 7 triggers striking by rotating.
It is connected with dc source between the housing of vacuum chamber 1 and tubulose plasma target 3, vacuum room housing and dc source
Positive pole is connected, and tubulose plasma target is connected with the negative pole of dc source, tubulose plasma target both ends connection Xun ring water coolings
Device.
As shown in Fig. 2 insulated enclosure flange 4 include spill flange I41 with while convex flange II42, flange
I41 concave panel is corresponding with flange II42 convex, forms the cooperation of concave-convex side, middle (bottom surface) non-contact structure.
Embodiment
In the present embodiment, Φ 30 × 100mm stainless steel pipes inwall deposition cu coating, comprise the following steps that:
Step 1, according to the utility model structure, electric arc ion-plating deposition inside pipe wall coating technology need certain diameter copper pipe
As arc ion plating tubulose copper target source.On tubular vacuum arc ion plating film device, two and vacuum chamber and copper target are made
The insulated enclosure flange of material connection, connection as shown in Figure 1 is assembled, in permanent magnet distribution copper, i.e. plasma focus magnetic field.Copper
Pipe both ends connect Xun ring water, connect dc source, insulated rotary triggering method is taken in plasma arc striking.
Step 2, vacuum chamber pipe outer wall connection DC power anode, tubulose plasma copper target material connection DC power cathode,
Plasma arc arc initiation device connects DC power anode.Every group of mechanism independence insulating mounting composition, each group uses vacuum mode
Assembled with vacuum chamber.
Step 3, cleaning inside pipe wall, using Φ 30 × 100mm stainless steel pipes.It is spirituous de- with dipping in before plated film
Fat cotton rub wipes inner surface, is then placed in ultrasonic 20min in deionized water.After cleaning drying, clamping is oriented to magnetic in pipe outer wall gradient
The inside of field coil.In order to facilitate thickness is characterized, will polish, the side on the stainless steel print (5 × 10 × 1mm) after cleaning is used
Oil pen draws one, and is placed in pipe bottom according to this from left to right, and by the mouth of pipe, internally number consecutively is 1~10.
Step 4, inside pipe wall depositing coating.It is powered in advance for plasma focus according to the experiment parameter given in table 1, when
Vacuum chamber base vacuum is evacuated to 6 × 10-3During Pa, Ar is introduced so that pressure in vacuum tank is stable in 0.3~0.4Pa, to cathode arc source
Striking, arc stream 60A, arc voltage 20V or so, the start recording time after stable discharging, plated film time 90min, close after the completion of plated film
Dc source.
Sample is taken out in step 5, cooling.When temperature is less than 40 DEG C near inside pipe wall, deflate, take out sample.
Step 6, finally characterize film thickness distribution.Stainless steel print inside pipe is poured, wipes what oil pen left
Vestige, you can obtain step, thickness is measured by step instrument.
By distribution of the inside pipe wall plated film obtained by above-mentioned experimental procedure along pipe depth direction film thickness, this reality is used with no
With the Film Thickness Ratio that the commonsense method of new technique obtains compared with experimental conditions and result are described as follows:
Using the inside pipe wall film of commonsense method deposition after length reaches 50mm, coating is almost invisible;And use this
The coating of the film of utility model effective thickness in deposition in the range of 0~100mm.Meanwhile prepared using the utility model
Inside pipe wall coating, 100mm length pipeline be internally formed than more uniform, continuous film, film of its thickness with commonsense method
Thickness is smaller compared to fluctuating change.That is, not only film forming depth has the inside pipe wall coating for depositing to obtain using the utility model
Effect improves, and uniformity is good.
The deposition parameter of the embodiment inside pipe wall plated film of table 1
Filming parameter | Value | Magnetic field parameter | Value |
Base vacuum P0 | 6×10-3Pa | Focusing magnetic field electric current I0 | 4A |
Work atmosphere | Ar | The electric current I1 of guidance coil 1 | 0.2A |
Pressure P | 0.3~0.4Pa | The electric current I2 of guidance coil 2 | 0.5A |
Arc stream I | 60A | The electric current I3 of guidance coil 3 | 1.0A |
Arc voltage U | ~20V | ||
Sedimentation time t | 90min |
Claims (4)
1. a kind of arc ion plating apparatus of deposited tube inside coating, it is characterised in that the equipment includes being placed in vacuum chamber
Tubulose plasma target, tubular vacuum focus on permanent magnet, plasma arc arc initiation device;Wherein, the both ends of tubulose plasma target
It is connected by insulated enclosure flange with vacuum chamber shell, tubular workpiece is non-contact to be placed on tubulose plasma target, more than two
Tubular vacuum focus on permanent magnet tubulose plasma target tube interior edge pipe to by reverse magnetic pole order discharge, focus control distribution
Electric arc, ionization arc target material.
2. according to the arc ion plating apparatus of the deposited tube inside coating described in claim 1, it is characterised in that plasma arc draws
Arc device is arranged on vacuum chamber by insulated enclosure flange, and plasma arc arc initiation device includes being exposed to the rotation outside vacuum chamber
Handle and the striking pin being connected in vacuum chamber with rotating handle, plasma arc arc initiation device pass through striking pin and dc source
Negative pole communicates, and plasma arc arc initiation device triggers striking by rotating.
3. according to the arc ion plating apparatus of the deposited tube inside coating described in claim 1, it is characterised in that vacuum room housing
Dc source is connected between tubulose plasma target, vacuum room housing is connected with the positive pole of dc source, tubulose plasma
Target is connected with the negative pole of dc source, tubulose plasma target both ends connection Xun ring water-cooling apparatus.
4. according to the arc ion plating apparatus of the deposited tube inside coating described in claim 1, it is characterised in that insulated enclosure method
Orchid include spill flange I with while convex flange II, flange I concave panel is corresponding with flange II convex,
Form non-contact structure among male-female engagement.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201720901364.6U CN207047312U (en) | 2017-07-24 | 2017-07-24 | A kind of arc ion plating apparatus of deposited tube inside coating |
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Application Number | Priority Date | Filing Date | Title |
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CN201720901364.6U CN207047312U (en) | 2017-07-24 | 2017-07-24 | A kind of arc ion plating apparatus of deposited tube inside coating |
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Publication Number | Publication Date |
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CN207047312U true CN207047312U (en) | 2018-02-27 |
Family
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CN201720901364.6U Expired - Fee Related CN207047312U (en) | 2017-07-24 | 2017-07-24 | A kind of arc ion plating apparatus of deposited tube inside coating |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107227445A (en) * | 2017-07-24 | 2017-10-03 | 曲士广 | A kind of arc ion plating apparatus of deposited tube inside coating |
CN113373417A (en) * | 2021-06-11 | 2021-09-10 | 哈尔滨工业大学 | Coating device and coating method for optimizing coating on inner wall of tube by using cathode and anode double-target head |
CN113388807A (en) * | 2021-06-11 | 2021-09-14 | 哈尔滨工业大学 | Coating device for optimizing coating of inner wall of pipe and coating method based on coating device |
-
2017
- 2017-07-24 CN CN201720901364.6U patent/CN207047312U/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107227445A (en) * | 2017-07-24 | 2017-10-03 | 曲士广 | A kind of arc ion plating apparatus of deposited tube inside coating |
CN107227445B (en) * | 2017-07-24 | 2019-01-25 | 曲士广 | A kind of arc ion plating apparatus of deposited tube inside coating |
CN113373417A (en) * | 2021-06-11 | 2021-09-10 | 哈尔滨工业大学 | Coating device and coating method for optimizing coating on inner wall of tube by using cathode and anode double-target head |
CN113388807A (en) * | 2021-06-11 | 2021-09-14 | 哈尔滨工业大学 | Coating device for optimizing coating of inner wall of pipe and coating method based on coating device |
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GR01 | Patent grant | ||
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180227 |
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CF01 | Termination of patent right due to non-payment of annual fee |