CN107620050A - Vacuum coater and film plating process for metal, rod-shaped piece surface - Google Patents
Vacuum coater and film plating process for metal, rod-shaped piece surface Download PDFInfo
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- CN107620050A CN107620050A CN201711066320.7A CN201711066320A CN107620050A CN 107620050 A CN107620050 A CN 107620050A CN 201711066320 A CN201711066320 A CN 201711066320A CN 107620050 A CN107620050 A CN 107620050A
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Abstract
The present invention relates to metal works anticorrosion technique field, it is particularly used for the vacuum coater and film plating process of metal, rod-shaped piece surface, two targets alternately work, avoid the situation of target poisoning, the characteristics of fully combining magnetron sputtering electric discharge and hollow cathode discharge, relative to conventional magnetron sputtering method, there is the advantages of sedimentation rate is high；Sputter coating process is completed in the cavity that sputtering target material and end flanges surround, without additional vacuum cell structure and the motion of complexity, you can complete the preparation process of anticorrosion coating.Further, since the material spilt is constrained on sputtering target material and sputtered in the tubular structure that baffle plate is formed, target utilization is high, and other workpiece will not be polluted.
Description
Technical field
The present invention relates to metal works anticorrosion technique field, and in particular to the Vacuum Deposition for metal, rod-shaped piece surface
Film device and film plating process.
Background technology
Workpiece failure and material loss caused by metal works corrosion are always the most important research of field of engineering technology
One of problem, electroplated metal layer (zinc, chromium, nickel etc.) have been obtained for extensively using as anticorrosion coating and achieve good effect
Fruit.But in recent years, the environment and waste of material problem that electroplating effluent is brought receive increasing attention, develop new nothing
The metal works anti-corrosion method for polluting, saving and save material is very urgent.
Vapour deposition is the method for the surface treatment that a major class is completed under vacuum and plated film.Magnetron sputtering (and it is empty
Heart cathodic discharge has obtained widely applying as two methods therein.Magnetically controlled sputter method is transported using the electronics in magnetic field
It is dynamic, sputtering target material is splashed to the surface of workpiece under the conditions of " at a high speed, low temperature "；Hollow cathode discharge utilizes plasma
" plasma sheath " that tubular inner surface is formed about when body discharges, makes the gas molecule ionization level near inner surface obtain greatly
It is big to improve.
Anticorrosion coating is coated with using magnetically controlled sputter method and hollow cathode discharge method to have obtained in production practices
Using.Such as the shortcomings that following be present using magnetically controlled sputter method：Sedimentation rate is relatively low, and binding force of cladding material is relatively low, target utilization
It is low, and easily other structures in pollution vacuum chamber.In addition, magnetron sputtering is usually using planar targets and plane sputtering source, workpiece
Required coating could be coated with rotary surface by needing the rotating mechanism of complexity；Using hollow cathode discharge method, due to
Using the method for chemical vapor deposition, this method can uniformly be coated with corresponding coating on rotary surface.However, chemical gas
The material category that phase method can be coated with is limited, and needs higher temperature, so the application of such method is also restricted.
The content of the invention
(1) technical problem solved
Present invention aims to overcome that the shortcomings of the prior art, and provide the Vacuum Deposition of metal, rod-shaped piece surface
Film device and film plating process, two targets alternately work, and avoid the situation of target poisoning, have magnetron sputtering and hollow cathode concurrently
The advantages of electric discharge, while avoid their application shortcoming.
(2) technical scheme
For the vacuum coater of metal, rod-shaped piece surface, including controlled sputtering source and shielding power supply；The magnetic control
Sputtering source includes sleeve, end flanges, insulating flange and locating flange；The sleeve includes that structure is identical and a symmetrically arranged left side
Sleeve and right sleeve, opposite end are provided with end flanges, are provided with insulating flange between end flanges, the end flanges of both sides and
Middle insulating flange is compressed by screw bolt and nut and connected, and seal is additionally provided between insulating flange and end flanges；Institute
The outer end for stating left sleeve and right sleeve is also equipped with end flanges, and splash-proof casing, end flanges outside are provided with the inside of end flanges
Counter flange is provided with, insulating flange, insulating flange and counter flange and end face are provided between counter flange and end flanges
Seal is additionally provided between flange, insulating flange, counter flange and end flanges are compressed by screw bolt and nut and connected；It is described
Be also associated with locating flange on the outside of counter flange, the flange plate bolt connection shaping of locating flange, between be provided with seal；Institute
State sleeve and be divided into the outer barrel of outer layer and the inner cylinder of inner side, multi-ring annular magnet is provided between outer barrel and inner cylinder；In the inner cylinder
Sputtering target material is provided with wall；The counter flange is additionally provided with ventilation interface.
Preferably, in addition to two metal, rod-shaped parts, the metal, rod-shaped part be each passed through left and right locating flange,
Counter flange, end flanges stretch into corresponding inner cylinder, and seal is also equipped between metal, rod-shaped part and locating flange.
Preferably, in addition to grid bias power supply, the pole of grid bias power supply one connect shaft-like metal parts, and another pole connects positioning mode
It is blue.
Preferably, the shielding power supply is alternating source or the pulse power, and pole connection left sleeve, another pole connects right set
Cylinder.
Preferably, the splash-proof casing is identical with sputtered target material, and splash-proof casing internal diameter is corresponding with metal, rod-shaped part external diameter.
Preferably, the insulating flange is polytetrafluoroethylmaterial material, and the seal is cushion rubber.
For the vacuum coating method of metal, rod-shaped piece surface, comprise the following steps：
S1, metal, rod-shaped part is cleaned；
S2, metal, rod-shaped part progress clamping is entered into above-mentioned vacuum coater；
S3, above-mentioned vacuum coater is vacuumized；
S4, plasma clean is carried out to metal, rod-shaped part and is heated；
S5, corrosion-resistant coating is coated with metal, rod-shaped piece surface using hollow cathode magnetically controlled sputter method.
Preferably, in the step 5, argon gas is passed through, inner cylinder air pressure inside is controlled in 0.1~2Pa scopes, utilizes bias
Metal, rod-shaped part is placed in 45~200V negative voltage by power supply, connects shielding power supply, is sputtered in 250V~600V scopes
Plated film, the thickness control of aluminium film is in 2~20 micrometer ranges.
Preferably, in the step 5, argon gas is passed through, inner cylinder air pressure inside is controlled in 0.1~2Pa scopes, utilizes bias
Metal, rod-shaped part is placed in 45~200V negative voltage by power supply, connects shielding power supply, aluminium is first coated with 250V~600V scopes
Film, the thickness control of aluminium film is in 3~15 micrometer ranges；After the completion of aluminium film is coated with, the electricity of grid bias power supply and shielding power supply is kept
Pressure and inner cylinder air pressure, be stepped up oxygen content and reduce argon content, until oxygen content account for gas gross 25%~
55%；After stable sputtering a period of time, then gradually reduce oxygen content and increase argon content, be until oxygen content drops to zero
Only, the thickness control of alumina layer is at 0.1~0.5 micron.
Preferably, in the step 5, argon gas is passed through, inner cylinder air pressure inside is controlled in 0.1~2Pa scopes, utilizes bias
Metal, rod-shaped part is placed in 45~200V negative voltage by power supply, connects shielding power supply, aluminium is first coated with 250V~600V scopes
Film, the thickness control of aluminium film is in 3~15 micrometer ranges；After the completion of aluminium film is coated with, the electricity of grid bias power supply and shielding power supply is kept
Pressure and inner cylinder air pressure, be stepped up oxygen content and reduce argon content, until oxygen content account for gas gross 25%~
55%；After stable sputtering a period of time, then gradually reduce oxygen content and increase argon content, be until oxygen content drops to zero
Only；Above-mentioned coating operation is repeated afterwards；At 0.5~5 micron, the number of plies of aluminium film and pellumina exists the thickness control of pure aluminium film
3~6 layers.
(3) beneficial effect
The invention provides the vacuum coater and film plating process for metal, rod-shaped piece surface, has following excellent
Point：
1, under vacuum, the coating with corrosion proof function is prepared in surface of workpiece.Due to avoiding waste liquid
Generation, for shaft-like and other metal works with revolution feature, it is possible to achieve the pollution-free of conventional plating process is replaced
Generation.
2, fully combine magnetron sputtering electric discharge and the characteristics of hollow cathode discharge, relative to conventional magnetron sputtering method,
With sedimentation rate it is high the advantages of.Further, since surface to be treated completely " submergence " in plasma discharge, coating
Adhesion is also better than conventional magnetron sputtering method.
3, sputter coating process is completed in the cavity that sputtering target material and end flanges surround, and is tied without additional vacuum room
The motion of structure and complexity, you can complete the preparation process of anticorrosion coating.Further, since the material spilt is constrained on and splashed
Shoot at the target in the tubular structure that material and sputtering baffle plate are formed, target utilization is high, and other workpiece will not be polluted.
Brief description of the drawings
In order to illustrate the technical solution of the embodiments of the present invention more clearly, used required for being described below to embodiment
Accompanying drawing is briefly described, it should be apparent that, drawings in the following description are only the present invention, protect some embodiments, right
For those of ordinary skill in the art, on the premise of not paying creative work, it can also be obtained according to these accompanying drawings
His accompanying drawing.
Fig. 1 is the structure chart of vacuum coater in the present invention；
Fig. 2 is oxygen content and the graph of a relation of plated film time；
Fig. 3 is the structure chart of plated film finished product.
In accompanying drawing, the list of parts representated by each label is as follows：
The metal, rod-shaped parts of 1-, 2- locating flanges, 3- bolts, 4- nuts, 5- counter flanges, 6- outer barrels, 7- annular magnets,
8- inner cylinders, 9- insulating flanges, 10- seals, 13- splash-proof casings, 14- targets.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained all other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
Referring to accompanying drawing, for the vacuum coater of metal, rod-shaped piece surface, including controlled sputtering source and shielding power supply；
Controlled sputtering source includes sleeve, end flanges, insulating flange 9 and locating flange 3；It is identical and symmetrically arranged that sleeve includes structure
Left sleeve and right sleeve, opposite end are provided with end flanges, and insulating flange 9, the end face method of both sides are provided between end flanges
Blue and middle insulating flange 9 compresses connection by bolt 3 and nut 4, is additionally provided between insulating flange 9 and end flanges close
Sealing 10；The outer end of left sleeve and right sleeve is also equipped with end flanges, and splash-proof casing 13, end face method are provided with the inside of end flanges
Blue outside is provided with counter flange 5, and insulating flange 9, insulating flange 9 and transition are provided between counter flange 5 and end flanges
Seal 10 is additionally provided between flange 5 and end flanges, insulating flange 9, counter flange 5 and end flanges pass through the and of bolt 3
Nut 4 compresses connection；The outside of counter flange 5 is also associated with locating flange 3, and the flange plate bolt connection of locating flange 3 is molded, it
Between be provided with seal 10；Sleeve is divided into the outer barrel 6 of outer layer and the inner cylinder 8 of inner side, and multi-turn is provided between outer barrel 6 and inner cylinder 8
Annular magnet 7；Sputtering target material 14 is provided with the inwall of inner cylinder 8；Counter flange 5 is additionally provided with ventilation interface, for connecting vacuum
Extract system or inflation system；Shielding power supply is alternating source or the pulse power, and pole connection left sleeve, another pole connects right set
Cylinder.
The present apparatus at work, the metal, rod-shaped part 1 of two identicals is each passed through locating flange 2, the transition of left and right
Flange 5, end flanges stretch into corresponding inner cylinder 8, and seal 10 is also equipped between metal, rod-shaped part 1 and locating flange 2.Absolutely
Lot or luck by which people are brought together orchid 9 is polytetrafluoroethylmaterial material, and seal 10 is cushion rubber
In one embodiment, device also includes grid bias power supply, and the pole of grid bias power supply one connects shaft-like metal parts 1, another
Pole connects locating flange 2, there is provided back bias voltage.
Sputtering target material 14 is the material source to form coating.Locating flange 2, bolt 3, nut 4, counter flange 5, end face method
The tubular space that blue, inner cylinder 8 and sputtering target material 14 include is closed to form sputtering space, the vacuum chamber as magnetron sputtering.Sputtering
In coating process, anode and cathode, the plasma of annular magnet 7 enter row constraint to the sputtering target material 14 of left and right sleeve each other.Insulation method
Orchid 9 realizes the electric insulation of left and right vacuum chamber.Metal, rod-shaped part 1 is fixed by flange, and controlled sputtering source coaxial line, due to
Insulating flange 9 is used, the negative electrode and anode of metal, rod-shaped part 1 and controlled sputtering source remain electrically isolated from.Such electricity knot
Structure is set, it is ensured that forms plasma discharge between a cathode and an anode, metal, rod-shaped part 1 needs the area of plated film
Domain " submergence " completely is within plasma discharge.Further, since the negative electrode and sun of the metal, rod-shaped controlled sputtering source of part 1
The electric insulation of pole, it can meet that plasma clean and sputter procedure apply the requirement of back bias voltage for metal, rod-shaped part 1.
Magnetron sputtering discharges and hollow cathode discharge occurs in the near surface of sputtering target material 14, because the superposition of the two is made
With greatly improving the sputter rate of sputtering target material 14, uniform deposition is needed plated film by the raw material spilt in metal, rod-shaped part 1
On the surface in region.Region for being not required to be coated with coating, insulation blocking is carried out using splash-proof casing 13.
May pollute and spill metal to other workpiece in controlled sputtering source for sputter procedure can cause to insulate
The problem of Joint failure, the material of splash-proof casing 14 are identical with sputtering target material 14.The internal diameter of splash-proof casing 13 and the metal, rod-shaped external diameter pair of part 1
Should, material will be spilt and be strapped in as much as possible in the space that sputtering target material 14 and splash-proof casing 13 are formed.
For the vacuum coating method of metal, rod-shaped piece surface, specifically：
A. pending metal, rod-shaped part 1 is cleaned, generally includes mechanical cleaning and Chemical cleaning.Mechanical cleaning can
Completed in a manner of using sand paper polishing, blasting treatment etc., it is therefore intended that remove the rusty stain and burr of workpiece surface.Chemical cleaning can
To be completed using alcohol or acetone in ultrasonic unit, it is therefore intended that remove workpiece surface dust and other reduction dirts.
B. pending metal, rod-shaped part 1 is subjected to reasonable clamping, for all kinds of different workpiece, be designed corresponding
Fixture.Reasonable clamping herein is embodied in three aspects：Requirement is vacuumized firstly the need of satisfaction, is used for metal, rod-shaped part
Double rubber ring structures；Next needs the requirement for meeting bias sputtering；Finally by splash-proof casing 13 in sputter area but nothing
The workpiece surface of plated film is needed to carry out Reasonable Protection.
C. device vacuumizes, using the ventilation interface of vacuum-pumping system connecting end surface flange by gas inside controlled sputtering source
Pressure is extracted into 0.5X10-2Below Pa.
D. plasma clean is carried out to pending metal, rod-shaped part：It is filled with argon gas, and by gas inside controlled sputtering source
Voltage-controlled system applies 100V~450V negative voltage using direct current or the pulse power in 5~25Pa scopes on workpiece, utilize etc. from
Daughter glow discharge is carrying out plasma clean, scavenging period 4-10 minutes to workpiece surface.
E. corrosion-resistant coating is coated with rod member surface using hollow cathode magnetically controlled sputter method.Different degrees of according to workpiece
Anticorrosion needs, and coating can take three kinds of forms, fine aluminium monofilm, pure aluminium film+pellumina duplicature or pure aluminium film and oxygen
The form for changing aluminium film alternate multi-layered film realizes the anti-corrosion protection to workpiece.
The technology characteristics of different electroplated coating combinations are as shown in table 1 below：
The technology characteristics table of 1 different electroplated coating combinations of table
Specifically, for fine aluminium monofilm：Argon gas is passed through, controlled sputtering source air pressure inside is controlled in 0.1~2Pa models
Enclose, pending workpiece (10) is placed in 45~200V negative voltage using grid bias power supply, shielding power supply is connected, in 250V~600V
Scope carries out sputter coating, and the thickness of aluminium film is as needed, controls in 2~20 micrometer ranges.
For fine aluminium+aluminum oxide two membranes：Argon gas is passed through, controlled sputtering source air pressure inside is controlled in 0.1~2Pa models
Enclose, pending workpiece (10) is placed in 45~200V negative voltage using grid bias power supply, shielding power supply is connected, in 250V~600V
Scope elder generation aluminum film, the thickness of aluminium film is as needed, controls in 3~15 micrometer ranges.After the completion of aluminium film is coated with, keep inclined
Air pressure in the voltage and controlled sputtering source of voltage source and shielding power supply, it is stepped up oxygen content and reduces argon content, directly
The 25%~55% of gas gross is accounted for oxygen content.After stable sputtering a period of time, then gradually reduce oxygen content and increase
Argon content, untill oxygen content drops to zero.The thickness control of alumina layer is at 0.1~0.5 micron.
For fine aluminium+aluminum oxide multi-layer film：Preparation process and fine aluminium+aluminum oxide two membranes are essentially identical, but every layer of fine aluminium
The thickness control of film is at 0.5~5 micron, and the number of plies of aluminium film and pellumina is at 3~6 layers.
As shown in Fig. 2 to reduce the stress between aluminium lamination and alumina layer, when being coated with every layer of aluminum oxide, oxygen is being coated with
In the time T for changing aluminium, oxygen content progressively increases to setting value (0~T by 01), then stablize in setting value (T1~T2), finally
It is gradually lowered to 0 (T2~T).Relative to T, the time is within 0.25T used in oxygen content increase and reduction.
Vacuum coating method and controlled sputtering source of the present invention, sputter coating process is in sputtering target material 14 and positioning
Completed in the cavity that flange 2, end flanges, inner cylinder 8 surround, without additional vacuum cell structure and the motion of complexity, you can
Complete the preparation process of anticorrosion coating.Further, since the material spilt is constrained on 13 shapes of sputtering target material 14 and splash-proof casing
Into tubular structure in, target utilization is high, and other workpiece will not be polluted.
It can realize that product surface is aluminized by such a process bonding apparatus, replacement is zinc-plated, realizes corresponding anticorrosive
Contrast on effect, 2 are shown in Table with reference to salt mist experiment test comparison data.
The salt mist experiment statistical form of table 2
As shown in Table 2, it is identical in its surface attachment thickness for the exemplar of test, and the related corruption of material that material is different
Lose corresponding to the time from the point of view of data, carried out pair by the product aluminized that this device and technique are completed and conventional galvanizing technique
Than considerably beyond galvanizing production in terms of corrosion stability, there is high advantage.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means
Feature, which is lived, with reference to specific features, structure, the material that the embodiment or example describe is contained at least one implementation of the invention
In example or example.In this manual, identical embodiment or example are not necessarily referring to the schematic representation of above-mentioned term.
Moreover, specific features, structure, material or the feature of description can close in any one or more embodiments or example
Suitable mode combines.
Present invention disclosed above preferred embodiment is only intended to help and illustrates the present invention.Preferred embodiment is not detailed
All details are described, also do not limit the embodiment that the invention is only.Obviously, according to the content of this specification, can make
Many modifications and variations.This specification is chosen and specifically describes these embodiments, is to preferably explain the original of the present invention
Reason and practical application, so that skilled artisan can be best understood by and utilize the present invention.The present invention is only authorized
The limitation of sharp claim and its four corner and equivalent.
Claims (10)
1. for the vacuum coater of metal, rod-shaped piece surface, including controlled sputtering source and shielding power supply, it is characterised in that：
The controlled sputtering source includes sleeve, end flanges, insulating flange and locating flange；It is identical and symmetrical that the sleeve includes structure
The left sleeve of setting and right sleeve, opposite end are provided with end flanges, and insulating flange, the end of both sides are provided between end flanges
Face flange and middle insulating flange are compressed by screw bolt and nut to be connected, and is additionally provided between insulating flange and end flanges close
Sealing；The outer end of the left sleeve and right sleeve is also equipped with end flanges, and splash-proof casing, end face method are provided with the inside of end flanges
Blue outside is provided with counter flange, and insulating flange, insulating flange and counter flange are provided between counter flange and end flanges
Seal is additionally provided between end flanges, insulating flange, counter flange and end flanges are compressed by screw bolt and nut to be connected
Connect；Be also associated with locating flange on the outside of the counter flange, the flange plate bolt connection shaping of locating flange, between be provided with it is close
Sealing；The sleeve is divided into the outer barrel of outer layer and the inner cylinder of inner side, and multi-ring annular magnet is provided between outer barrel and inner cylinder；It is described
Sputtering target material is provided with inner cylinder inwall；The counter flange is additionally provided with ventilation interface.
2. the vacuum coater according to claim 1 for metal, rod-shaped piece surface, it is characterised in that：Also include
Two metal, rod-shaped parts, the locating flange, counter flange, end flanges that the metal, rod-shaped part is each passed through left and right stretch into
Corresponding inner cylinder, seal is also equipped between metal, rod-shaped part and locating flange.
3. the vacuum coater according to claim 2 for metal, rod-shaped piece surface, it is characterised in that：Also include
Grid bias power supply, the pole of grid bias power supply one connect shaft-like metal parts, and another pole connects locating flange.
4. the vacuum coater according to claim 1 for metal, rod-shaped piece surface, it is characterised in that：It is described to splash
Radio source is alternating source or the pulse power, and pole connection left sleeve, another pole connects right sleeve.
5. the vacuum coater according to claim 1 for metal, rod-shaped piece surface, it is characterised in that：It is described anti-
Splash set it is identical with sputtered target material, splash-proof casing internal diameter is corresponding with metal, rod-shaped part external diameter.
6. the vacuum coater according to claim 1 for metal, rod-shaped piece surface, it is characterised in that：It is described exhausted
Lot or luck by which people are brought together orchid is polytetrafluoroethylmaterial material, and the seal is cushion rubber.
7. the vacuum coating method for metal, rod-shaped piece surface, it is characterised in that comprise the following steps：
S1, metal, rod-shaped part is cleaned；
S2, metal, rod-shaped part progress clamping is entered into any vacuum coaters of claim 1-6；
S3, above-mentioned vacuum coater is vacuumized；
S4, plasma clean is carried out to metal, rod-shaped part and is heated；
S5, corrosion-resistant coating is coated with metal, rod-shaped piece surface using hollow cathode magnetically controlled sputter method.
8. the vacuum coating method according to claim 7 for metal, rod-shaped piece surface, it is characterised in that：The step
In rapid 5, argon gas is passed through, inner cylinder air pressure inside is controlled in 0.1~2Pa scopes, put metal, rod-shaped part using grid bias power supply
In 45~200V negative voltage, shielding power supply is connected, sputter coating is carried out in 250V~600V scopes.
9. the vacuum coating method according to claim 5 for metal, rod-shaped piece surface, it is characterised in that：The step
In rapid 5, argon gas is passed through, inner cylinder air pressure inside is controlled in 0.1~2Pa scopes, put metal, rod-shaped part using grid bias power supply
In 45~200V negative voltage, shielding power supply is connected, in 250V~600V scopes elder generation aluminum film；After the completion of aluminium film is coated with,
The voltage and inner cylinder air pressure of grid bias power supply and shielding power supply are kept, oxygen content is stepped up and reduces argon content, until oxygen
Gas content accounts for the 25%~55% of gas gross；After stable sputtering a period of time, then gradually reduce oxygen content and increase argon gas
Content, untill oxygen content drops to zero.
10. the vacuum coating method according to claim 5 for metal, rod-shaped piece surface, it is characterised in that：It is described
In step 5, argon gas is passed through, by the control of inner cylinder air pressure inside in 0.1~2Pa scopes, using grid bias power supply by metal, rod-shaped part
45~200V negative voltage is placed in, shielding power supply is connected, in 250V~600V scopes elder generation aluminum film；When aluminium film is coated with completion
Afterwards, the voltage and inner cylinder air pressure of grid bias power supply and shielding power supply are kept, oxygen content is stepped up and reduces argon content, until
Oxygen content accounts for the 25%~55% of gas gross；After stable sputtering a period of time, then gradually reduce oxygen content and increase argon
Gas content, untill oxygen content drops to zero；Above-mentioned coating operation is repeated afterwards；Aluminium film and the number of plies of pellumina are 3
~6 layers.
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| CN201711066320.7A CN107620050A (en) | 2017-11-02 | 2017-11-02 | Vacuum coater and film plating process for metal, rod-shaped piece surface |
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| CN114318321A (en) * | 2022-01-14 | 2022-04-12 | 桂林航天工业学院 | Ultrasonic-assisted metal plating device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109023273A (en) * | 2018-08-06 | 2018-12-18 | 信阳舜宇光学有限公司 | A kind of filming equipment and film plating process |
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| CN109097740A (en) * | 2018-09-30 | 2018-12-28 | 佛山科学技术学院 | A kind of vacuum coating equipment with corrosion proof function |
| CN110205596A (en) * | 2019-06-12 | 2019-09-06 | 河北道荣新能源科技有限公司 | The drive mechanism and method of intracavity magnetron sputtering apparatus |
| CN114318321A (en) * | 2022-01-14 | 2022-04-12 | 桂林航天工业学院 | Ultrasonic-assisted metal plating device |
| CN114318321B (en) * | 2022-01-14 | 2023-05-12 | 桂林航天工业学院 | Ultrasonic-assisted metal plating device |
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