CN103668061B - A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like - Google Patents
A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like Download PDFInfo
- Publication number
- CN103668061B CN103668061B CN201310725837.8A CN201310725837A CN103668061B CN 103668061 B CN103668061 B CN 103668061B CN 201310725837 A CN201310725837 A CN 201310725837A CN 103668061 B CN103668061 B CN 103668061B
- Authority
- CN
- China
- Prior art keywords
- arc
- film
- coating chamber
- diamond
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The present invention relates to a kind of achievable high adhesion force, high rigidity, low-friction coefficient diamond-film-like coating apparatus, it includes coating chamber, planetary rotation work rest, Magnetic filter arc source, molecular pump.The present invention has many advantages, such as that compact structure, adhesive force are strong, hardness is high, coefficient of friction is small using Magnetic filter function and high vacuum multi sphere target structure, using the diamond-like membrane coat that the present invention makes.
Description
Technical field
The present invention relates to a kind of diamond-film-like coating apparatus.
Background technique
Diamond-like membrane coat (Diamond-like Carbon) abbreviation DLC coating.Diamond-like (DLC) film is one
The film of the metastable class of amorphous carbon of the kind containing a certain amount of diamond key (sp2 and sp3).The main component of film is carbon, because
Carbon can exist with three kinds of different hybrid form sp3, sp2 and sp1, so carbon can form different crystal and unordered knot
Structure.This is but also the research to carbon-base film is complicated.In sp3 hybrid structure, four valence electrons of a carbon atom
It is assigned in the sp3 track of the orientation with tetrahedral structure, carbon atom and adjacent atom form very strong ♂ key, this
Bonding pattern we be also commonly referred to as diamond key.In sp2 hybrid structure, three in four valence electrons of carbon enter three
In the sp2 track of angular orientation, and ♂ key is in one plane formed, the 4th electronics is located at the p π rail with one plane of ♂ key
Road.π track is same or multiple adjacent atoms form weak pi bond.And in sp1 structure, two in four valence electrons into
Enter after π track each leisure and is upwardly formed ♂ key along the side of x-axis, and other two valence electron then enters the p π track of y-axis and z-axis
Form pi bond.DLC carbon film can be doped DLC (N-DLC) film that different elements is adulterated.C in them be all with
The bonding pattern of sp3, sp2 and sp1 and exist, thus have many performances similar with diamond film.
Diamond-like (DLC) film has many and diamond phase seemingly or similar excellent performance, as hardness is high, elasticity modulus
It is high, coefficient of friction is low, biological compatibility is good, acoustical behavior is good, electric property is good etc..DLC film develops to today, for more
Come known to more researcher and industry and pay close attention to, has great application prospect in each field of industry.DLC film at present
In aerospace, precision machinery, microelectromechanicdevices devices, magnetic disk storage, auto parts and components, optical equipment and biology doctor
Etc. multiple fields are widely used, and are the high performance inorganic non-metallic thin-film materials with important application prospect.
The U.S. is using DLC film material as one of strategic material of 21 century.Diamond-film-like is ground at present
Study carefully, develop, preparing and using just promoting both in depth and in breadth.Diamond-like preparation method it is very much: as ion beam assisted depositing,
Magnetron sputtering, vacuum cathode arc deposition, plasma enhanced chemical vapor deposition, ion implantation etc..But different preparation
Method, ingredient, structure and the performance of DLC film have very big difference.Realize that high-volume, large area, DLC film of fine quality are answered
With there is also many problems.Such as: current most of depositing devices or device belong to the equipment that laboratory uses principle type, system
For at high cost, single heat yield is small, is unable to continuous production.It cannot make industrial enterprise's mass production, the equipment for realizing industrialization.
Traditional equipment or the coating quality of device preparation are unstable at present, and coating adhesion is poor, and thicknesses of layers is extremely micro-
Thin (1 μm or so) etc..It is not able to satisfy practical application especially in high kinematic pair, the narrow surface coating of high-frequency friction
The quality requirement of DLC.
Summary of the invention
The present invention is for overcome the deficiencies in the prior art, to provide one kind and be produced on a large scale, realize industrialization and can
Realize high adhesion force, high rigidity, low-friction coefficient diamond-film-like coating apparatus.
The present invention is achieved by the following technical programs:
A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like, it includes coating chamber, planet rotation
Turn work rest, Magnetic filter arc source, molecular pump, vacuum system, the coating chamber is vertical type cylinder shape, whole Double-layer water cold type knot
Structure, the coating chamber front are equipped with feeding gate, and the top of the coating chamber is equipped with tubular heater, thermocouple interface, the painting
The bottom of floor room is equipped with air inlet and planetary rotation work rest, and planetary rotation work rest bottom is connected with drive system, institute
The side wall for stating coating chamber is equipped with Magnetic filter arc source, and the rear portion of the coating chamber is equipped with molecular pump and vacuum system.
Further, Magnetic filter arc source by arc electrode, cathode anchor, target, push away arc electromagnetic coil, focused electromagnetic
Coil, elbow composition, the target are mounted on cathode anchor, the arc electrode and the external striking electricity of the cathode anchor
Source, it is described to push away arc electromagnetic coil and the focused electromagnetic coil is mounted on the arc electrode and cathode anchor generates at electric arc
Periphery.
Further, the elbow is the taper elbow that 2 ° of crooked radians of taper are 100 °, the appearance of the taper elbow
Face is equipped with multiple arc of curvature electromagnetic coils, and the bent magnetic field that intensity is 0~20 mT is formed in taper elbow.
The working principle of the invention: the external striking power supply of arc electrode and cathode anchor in Magnetic filter arc source focuses electricity
The motive force that magnetic coil generates pushes electric arc to front, appropriate to adjust the coil electricity for pushing away arc electromagnetic coil and focused electromagnetic coil
Stream, can also control the range that cathode protection is moved in cathode surface, etch cathode uniformly, obtain one and stablize burning
Cold plasma electric arc.Taper elbow is the pipeline that passes through of plasma, arc of curvature electromagnetic coil can produce intensity be 0~
The bent magnetic field of 20 mT plays the role of being bent the macroparticles groups such as electric arc filtering neutral particle.Finally, cathode material ion
Enter coating chamber by the outlet of taper elbow.In coating chamber, heating temperature, vacuum degree are set according to the technological requirements, then fill
Enter N, C, H, O2、CH4Gases are waited, the ion after Magnetic filter carries out plated film in workpiece surface.
The present invention has following technical effect that
(1) present invention uses Magnetic filter function separately to reinforce big ion source with high vacuum multiple arc target and combines coating, multi beam
Arc source makes to generate vacuum arc discharge between its multi-faceted trigger electrode and graphite cathode, inspires the carbon plasma of high ionization level
Body falls the bulky grain and neutral atom of the generation of arc source using Magnetic filter coil filtering, can make to reach the almost all of substrate to be carbon
Ion prepares high quality, fine and close hydrogen-free film with higher deposition rate.
(2) present invention setting multiple Magnetic filter arcs source is distributed in true for depositing DLC coating, multiple Magnetic filter arcs source point column
Empty room side wall and gate, each target position have interchangeability, and Function Extension and depositing operation is facilitated to adjust；The configuration of this device vacuum system
Pump is taken out based on molecular pump, avoids contamination phenomenon of the pumping fluid in coating process；The present invention is using PLC+ industrial personal computer hand, automatic
The control mode of one, person-computer union operation mode.
(3) it is characteristic of the invention that the right angle resistance of target extraction can be overcome using taper elbow (2 ° curved 100 ° of cone),
The suction of striking can be given full play to and push away the effect of arc, target is smoothly introduced to coating chamber and is deposited on workpiece.The present invention
Target utilization reach 60% or more.
The coating apparatus quality of production of the present invention is reliable and stable, can be applied to produce in enormous quantities, advantageously reduces production cost,
Realize industrialization.
Detailed description of the invention
Fig. 1 is top view of the invention.
Fig. 2 is left view of the invention.
Fig. 3 is the structural schematic diagram in Magnetic filter arc source.
Fig. 4 is the surface topography map of the diamond-like membrane coat prepared using present device.
Fig. 5 is the Raman spectrogram of the diamond-like membrane coat prepared using present device.
Fig. 6 is the coefficient of friction detection figure of the diamond-like membrane coat prepared using present device.
Fig. 7 is the Cross Section Morphology figure of the diamond-like membrane coat prepared using present device.
In attached drawing: 1-Magnetic filter arc source, 2-coating chambers, 3-vacuum systems, 4-racks, 5-molecular pumps, 6-planets
Rotational workpieces frame, 7-feeding gates, 8-thermocouple interfaces, 9-tubular heaters, 10-drive systems, 11-air inlets, 12-
Cathode anchor, 13-arc electrodes, 14-push away arc electromagnetic coil, 15-targets, 16-elbows, 17-arc of curvature electromagnetic coils,
18-focused electromagnetic coils.
Specific embodiment
With reference to the accompanying drawing, the present invention is further elaborated on.
As shown in Figure 1 and Figure 2, a kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like, including apply
Floor room 2, planetary rotation work rest 6, Magnetic filter arc source 1, molecular pump 5, rack 4.
Coating chamber 2 is fixedly mounted in rack 4, and coating chamber 2 uses vertical type cylinder shape structure 900 × 900mm of Ф, stainless steel
Material, whole Double-layer water cold type structure, button fly front structure are conveniently replaceable sample, target 15 and daily maintenance.Vacuum chamber integrally welds
Heat treatment elimination welding stress is carried out after connecing prevents post welding distortion.2 front of coating chamber is provided with feeding gate 7 and observation window, coating chamber 2
Top be equipped with tubular heater 9, thermocouple interface 8, charge valve and reserved CF35 flange-interface.The rear portion of the coating chamber 2
Molecular pump 5 and vacuum system 3 are installed.
The bottom of coating chamber 2 is equipped with air inlet 11 and planetary rotation work rest 6, and 6 bottom of planetary rotation work rest connects
It is connected to drive system 10, the planetary rotation work rest 6 is that planetary gear mechanism (row is communicated rotational motion to by direct current generator
Star gear mechanism is made of sun gear, planetary gear and internal gear), drive the work hanger connecting with planetary gear to make certainly
Turn, while the big disk that driving is connect with internal gear again revolves, to realize that workpiece is " rotation " and " public during the deposition process
Turn " guarantee that workpiece is comprehensive, uniform DLC films deposited layer.Planetary rotation work rest 6 is to aim at that high-volume, industrialization production sets
Meter, station is more, and substrate loading range is big, and rotation speed is that 0~20RPM is adjustable, useful load: being calculated, can be filled with φ 130
2000/furnace.
The side wall of coating chamber 2 is equipped with multiple Magnetic filter arcs source 1, as shown in figure 3, Magnetic filter arc source 1 is by striking electricity
Pole 13, target 15, pushes away arc electromagnetic coil 14, focused electromagnetic coil 18, the composition of elbow 16 at cathode anchor 12.The target 15 is pacified
On cathode anchor 12, the arc electrode 13 and the external striking power supply of the cathode anchor 12, the striking power supply have energy
Enough identify electric arc burning or OFF state link, as needed and issue striking pulse, arc automatic starting when being started and
Automatic restarting after blow-out.It is described to push away arc electromagnetic coil 14 and the focused electromagnetic coil 18 is mounted on 13 He of arc electrode
Cathode anchor 12 generates the periphery at electric arc.The table for being transitioned into cathode after arc ignition rapidly can be made by pushing away arc electromagnetic coil 14
Face is also possible to prevent after arc ignition to 12 root-burn of water-cooled cathode bracket.The motive force that focused electromagnetic coil 18 generates will
Electric arc pushes front to, appropriate to adjust the coil current for pushing away arc electromagnetic coil 14 and focused electromagnetic coil 18, can also control cathode
The range that spot is moved in cathode surface, etches cathode uniformly, obtains the cold plasma electric arc for stablizing burning.
Two coils can produce the electromagnetic field of 0~40 mT.
As shown in figure 3, the elbow 16 is the taper elbow 16 that 2 ° of crooked radians of taper are 100 °, the taper elbow
16, the outer surface of the taper elbow 16 is equipped with multiple arc of curvature electromagnetic coils 17, and it is 0 that intensity is formed in taper elbow 16
The bent magnetic field of~20 mT plays the role of being bent the macroparticles groups such as electric arc filtering neutral particle.The arc that system uses plates electricity
Source floating voltage is 65 V, and rated current is 25~300 A.Cathode connects the negative polarity end of arc plating power supply by cathode anchor 12,
The plus earth of arc plating power supply.Special anode is not used in whole device, anode is made of the taper elbow 16 being grounded, and is simplified
The structure of curved arc magnetic filter.High vacuum multi sphere ionic coating is a kind of ionization level highest (70%~100%), macroion energy
Measure (40~100 eV) [ 1 ], high speed, efficient new coatings technology.It is using coated material as cathode, in a vacuum
Arc discharge is generated, a kind of technology of deposition plating is carried out using plasma.
During discharge, there are at cathode protection very high current density, up to 106~108 A/ due to electric arc
Cm2 [ 2,3 ], thus, still there is very high temperature at cathode protection.If this temperature is significantly larger than the fusing point of cathode,
There is single or multiple small molten baths (1~20 μm [ Isosorbide-5-Nitrae ]) in cathode surface, evaporates cathode material steam, air pressure increases suddenly.This
Sample, molten metal can be made under the action of the barometric gradient with the barometric gradient of surrounding vacuum by generating at cathode protection
Spot break into include metal ion, metal vapors, macroparticle group etc. compositions electric arc stream.If this macroparticle group
Reach coated workpieces surface, it is possible to be attached to above, not only cause workpiece surface coarse, but also may be in film use process first
Flake-off forms the initiation source of film rupture.In addition, (the yin as made of the sintering such as graphite in the electric arc of high-melting-point cathode material
Pole material), it is mingled with a large amount of blocky-shaped particle.It falls off or adheres to behind the surface of these particles arrival film, attaching particles are subsequent
The film of growth is covered, and the field trash of film is caused, and becomes the defect of film, reduces the quality of film.Thus, to vacuum cathode arc ion
The arc source of plating improves, to eliminate coarse grained particle cluster.Other than using geometry baffle, using magnetic field to charged particle
Lorentz force changes the path that plasma reaches workpiece surface, achievees the purpose that filter electric arc, to obtain the thin of high quality
Film.The method that the present invention uses 100 ° of 16 formula magnetic filters of taper elbow is obtained well using the structure of no impressed current anode
Effect.
The present invention separately reinforces big ion source with high vacuum multiple arc target using Magnetic filter function and combines coating, multi beam arc source
Make to generate vacuum arc discharge between its multi-faceted trigger electrode and graphite cathode, inspire the carbon plasma of high ionization level,
The bulky grain and neutral atom for falling the generation of arc source using Magnetic filter coil filtering, can make to reach the almost all of substrate be carbon from
Son prepares high quality, fine and close hydrogen-free film with higher deposition rate.
Actual effect using the diamond-like membrane coat of the invention made is as follows:
Fig. 4 is the shape appearance figure that test sample surface amplifies 5000 times under field emission electron scanning electron microscope.From testing result
As can be seen that sample surfaces deposited one layer of fine and close film.
Fig. 5 is the Raman spectrogram on test sample surface, from testing result as can be seen that the painting of two positions detected
Layer all shows out two characteristic peaks of diamond-like, i.e. near the peak amorphous carbon D and 1580cm-1 near 1350cm-1
The peak graphite G.Coating is typical diamond-like, and coating quality is good.
Fig. 6 is detection coating under dry conditions with friction curve figure when silicon nitride ceramic ball opposite grinding, can be seen by figure
Its average friction coefficient is about 0.13 out.
As shown in fig. 7, can be seen that between coating and substrate from testing result has apparent line of demarcation, detected two
The coating layer thickness of a position is each about 10 microns, and traditional coating apparatus and equipment are extremely difficult to this thickness, while Fig. 7
Also show that coating thickness on different location is more uniform.
Claims (2)
1. a kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like, it is characterised in that: it includes coating
Room, planetary rotation work rest, Magnetic filter arc source, molecular pump, vacuum system, the coating chamber are vertical type cylinder shape, whole double-deck
Water-cooled structure, the coating chamber front are equipped with feeding gate, and the top of the coating chamber is equipped with tubular heater, thermoelectricity couples
Mouthful, the bottom of the coating chamber is equipped with air inlet and planetary rotation work rest, and planetary rotation work rest bottom is connected with drive
Dynamic system, the side wall of the coating chamber are equipped with Magnetic filter arc source, and the rear portion of the coating chamber is equipped with molecular pump and vacuum system
System；Multi beam arc source makes to generate vacuum arc discharge between its multi-faceted trigger electrode and graphite cathode；
Magnetic filter arc source by arc electrode, cathode anchor, target, push away arc electromagnetic coil, focused electromagnetic coil, elbow and form
The target is mounted on cathode anchor, the arc electrode and the external striking power supply of the cathode anchor, described to push away arc electromagnetism
Coil and the focused electromagnetic coil are mounted on the periphery at the arc electrode and cathode anchor generation electric arc.
2. a kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like according to claim 1,
Be characterized in that: the elbow is the taper elbow that 2 ° of crooked radians of taper are 100 °, and the outer surface of the taper elbow is equipped with
Multiple arc of curvature electromagnetic coils form the bent magnetic field that intensity is 0~20mT in taper elbow.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310725837.8A CN103668061B (en) | 2013-12-25 | 2013-12-25 | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310725837.8A CN103668061B (en) | 2013-12-25 | 2013-12-25 | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103668061A CN103668061A (en) | 2014-03-26 |
| CN103668061B true CN103668061B (en) | 2018-12-14 |
Family
ID=50306822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310725837.8A Active CN103668061B (en) | 2013-12-25 | 2013-12-25 | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103668061B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105039914A (en) * | 2015-04-22 | 2015-11-11 | 常州大学 | Multi-arc ion plating accelerating system |
| CN108504999B (en) * | 2018-05-29 | 2020-07-17 | 安徽顺彤包装材料有限公司 | Film coating machine |
| CN110592534A (en) * | 2019-10-12 | 2019-12-20 | 九江职业技术学院 | Method and device for preparing ultra-nano diamond film |
| CN111663106A (en) * | 2020-07-07 | 2020-09-15 | 北京师范大学 | Device for preparing high-shielding matrix coating |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1332266A (en) * | 2000-07-06 | 2002-01-23 | 日新电机株式会社 | Vacuum arc evaporation source and film-forming device using it |
| CN101768720A (en) * | 2010-03-31 | 2010-07-07 | 西安交通大学 | Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw |
| CN103205711A (en) * | 2013-04-16 | 2013-07-17 | 温州职业技术学院 | Non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device |
| CN203700496U (en) * | 2013-12-25 | 2014-07-09 | 湖南中航超强金刚石膜高科技有限公司 | Device for coating diamond-like carbon films |
-
2013
- 2013-12-25 CN CN201310725837.8A patent/CN103668061B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1332266A (en) * | 2000-07-06 | 2002-01-23 | 日新电机株式会社 | Vacuum arc evaporation source and film-forming device using it |
| CN101768720A (en) * | 2010-03-31 | 2010-07-07 | 西安交通大学 | Method for preparing amorphous carbon coating on surface of medical stainless steel knife saw |
| CN103205711A (en) * | 2013-04-16 | 2013-07-17 | 温州职业技术学院 | Non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device |
| CN203700496U (en) * | 2013-12-25 | 2014-07-09 | 湖南中航超强金刚石膜高科技有限公司 | Device for coating diamond-like carbon films |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103668061A (en) | 2014-03-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101792895B (en) | Cathodic vacuum arc source film depositing device and method for depositing film | |
| CN103668095B (en) | A kind of high power pulse plasma enhancing combined magnetic-controlled sputter deposition apparatus and using method thereof | |
| CN103668061B (en) | A kind of coating apparatus of high adhesion force high rigidity low-friction coefficient diamond-film-like | |
| CN203174194U (en) | Multifunctional plasma body enhanced coat system | |
| CN104141109B (en) | Method for in-situ synthesis of composite TiC-DLC coating on surface of titanium | |
| CN201660693U (en) | Cathode vacuum arc source thin film deposition device | |
| CN105755442A (en) | Method for preparing DLC (diamond-like carbon) thick films by means of efficient magnetic filter plasma deposition | |
| CN104213076A (en) | Method and equipment for preparing ultra-hard DLC coatings through PVD and HIPIMS | |
| CN109778136B (en) | Method for preparing diamond-like coating by adopting thermionic plasma technology | |
| JP2005500440A (en) | Method for forming nanostructured functional layer and coating layer produced thereby | |
| CN103589999B (en) | A kind of self-supporting quasi-diamond nano thin-film preparation facilities and method for manufacturing thin film | |
| CN101701332B (en) | Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method | |
| CN107779839B (en) | DLC film plating process based on anode technology | |
| CN107142463A (en) | A kind of plasma activated chemical vapour deposition and magnetron sputtering or the compound coating method of ion plating | |
| CN201962349U (en) | Normal temperature deposition equipment for high boundary strength diamond film material | |
| CN102011102A (en) | Normal-temperature deposition equipment for high-interfacial strength diamond film materials and method thereof | |
| CN108374154A (en) | Diamond-like coating preparation facilities with resultant field and its application | |
| CN106048531A (en) | ICP reinforced multi-target magnetron sputtering device and method for preparing TiO2 film by using device | |
| CN102943240A (en) | Multifunctional plasma enhanced coating system | |
| CN203700496U (en) | Device for coating diamond-like carbon films | |
| CN114481025A (en) | ta-C deposition coating method | |
| CN108165944B (en) | A kind of super thick Ti2The preparation method of AlC coating | |
| CN100395371C (en) | Apparatus for reinforcing arc-glow percolation plated ceating by microwave plasma and process thereof | |
| CN109825808A (en) | A kind of doped diamond film preparation device and method | |
| CN108559956A (en) | A kind of strong glow discharge deposition diamond-like-carbon film device and processing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |