CN103205711A - Non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device - Google Patents
Non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device Download PDFInfo
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Abstract
The invention relates to the field of surface protective coatings and in particular relates to a non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device. The non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device comprises an arc source main body with a supporting target, an internal-coupling magnetic field generating device, a double-layer water-cooling transitional transmission flange sleeve, two sets of external-coupling magnetic field generating devices (external-coupling magnetic field generating device I and external-coupling magnetic field generating device II) and a multi-magnetic-field structure adaptability control magnetic field group formed by middle magnet spokes; the inner-coupling magnetic field generating device on the back of the target is matched with the two sets of external-coupling magnetic field generating devices on a transmission flange sleeve, so that a composite magnetic field structure in which the target surface dynamic arched magnetic fields for restraining arc spot movement and transmission space axial-focusing guide magnetic fields is formed. The non-equilibrium dynamic arched compatible axial guide magnetic field auxiliary ion-plating device can be used for realizing the dual effects of improving arc spot discharging, control arc spot movement and reducing particle emission as well as improving the magnetic field distribution of the transmission space and improving the film-plating key parameters including the transmission efficiency, density and the like of the plasma.
Description
Technical field
The present invention relates to the surface protection coating field, specifically the compatible axially guide field assisting ion plating appts of a kind of non-equilibrium dynamic arch.
Background technology
The surface protection coating technology is to improve tool and mould and the important channel in mechanical part quality and work-ing life, as the physical gas phase deposition technology of one of material surface guard technology, the application facet at modern cutter, mould and mechanical component has obtained very good effect.In actual applications, High performance protective coating must have high rigidity, high tenacity, low-friction coefficient, good chemical stability, antistick ability preferably and heat resistanceheat resistant polishing machine, and particularly important has good bonding properties with matrix.This just requires coating technology that high plasma body ionization level, high plasma density, high particle energy, sedimentation rate and less defects faster can be provided, and does not have certain technology can reach these targets simultaneously at present as yet.Physical gas phase deposition technology mainly is divided into vacuum evaporation, magnetron sputtering and three types of ion plating, vacuum evaporation and magnetron sputtering are because particle energy and ionization level are low, cause that rete is loose porous, poor mechanical property, be difficult to obtain good coating and the bonding force between the matrix, seriously limited the application of such technology in the protective coating preparation field.But the ionization level height of arc ion plating, plasma density height, particle energy height, sedimentation rate outstanding advantage fast and low temperature depositing makes it plate at tool and mould and shows the not available advantage of other plated film modes, be the optimised process of present tool and mould and mechanical component protective coating preparation.
The ion plating source is the source of arc plasma discharge, is the core component of ion plating technique.In order to produce high ionization level, macroion density, high particle energy, high plasma body transmission efficiency and the plasma body of less defects, must have rational arc spot discharge mechanism and control and plasma body to distribute in the effective high-density of transmission space, and this all must have cooperating of rational physical construction and magnetic field structure.Magnetic field, ion plating source the effect that two aspects must be arranged is set, effectively improve the discharge of arc spot on the one hand, the control spots moving reduces the particle emission, keeps that self-maintained discharge is stable to be taken place; Effectively improve the Distribution of Magnetic Field of transmission space on the other hand, plated film key parameters such as the transmission efficiency of raising plasma body and density.Therefore, must consider near the target surface magnetic field and the Magnetic Field Design of transmission space simultaneously.And the design of traditional ion plating source mainly is to consider to apply near target the motion that the arc spot is controlled in magnetic field, improve discharge stability and target etching rate, do not solve plasma simultaneously in the ununiformity that transmission space distributes, caused the decline of plasma body transmission space and matrix place ion density.Or mainly considered raising plasma transmission efficiency, very big influence has been caused near the Distribution of Magnetic Field the target surface again in the magnetic field that arranges, be difficult to reach the discharge of arc spot and improve required magnetic field state, and effective control of arc spot is the source that produces the high-quality plasma body, therefore do not improve near the Magnetic Field Design of effective target surface, the generation of good plasma body will do not had, and there is not the reasonable distribution in transmission space magnetic field, to not have the transmission of the uniform plasma body of efficient high-density, offer amount and matter that high-performance coating prepares required plasma body.Therefore, in the design in ion plating source, how to provide compound magnetic field, can compatible target surface near and the Distribution of Magnetic Field of plasma body transmission space, be the required consideration in ion plating source of superior performance.
Summary of the invention
The object of the present invention is to provide the compatible axially guide field assisting ion plating appts of a kind of non-equilibrium dynamic arch, reach and both improve the discharge of arc spot, the control spots moving, reduce the particle emission, improve the Distribution of Magnetic Field of transmission space again, the double effects of plated film key parameters such as the transmission efficiency of raising plasma body and density.
Technical scheme of the present invention is:
The compatible axially guide field assisting ion plating appts of a kind of non-equilibrium dynamic arch, have the arc source main body, the interior coupled magnetic field generating unit that support target, transition transmission flange cover and the outer coupled magnetic field generating unit of two covers of double-deck water-cooled: many magnetic field structures Adaptive Control magnetic field group that the outer coupled magnetic field generating unit of I level and the outer coupled magnetic field generating unit of II level and middle yoke form; Cooperating of the outer coupled magnetic field generating unit of two covers that interior coupled magnetic field generating unit by the target back side and transmission flange put, form the target surface dynamic arch magnetic field that retrains spots moving and the resultant field structure of transmission space axial focusing guide field compatibility.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, and interior coupled magnetic field generating unit is arranged at the back side of target; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover;
Perhaps, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, interior coupled magnetic field generating unit is arranged at the back side of target, outside the interior coupled magnetic field generating unit iron core with between the interior coupled magnetic field generating unit coil inner core and the coaxial target base that encloses cover of urceolus are set, target base bottom arranges target base rising pipe, target base water inlet pipe; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover;
Perhaps, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, interior coupled magnetic field generating unit is arranged at the back side of target, the coaxial target base that encloses cover of the arranged outside inner core of interior coupled magnetic field generating unit and urceolus, target base bottom arranges target base rising pipe, target base water inlet pipe; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, the arc source main body that supports target adopts the extraordinary multifunction ion plating rifle of compact construction, the insulated wire corral is enclosed within around the target foundation insulation covering of target base rear end, and the yoke in the target foundation forms interior coupled magnetic field generating unit;
Perhaps, support the double-deck water-cooled target base arc source of the arc source main body employing intermediate gaps spaciousness of target, permanent magnet assembly or independent yoke or yoke form interior coupled magnetic field generating unit in electromagnetic spool device is positioned over target rear end target base intermediate gaps;
Interior coupled magnetic field generating unit acts on the rotational symmetry divergent magnetic field of formation small size target surface or the static arch magnetic field of large size target surface separately.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, interior coupled magnetic field generating unit is positioned over the target back, is reached by permanent magnet assembly or high permeability yoke and forms with the solenoid of permanent magnet assembly or the coaxial placement of high permeability yoke; The outer coupled magnetic field generating unit of two covers is made up of solenoid, is positioned over the target front, and with the coaxial placement of target, the center of the outer coupled magnetic field generating unit of I level is concordant with target surface or be higher than target surface, and the outer coupled magnetic field generating unit of II level is placed away from target surface.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, the dynamic arch magnetic field of target surface is formed by interior coupled magnetic field device and the outer coupled magnetic field generating unit coupling of I level, the small size target, or the large-size target interior coupled magnetic field that cooperates large size permanent magnet or yoke is dispersed and opposite with coupled magnetic field magnetic pole outside the I level at target surface, large-size target cooperates the interior coupled magnetic field of small size permanent magnet or yoke in the target surface closure, the outer coupled magnetic field polarity dynamic change of its I level, the coupled magnetic field dynamic change forms intensity in one of the dynamic arch of 10-150 Gauss magnitude magnetic field:
(1) interior coupled magnetic field intensity is constant, by permanent magnet or yoke and logical galvanic solenoid generation, the outer coupled magnetic field intensity dynamic change of I level, solenoid constant by the logical continuous change direction of intensity or the exchange current that the intensity direction all constantly changes produces;
(2) coupled magnetic field intensity is constant outside the I level, is produced by logical galvanic solenoid, and the dynamic change of interior coupled magnetic field intensity is by yoke and the constantly solenoid generation of the exchange current of variation of logical intensity.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, focusing on guide field is formed by the outer coupled magnetic field generating unit of I level and the outer coupled magnetic field generating unit coupling of II level, the outer coupled magnetic field of I level and the outer coupled magnetic field of II level are axial magnetic field, the outer coupled magnetic field intensity of II level is constant, produced by logical galvanic solenoid, form the focusing guide field of intensity between 100-250G.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, the solenoid in interior coupled magnetic field generating unit and the outer coupled magnetic field generating unit of two covers is regulated separately or common the adjusting; Solenoid leads to direct current, and magneticstrength is controlled by strength of current; Solenoid indirect current, alternating-current form are direct current biasing choppy sea, zigzag wave, pulse square wave, half-sine wave, sine wave and the other forms of exchange current of frequency adjustable, and the exchange current voltage amplitude is adjustable, and the bias current voltage amplitude is adjustable; Alternating-current generation power supply adopts the synthetic random wave signal generator of numeral and power amplifier to form, or electric crystal amplification mode, or the PWM pulse width modulation mode is realized; Alternating-current generation power supply can be realized multiple waveform, realization low-and high-frequency different frequency range variable frequency control.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, permanent magnet assembly is formed nut by permanent magnet, union lever, and permanent magnet is connected with nut by union lever; Permanent magnet is combined by single or two above high permeability block materials, and yoke is shaped as disc, annular, the cylindrical or stairstepping of frustum Xing ﹑; Permanent magnet assembly is connected by the threaded hole of union lever screw thread with target base bottom, but by the allotment both inside and outside of nut turn-knob, regulates magnitude of field intensity, and permanent magnet assembly is positioned in the target base intermediate gaps of target rear end.
The compatible axially guide field assisting ion plating appts of described non-equilibrium dynamic arch, the flange cover is made by non-magnetic stainless steel, and the flange cover is hollow structure, logical water coolant protection; Flange cover cross section is monolateral be shaped as L shaped, the intercooling aquaporin is made up of the coaxial cover that encloses of double-layer stainless steel tube, an annular flange dish is welded on intercooling aquaporin top, the ring flange internal diameter is concordant with flange cover internal diameter, external diameter is concordant with the body of heater flange outer diameter, the ring flange edge has 6-8 connecting hole, by connecting hole flange cover integral body is connected with body of heater; Intercooling aquaporin bottom connects the steel flange ring, and external diameter is consistent with the flange cover in the flange ring, has 8 threaded holes bottom the flange ring, and wherein symmetrical two screw threads are through hole, as entery and delivery port, other 6 as arc source connecting hole.
Principle of the present invention is:
Magnetic Field Design is mainly considered two principles near the target surface, the one, utilize the motion of acute angle rule restriction arc spot, and the 2nd, utilize transverse component to improve the movement velocity of arc spot.More effective arc spot controlling magnetic field is to form arch magnetic field by field generator for magnetic at target surface at present, this magnetic field can be decomposed into horizontal magnetic field B//and vertical magnetic field B ⊥, the characteristics of motion of under transverse magnetic field, " falling to walk " according to the arc spot, B//can order about the arc spot to make circumferential motion at target surface, along with B//increase, the movement velocity of arc spot also increases; Arch magnetic field and target surface form two angles that point to the arch summit simultaneously, and under the effect of " acute angle rule ", the arc spot is limited in certain position, form the effective control to the arc spot.If change the arch DISTRIBUTION OF MAGNETIC FIELD dynamically, change the position on arch summit, then can change the arc spot in the distribution of target surface.For stable discharging and the emission of minimizing particle of arc spot, the intensity of arch magnetic field transverse component is generally controlled in 10-150 Gauss magnitude.The reversed polarity rotational symmetry confining magnetic field coupling that the rotational symmetry divergent magnetic field that the generation in dynamic arch magnetic field can be produced by permanent magnet or the solenoid of target back and the solenoid of target end face produce produces, rotational symmetry divergent magnetic field and small size target material surface form the acute angle that points to the target edge, form the monolateral of arch magnetic line of force, reversed polarity rotational symmetry confining magnetic field and target material surface form the acute angle that points to target center, form the other side of arch magnetic line of force, both are coupled and form closed arch magnetically confined, and both dynamic changes can form dynamic arch magnetic field.Rotational symmetry divergent magnetic field and large-size target surface form the bilateral of static arch magnetic line of force, homopolarity or reversed polarity rotational symmetry confining magnetic field and target material surface form the acute angle that points to target center, form the both sides of arch magnetic line of force respectively, the dynamic change of rotational symmetry confining magnetic field can form dynamic arch magnetic field.
In order to improve the transmission efficiency of plasma body, need form an axial strong-focusing guide field at the plasma body transmission space, reduce dispersing of plasma body, the general control of axial magnetic field intensity could form effective transmission and the control of article on plasma body in hundreds of Gauss magnitude.Make to focus on the acute angle that axial magnetic field and target surface form the sensing target center simultaneously, arc extinguishing is avoided in motion that can the bound arc spot.Plasma body is under focusing magnetic field guiding, and stable transmission can strengthen the particle encounter probability of plasma body simultaneously, improves ionization level and ion density.
According to above principle, the present invention improves by traditional arc source structure, cooperating of the two outer coupled magnetic field generating units of cover that interior coupled magnetic field generating unit by the target back side and transmission flange put, produce the compatible resultant field of the axial focusing guide field (hundreds of Gauss magnitude) of effective arch magnetic field (transverse component intensity 10-150 Gauss magnitude) and transmission space simultaneously at target surface, reach and both improve the discharge of arc spot, the control spots moving, reduce the particle emission, improve the Distribution of Magnetic Field of transmission space again, the double effects of plated film key parameters such as the transmission efficiency of raising plasma body and density.
The invention has the beneficial effects as follows:
1, the present invention cooperates with the outer coupled magnetic field of I level that the transmission flange puts by the interior coupled magnetic field at the target back side, form the dynamic arch of the target surface magnetic field of constraint spots moving, under certain magnetic field intensity and certain alternative frequency comprehensive action, make the arc spot distribute at whole target surface, reduce the power density of arc spot greatly, improve the discharge of arc spot, reduce the particle emission, improve the generation quality of plasma body.
2, the present invention cooperates with the outer coupled magnetic field generating unit of II level by the outer coupled magnetic field generating unit of I level, improve the Distribution of Magnetic Field of transmission space, form the focusing guide field of confining plasma, the high density plasma that purifies is extracted out, improved the plated film key parameters such as transmission efficiency, density and ionization level of plasma body.
3, the present invention improves by traditional arc source structure, cooperating of the two outer coupled magnetic field generating units of cover that interior coupled magnetic field generating unit by the target back side and transmission flange put, the extraordinary multifunction ion plating rifle that can adopt compact construction as arc source main body or the double-deck water-cooled target base arc source of adopting the intermediate gaps spaciousness as arc source main body, can be applicable to the circular target of plurality of specifications of diameter 60-200mm, embodiment is many, physical construction and magnetic field structure are rationally easy, can produce high ionization level, macroion density, high particle energy, high plasma body transmission efficiency and the plasma body of less defects, be beneficial to the complete machine design, promote the development of instrument plated film and decoration film coating.
In a word, the present invention is by improving traditional arc source structure, non-equilibrium arch axis has been proposed to the design of compatible magnetic field assisting ion plating appts, cooperating of the two outer coupled magnetic field generating units of cover that interior coupled magnetic field generating unit by the target back side and transmission flange put, form the target surface arch magnetic field of constraint spots moving and the resultant field structure of transmission space axial magnetic field compatibility, reach and both improve the discharge of arc spot, the control spots moving, reduce the particle emission, improve the Distribution of Magnetic Field of transmission space again, the double effects of plated film key parameters such as the transmission efficiency of raising plasma body and density.
Description of drawings
Fig. 1 is the compatible axially guide field assisting ion plating appts structural representation of non-equilibrium dynamic arch.
Fig. 2 adopts compact construction for embodiment 1 extraordinary multifunction ion plating rifle as in the arc source main body that supports target, the target foundation that yoke is positioned over the ion plating rifle, solenoid be positioned over and form around the target base rear end target foundation in the compatible axially guide field assisting ion plating appts synoptic diagram of non-equilibrium dynamic arch of coupled magnetic field generating unit.
Fig. 3 is positioned in the target base intermediate gaps of target rear end as the arc source main body, the permanent magnet assembly that support target for embodiment 2 adopts the double-deck water-cooled target base arc source of intermediate gaps spaciousness, the compatible axially guide field assisting ion plating appts synoptic diagram of the non-equilibrium dynamic arch of coupled magnetic field generating unit in forming.
Fig. 4 is positioned in the target base intermediate gaps of target rear end as the arc source main body, the yoke that support target for embodiment 3 adopts the double-deck water-cooled target base arc source of intermediate gaps spaciousness, and solenoid is positioned over the compatible axially guide field assisting ion plating appts synoptic diagram of non-equilibrium dynamic arch of coupled magnetic field generating unit in the formation on every side of target base.
Fig. 5 adopts the intermediate gaps spaciousnesses for embodiment 4 double-deck water-cooled target base arc source as the arc source main body that supports target, yoke in electromagnetic spool device is positioned over target rear end target base intermediate gaps, the compatible axially guide field assisting ion plating appts synoptic diagram of the non-equilibrium dynamic arch of coupled magnetic field generating unit in forming.
Fig. 6 (a)-Fig. 6 (b) acts on the magnetic line of force distribution plan of formation separately for interior coupled magnetic field generating unit and outer coupled magnetic field generating unit.Wherein, Fig. 6 (a) is for pointing to the rotational symmetry divergent magnetic field at target edge; Fig. 6 (b) is for pointing to the rotational symmetry focusing magnetic field of target center.
Fig. 7 (a)-Fig. 7 (f) is that interior coupled magnetic field intensity is constant, and the outer coupled magnetic field intensity of II level is constant, and the outer coupled magnetic field intensity of I level changes the position shape variation diagram of the coupling magnetic line of force that causes from small to large.
Fig. 8 (a)-Fig. 8 (f) is that the outer coupled magnetic field intensity of I level is constant, and the outer coupled magnetic field intensity of II level is constant, and interior coupled magnetic field intensity changes the position shape variation diagram of the coupling magnetic line of force that causes from small to large.
Among the figure, 1 target; Coupled magnetic field generating unit in 2; Coupled magnetic field generating unit coil in 3; Coupled magnetic field generating unit iron core in 4; 5, the outer coupled magnetic field generating unit of I level; 6 yokes; 7, the outer coupled magnetic field generating unit of II level; 8 target shielding cases; 9 target base band of column covers; 10 target base cooled copper; 11 target base cooling channel dividing plates; 12 target bases; 13 cooling water inlet pipe roads; 14 target foundation insulation coverings; 15 ion plating rifle chassis bindings; 16 ion plating rifle chassis; 17 ion plating rifle chassis insulating discs; 18 target foundation; 19 cooling-water duct bases; 20 water-ins; 21 water outlets; 22 flange covers; 23 flanges cover insulation covering; 24 flange jacket water passages; 25 flanges cover water outlet; 26 flanges cover water-in; 27 flange mounting holes; 28 ring flanges; 29 target base water coolant upper channels; 30 target foundation pipe connectings; 31 target base cooling water inlet pipes; 32 annular brace platforms; 33 target base water coolant lower channels; 34 permanent magnet assemblies; 35 inner cores; 36 urceolus; 37 target base rising pipes; 38 target base water inlet pipes; 39 arc initiation devices; 40 target base chassis; 41 target base insulation coverings; 42 connecting threads; 43 target base cooling-water ducts; 44 target base shielding cases; 45 target base disks; 46 target base chassis connecting holes; 47 permanent magnet assembly open holess; 48 target bases.
Embodiment
Fig. 1 is the compatible axially guide field assisting ion plating appts structural representation of the non-equilibrium dynamic arch of the present invention, the compatible axially guide field assisting ion plating appts of non-equilibrium dynamic arch has arc source main body, the interior coupled magnetic field generating unit 2 that supports target 1, and the transition transmission flange of double-deck water-cooled overlaps the many magnetic field structures Adaptive Control magnetic field group with the outer coupled magnetic field generating unit of two covers (the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level) and the formation of middle yoke.Wherein, interior coupled magnetic field generating unit iron core 4 constitutes interior coupled magnetic field generating unit 2 for interior coupled magnetic field generating unit coil 3 centers arrange, and interior coupled magnetic field generating unit 2 is arranged at the back side of target 1; Between the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level yoke 6 is set, the outer coupled magnetic field generating unit 5 of I level, yoke 6, the outer coupled magnetic field generating unit 7 of II level are arranged at the outside of flange cover.
Wherein, interior coupled magnetic field generating unit iron core 4 is permanent magnet assembly or high permeability (2000～6000H/m) yokes.Interior coupled magnetic field generating unit acts on the rotational symmetry divergent magnetic field of formation small size target surface (diameter is the target material surface of 50-100mm) or the static arch magnetic field of large size target surface (diameter is the target material surface of 100-250mm) separately.
Below by embodiment and accompanying drawing the present invention is described in further detail.
Fig. 2 adopts compact construction for embodiment 1 extraordinary multifunction ion plating rifle as in the arc source main body that supports target, the target foundation that yoke is positioned over the ion plating rifle, solenoid be positioned over and form around the target base rear end target foundation in the compatible axially guide field assisting ion plating appts synoptic diagram of non-equilibrium dynamic arch of coupled magnetic field generating unit.
The dynamic arch magnetic field of target surface is formed by interior coupled magnetic field device and the outer coupled magnetic field generating unit coupling of I level, the interior coupled magnetic field that small size target or large-size target cooperate large size permanent magnet or yoke is dispersed and opposite with coupled magnetic field magnetic pole outside the I level at target surface, large-size target cooperates interior coupled magnetic field coupled magnetic field polarity dynamic change outside target surface closure, its I level of small size permanent magnet or yoke, and the coupled magnetic field dynamic change forms intensity in one of the dynamic arch of 10-150 Gauss magnitude magnetic field:
(1) interior coupled magnetic field intensity is constant, by permanent magnet or yoke and logical galvanic solenoid generation, the outer coupled magnetic field intensity dynamic change of I level, solenoid constant by the logical continuous change direction of intensity or the exchange current that the intensity direction all constantly changes produces;
(2) coupled magnetic field intensity is constant outside the I level, is produced by logical galvanic solenoid, and the dynamic change of interior coupled magnetic field intensity is by yoke and the constantly solenoid generation of the exchange current of variation of logical intensity.
Wherein, the small size target refers to that diameter is the target of 50-100mm, large-size target refers to that diameter is the target of 100-250mm, and large size permanent magnet or yoke refer to that diameter is permanent magnet or the yoke of 70-220mm, and small size permanent magnet or yoke refer to that diameter is permanent magnet or the yoke of 15-170mm.
In the present embodiment, the ion plating rifle can adopt the Chinese invention patent application: a kind of extraordinary multifunction ion plating rifle of compact construction, application number: 201210430934.X.
The ion plating rifle is provided with target 1, cooling water inlet pipe road 13, interior coupled magnetic field generating unit iron core 4, target foundation 18, target foundation insulation covering 14, ion plating rifle chassis insulating disc 17, ion plating rifle chassis 16, ion plating rifle chassis binding 15, cooling-water duct base 19 etc., the target 1 of diameter 100mm is installed on the target base 12, the arranged outside target shielding case 8 of target 1, target 1 bottom closely contacts with target base cooled copper 10, cools off indirectly by target base cooled copper 10; Coupled magnetic field generating unit iron core 4 and cooling water inlet pipe road 13 in the inboard of target foundation 18 arranges, interior coupled magnetic field generating unit iron core 4 is arranged at the outside in cooling water inlet pipe road 13.Be provided with target base cooling channel dividing plate 11 in the target base 12, target base cooling channel dividing plate 11 is divided into target base water coolant upper channel 29 and target base water coolant lower channel 33 with the cavity in the target base 12, and target base cooling channel dividing plate 11 is welded on the target base cooling water inlet pipe 31 that is communicated with cooling water inlet pipe road 13 by the circular hole of centre.Target base 12 is installed on the target foundation 18, cooling-water duct base 19 is installed in target foundation 18 bottoms, one end of target foundation 18 is connected with cooling-water duct base 19, cooling water inlet pipe road 13 extends in the cooling-water duct base 19, communicate with the water-in 20 of cooling-water duct base 19, cooling-water duct base 19 communicates with water outlet 21 with passage between the target foundation 18.The other end of target foundation 18 is by target foundation pipe connecting 30(cooling-water duct pipe box pipe connecting) communicate with the target base water coolant lower channel 33 of target base 12.
The arranged outside target foundation insulation covering 14 of target foundation 18, the arranged outside ion plating rifle chassis insulating disc 17 of target foundation insulation covering 14, ion plating rifle chassis 16, ion plating rifle chassis binding 15, one side on ion plating rifle chassis 16 arranges ion plating rifle chassis binding 15, ion plating rifle chassis binding 15 separates by the insulation covering dish on the target foundation insulation covering 14 and ion plating rifle chassis 16, the opposite side on ion plating rifle chassis 16 arranges ion plating rifle chassis insulating disc 17, and the power connection terminal is installed on the target foundation 18;
Install with target foundation 18 by ion plating rifle chassis insulating disc 17, ion plating rifle chassis binding 15, insulation covering 14 on ion plating rifle chassis 16, open holes and the flange of ion plating rifle by ion plating rifle chassis 16 overlaps 22 bottom thread holes and is connected and installed and forms whole ion plating rifle structure, and the ion plating rifle is connected with body of heater by the ring flange 28 that flange overlaps 22 front portions.
Target foundation pipe connecting 30 and cooling-water duct base 19 outside dimensions of target foundation 18, target base 12 are set to 1/4 of target outside dimension, adopt the slender type compact form, make things convenient for complete machine design and field generator for magnetic to arrange.Flange cover 22 is by non-magnetic stainless steel making, and flange cover 22 is hollow structure, logical water coolant protection; The outside of flange cover 22 is provided with flange cover insulation covering 23, the outside of flange cover insulation covering 23 is provided with outer coupled magnetic field generating unit, coaxial between outer coupled magnetic field generating unit (the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level), flange cover 22 and target 1 three, insulation between outer coupled magnetic field generating unit and the flange cover 22, the position on flange cover 22 is adjustable; Flange overlap 22 cross sections monolateral be shaped as L shaped, flange overlaps 22 spacer flanger jacket water passages 24 and is made up of the coaxial cover that encloses of double-layer stainless steel tube, flange overlaps 22 tops and welds an annular flange dish 28, it is concordant that ring flange 28 internal diameters and flange overlap 22 internal diameters, ring flange 28 external diameters are concordant with the body of heater flange outer diameter, the ring flange edge has 6-8 flange mounting hole 27, by flange mounting hole 27 flange cover 22 integral body is connected with body of heater; Flange overlaps 22 bottoms and connects a thicker steel flange ring, it is 22 consistent that the inside and outside footpath of flange ring and flange overlap, the flange ring bottom has 8 threaded holes, wherein two threaded holes of symmetry are through hole, as flange cover water outlet 25, flange cover water-in 26, other 6 threaded holes are as ion plating rifle chassis connecting hole.Outer two cover coupled magnetic field generating units enclose and are enclosed within outside the flange cover, and insulation between the flange cover, and the position can free adjustment.
The target base cooled copper 10 of ion plating rifle is welded on target base band of column cover 9(target erection column ring set) on, target 1 is installed on the target base 12 by the ring set inner thread that the target base band of column overlaps between 9 upper surfaces and the target base cooled copper 10, and target 1 closely contacts with target base cooled copper 10; Target shielding case 8 is pottery (or BN) annulus tube, and target shielding case 8 is sleeved on target base band of column cover 9 brace table outward; Form certain clearance between target shielding case 8 and the target 1, gap size is less than 3mm.
Target base cooling channel dividing plate 11 coaxial welding have certain interval with target base cooled copper 10 on target base band of column cover 9, form target base water coolant upper channel 29; The centre has circular hole, edge to have spaced slot to be connected on the target base band of column cover 9 as target base cooling channel dividing plate 11 edge joint welds of cooling water outlet, with target base cooled copper 10 certain interval is arranged, and forms base water coolant upper channel; With target base disk 45 certain interval is arranged, form target base water coolant lower channel 33; Circular hole in the middle of the target base cooling channel dividing plate 11 is connected on the target base cooling water inlet pipe 31, the water inlet pipe outer wall has some sealing grooves, has certain compressive strength, top to have the cooling water inlet pipe road 13 of an annular brace platform 32 closely to be connected with target base cooling water inlet pipe 31 by the sealing-ring in the sealing groove.(2000～6000H/m) interior coupled magnetic field generating unit iron core 4 encloses on the annular brace platform 32 that is enclosed within the cooling water inlet pipe road high permeability, and annular brace platform 32 has certain interval with target foundation 18, forms the water coolant water exit.
Target base disk 45 is the middle thin disk that a circular hole is arranged, and this circular hole and target base cooling water inlet pipe 31 form certain annular space, as the cooling water outlet; Target foundation pipe connecting outer wall is provided with the screw thread of certain-length, and target foundation 18 upper inside wall of forming by this screw thread and thicker stainless steel cylinder are threaded; Target foundation 18 bottoms are provided with the outside screw of certain-length, are connected with cooling-water duct base 19 by this screw thread, form cooling-water duct between target foundation 18 and the cooling water inlet pipe road 13.
Cooling-water duct base 19 is made up of the thicker stainless steel cylinder in top and the right cylinder of bottom, top stainless steel cylinder bottom interior wall is provided with the screw thread of certain-length, be connected with target foundation bottom outside screw by upper internal threaded, top bottom of thread step has a sealing groove, closely contact with target foundation 18 bottoms by the sealing-ring in the sealing groove, form effective seal; Top stainless steel cylinder side wall has a step diplopore, this step diplopore is as water outlet 21 open holess, water outlet 21 external diameters are consistent with outer hole internal diameter, water outlet 21 internal diameters are consistent with the endoporus internal diameter, water outlet 21 bottoms contact with the diplopore step, and diplopore has certain distance from the right cylinder top of bottom; The right cylinder center of bottom has a step three holes, and last hole and mesopore form a step, and bottom, cooling water inlet pipe road is connected with this step contact; Following hole and mesopore form with step-shaped hole, and this step-shaped hole is as water-in 20 open holess, and water-in 20 bottoms and following hole contact with step between the mesopore and be connected; The stainless steel cylinder that top is thicker and the cylindrical length of bottom are regulated according to actual needs.
Cooling-water duct base 19, form cooling-water duct bottom water storage cavity between target foundation 18 and the cooling water inlet pipe road 13, the water coolant of whole ion plating rifle is gone into cooling water inlet pipe road 13 from cooling-water duct base bottom water-in 20, flow into target base water coolant upper channel 29 by cooling water inlet pipe road 13, flow out from the slit, dividing plate 11 edge, target base cooling channel of target base, enter the water coolant lower channel 33 of target base, reserve from target base chassis 12 centre holes, enter the passage between target foundation 18 and the cooling water inlet pipe road 13, enter the bottom water storage cavity then, flow out from cooling-water duct base side wall water outlet 21, form the effective cooling to whole ion plating rifle.The water coolant that flows out from base side wall water outlet 21 enters the water-in 26 of flange cover 22, after flowing through from flange jacket water passage 24, flows out from the water outlet 25 of flange cover 22, forms the effective cooling to flange cover and field generator for magnetic on every side thereof.
Ion plating rifle chassis 16 is the certain thickness Stainless Steel Disc that has of a band center hole, it is consistent that chassis outside dimension and flange overlap 22 outside dimensions, ion plating rifle chassis 16 center-hole diameters are consistent with target foundation insulation covering 14 external diameters, enclose and be enclosed within on the target foundation insulation covering 14, target foundation insulation covering 14 is certain thickness polymer pipe box, the pipe box internal diameter is consistent with target foundation 18 external diameters, carry out insulated enclosure by the sealing-ring in some annular seal grooves of target foundation 18 outer walls, pipe box encloses and is enclosed within around the target foundation 18, and pipe box top is concordant with target foundation 18; Target foundation insulation covering 14 is outer to be provided with an ion plating rifle chassis insulating disc 17, and the position of insulating disc is unrestricted, can be according to the practical application request setting, can overlap position in 22 at flange by ion plating rifle chassis insulating disc 17 position adjustments targets 1.Closely contact above 16 bottoms, ion plating rifle chassis and the ion plating rifle chassis insulating disc 17; Ion plating rifle chassis 16 peripheries have 8 connecting holes, and the threaded hole that overlaps 22 bottoms with flange is corresponding, by 6 connecting holes wherein ion plating rifle and flange are overlapped 22 bottoms and are connected; In addition, two connecting holes and flange cover water outlet 25, flange cover water-in 26 are corresponding.16 bottoms, ion plating rifle chassis are provided with sealing groove near centre hole, and the sealing groove external diameter is less than the insulating disc external diameter, closely contacts the formation effective seal by between groove inner seal ring and the insulating disc; Ion plating rifle chassis insulating disc 17 is provided with 6-8 threaded hole near near the sealing groove, the threaded hole preglabellar field is greater than ion plating rifle chassis insulating disc 17 external diameters, be connected with ion plating rifle chassis binding 15 by this threaded hole, ion plating rifle chassis insulating disc 17 is fastened between ion plating rifle chassis 16 and the ion plating rifle chassis binding 15.
Ion plating rifle chassis binding 15 is the certain thickness Stainless Steel Disc that has of a band center hole, the chassis outside dimension is more bigger than ion plating rifle chassis insulating disc 17 outside dimensions, center-hole diameter is consistent with target foundation insulation covering 14 external diameters, enclose and be enclosed within on the target foundation insulation covering 14, closely contact below the insulation covering dish of binding 15 tops, ion plating rifle chassis and target foundation insulation covering 14; Ion plating rifle chassis binding 15 keeps to the side and is provided with 6-8 open holes, and is consistent with 16 lower thread holes, ion plating rifle chassis, by this open holes ion plating rifle chassis insulating disc 17 is fastened between ion plating rifle chassis 16 and the ion plating rifle chassis binding 15; Binding 15 tops, ion plating rifle chassis are provided with sealing groove near centre hole, closely contact the formation effective seal by between groove inner seal ring and the ion plating rifle chassis insulating disc 17.
Interior coupled magnetic field generating unit is made up of the target foundation inner yoke that is positioned over the ion plating rifle and the solenoid that is positioned over around the target base rear end target foundation; The outer coupled magnetic field generating unit of two covers is made up of solenoid, be positioned over the target front, with the coaxial placement of target, center and the target surface of the outer coupled magnetic field generating unit of I level flush with or slightly higher than target surface 2-20mm, and the outer coupled magnetic field generating unit of II level is placed away from target surface.
Fig. 6 (a)-Fig. 6 (b) is the magnetic line of force distribution plan that the outer coupled magnetic field generating unit of interior coupled magnetic field generating unit and II level acts on formation separately.As can be seen, interior coupled magnetic field produces axisymmetric divergent magnetic field at target surface, and the outer coupled magnetic field coupling with it of opposite polarity I level can form the arch Distribution of Magnetic Field of target surface; The outer coupled magnetic field of II level is the axial magnetic field of transmission space, the outer coupled magnetic field coupling with it of I level, and the focusing guide field that can form transmission space distributes.
Fig. 7 (a)-Fig. 7 (f) is that interior coupled magnetic field intensity is constant, and the outer coupled magnetic field intensity of II level is constant, and the outer coupled magnetic field intensity of I level changes the position shape variation diagram of the coupling magnetic line of force that causes from small to large.Fig. 8 (a)-Fig. 8 (f) is that the outer coupled magnetic field intensity of I level is constant, and the outer coupled magnetic field intensity of II level is constant, and interior coupled magnetic field intensity changes the position shape variation diagram of the coupling magnetic line of force that causes from small to large.As can be seen, the outer coupled magnetic field of I level and interior coupled magnetic field form the arch magnetic field of target surface, and form the focusing guide field of transmission space with the outer coupled magnetic field effect of II level.Interior coupled magnetic field intensity is constant, variation along with the outer coupled magnetic field intensity of I level, the arch magnetic field of target surface is also in dynamic change, and its arch summit that is horizontal component ofmagnetic field B//maximum value, vertical magnetic field component B ⊥ zero position move to target center from the target surface edge; And the outer coupled magnetic field intensity of I level is constant, variation along with interior coupled magnetic field intensity, the arch magnetic field of target surface is also in dynamic change, and its arch summit that is horizontal component ofmagnetic field B//maximum value, vertical magnetic field component B ⊥ zero position mind-set target edge from target surface move; The variation in arch magnetic field causes the variation of spots moving, and it is shunk in the expansion of target surface spiral, distributes at whole target surface, forms the controlled motion of target surface arc spot.Simultaneously, control the transverse magnetic field components intensity that is fit to, can control the movement velocity of arc spot, reduce oarse-grained emission.
Simultaneously, the outer coupled magnetic field intensity of II level is constant, and the outer coupled magnetic field of II level is identical with the outer coupled magnetic field polarity of I level, and both interact and form the focusing guide field of transmission space, and this magneticstrength is between 100-250G.
The present invention adopts the extraordinary multifunction ion plating rifle of compact construction as the arc source main body that supports target, simple structure is effectively compact, the length of watercooling jacket can freely be set, the position of free adjustment target in vacuum chamber, easy and simple to handle, target are changed easily, the position adjustability is good, be convenient to the complete machine design and satisfy industrial production to the various demands of plasma distribution in the vacuum chamber.Simultaneously, the compatible axial focusing guide field of non-equilibrium dynamic arch can reach and both improve the discharge of arc spot, and the control spots moving reduces the particle emission, improve the Distribution of Magnetic Field of transmission space again, the double effects of plated film key parameters such as the transmission efficiency of raising plasma body and density.
Fig. 3 is that embodiment 2 adopts the double-deck water-cooled target base arc source of intermediate gaps spaciousness to be positioned in the target base intermediate gaps of target rear end as the arc source main body, the permanent magnet assembly that support target, the compatible axially guide field assisting ion plating appts synoptic diagram of the non-equilibrium dynamic arch of coupled magnetic field generating unit in forming.
Permanent magnet assembly is formed nut by permanent magnet, union lever, and permanent magnet is connected with nut by union lever; Permanent magnet is combined by single or two above high permeability block materials, and yoke is shaped as disc, annular, the cylindrical or stairstepping of frustum Xing ﹑; Permanent magnet assembly is connected by the threaded hole of union lever screw thread with target base bottom, but by the allotment both inside and outside of nut turn-knob, regulates magnitude of field intensity, and permanent magnet assembly is positioned in the target base intermediate gaps of target rear end.
In the present embodiment, Chinese utility application can be adopted in the arc source: a kind of ion plating arc source, application number 201320090903.4.
The arc source comprises target 1, connecting thread 42, arc initiation device 39, target base 48, target base cooling-water duct 43, target base shielding case 44, target base rising pipe 37, permanent magnet assembly 34, target base water inlet pipe 38, target base chassis 40, target base chassis connecting hole 46, target base insulation covering 41, permanent magnet assembly open holes 47, inner core 35, urceolus 36 etc., and concrete structure is as follows:
The arc source is connected with flange cover 22 by the target base chassis connecting hole 46 on target base chassis 40, outer two cover coupled magnetic field generating units (the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level) enclose and are enclosed within outside the flange cover 22, the field generator for magnetic 5 of outer coupled magnetic field group, 7 with target 1 coaxial placement, form whole arc source structure, the ring flange 28 that overlaps 22 front portions by flange is connected with body of heater, and insulation between the flange cover, the position can free adjustment.
Target stand base chassis 40 peripheries have 8 connecting holes, and to overlap 8 threaded holes in 22 bottoms corresponding with flange, by 6 connecting holes wherein the arc source are connected with the flange bottom; Two other connecting hole is corresponding with the flange intake-outlet.An arc initiation device installing port is opened near the target position base in target stand base chassis 40.Target base 48 is made by non-magnetic stainless steel, and by the double-layer stainless steel cylinder: inner core 35 and the urceolus 36 coaxial covers that enclose are formed; Inner core 35 tops are the sealing disk, and the space is the permanent magnet installation site in the tube; Urceolus 36 tops are step sealing disk, and bench height is consistent with target 1 connecting thread height, and the step outer shroud has screw thread, and target is threaded on the target base 48 by step.Step top disk external diameter is consistent with target bottom thread internal diameter, and step bottom annulus external diameter is consistent with the target external diameter, and internal radius is consistent with target bottom thread internal diameter; The urceolus external diameter is consistent with the target external diameter, and seal groove is arranged on the wall of the outer-rotor, by insulation covering and the assembling of target chassis; Urceolus and inner core intermediate formation cooling-water duct, certain space is left on inner core top and urceolus top, guarantees that current are unimpeded.Target base bottom connects a thicker steel flange ring, and external diameter is consistent with the target base in the flange ring, and flange ring bottom symmetry has two through holes, connects target base rising pipe 37, target base water inlet pipe 38 respectively; Welding one terminal in flange ring bottom is as cathode power connection.Target base shielding case 44 is one to scribble the stainless steel cylinder of insullac, and welding one annular flange dish in cylinder upper end is installed in shielding case on the target chassis by this ring flange; Shielding case tube bottom and target base paddle hole and power connection correspondence position have three holes, have one than thick disk in the middle of the shielding case tube bottom, have a threaded hole in the middle of the disk: permanent magnet assembly open holes 47, permanent magnet assembly 34 is connected with this threaded hole by the union lever screw thread, but by the allotment both inside and outside of nut turn-knob, regulate magnitude of field intensity.
Permanent magnet assembly is formed nut by permanent magnet, union lever, and permanent magnet is connected with nut by union lever; Permanent magnet is made up of single disc ndfeb magnet.Permanent magnet assembly 34 is positioned in target base 48 intermediate gaps of target rear end, avoids water coolant demagnetization influence.Arc initiation device adopts pneumatic machinery striking or high-frequency arc strike device, installs by the arc initiation device installing port on the target stand chassis.
Permanent magnet assembly forms interior coupled magnetic field generating unit, and outer two cover coupled magnetic field generating units enclose outside the flange cover that is enclosed within embodiment 1, and insulation between the flange cover, and the position can free adjustment.Because present embodiment 2 permanent magnets are compared with the target size and are more or less the same, so permanent magnet assembly forms axisymmetric divergent magnetic field at target surface, and magneticstrength is constant, and its size is regulated by relative position of adjusting permanent magnet and target.As shown in Figure 3, the divergent magnetic field coupling of the outer coupled magnetic field of opposite polarity I level and permanent magnet generation can form the arch Distribution of Magnetic Field of target surface; The outer coupled magnetic field of II level is the axial magnetic field of transmission space, the outer coupled magnetic field coupling with it of I level, and the focusing guide field that can form transmission space distributes.Coupled magnetic field intensity is constant in the present embodiment 2, the outer coupled magnetic field intensity of II level is constant, the outer coupled magnetic field intensity periodical change of I level, can form the arch magnetic field of the DYNAMIC DISTRIBUTION shown in Fig. 7 (a)-Fig. 7 (f) at target surface, the variation in arch magnetic field causes the variation of spots moving, it is shunk in the expansion of target surface spiral, distribute at whole target surface, form the controlled motion of target surface arc spot, simultaneously, control the transverse magnetic field components intensity that is fit to, can control the movement velocity of arc spot, reduce oarse-grained emission.
Simultaneously, the outer coupled magnetic field intensity of II level is constant, and the outer coupled magnetic field of II level is identical with the outer coupled magnetic field polarity of I level, and both interact and form the focusing guide field of transmission space, and this magneticstrength is between 100-250G.
Present embodiment is simple and compact for structure, adaptability good, simple to operate, target is changed easily, the position adjustability is good; Be beneficial to the complete machine design simultaneously, be fit to promote, can realize intensive arc source distribution on a body of heater, distance is little between the arc source window, has improved plated film space plasma distributing homogeneity, is conducive to large-area coating film.
Embodiment 3
Fig. 4 is that embodiment 3 adopts the double-deck water-cooled target base arc source of intermediate gaps spaciousness to be positioned in the target base intermediate gaps of target rear end as the arc source main body, the yoke that support target, and solenoid is positioned over the compatible axially guide field assisting ion plating appts synoptic diagram of non-equilibrium dynamic arch that the target base forms interior coupled magnetic field generating unit on every side.Wherein, interior coupled magnetic field generating unit iron core 4 constitutes interior coupled magnetic field generating unit 2 for interior coupled magnetic field generating unit coil 3 centers arrange, interior coupled magnetic field generating unit 2 is arranged at the back side of target 1, between interior coupled magnetic field generating unit iron core 4 outsides and the interior coupled magnetic field generating unit coil 3 inner core 35 and the urceolus 36 coaxial target bases that enclose cover are set, target base bottom arranges target base rising pipe 37, target base water inlet pipe 38; Between the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level yoke 6 is set, the outer coupled magnetic field generating unit 5 of I level, yoke 6, the outer coupled magnetic field generating unit 7 of II level are arranged at the outside of flange cover.
The arc source main body of present embodiment and embodiment 2 structural similitudies, difference is that the coupled magnetic field generating unit is to form by being positioned over the yoke in the target base intermediate gaps of target rear end and being positioned over target base solenoid on every side in the present embodiment 3, yoke is single or two above high permeability block materials combine, and yoke is shaped as the cylindrical or stairstepping of frustum Xing ﹑; Yoke is positioned over the target stand inside of target back, with the coaxial placement of target; The insulated wire corral is enclosed within around the target base or is positioned over target stand inside, with the coaxial placement of yoke; Yoke is a little more than coil or concordant with coil.The size of yoke is close with the target size, therefore forms axisymmetric divergent magnetic field at target surface, and its size and change frequency are regulated by size and the frequency of regulating electric current in the solenoid.As shown in Figure 3, the outer coupled magnetic field of opposite polarity I level and the divergent magnetic field coupling of yoke with the coupled magnetic field generating unit generation of solenoid composition can form the arch Distribution of Magnetic Field of target surface; But all periodical changes of the outer coupled magnetic field intensity of coupled magnetic field and I level in the present embodiment 3, if interior coupled magnetic field intensity is constant, the outer coupled magnetic field intensity periodical change of I level can be in the arch magnetic field of the DYNAMIC DISTRIBUTION of target surface formation shown in Fig. 7 (a)-Fig. 7 (f); If the outer coupled magnetic field intensity of I level is constant, the periodical change of interior coupled magnetic field intensity can be in the arch magnetic field of the DYNAMIC DISTRIBUTION of target surface formation shown in Fig. 8 (a)-Fig. 8 (f); The variation in arch magnetic field causes the variation of spots moving, and it is shunk in the expansion of target surface spiral, distributes at whole target surface, form the controlled motion of target surface arc spot, simultaneously, the transverse magnetic field components intensity that control is fit to, can control the movement velocity of arc spot, reduce oarse-grained emission.
Simultaneously, the outer coupled magnetic field intensity of II level is constant, and the outer coupled magnetic field of II level is identical with the outer coupled magnetic field polarity of I level, and both interact and form the focusing guide field of transmission space, and this magneticstrength is between 100-250G.
This embodiment 3 can effectively solve arc ion plating macrobead problem, improve transmission efficiency and the coating deposition uniformity of plasma body simultaneously, solve the problem of arc ion plating point-like emitting source, and raising target utilization, make arc ion plating can reach every requirement of High performance protective coating preparation, become a kind ofly than more excellent plating process, play a role at each industry field that needs.
Embodiment 4:
Fig. 5 be embodiment 4 adopt the intermediate gaps spaciousnesses double-deck water-cooled target base arc source as the arc source main body that supports target, yoke in electromagnetic spool device is positioned over target rear end target base intermediate gaps, the compatible axially guide field assisting ion plating appts synoptic diagram of the non-equilibrium dynamic arch of coupled magnetic field generating unit in forming.Wherein, interior coupled magnetic field generating unit iron core 4 constitutes interior coupled magnetic field generating unit 2 for interior coupled magnetic field generating unit coil 3 centers arrange, interior coupled magnetic field generating unit 2 is arranged at the back side of target 1, the arranged outside inner core 35 of interior coupled magnetic field generating unit 2 and the urceolus 36 coaxial target bases that enclose cover, target base bottom arranges target base rising pipe 37, target base water inlet pipe 38; Between the outer coupled magnetic field generating unit 5 of I level, the outer coupled magnetic field generating unit 7 of II level yoke 6 is set, the outer coupled magnetic field generating unit 5 of I level, yoke 6, the outer coupled magnetic field generating unit 7 of II level are arranged at the outside of flange cover.
The arc source main body of present embodiment and embodiment 2 structural similitudies, difference is that the target size of present embodiment 4 is bigger, target base intermediate gaps space, target rear end is rather spacious, and interior coupled magnetic field generating unit is made up of the yoke and the electromagnetic spool device that are positioned in the target base intermediate gaps of target rear end.This embodiment 4 is in two kinds of situation:
(1) the yoke size is bigger, produces the axisymmetrical magnetic field of dispersing at target material surface, and its size and change frequency are regulated by size and the frequency of regulating electric current in the solenoid.As shown in Figure 5, the outer coupled magnetic field of I level is opposite with interior coupled magnetic field polarity, and both couplings can form the arch Distribution of Magnetic Field of target surface; But all periodical changes of the outer coupled magnetic field intensity of interior coupled magnetic field and I level, if interior coupled magnetic field intensity is constant, the outer coupled magnetic field intensity periodical change of I level can be in the arch magnetic field of the DYNAMIC DISTRIBUTION of target surface formation shown in Fig. 7 (a)-Fig. 7 (f); If the outer coupled magnetic field intensity of I level is constant, the equal periodical change of interior coupled magnetic field intensity can be in the arch magnetic field of the DYNAMIC DISTRIBUTION of target surface formation shown in Fig. 8 (a)-Fig. 8 (f).
(2) the yoke size is less, and the interior coupled magnetic field generating unit that is positioned in the target base intermediate gaps of target rear end forms closed arch magnetic field at target surface, and the magnetic field size is regulated by the size of current of coil.The static arch magneticstrength that interior coupled magnetic field produces is constant, the outer coupled magnetic field size of I level and polar cycle variation, it is the logical periodically variable electric current of size and Orientation in the outer coupled magnetic field coil of I level, the outer coupled magnetic field of periodically variable I level and static arch magnetic field interaction, can form dynamic arch magnetic field at target surface, the variation in arch magnetic field causes the variation of spots moving, it is shunk in the expansion of target surface spiral, distribute at whole target surface, form the controlled motion of target surface arc spot, simultaneously, the transverse magnetic field components intensity that control is fit to, can control the movement velocity of arc spot, reduce oarse-grained emission.
Simultaneously, the outer coupled magnetic field intensity of II level and polarity are constant, and both interact and form the focusing guide field of transmission space, and this magneticstrength is between 100-250G.
To sum up, the present invention cooperates with the outer coupled magnetic field of I level that the transmission flange puts by the interior coupled magnetic field at the target back side, form the dynamic arch of the target surface magnetic field of constraint spots moving, under certain magnetic field intensity and certain alternative frequency comprehensive action, make the arc spot distribute at whole target surface, reduce the power density of arc spot greatly, improve the discharge of arc spot, reduce the particle emission, improve the generation quality of plasma body; Cooperate with the outer coupled magnetic field generating unit of II level by the outer coupled magnetic field generating unit of I level, improve the Distribution of Magnetic Field of transmission space, form the focusing guide field of confining plasma, the high density plasma that purifies is extracted out, improved the plated film key parameters such as transmission efficiency, density and ionization level of plasma body.Embodiment of the present invention is many, physical construction and magnetic field structure are rationally easy, can produce high ionization level, macroion density, high particle energy, high plasma body transmission efficiency and the plasma body of less defects, be beneficial to the complete machine design, promote the development of instrument plated film and decoration film coating.
Claims (9)
1. compatible axially guide field assisting ion plating appts of non-equilibrium dynamic arch, it is characterized in that, have the arc source main body, the interior coupled magnetic field generating unit that support target, transition transmission flange cover and the outer coupled magnetic field generating unit of two covers of double-deck water-cooled: many magnetic field structures Adaptive Control magnetic field group that the outer coupled magnetic field generating unit of I level and the outer coupled magnetic field generating unit of II level and middle yoke form; Cooperating of the outer coupled magnetic field generating unit of two covers that interior coupled magnetic field generating unit by the target back side and transmission flange put, form the target surface dynamic arch magnetic field that retrains spots moving and the resultant field structure of transmission space axial focusing guide field compatibility.
2. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, and interior coupled magnetic field generating unit is arranged at the back side of target; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover;
Perhaps, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, interior coupled magnetic field generating unit is arranged at the back side of target, outside the interior coupled magnetic field generating unit iron core with between the interior coupled magnetic field generating unit coil inner core and the coaxial target base that encloses cover of urceolus are set, target base bottom arranges target base rising pipe, target base water inlet pipe; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover;
Perhaps, interior coupled magnetic field generating unit is that coupled magnetic field generating unit iron core constituted in permanent magnet assembly or interior coupled magnetic field generating unit hub of a spool arranged, interior coupled magnetic field generating unit is arranged at the back side of target, the coaxial target base that encloses cover of the arranged outside inner core of interior coupled magnetic field generating unit and urceolus, target base bottom arranges target base rising pipe, target base water inlet pipe; Between the outer coupled magnetic field generating unit of I level, the outer coupled magnetic field generating unit of II level yoke is set, the outer coupled magnetic field generating unit of I level, yoke, the outer coupled magnetic field generating unit of II level are arranged at the outside of flange cover.
3. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that, the arc source main body that supports target adopts the extraordinary multifunction ion plating rifle of compact construction, the insulated wire corral is enclosed within around the target foundation insulation covering of target base rear end, and the yoke in the target foundation forms interior coupled magnetic field generating unit;
Perhaps, support the double-deck water-cooled target base arc source of the arc source main body employing intermediate gaps spaciousness of target, permanent magnet assembly or independent yoke or yoke form interior coupled magnetic field generating unit in electromagnetic spool device is positioned over target rear end target base intermediate gaps;
Interior coupled magnetic field generating unit acts on the rotational symmetry divergent magnetic field of formation small size target surface or the static arch magnetic field of large size target surface separately.
4. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that, interior coupled magnetic field generating unit is positioned over the target back, is reached by permanent magnet assembly or high permeability yoke and forms with the solenoid of permanent magnet assembly or the coaxial placement of high permeability yoke; The outer coupled magnetic field generating unit of two covers is made up of solenoid, is positioned over the target front, and with the coaxial placement of target, the center of the outer coupled magnetic field generating unit of I level is concordant with target surface or be higher than target surface, and the outer coupled magnetic field generating unit of II level is placed away from target surface.
5. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that, the dynamic arch magnetic field of target surface is formed by interior coupled magnetic field device and the outer coupled magnetic field generating unit coupling of I level, the small size target, or the large-size target interior coupled magnetic field that cooperates large size permanent magnet or yoke is dispersed and opposite with coupled magnetic field magnetic pole outside the I level at target surface, large-size target cooperates the interior coupled magnetic field of small size permanent magnet or yoke in the target surface closure, the outer coupled magnetic field polarity dynamic change of its I level, the coupled magnetic field dynamic change forms intensity in one of the dynamic arch of 10-150 Gauss magnitude magnetic field:
(1) interior coupled magnetic field intensity is constant, by permanent magnet or yoke and logical galvanic solenoid generation, the outer coupled magnetic field intensity dynamic change of I level, solenoid constant by the logical continuous change direction of intensity or the exchange current that the intensity direction all constantly changes produces;
(2) coupled magnetic field intensity is constant outside the I level, is produced by logical galvanic solenoid, and the dynamic change of interior coupled magnetic field intensity is by yoke and the constantly solenoid generation of the exchange current of variation of logical intensity.
6. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that, focusing on guide field is formed by the outer coupled magnetic field generating unit of I level and the outer coupled magnetic field generating unit coupling of II level, the outer coupled magnetic field of I level and the outer coupled magnetic field of II level are axial magnetic field, the outer coupled magnetic field intensity of II level is constant, produced by logical galvanic solenoid, form the focusing guide field of intensity between 100-250G.
7. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that the solenoid in interior coupled magnetic field generating unit and the outer coupled magnetic field generating unit of two covers is regulated separately or common the adjusting; Solenoid leads to direct current, and magneticstrength is controlled by strength of current; Solenoid indirect current, alternating-current form are direct current biasing choppy sea, zigzag wave, pulse square wave, half-sine wave, sine wave and the other forms of exchange current of frequency adjustable, and the exchange current voltage amplitude is adjustable, and the bias current voltage amplitude is adjustable; Alternating-current generation power supply adopts the synthetic random wave signal generator of numeral and power amplifier to form, or electric crystal amplification mode, or the PWM pulse width modulation mode is realized; Alternating-current generation power supply can be realized multiple waveform, realization low-and high-frequency different frequency range variable frequency control.
8. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 4, it is characterized in that permanent magnet assembly is formed nut by permanent magnet, union lever, permanent magnet is connected with nut by union lever; Permanent magnet is combined by single or two above high permeability block materials, and yoke is shaped as disc, annular, the cylindrical or stairstepping of frustum Xing ﹑; Permanent magnet assembly is connected by the threaded hole of union lever screw thread with target base bottom, but by the allotment both inside and outside of nut turn-knob, regulates magnitude of field intensity, and permanent magnet assembly is positioned in the target base intermediate gaps of target rear end.
9. according to the compatible axially guide field assisting ion plating appts of the described non-equilibrium dynamic arch of claim 1, it is characterized in that the flange cover is made by non-magnetic stainless steel, the flange cover is hollow structure, logical water coolant protection; Flange cover cross section is monolateral be shaped as L shaped, the intercooling aquaporin is made up of the coaxial cover that encloses of double-layer stainless steel tube, an annular flange dish is welded on intercooling aquaporin top, the ring flange internal diameter is concordant with flange cover internal diameter, external diameter is concordant with the body of heater flange outer diameter, the ring flange edge has 6-8 connecting hole, by connecting hole flange cover integral body is connected with body of heater; Intercooling aquaporin bottom connects the steel flange ring, and external diameter is consistent with the flange cover in the flange ring, has 8 threaded holes bottom the flange ring, and wherein symmetrical two screw threads are through hole, as entery and delivery port, other 6 as arc source connecting hole.
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| SK500322019A3 (en) * | 2019-07-11 | 2021-01-13 | STATON, s. r. o. | Plasma source using a cathodic vacuum arc with an improved magnetic field configuration and method of operation |
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