CN207749179U - A kind of vaporizing-source system - Google Patents
A kind of vaporizing-source system Download PDFInfo
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- CN207749179U CN207749179U CN201721605245.2U CN201721605245U CN207749179U CN 207749179 U CN207749179 U CN 207749179U CN 201721605245 U CN201721605245 U CN 201721605245U CN 207749179 U CN207749179 U CN 207749179U
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- vaporizing
- source system
- baffle
- evaporation source
- height
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Abstract
The utility model is related to OLED vacuum evaporation process technical fields, specifically disclose a kind of vaporizing-source system, including evaporation source, the evaporation source is made of multiple linearly aligned linear evaporation source units, the baffle that height is adjusted by driving mechanism is equipped between the linear evaporation source unit, the utility model is adjusted height of baffle plate by the way that driving mechanism is arranged, realize the function of adjust automatically height of baffle plate under the conditions of keeping mum, the generation of shadow is reduced by changing deposition angles, it solves colour mixture situation, improves product yield.
Description
Technical field
The utility model is related to OLED vacuum evaporation process technical field more particularly to a kind of vaporizing-source systems for this.
Background technology
Vacuum evaporation technology is one of the core technology of small size OLED production technologies, and the quality of organic material film forming is shadow
An important factor for ringing OLED performances.Some film layers needs are steamed by coevaporation technique come realization body material and guest materials jointly
It is plated in same film layer, since traditional batch baffle is disposably to design the baffle made according to demand, structure immobilizes.In life
When production, the baffle deformation and baffle that are affected by temperature generation have different occlusion effects to different evaporation rates, different organic
There are material different physicochemical properties etc., these factors to cause the vapor deposition micro change in area that can be superimposed and cause the more apparent change of vapor deposition area generation
Change, causes material of main part and guest materials that cannot optimize overlapping, the uniformity of doping is not ensured well, is caused thin
Film uniform doping is poor.
Utility model content
In view of the above technical problems, it is high to provide a kind of realization adjust automatically baffle under the conditions of keeping mum for the utility model
The function of degree reduces shadow generations by changing deposition angles and improves the vaporizing-source system of product yield.
In order to solve the above-mentioned technical problem, concrete scheme provided by the utility model is as follows：A kind of vaporizing-source system, including
Evaporation source, the evaporation source is made of multiple linearly aligned linear evaporation source units, between the linear evaporation source unit
Equipped with the baffle that height is adjusted by driving mechanism.
Preferably, the evaporation source both ends are equipped with the baffle that height is adjusted by driving mechanism.
Preferably, the driving mechanism includes controller and the servo motor that is connect with controller, servo motor connection gear
Plate, driving baffle moves up and down to adjust its height, and then adjusts deposition angles.
Preferably, the linear evaporation source unit includes the heating mechanism for evaporating evaporation material, the heating mechanism
It is equipped with linear nozzle group.
Preferably, the heating mechanism is vapor deposition crucible.
Preferably, the linear nozzle group includes multiple nozzles, and the quantity of nozzle can be carried out according to actual production demand
Setting.
Preferably, the nozzle is equipped with the shielding plate for adjusting nozzle bore size, and shielding plate adjusts nozzle bore
Size so that film thickness uniformity is good.
Preferably, the vapor deposition crucible bottom inner surface is equipped with bulge-structure, can largely increase material and earthenware
The contact area of crucible improves vapor deposition efficiency.
Preferably, the bulge-structure is equipped with heat conduction film layer so that heating is more uniform.
It is further preferred that the baffle is metal baffle, service life is long.
Compared with prior art, the beneficial effects of the utility model are：The utility model is by being arranged driving mechanism pair
Height of baffle plate is adjusted, and driving mechanism includes controller and the servo motor that is connect with controller, is set by controller
Adjusting parameter is simultaneously moved by servo motor driving baffle, is realized the function of adjust automatically height of baffle plate under the conditions of keeping mum, is led to
It crosses and changes deposition angles to reduce the generation of shadow, solve colour mixture situation, improve product yield；By the way that shielding plate is arranged
It adjusts nozzle bore size and so that film thickness uniformity is more preferable；Crucible bottom inner surface setting protrusion, increase material and crucible connect
Contacting surface is accumulated, and vapor deposition efficiency is improved.
Description of the drawings
Fig. 1 is vaporizing-source system structural schematic diagram in the prior art；
Fig. 2 is the vaporizing-source system structural schematic diagram after one controllable register height of embodiment；
Fig. 3 is the structural schematic diagram of the heating mechanism of embodiment two；
Wherein, 1 is baffle；2 be servo motor；3 be heating mechanism；31 be bulge-structure；4 be linear nozzle group；41 are
Nozzle.
Specific implementation mode
In order to make those skilled in the art be better understood from the technical solution of the utility model, below in conjunction with the accompanying drawings to this
The technical solution of utility model is further elaborated.
Embodiment one：As shown in Fig. 2, a kind of vaporizing-source system, including evaporation source, the evaporation source is by multiple linear rows
The linear evaporation source unit of row forms, and between linear evaporation source unit and evaporation source both ends are equipped with is adjusted by driving mechanism
The baffle of height is saved, traditional batch baffle is disposably to design the baffle made according to demand, and structure immobilizes, and this implementation
Example realizes the height that baffle can be automatically adjusted in the case where not opening cavity, changes deposition angles and then reduces
The generation of shadow.
The baffle of the present embodiment uses metal material, i.e. metal baffle, and longer make can be had in vapor deposition cavity by applying
With the service life, and deformation is less likely to occur, convenient for calculating and adjusting its height parameter, error is small, as a preferred solution, this
Baffle in embodiment is made of titanium metal material, has small fusing point height, proportion, good toughness, antifatigue, corrosion-resistant, heat conduction
The advantage that coefficient is low, high and low temperature tolerance performance is good is not restricted to titanium metal material herein certainly, can also be that other are resistance to
The heat safe metal of heat.
Driving mechanism includes controller and the servo motor that is connect with controller, and servo motor connects baffle, drives baffle
It moves up and down to adjust its height, and then adjusts deposition angles.
The present embodiment is being kept mum, operating personnel set parameter by controller in specific implementation process
Highly, servo motor driving baffle do corresponding sports, keep baffle adjust automatically good to setting parameter height, adjusting coating film area
With improvement deposition angles, the generation of colour mixture situation is reduced.
Embodiment two：As shown in Figure 2,3, the present embodiment is similar to embodiment one, further, linear evaporation source unit packet
The heating mechanism for evaporating evaporation material is included, heating mechanism is equipped with linear nozzle group, and linear nozzle group includes multiple nozzles,
It herein there is no limiting the quantity of nozzle, can be configured according to actual production demand, nozzle is equipped with for adjusting
The shielding plate for saving nozzle bore size, the spray sprayed from each nozzle due to the vapor deposition gas formed after being evaporated there are evaporation material
Go out pressure difference, leads to the U-shaped shape of the film thickness distribution of evaporation film, at this point it is possible to adjust each nozzle by shielding plate
Pore size keeps the ejection pressure of vapor deposition gas identical, is conducive to the film thickness homogeneity for improving evaporation film.
Heating mechanism in the present embodiment is vapor deposition crucible, and the bottom interior surface that crucible is deposited is equipped with bulge-structure, can
The contact area for largely increasing material and crucible, improves vapor deposition efficiency, and bulge-structure is equipped with heat conduction film layer so that adds
Heat is more uniform, promotes product yield.
Heat conduction film layer uses alumina material, as aluminum oxide film layer, and alumina material has higher fusing point and advantageous
In heat conduction herein so that heating is more uniform, certainly, does not limit the material of heat conduction film layer, can also be that other are molten
Point height and the good material of thermal conductivity.
Finally, it should be noted that above example is only to illustrate the technical solution of the utility model rather than to this reality
With the limitation of novel protected range, any modification made within the spirit and principle of the utility model, equivalent replacement and
Improve etc., it should be included within the scope of protection of this utility model.
Claims (10)
1. a kind of vaporizing-source system, including evaporation source, the evaporation source is by multiple linearly aligned linear evaporation source unit groups
At, it is characterised in that：The baffle that height is adjusted by driving mechanism is equipped between the linear evaporation source unit（1）.
2. vaporizing-source system according to claim 1, it is characterised in that：The evaporation source both ends, which are equipped with, passes through driving mechanism
The baffle of height is adjusted（1）.
3. vaporizing-source system according to claim 2, it is characterised in that：The driving mechanism include controller and with control
The servo motor of device connection（2）.
4. vaporizing-source system according to claim 3, it is characterised in that：The linear evaporation source unit includes for evaporating
The heating mechanism of evaporation material（3）, the heating mechanism（3）It is equipped with linear nozzle group（4）.
5. vaporizing-source system according to claim 4, it is characterised in that：The heating mechanism（3）It is vapor deposition crucible.
6. vaporizing-source system according to claim 4, it is characterised in that：The linear nozzle group（4）Including multiple nozzles
（41）.
7. vaporizing-source system according to claim 6, it is characterised in that：The nozzle（41）It is equipped with for adjusting nozzle
The shielding plate of pore size.
8. vaporizing-source system according to claim 5, it is characterised in that：The vapor deposition crucible bottom inner surface is equipped with protrusion
Structure（31）.
9. vaporizing-source system according to claim 8, it is characterised in that：The bulge-structure（31）It is equipped with heat conducting film
Layer.
10. according to claim 1 ~ 9 any one of them vaporizing-source system, it is characterised in that：The baffle（1）It is kept off for metal
Plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721605245.2U CN207749179U (en) | 2017-11-27 | 2017-11-27 | A kind of vaporizing-source system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721605245.2U CN207749179U (en) | 2017-11-27 | 2017-11-27 | A kind of vaporizing-source system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207749179U true CN207749179U (en) | 2018-08-21 |
Family
ID=63148264
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| Application Number | Title | Priority Date | Filing Date |
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| CN201721605245.2U Active CN207749179U (en) | 2017-11-27 | 2017-11-27 | A kind of vaporizing-source system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110344004A (en) * | 2019-08-29 | 2019-10-18 | 上海天马有机发光显示技术有限公司 | A kind of vapor deposition crucible and evaporated device |
| CN110423986A (en) * | 2019-07-24 | 2019-11-08 | 福建华佳彩有限公司 | A kind of evaporation source baffle |
| WO2020093479A1 (en) * | 2018-11-05 | 2020-05-14 | 武汉华星光电半导体显示技术有限公司 | Evaporation baffle mechanism and evaporation device |
| CN111549319A (en) * | 2020-05-20 | 2020-08-18 | 上海天马有机发光显示技术有限公司 | Vacuum evaporation system and vacuum evaporation method |
-
2017
- 2017-11-27 CN CN201721605245.2U patent/CN207749179U/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020093479A1 (en) * | 2018-11-05 | 2020-05-14 | 武汉华星光电半导体显示技术有限公司 | Evaporation baffle mechanism and evaporation device |
| CN110423986A (en) * | 2019-07-24 | 2019-11-08 | 福建华佳彩有限公司 | A kind of evaporation source baffle |
| CN110423986B (en) * | 2019-07-24 | 2024-04-16 | 福建华佳彩有限公司 | Evaporation source baffle |
| CN110344004A (en) * | 2019-08-29 | 2019-10-18 | 上海天马有机发光显示技术有限公司 | A kind of vapor deposition crucible and evaporated device |
| CN111549319A (en) * | 2020-05-20 | 2020-08-18 | 上海天马有机发光显示技术有限公司 | Vacuum evaporation system and vacuum evaporation method |
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