CN208430227U - A kind of large area heating plate for vacuum cavity - Google Patents
A kind of large area heating plate for vacuum cavity Download PDFInfo
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- CN208430227U CN208430227U CN201820214403.XU CN201820214403U CN208430227U CN 208430227 U CN208430227 U CN 208430227U CN 201820214403 U CN201820214403 U CN 201820214403U CN 208430227 U CN208430227 U CN 208430227U
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Abstract
The utility model discloses a kind of large area heating plates for vacuum cavity, the heating plate is made of several pieces of A type heating units and Type B heating unit, the A type heating unit and Type B heating unit arranged distribution are integral, and the two sides of each A type heating unit and Type B heating unit are respectively corresponded equipped with monitoring temperature point.The utility model heating plate compartmentalization, hot spot is independent not by other regional effects, chamber heating will not be caused uneven because of the interference in each region, and it is equipped with multiple monitoring temperature points, temperature conditions in Real-time Feedback heating plate, adjustment region temperature reduce each space temperature variation of heating plate, vacuum room temperature distributing homogeneity greatly improves, and rate of film build is more evenly.
Description
Technical field
The utility model relates to solar cell device technical field more particularly to a kind of large area for vacuum cavity
Heating plate.
Background technique
Silicon based hetero-junction battery is a kind of to utilize mixed type solar battery made of crystalline silicon substrates and amorphous silicon membrane.
PECVD system is modular system, after silicon wafer wool making and cleaning pretreatment, is transmitted by support plate, into preheating chamber, then
I is completed, N (or P) layer deposition is cooled down by cooling body later, complete coating process, wherein silicon wafer is in I, N (or P) layer
Deposition will directly affect silicon wafer yield and final product quality.
PECVD process is to first have to preheat silicon wafer in preheating cavity, is then fed into I, carried out in N (or P) chamber etc.
Ion chemistry deposition, a necessary condition of deposition process is exactly to need that silicon wafer is made to reach certain temperature, otherwise will lead to deposition
Effect is poor, or even can not deposit.Therefore, the heating of cavity is for entire technique with regard to extremely important, traditional heating method
For electric heating, specially heating plate is in close contact by four wall of periphery of mechanical fastening structures and vacuum chamber, to obtain to vacuum
The effective heat transfer in locular wall face, and then vacuum chamber is heated.Its heater is made of U-shaped heating tube and heating plate.But by
Larger in whole hot table area, can unevenly make and the chamber of temperature of heating plate itself carry out having heat transfer not when heat transmitting
Uniform situation eventually makes part silicon wafer deposition quality poor, and yields reduces.
Utility model content
In view of the above-mentioned problems, the utility model provides a kind of large area heating plate for vacuum cavity, heating is solved
The each point temperature inconvenience of plate controls, and there are non-uniform phenomenons for temperature when heating, so that the problem of processing quality declines.
It is a kind of for the big of vacuum cavity that in order to solve the above technical problems, the technical scheme adopted by the utility model is:
Area heater plate, the heating plate are made of several pieces of A type heating units and Type B heating unit, the A type heating unit and B
Type heating unit arranged distribution is integral, and the two sides of each A type heating unit and Type B heating unit, which respectively correspond, to be equipped with
Monitoring temperature point.
Further, the A type heating unit and Type B heating unit are respectively equipped with 8, the ruler of the A type heating unit
Very little is 380 × 290, and the size of the Type B heating unit is 660 × 110.
Further, the A type heating unit and Type B heating unit are correspondingly provided with independent heating tube and temperature control
Element.
Further, the monitoring temperature point is equipped with 22, and neighbouring heating unit shares a monitoring temperature point,
For Real-time Feedback each point temperature, temperature is controlled convenient for control system.
By the above-mentioned description to the utility model structure it is found that compared to the prior art, the utility model has following excellent
Point:
The utility model is a kind of large area heating plate for vacuum cavity of low cost, heating plate compartmentalization, so that
Each Heating Zone Temperature more can be close to heating tube temperature, and hot spot is independent not by other regional effects, will not be because of the interference in each region
Cause chamber heating uneven, and is equipped with multiple monitoring temperature points, temperature conditions in Real-time Feedback heating plate, adjustment region temperature
Degree reduces each space temperature variation of heating plate, and vacuum room temperature distributing homogeneity greatly improves, and rate of film build is more evenly.
Detailed description of the invention
The attached drawing constituted part of this application is used to provide a further understanding of the present invention, the utility model
Illustrative embodiments and their description are not constituteed improper limits to the present invention for explaining the utility model.In attached drawing
In:
Fig. 1 is a kind of structural schematic diagram of the large area heating plate for vacuum cavity of the utility model;
Fig. 2 is the temperature curve of the utility model embodiment.
Specific embodiment
In order to make the purpose of the utility model, technical solutions and advantages more clearly understood, below in conjunction with attached drawing and implementation
Example, the present invention will be further described in detail.It should be appreciated that specific embodiment described herein is only used to explain
The utility model is not used to limit the utility model.
Embodiment
With reference to Fig. 1, Fig. 2, a kind of large area heating plate for vacuum cavity, the heating plate is heated by several pieces of A types
Unit 1 and Type B heating unit 2 form, and the A type heating unit 1 and 2 arranged distribution of Type B heating unit are integral, described every
The two sides of a A type heating unit 1 and Type B heating unit 2 are respectively corresponded equipped with monitoring temperature point 3.
The A type heating unit 1 and Type B heating unit 2 are respectively equipped with 8, and the size of the A type heating unit 1 is 380
× 290, the size of the Type B heating unit 2 is 660 × 110, heating plate compartmentalization heating, convenient for controlling each regional temperature
Measurement, is adjusted monitoring.
The A type heating unit 1 and Type B heating unit 2 are correspondingly provided with independent heating tube and temperature control component.It is whole
The heating system of a complete vacuum cavity is synthesized, entire heating system uses PID control, by the way that its parameter is arranged, by surveying
Warm spot fed back values can accordingly adjust heter temperature, guarantee the steady efficient operation of heater.
The monitoring temperature point 3 is equipped with 22, and neighbouring heating unit shares a monitoring temperature point 3, for real
When feed back each point temperature, convenient for control system control temperature.
The utility model is a kind of large area heating plate for vacuum cavity of low cost, heating plate compartmentalization, so that
Each Heating Zone Temperature more can be close to heating tube temperature, and hot spot is independent not by other regional effects, will not be because of the interference in each region
Cause chamber heating uneven, and is equipped with multiple monitoring temperature points, temperature conditions in Real-time Feedback heating plate, adjustment region temperature
Degree reduces each space temperature variation of heating plate, and vacuum room temperature distributing homogeneity greatly improves, and rate of film build is more evenly.
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (4)
1. a kind of large area heating plate for vacuum cavity, it is characterised in that: the heating plate is by several pieces of A type heating units
(1) it is formed with Type B heating unit (2), the A type heating unit (1) and Type B heating unit (2) arranged distribution are integral, institute
The two sides for stating A type heating unit (1) and Type B heating unit (2) are respectively corresponded equipped with monitoring temperature point (3).
2. a kind of large area heating plate for vacuum cavity according to claim 1, it is characterised in that: the A type heating
Unit (1) and Type B heating unit (2) are respectively equipped with 8, and the size of the A type heating unit (1) is 380 × 290, the Type B
The size of heating unit (2) is 660 × 110.
3. a kind of large area heating plate for vacuum cavity according to claim 1, it is characterised in that: the A type heating
Unit (1) and Type B heating unit (2) are correspondingly provided with independent heating tube and temperature control component.
4. a kind of large area heating plate for vacuum cavity according to claim 1, it is characterised in that: the monitoring temperature
Point (3) is equipped with 22, and neighbouring heating unit shares a monitoring temperature point (3).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201820214403.XU CN208430227U (en) | 2018-02-07 | 2018-02-07 | A kind of large area heating plate for vacuum cavity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201820214403.XU CN208430227U (en) | 2018-02-07 | 2018-02-07 | A kind of large area heating plate for vacuum cavity |
Publications (1)
Publication Number | Publication Date |
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CN208430227U true CN208430227U (en) | 2019-01-25 |
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CN201820214403.XU Active CN208430227U (en) | 2018-02-07 | 2018-02-07 | A kind of large area heating plate for vacuum cavity |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117488265A (en) * | 2023-11-13 | 2024-02-02 | 甚磁科技(上海)有限公司 | Multi-point heating structure for reel-to-reel vacuum coating system |
-
2018
- 2018-02-07 CN CN201820214403.XU patent/CN208430227U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117488265A (en) * | 2023-11-13 | 2024-02-02 | 甚磁科技(上海)有限公司 | Multi-point heating structure for reel-to-reel vacuum coating system |
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