CN202808933U - Heating plate for substrate of heterojunction solar battery - Google Patents

Heating plate for substrate of heterojunction solar battery Download PDF

Info

Publication number
CN202808933U
CN202808933U CN201220302784XU CN201220302784U CN202808933U CN 202808933 U CN202808933 U CN 202808933U CN 201220302784X U CN201220302784X U CN 201220302784XU CN 201220302784 U CN201220302784 U CN 201220302784U CN 202808933 U CN202808933 U CN 202808933U
Authority
CN
China
Prior art keywords
heating
substrate
plate
heating plate
heating source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201220302784XU
Other languages
Chinese (zh)
Inventor
周文彬
刘幼海
刘吉人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jifu New Energy Technology Shanghai Co Ltd
Original Assignee
Jifu New Energy Technology Shanghai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jifu New Energy Technology Shanghai Co Ltd filed Critical Jifu New Energy Technology Shanghai Co Ltd
Priority to CN201220302784XU priority Critical patent/CN202808933U/en
Application granted granted Critical
Publication of CN202808933U publication Critical patent/CN202808933U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Surface Heating Bodies (AREA)

Abstract

The utility model relates to a heating plate for a substrate of a heterojunction solar battery. The heating plate comprises a heating plate and heating sources, wherein the heating plate is divided in a ladder shape so as to form three heating regions, and the heating sources are embedded in the three heating regions; and an outer cover and a power supply controller are arranged below the heating plate, wherein the outer cover is closely locked with the heating plate, and the power supply controller is connected with the heating sources in a coupling manner. The heating plate is characterized in that the heating plate is arranged in the ladder shape, different heating sources correspond to different heat radiation distances, the gradient adjustment on temperature of the substrate can be achieved through adjusting individual heating power, and then, the temperature of a middle region and an edge region of the substrate is enabled to be uniform. The heating plate for the substrate of the heterojunction solar battery, provided by the utility model, is particularly suitable for depositing films on large-size substrates, and excellent temperature uniformity is provided for the substrates during heating, so that the deposited films accordingly have good uniformity.

Description

A kind of hot-plate for the heterojunction solar battery substrate
Affiliated technical field
The utility model relates to a kind of hot-plate for the heterojunction solar battery substrate, particularly a kind ofly heats for physical vapor deposition sputtering equipment substrate.
Background technology
Pvd equipment (PVD) is a kind of key equipment of making thin-film solar cells.See also Fig. 1, be the diagrammatic cross-section of the PVD equipment of prior art.This PVD equipment comprises a cavity 11, is arranged at the magnetron cathode target utmost point 12 in the cavity 11, and faces the hot-plate 15 that the magnetron cathode target utmost point 12 arranges.During sputtered film, substrate 14 is transmitted device 13 and transmits through heating unit 15 and the magnetron cathode target utmost point 12, and hot-plate 15 is heated to certain temperature with substrate 14, and keeps the temperature of substrate 14.After the sputtering target utmost point sputtered target atom, the substrate 14 that arranges to the opposite splashed, and finishes the deposition of thin film on its surface.
In the thin film sputtering deposition process, the homogeneity of temperature will directly affect the homogeneity of deposit film on the substrate 14.Along with continuous progress and the development of heterojunction solar battery technology, the size of substrate 14 is also increasing.Yet in the prior art, adopt subregion thermal resistance wire mode to heat, because distributing distance, radiant heat energy can't effectively keep certain, therefore in heat-processed, can non-uniform temperature get phenomenon, and owing to the outer edge area radiating rate at substrate 14 is fast than its middle zone, therefore in heat-processed, can cause non-uniform temperature and then the direct homogeneity that affects the film that on substrate 14, deposits of region intermediate and the fringe region of substrate 14.
The utility model content
The utility model main purpose system provides a kind of hot-plate for the heterojunction solar battery substrate, solves the problem of the non-uniform temperature of the region intermediate that can cause substrate in the heat-processed that exists in the prior art and fringe region.
In order to reach above-mentioned utility model purpose, the technical solution of the utility model provides a kind of hot-plate for the heterojunction solar battery substrate, comprises a hot-plate, and this hot-plate is separated to form three heating regions with stairstepping; Heating source, it is embedded in three heating regions; One enclosing cover is set in the hot-plate below and hot-plate closely locks, power-supply controller of electric, and itself and heating source are of coupled connections.
Described three district's heating sources are thermal resistance wire.
Described power-supply controller of electric respectively with each first heating source and, the second heating source and the 3rd heating source be connected.
Further, the utility model heating source all arranges the surface of the different ladders of hot-plate, and wherein second surface is nearest apart from first surface; The 3rd surface distance first surface takes second place; The 4th surface distance first surface farthest, for substrate: it is peripheral that second surface arranges the first heating source heated substrate; The 3rd surface arranges the second heating source heated substrate inner ring; The 4th surface arranges the 3rd heating source heated substrate innermost circle.
Compared with prior art, the utlity model has following advantage:
The utility model hot-plate is set to stairstepping, and the corresponding different radiant heat distances in different heating source can reach by adjustment other heating power the adjustment of thermograde on the substrate, make the temperature of substrate region intermediate and fringe region even.
Further, the utility model is adopting described power-supply controller of electric independently to control respectively first, second and third heating source that is arranged in central authorities, inner ring and the edge heating zone, to carry out heating in various degree, further guaranteed the homogeneity of substrate regional heating.
A kind of hot-plate for the heterojunction solar battery substrate provided by the utility model, be particularly useful for deposit film on large-sized substrate, in heat-processed, provide substrate fabulous temperature homogeneity, so that therefore the film of deposition has good homogeneity.
Description of drawings
Fig. 1 is the utility model PVD cross-sectional view.
Fig. 2 is the utility model hot-plate cross-sectional view.
The primary clustering nomenclature.
11... cavity.
12... the magnetron cathode target utmost point.
13... transport unit.
14... substrate.
15... hot-plate.
20... the 4th surface.
21... hot-plate enclosing cover.
22... heating upper plate.
23... the first heating source.
24... the second heating source.
25... the 3rd heating source.
26... power-supply controller of electric.
27... first surface.
28... second surface.
29... the 3rd surface.
Embodiment
By other features of making convenient simple and direct understanding the present invention and advantage and the effect reached thereof can more manifest, below in conjunction with Fig. 1 Fig. 2, describe embodiment of the present utility model in detail, Xiang Xi Said is bright as follows:
Please read Fig. 1 by Ginseng, be the diagrammatic cross-section of PVD equipment of the present utility model.It comprises: be arranged at the magnetron cathode target utmost point 12 in the cavity 11, and face the hot-plate 15 that the magnetron cathode target utmost point 12 arranges.
Substrate 14 is transmitted device 13 and is sent to cavity 11, and this hot-plate 15 is heated to certain temperature with substrate 14, and keeps the temperature of substrate 14.Magnetron cathode target 12 is deposited on target material on heated substrate 14 surfaces after producing top gas ions bombardment target atom, and this film is generally tin indium oxide (ITO) layer.
See also shown in Figure 2ly, it has shown the cross-sectional view of described hot-plate 15.This hot-plate 15 comprises stepped heating upper plate 22, hot-plate enclosing cover 21, some heating sources and a power-supply controller of electric 26.Wherein, this heating upper plate 22 forms three surfaces with stairstepping, specifically comprises second surface 28, the 3rd surface 29, the 4th surface 20.Described heating source comprises the first heating source 23, the second heating source 24 and the 3rd heating source 25, its respectively one by one correspondence be embedded in above-mentioned stepped surfaces.
In the present embodiment, described the first heating source 23, the second heating source 24 and the 3rd heating source 25 are thermal resistance wire.The material of described heating upper plate 22 is metallic substance, so that the heat of heated the first heating source 23, the second heating source 24 and the 3rd heating source 25 can conduct to described heating upper plate 22.Particularly, the material of described heating upper plate 22 can adopt the alloy aluminium in the present embodiment, and described the first heating source 23, the second heating source 24 and the 3rd heating source 25 are heated to 300-350 degree centigrade usually.
Described power-supply controller of electric 26 is connected with the first heating source 23, the second heating source 24 and the 3rd heating source 25 respectively, it independently controls respectively outer ring, inner ring and the innermost circle that is positioned at the heating upper plate, thereby has different degree of heat so that be positioned at the heating source of different zones.It is general because the radiating rate of outer edge zone may is fast than region intermediate, therefore can control the 3rd heating source 25 has stronger degree of heat compared to the first heating source 23 and the second heating source 24, effective compensation heats upper plate 21 outer edge zone may and the non-uniform temperature of middle section in heat-processed, and then guarantees the temperature homogeneity of whole substrate 14 surperficial different zones.
Further, heating upper plate 22 of the present utility model has the stepped surfaces of different heights, this stepped surfaces difference is corresponding different heating source one by one, by the power-supply controller of electric 26 different heating source of independent control and because the different heights of stepped surfaces respectively, becoming thermograde in various degree to be presented on the first surface 27 that heats upper plate 22, indirectly with in various degree radiant heat source heated substrate 14, make the temperature of substrate region intermediate and fringe region even.
In sum, the utility model is being broken through under the previous technical pattern, really reached the effect of institute's wish enhancement, and also non-be familiar with this skill person institute easily full of beard and, the progressive of its tool, practicality, the aobvious application important document that has met utility model, only the bright system of above-listed Xiang Xi Said is bright for the Ju Ti Said of one of the utility model possible embodiments, this embodiment is not the claim that limits the utility model, and all do not take off From the utility model skill spirit institute for it equivalence implement or change, all should be contained in the claim of this case.

Claims (4)

1. a hot-plate that is used for the heterojunction solar battery substrate comprises a hot-plate, and this hot-plate is separated to form three heating regions with stairstepping; Heating source, it is embedded in three heating regions; One enclosing cover is set in the hot-plate below and hot-plate closely locks, power-supply controller of electric, and itself and heating source are of coupled connections.
2. described a kind of hot-plate for the heterojunction solar battery substrate according to claim 1, wherein this hot-plate comprises a heating upper plate and heating enclosing cover.
3. described a kind of hot-plate for the heterojunction solar battery substrate according to claim 2, it is characterized in that, described heating upper plate is set to stairstepping, and be respectively first surface, second surface, the 3rd surface and the 4th surface: this second surface is apart from first surface 10mm; The 3rd surface distance first surface 20mm; The 3rd surface distance first surface 30mm.
4. described a kind of hot-plate for the heterojunction solar battery substrate according to claim 1, it is characterized in that described heating source comprises the first heating source, the second heating source and the 3rd heating source: this first heating source down is located in the second surface;
This second heating source down is located in the 3rd surface; The 3rd heating source down is located in the 4th surface.
CN201220302784XU 2012-06-27 2012-06-27 Heating plate for substrate of heterojunction solar battery Expired - Fee Related CN202808933U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201220302784XU CN202808933U (en) 2012-06-27 2012-06-27 Heating plate for substrate of heterojunction solar battery

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201220302784XU CN202808933U (en) 2012-06-27 2012-06-27 Heating plate for substrate of heterojunction solar battery

Publications (1)

Publication Number Publication Date
CN202808933U true CN202808933U (en) 2013-03-20

Family

ID=47867848

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201220302784XU Expired - Fee Related CN202808933U (en) 2012-06-27 2012-06-27 Heating plate for substrate of heterojunction solar battery

Country Status (1)

Country Link
CN (1) CN202808933U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103710664A (en) * 2013-12-27 2014-04-09 江苏宇天港玻新材料有限公司 Vacuum coating heating device
CN103938159A (en) * 2012-04-27 2014-07-23 奥昱公司 Inverted Evaporation Apparatus
CN104282611A (en) * 2013-07-09 2015-01-14 中微半导体设备(上海)有限公司 Plasma processing cavity and static chuck thereof
CN110994077A (en) * 2019-12-30 2020-04-10 福建省汽车工业集团云度新能源汽车股份有限公司 Uniform temperature heating method for power battery pack and storage medium

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103938159A (en) * 2012-04-27 2014-07-23 奥昱公司 Inverted Evaporation Apparatus
CN104282611A (en) * 2013-07-09 2015-01-14 中微半导体设备(上海)有限公司 Plasma processing cavity and static chuck thereof
CN103710664A (en) * 2013-12-27 2014-04-09 江苏宇天港玻新材料有限公司 Vacuum coating heating device
CN110994077A (en) * 2019-12-30 2020-04-10 福建省汽车工业集团云度新能源汽车股份有限公司 Uniform temperature heating method for power battery pack and storage medium

Similar Documents

Publication Publication Date Title
CN201817546U (en) Substrate supporting base and chemical vapor deposition equipment applying same
CN202808933U (en) Heating plate for substrate of heterojunction solar battery
EP3412794B1 (en) Coating device with moving target and coating method
WO2010017054A3 (en) Indium tin oxide (ito) layer forming
CN102628163B (en) Cadmium telluride thin-film solar cell back contact layer production method and vertical coater
CN104498892A (en) Method for preparing graphene film through low-temperature fixed-point nucleating
CN204325497U (en) A kind of base plate heating plate
CN101226877B (en) Substrate processing device and method
CN202543323U (en) Low pressure chemical vapor deposition (LPCVD) preheating cavity temperature control system
CN109385602B (en) Uniform surface shape deposition evaporation device and method
US20120048726A1 (en) Methods of sputtering using a non-bonded semiconducting target
CN216404520U (en) Vacuum evaporation coating equipment
CN102842636B (en) For the base plate heating pedestal of chemical gas-phase deposition system
CN216514090U (en) Evaporation plating device capable of improving heat utilization rate
CN103014620B (en) OLED (Organic Light Emitting Diode) glass substrate thermal evaporator
US8460521B2 (en) Sputtering cathode having a non-bonded semiconducting target
CN102839806A (en) Heating composite floor
CN105006501A (en) Preparation method and preparation device for CIGS-based thin-film solar cell
CN101497984A (en) Locating mask
CN211720759U (en) Heating device for evaporation
JP2013187194A (en) High frequency heating apparatus
CN103824649A (en) Method of using electromagnetic heating to optimize quality of transparent conducting oxide film
CN202226913U (en) Magnetron sputtering uniform heating device
CN201708176U (en) Flat heating device for heating substrates
KR20150083066A (en) Linear Depositing System for Substrate Cooling

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130320

Termination date: 20150627

EXPY Termination of patent right or utility model