CN103824649A - Method of using electromagnetic heating to optimize quality of transparent conducting oxide film - Google Patents
Method of using electromagnetic heating to optimize quality of transparent conducting oxide film Download PDFInfo
- Publication number
- CN103824649A CN103824649A CN201410035552.6A CN201410035552A CN103824649A CN 103824649 A CN103824649 A CN 103824649A CN 201410035552 A CN201410035552 A CN 201410035552A CN 103824649 A CN103824649 A CN 103824649A
- Authority
- CN
- China
- Prior art keywords
- oxide film
- transparent conductive
- conductive oxide
- optimize
- electromagnetic heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses a method of using electromagnetic heating to optimize the quality of a transparent conducting oxide (TCO) film. A TCO film is firstly prepared on a substrate of flexible material; the prepared TCO film is placed in an electromagnetic field to undergo heating processing to enhance conducting and light-transmitting performances, and optimized TCO film is obtained. According to the method, the problem that TCO is prepared on the flexible material under low temperature can be solved, quick heating processing can be carried out on a TCO film commonly prepared on glass at present, a TCO film excellent in performances can be obtained, and the method can be widely applied to the flexible display field and the photovoltaic field.
Description
Technical field
The invention belongs to material technology field, relate to a kind of method of optimizing transparent conductive oxide film quality, especially a kind of method of utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality.
Background technology
Along with developing by leaps and bounds of information technology and photovoltaic, flexible conducting material is more and more subject to people's attention and pays close attention to, have broad application prospects in a lot of fields, and as photovoltaic cell, display screen etc.Existing TCO coating technique is all to utilize the methods such as thermal evaporation, electron beam evaporation, vacuum sputtering, chemical vapour deposition (CVD), spraying, these methods will expect that the TCO film of high permeability, high conductivity just must add the temperature that is not less than 200 ℃ to substrate base, and so high temperature makes the composite material of PET class be difficult to use, even or can be plated at low temperatures TCO film, the electricity of film or optical characteristics do not reach utilization requirement.Therefore, PET plastics temperature tolerance is poor, and this has restricted its application in flexible solar cell, flexible demonstration field.The TCO electrode how preparation has a good photoelectric characteristic excellence under cryogenic conditions has become key.
Summary of the invention
The object of the invention is to overcome the shortcoming of above-mentioned prior art, a kind of method of utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality is provided, the method can solve this difficult problem of TCO of preparing at low temperatures on flexible material, can be applied to flexible demonstration field and photovoltaic field.
The object of the invention is to be achieved through the following technical solutions:
This method of utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality is first prepared TCO film in flexible substrate; The TCO film of preparation is placed in to elect magnetic field to its selectivity heat treated, its conduction, light transmission is got a promotion, the transparent conductive oxide film being optimized.
Further, the above transparent conductive oxide film of preparing in flexible substrate is the mode that adopts thermal evaporation, electron beam evaporation, vacuum sputtering, chemical vapour deposition (CVD) or spraying.
Further, above heat treatment process is to carry out in oxygen, air, nitrogen or argon gas.
Above-mentioned TCO film is one or more mixture, metal alloy or laminate film of indium oxide, the tin oxide of doping and the zinc oxide of doping of doping.
Above-mentioned flexible material substrate is glass, macromolecular material or stainless steel.
Above-mentioned flexible material substrate is PET, polyamide, Merlon, polyethylene or organic substance material.
Upper prefabricated membrane type comprises: for the preparation of all kinds of oxidation films and the emtal alloy film of TCO film.
The above-mentioned transparent conductive oxide film thickness being optimized is between 10 nanometers to 3 micron.
Further, above-mentioned while carrying out heat treated, wave frequency at 10 hertz between 100GHz.
Further, while more than preparing TCO film and heat treatment, use reel-to-reel technology.
The present invention has following beneficial effect:
The method that the present invention utilizes Electromagnetic Heating to optimize transparent conductive oxide film quality heats TCO film (alloy film or conductive oxide film) by electromagnetism selectivity.Utilize electromagnetic induction principle, high-frequency current flows through coil and produces the magnetic field changing at a high speed, and the magnetic field of variation produces countless little eddy current by conductive film, make to conduct electricity prefabricated membrane itself moment heating, and as the composite material of substrate, non-conductive, can significantly do not heated.Thereby realize under low temperature on the backing material of non-refractory selective thermal and process the effective ways of TCO film.The method has not only solved this difficult problem of TCO of preparing at low temperatures on flexible material, and can carry out rapid thermal treatment at TCO film on glass to existing general preparation, thereby obtains the TCO film that performance is more excellent.Can be widely used in flexible demonstration field and photovoltaic field.
Accompanying drawing explanation
Fig. 1 is the preparation process schematic diagram of embodiments of the invention 1;
Fig. 2 is the preparation process schematic diagram of embodiments of the invention 2;
Fig. 3 is the preparation process schematic diagram of embodiments of the invention 3;
Fig. 4 is the preparation process schematic diagram of embodiments of the invention 4;
Fig. 5 is wherein a kind of preparation process schematic diagram of the inventive method;
Fig. 6 is the another kind of preparation process schematic diagram of the inventive method.
Embodiment
As shown in Figure 6: the method that the present invention utilizes Electromagnetic Heating to optimize transparent conductive oxide film quality is: first on flexible material substrate, prepare TCO film (this prefabricated TCO film itself or backing material must conduct electricity); The TCO film of preparation is placed in to elect magnetic field, and to its heat treated, (heat treatment process is to carry out in the atmosphere that is conducive to optimize TCO film, as oxygen, air, nitrogen, argon gas etc.), its conduction, light transmission are got a promotion, the transparent conductive oxide film being optimized.Wherein on flexible material substrate, preparing transparent conductive oxide film is the mode that adopts thermal evaporation, electron beam evaporation, vacuum sputtering, chemical vapour deposition (CVD) or spraying.Wave frequency used in the present invention at 10 hertz between 100GHz.Film preparation and heat treatment are used reel-to-reel technology.
Above-mentioned TCO film is one of following film:
Indium oxide, the tin oxide of doping, the zinc oxide of doping, above-mentioned hopcalite, metal alloy or the laminate film etc. of doping.
Above-described flexible material substrate is one of following:
Glass, stainless steel, macromolecular material are as PET, polyamide, Merlon, polyethylene etc., organic substance material etc.
Prefabricated membrane type of the presently claimed invention comprises: object is for the preparation of TCO(transparent conductive oxide) all kinds of oxidation films and the alloy firm of film.
Transparent conductive oxide film thickness of the present invention is between 10 nanometers to 3 micron.
Below in conjunction with drawings and Examples, the present invention is described in further detail:
Embodiment 1
By the method for magnetron sputtering, ITO is deposited on to PET composite material volume upper, by Fig. 1 shown device, prefabricated ito thin film is processed, according to carrying out below:
1. prepare ito thin film with magnetron sputtering apparatus, sputtering condition:
2.PET composite material volume, thickness: 0.125mm; Width: 150mm; Length: 300m.
3. electromagnetic wave generator: frequency: 13.56MHz, 30 watts of power.
4. volume transmission speed is 1 meter per second, and ito thin film surface temperature reaches 230 ℃ (laser temperature-measuring instrumentation amounts).Volume transmission speed has determined the temperature that ito thin film can reach, and transmitance and the resistivity of rear film is processed in final decision.
5. result after treatment
1) transmitance: before processing, 86%, process rear 93%;
2) resistivity: process front 1.9 × 10
-4Ω cm, processes rear 1.9 × 10
-4Ω cm.
Embodiment 2
AZO is deposited on white glass substrate with electron beam vapour deposition method, by Fig. 2 shown device, prefabricated AZO film is processed, according to carrying out below:
1. section north instrument ZZSX-500 electron beam evaporation equipment evaporation AZO film in using, evaporation conditions:
2. white glass substrate, thickness: 0.9mm; Width: 100mm; Length: 100mm.
3. electromagnetic wave generator: frequency: 40KHz.200 watts of power.
4. the processing time: 20 seconds, AZO film surface temperature reached 315 ℃ (laser temperature-measuring instrumentation amounts).
5. result after treatment:
1) transmitance: process front 91%, after processing 95%;
2) resistivity: process front 1.87 × 10
-3Ω cm, processes rear 8.2 × 10
-4Ω cm.
Embodiment 3
On ITO being deposited at the bottom of stainless steel lining with electron beam vapour deposition method, by Fig. 4 shown device, prefabricated ito thin film is processed.According to carrying out below:
1. section north instrument ZZSX-500 electron beam evaporation equipment evaporation ITO film in using, evaporation conditions:
2. at the bottom of stainless steel lining, thickness: 0.3mm; Width: 150mm; Length: 150mm.
3. electromagnetic wave generator: frequency: 40KHz; 360 watts of power.
4. the processing time: 20 seconds, ITO film surface temperature reached 273 ℃ (laser temperature-measuring instrumentation amounts).
5. result after treatment:
1) transmitance is greatly improved, and is approximately increased to 90% by 80%
2) resistivity: process front 4.9 × 10
-4Ω cm, processes rear 3.7 × 10
-4Ω cm.
Embodiment 4
ITO is deposited on white glass substrate with electron beam vapour deposition method, prefabricated ito thin film is processed in O2 atmosphere by Fig. 4 shown device.According to carrying out below:
1. section north instrument ZZSX-500 electron beam evaporation equipment evaporation ITO film in using, evaporation conditions:
2. white glass substrate, thickness: 0.9mm; Width: 100mm; Length: 100mm.
3. electromagnetic wave generator: frequency: 40KHz; 200 watts of power.
4. the processing time: 20 seconds.
5. result after treatment:
1) transmitance: process front 78%, after processing 91%;
2) resistivity: process front 5 × 10
-4Ω cm, processes rear 3 × 10
-4Ω cm.
Embodiment 5
This electromagnetic heater is integrated in vacuum sputtering chamber, forms the production system of high-quality TCO film in a set of flexible substrate with vacuum sputter system, as shown in Figure 5.Press shown in figure, drive system is arranged on each type flexible material volume on return idler 1, after vacuum reaches sputter requirement, starts active roller 2, sputter equipment, electromagnetic heater simultaneously.Active roller 2 drives whole drive system motion; By the deposition quality of the parameter adjustment films such as the distance between sputtering power, sputtering pressure, sputtering target and flexible material volume; The heat treatment situation of the parameter adjustment such as power, the frequency film by high frequency coil; Transmission speed affects deposit thickness and the heating-up temperature of film.
Claims (10)
1. utilize Electromagnetic Heating to optimize a method for transparent conductive oxide film quality, it is characterized in that, first on flexible material substrate, prepare TCO film; The TCO film of preparation is placed in to elect magnetic field to its heat treated, its conduction, light transmission is got a promotion, the transparent conductive oxide film being optimized.
2. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterized in that, on flexible material substrate, preparing transparent conductive oxide film is the mode that adopts thermal evaporation, electron beam evaporation, vacuum sputtering, chemical vapour deposition (CVD) or spraying.
3. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, heat treatment process is to carry out in oxygen, air, nitrogen or argon gas.
4. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, it is characterized in that, described TCO film is one or more mixture, alloy or laminate film of indium oxide, the tin oxide of doping and the zinc oxide of doping of doping.
5. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, described flexible material substrate is glass, macromolecular material, stainless steel foil or aluminium foil.
6. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, described flexible material substrate is PET, polyamide, Merlon, polyethylene or organic substance material.
7. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, prefabricated membrane type comprises: for the preparation of all kinds of oxidation films and the alloy firm of TCO film.
8. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, the transparent conductive oxide film thickness being optimized is between 10 nanometers to 3 micron.
9. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, while carrying out heat treated, wave frequency at 10 hertz between 100GHz.
10. the method for utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality according to claim 1, is characterized in that, when preparation TCO film and heat treatment, uses reel-to-reel technology.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410035552.6A CN103824649B (en) | 2014-01-25 | 2014-01-25 | A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410035552.6A CN103824649B (en) | 2014-01-25 | 2014-01-25 | A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103824649A true CN103824649A (en) | 2014-05-28 |
| CN103824649B CN103824649B (en) | 2016-11-09 |
Family
ID=50759654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410035552.6A Active CN103824649B (en) | 2014-01-25 | 2014-01-25 | A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103824649B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106048530A (en) * | 2016-07-20 | 2016-10-26 | 陕西师范大学 | Transparent conducting oxide (TCO) film and preparation method thereof |
| CN106683795A (en) * | 2017-03-02 | 2017-05-17 | 苏州维业达触控科技有限公司 | Coating method of transparent conducting film and device for forming hydrophobic and oleophobic substance |
| CN114242338A (en) * | 2021-12-16 | 2022-03-25 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000087219A (en) * | 1998-09-08 | 2000-03-28 | Mitsubishi Rayon Co Ltd | Forming method of transparent conductive film |
| CN101036236A (en) * | 2004-10-08 | 2007-09-12 | 仲夏股份公司 | Apparatus and method of manufacturing solar cells |
| CN102134691A (en) * | 2010-12-22 | 2011-07-27 | 中国兵器工业第五二研究所 | Cobalt-based amorphous giant magneto-impedance ribbon and preparation method thereof |
| KR101297084B1 (en) * | 2011-02-23 | 2013-08-19 | 한국전기연구원 | Transparent conductive film, device for manufacturing transparent conductive film, and method of manufacturing transparent conductive film |
-
2014
- 2014-01-25 CN CN201410035552.6A patent/CN103824649B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000087219A (en) * | 1998-09-08 | 2000-03-28 | Mitsubishi Rayon Co Ltd | Forming method of transparent conductive film |
| CN101036236A (en) * | 2004-10-08 | 2007-09-12 | 仲夏股份公司 | Apparatus and method of manufacturing solar cells |
| CN102134691A (en) * | 2010-12-22 | 2011-07-27 | 中国兵器工业第五二研究所 | Cobalt-based amorphous giant magneto-impedance ribbon and preparation method thereof |
| KR101297084B1 (en) * | 2011-02-23 | 2013-08-19 | 한국전기연구원 | Transparent conductive film, device for manufacturing transparent conductive film, and method of manufacturing transparent conductive film |
Non-Patent Citations (1)
| Title |
|---|
| 裴瑜: "ITO薄膜的制备及通电电流对薄膜特性的影响", 《中国优秀硕士学位论文全文数据库 工程科技I辑》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106048530A (en) * | 2016-07-20 | 2016-10-26 | 陕西师范大学 | Transparent conducting oxide (TCO) film and preparation method thereof |
| CN106683795A (en) * | 2017-03-02 | 2017-05-17 | 苏州维业达触控科技有限公司 | Coating method of transparent conducting film and device for forming hydrophobic and oleophobic substance |
| CN114242338A (en) * | 2021-12-16 | 2022-03-25 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
| CN114242338B (en) * | 2021-12-16 | 2024-02-06 | 长春博信光电子有限公司 | Method for improving resistance value of ITO film |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103824649B (en) | 2016-11-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106756840A (en) | A kind of high-temperature flexible transparent conductive film and preparation method and application | |
| CN101294272A (en) | Method for sputtering and depositing tin indium oxide transparent electroconductive film on flexible substrate at room temperature | |
| TWI621726B (en) | Transparent conductive film and method of producing the same | |
| Cheong et al. | Transparent film heaters with highly enhanced thermal efficiency using silver nanowires and metal/metal-oxide blankets | |
| CN108118303A (en) | A kind of film and preparation method thereof | |
| Chu et al. | AZO/Au/AZO tri-layer thin films for the very low resistivity transparent electrode applications | |
| WO2018040954A1 (en) | Preparation of pet/nano silver wire transparent conductive film by illumination sintering | |
| CN102168246B (en) | Large-area high-uniformity transparent conducting film deposited on flexible substrate and preparation method thereof | |
| CN103824649B (en) | A kind of method utilizing Electromagnetic Heating to optimize transparent conductive oxide film quality | |
| CN104810114B (en) | High transmission rate flexible polyimide substrate ITO conductive film and preparation method and application | |
| CN103993288B (en) | A kind of preparation method of electrically conducting transparent FTO/Ag/FTO laminated film | |
| CN105551579A (en) | Electrochromic multi-layered transparent conductive thin film and preparation method therefor | |
| Sahu et al. | Effect of substrate temperature and annealing treatment on the electrical and optical properties of silver-based multilayer coating electrodes | |
| CN104993057B (en) | A kind of production method using graphene film and the compound transparency electrode of wire netting | |
| CN104377261B (en) | One prepares CdTe thin film solar panel method | |
| CN108914077A (en) | One kind being based on Nb2O5Transparent conductive oxide film and preparation method thereof | |
| CN204884600U (en) | A flexible conductive film of ITO for intelligent light -adjusting glass | |
| Mian et al. | Improvement of the uniformity of structural and electrical properties of transparent conductive Al-doped ZnO thin films by inductively coupled plasma-assisted radio frequency magnetron sputtering | |
| CN203487223U (en) | Coating device for depositing flexible base material ITO (Indium Tin Oxides) film at low temperature | |
| Park et al. | Flexible indium zinc oxide/Ag/indium zinc oxide multilayer electrode grown on polyethersulfone substrate by cost-efficient roll-to-roll sputtering for flexible organic photovoltaics | |
| CN106119795A (en) | Utilize the method that vacuum magnetron sputtering coating film technology prepares lithium battery C Si negative pole coating | |
| Kao et al. | The characteristics of transparent conducting Al-doped zinc oxide thin films deposited on polymer substrates | |
| CN104803374B (en) | Prepare the structure of the device of graphene film, method and graphene film | |
| CN103695856B (en) | Flexible F doping SnO 2transparent conductive film and preparation method | |
| CN105869773A (en) | Preparation method of graphene-metal nanoparticle composite transparent conductive film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |